会员体验
专利管家(专利管理)
工作空间(专利管理)
风险监控(情报监控)
数据分析(专利分析)
侵权分析(诉讼无效)
联系我们
交流群
官方交流:
QQ群: 891211   
微信请扫码    >>>
现在联系顾问~
热词
    • 17. 发明专利
    • Sputtering target
    • 飞溅目标
    • JP2009256719A
    • 2009-11-05
    • JP2008106489
    • 2008-04-16
    • Hirasho:Kk株式会社平昭
    • TAKAGI TAKESHIHEISHO TAISEINAKAJIMA KUNIHIKO
    • C23C14/34C04B35/628
    • C23C14/3414C04B35/453C04B35/628C22C29/12C25D7/00H01J37/3414H01J37/3426H01J37/3429H01J37/3435H01J37/3491
    • PROBLEM TO BE SOLVED: To provide a sputtering target having a flat and smooth surface having a uniform composition, which is obtained by using, as a raw material, a conductive inorganic oxide powder having finer particle size and more excellent powder resistance as compared with the conventional conductive inorganic oxide powder. SOLUTION: The sputtering target is obtained by molding and sintering a conductive inorganic oxide powder having an average primary particle diameter of 3-40 nm, which is provided with conductivity by being doped with one or more components selected from aluminum, gallium and indium in an amount of 0.1-20.0 wt.% in terms of oxides. The conductive inorganic oxide powder is manufactured by an electrolytic doping method wherein electrolysis is performed in a state that a slurry containing an inorganic oxide powder having an average primary particle diameter of 1-30 nm, is made to contain one or more components selected from aluminum, gallium and indium. COPYRIGHT: (C)2010,JPO&INPIT
    • 要解决的问题:为了提供具有均匀组成的平滑光滑表面的溅射靶,其通过使用具有更细粒度和更优异的耐粉末性的导电性无机氧化物粉末作为原料而获得, 与常规的导电无机氧化物粉末相比。 解决方案:溅射靶是通过模制和烧结平均一次粒径为3-40nm的导电无机氧化物粉末而获得的,其通过掺杂一种或多种选自铝,镓和镓的组分而具有导电性, 铟的量为0.1-20.0重量%,以氧化物计。 导电无机氧化物粉末通过电解掺杂法制造,其中电解是在含有平均一次粒径为1-30nm的无机氧化物粉末的浆料中含有一种或多种选自铝的成分 ,镓和铟。 版权所有(C)2010,JPO&INPIT