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11. 发明专利

JP2013175595A Substrate holding device, pattern transfer device, and pattern transfer method 有权
标题翻译：基板保持装置，图案转印装置和图案转印方法
公开(公告)号：JP2013175595A
公开(公告)日：2013-09-05
申请号：JP2012039074
申请日：2012-02-24
申请人： Toshiba Corp , 株式会社東芝
发明人： KASA KENTARO , TAKAKUWA MAHO , INENAMI RYOICHI , MATSUKI KAZUTO , NAKASUGI TETSUO , KOIZUMI HIROSHI , INOMOTO MINORU
IPC分类号： H01L21/683 , H01L21/027
CPC分类号： G03F7/70783 , G03F7/707
摘要： PROBLEM TO BE SOLVED: To provide a substrate holding device, a pattern transfer device, and a pattern transfer method which properly adjust the distortion of a substrate held.SOLUTION: According to an embodiment, a substrate holding device including a body part, and multiple first support parts is provided. The body part has a main surface. The body part is formed into a plate shape. The multiple first support parts are disposed on the main surface. The multiple first support parts respectively have suction parts that suction the substrate. The suction parts may move along a first direction that is arranged perpendicular to the major surface and a second direction that is arranged parallel to the major surface.
摘要翻译：要解决的问题：提供一种适当调整保持的基板的变形的基板保持装置，图案转印装置和图案转印方法。解决方案：根据实施方式，一种基板保持装置，包括主体部分和多个提供第一支撑部件。身体部位有一个主表面。主体部分形成为板状。多个第一支撑部分设置在主表面上。多个第一支撑部分分别具有吸附基板的抽吸部件。抽吸部件可以沿着垂直于主表面布置的第一方向和平行于主表面布置的第二方向移动。

12. 发明专利

JP2012243799A Imprint method and defect inspection method of template 审中-公开
标题翻译：模糊方法和缺陷检测方法
公开(公告)号：JP2012243799A
公开(公告)日：2012-12-10
申请号：JP2011109404
申请日：2011-05-16
申请人： Toshiba Corp , 株式会社東芝
发明人： INENAMI RYOICHI
IPC分类号： H01L21/027 , B29C33/70 , B29C59/02
摘要： PROBLEM TO BE SOLVED: To provide an imprint method capable of reliably performing an inspection of an imprinting template in a short time and improving the operation rate and the productivity of an imprint apparatus.SOLUTION: The imprint method determines application conditions of a resist material used in template inspection based on a piece of pattern data for manufacturing the template, and applies a resist material 11 over an inspection substrate 30 under the determined application conditions. After bringing a template 20 into contact with the resist material 11 to allow the resist material 11 to harden for a certain period, the template 20 is peeled off from the resist material 11. Thus, a resist pattern is formed on the inspection substrate 30. The resist pattern formed on the inspection substrate 30 is inspected to determine the acceptability of the template 20. A resist pattern is formed on a substrate to be processed using the template 20 determined as acceptable.
摘要翻译：要解决的问题：提供能够在短时间内可靠地执行对压印模板的检查并提高压印装置的操作率和生产率的压印方法。解决方案：压印方法基于用于制造模板的图案数据确定在模板检查中使用的抗蚀剂材料的应用条件，并且在确定的应用条件下将抗蚀剂材料11涂覆在检查基板30上。在使模板20与抗蚀剂材料11接触以使抗蚀剂材料11硬化一定时间后，将模板20从抗蚀剂材料11剥离。因此，在检查基板30上形成抗蚀剂图案。检查形成在检查基板30上的抗蚀剂图案，以确定模板20的可接受性。使用确定为可接受的模板20在待处理的基板上形成抗蚀剂图案。版权所有（C）2013，JPO＆INPIT

13. 发明专利

JP2012064810A Template for nanoimprint and pattern transfer device 审中-公开
标题翻译： NANOIMPRINT和图案传输设备的模板
公开(公告)号：JP2012064810A
公开(公告)日：2012-03-29
申请号：JP2010208540
申请日：2010-09-16
申请人： Toshiba Corp , 株式会社東芝
发明人： SANHONGI AKIKO , INENAMI RYOICHI , KASA KENTARO , NAKAJIMA YUMI , SUZUKI MASATO , TAKAKUWA MAHO , FURUDONO YOKO
IPC分类号： H01L21/027 , B29C33/42 , B29C59/02
CPC分类号： G03F7/002 , G03F9/7042
摘要： PROBLEM TO BE SOLVED: To provide highly precise alignment without having any adverse effect.SOLUTION: A template for nanoimprint comprises a transfer pattern 16a and an alignment mark AM2 provided on the identical face. The alignment mark AM2 is composed of a polarizer or a phase difference film 17. During pattern transfer on a substrate by a nanoimprint technology, by using polarization or by detecting an optical phase difference, alignment between the substrate and the template for nanoimprint is performed.
摘要翻译：要解决的问题：提供高精度对准而不产生任何不利影响。解决方案：用于纳米压印的模板包括设置在同一面上的转印图案16a和对准标记AM2。对准标记AM2由偏振片或相位差膜17构成。在通过纳米压印技术在衬底上进行图案转印时，通过使用偏振或通过检测光学相位差来进行衬底和用于纳米压印的模板之间的对准。版权所有（C）2012，JPO＆INPIT

14. 发明专利

JP2012049370A Imprint device 审中-公开
标题翻译：印刷设备
公开(公告)号：JP2012049370A
公开(公告)日：2012-03-08
申请号：JP2010190852
申请日：2010-08-27
申请人： Toshiba Corp , 株式会社東芝
发明人： INENAMI RYOICHI
IPC分类号： H01L21/027 , B29C59/02
CPC分类号： G03F7/0002 , B82Y10/00 , B82Y40/00
摘要： PROBLEM TO BE SOLVED: To provide an imprint device that transfers a pattern with high accuracy and efficiency.SOLUTION: An imprint device for forming a resist pattern by curing a resist formed on a substrate to be transferred in the state in which a template having a shape of the pattern to be transferred to the substrate to be transferred is in touch with the resist formed on the substrate to be transferred comprises template holding means for holding a plurality of templates at desired intervals to form an array-like shape and position control means for individually controlling the template positions.
摘要翻译：要解决的问题：提供以高精度和高效率传送图案的压印装置。解决方案：一种用于通过固化形成在要转移的基板上的抗蚀剂来形成抗蚀剂图案的印模装置，其中将具有要转印到待转印的基板的图案的形状的模板的模板与待转印的基板接触形成在待转印的基板上的抗蚀剂包括用于以期望的间隔保持多个模板以形成阵列状的模板保持装置和用于单独控制模板位置的位置控制装置。版权所有（C）2012，JPO＆INPIT

15. 发明专利

JP2011240662A Imprint method, imprint device, and program 审中-公开
标题翻译： IMPRINT方法，IMPRINT DEVICE和PROGRAM
公开(公告)号：JP2011240662A
公开(公告)日：2011-12-01
申请号：JP2010116546
申请日：2010-05-20
申请人： Toshiba Corp , 株式会社東芝
发明人： KISHIMOTO MASAMICHI , INENAMI RYOICHI , KYO SUIGEN , TOKUE HIROSHI
IPC分类号： B29C59/02 , B29C33/70 , H01L21/027
摘要： PROBLEM TO BE SOLVED: To provide a high productive imprint method for controlling an optimal yield ratio according to a type of defect when a defective template is produced, and to provide an imprint device and a program.SOLUTION: The imprint method performs multiple times: a step of transferring an indented pattern on an imprint material by bringing the indented pattern formed on the template into contact with the imprinted material on a substrate; and a step of imaging the indented pattern formed on the template after the transferring step, or the imprint material. Subsequently, the method determines the type of the defect of the template based on time course of change of multiple images obtained by the imaging steps over multiple times.
摘要翻译：要解决的问题：提供一种高生产率的压印方法，用于当产生缺陷模板时根据缺陷的类型来控制最佳屈服比，并提供压印装置和程序。压印方法执行多次：通过使形成在模板上的缩进图案与基板上的印刷材料接触来将压痕图案转印到压印材料上的步骤; 以及在转印步骤之后，在模板上形成的缩进图案或压印材料成像步骤。随后，该方法基于通过多次成像步骤获得的多个图像的改变的时间过程来确定模板的缺陷的类型。版权所有（C）2012，JPO＆INPIT

16. 发明专利

JP2010283207A Pattern forming device and pattern forming method 审中-公开
标题翻译：图案形成装置和图案形成方法
公开(公告)号：JP2010283207A
公开(公告)日：2010-12-16
申请号：JP2009136218
申请日：2009-06-05
申请人： Toshiba Corp , 株式会社東芝
发明人： INENAMI RYOICHI , ARAKI SHUNJI , KONO TAKUYA
IPC分类号： H01L21/027 , B29C59/02
CPC分类号： G03F7/0002 , B82Y10/00 , B82Y40/00 , G03F9/00
摘要： PROBLEM TO BE SOLVED: To form a pattern by imprinting without causing a decrease in throughput nor deterioration in alignment precision.
SOLUTION: A pattern forming device includes a substrate holder 20 holding a substrate 60 to be processed, a template holder 10 holding a template 50 where a predetermined pattern is formed, a position measuring device 21 measuring the position of the substrate 60 to be processed which is held by the substrate holder 20, a position measuring device 12 measuring the position of the template 50 held by the template holder 10, and a controller 40 calculating displacement of the substrate 60 to be processed and the template 50, respectively, obtaining a relative displacement of the template 50 to the substrate 60 to be processed, and correcting a pattern transfer position using the relative displacement.
COPYRIGHT: (C)2011,JPO&INPIT
摘要翻译：要解决的问题：通过压印形成图案，而不会导致生产量的降低或对准精度的劣化。解决方案：图案形成装置包括保持要处理的基板60的基板保持件20，保持形成有预定图案的模板50的模板保持器10，测量基板60的位置的位置测量装置21 由基板保持器20保持的位置测量装置12，测量由模板保持器10保持的模板50的位置的位置测量装置12以及分别计算待处理的基板60和模板50的位移的控制器40，获得模板50相对于要处理的基板60的相对位移，并且使用相对位移校正图案转印位置。版权所有（C）2011，JPO＆INPIT

17. 发明专利

JP2010251601A Template, method of manufacturing the same, and method of forming pattern 有权
标题翻译：模板，其制造方法和形成图案的方法
公开(公告)号：JP2010251601A
公开(公告)日：2010-11-04
申请号：JP2009100937
申请日：2009-04-17
申请人： Toshiba Corp , 株式会社東芝
发明人： YONEDA IKUO , KONO TAKUYA , NAKASUGI TETSUO , INENAMI RYOICHI
IPC分类号： H01L21/027 , B29C33/38 , B29C59/02
CPC分类号： G03F7/0002 , B82Y10/00 , B82Y40/00
摘要： PROBLEM TO BE SOLVED: To provide a template in which the gap region of a substrate to be processed can be covered with an imprint resist uniformly with good reproducibility, a method of manufacturing the same, and to provide a method of forming a pattern.
SOLUTION: The method of manufacturing the template used in an optical imprint method includes: forming a pattern for imprinting in a pattern forming region 14 on a substrate 10; forming a resist film 11 in the pattern forming region 14; carrying out anisotropic etching using the resist film 11 as a mask to form a first step portion 13b and a first side portion 13a that connects the pattern forming region 14 and the first step portion 13b; forming a resist film 12 in the pattern forming region 14 and an outer peripheral portion 14b surrounding the pattern forming region 14 after removing the resist film 11; and carrying out wet etching using the resist film 12 as a mask to form a second step portion 13d and a curved second side portion 13c that connects the first step portion 13b and the second step portion 13d.
COPYRIGHT: (C)2011,JPO&INPIT
摘要翻译：要解决的问题：提供一种模板，其中待加工的基板的间隙区域可以均匀地以良好的再现性被抗压印抗蚀剂覆盖，其制造方法和提供一种形成模式。解决方案：在光学压印方法中使用的模板的制造方法包括：在基板10上的图案形成区域14中形成用于压印的图案; 在图案形成区域14中形成抗蚀剂膜11; 使用抗蚀剂膜11作为掩模进行各向异性蚀刻，以形成连接图案形成区域14和第一台阶部分13b的第一台阶部分13b和第一侧面部分13a; 在除去抗蚀剂膜11之后，在图案形成区域14中形成抗蚀剂膜12和围绕图案形成区域14的外周部分14b; 并使用抗蚀剂膜12作为掩模进行湿式蚀刻，以形成连接第一台阶部分13b和第二台阶部分13d的第二台阶部分13d和弯曲的第二侧部分13c。版权所有（C）2011，JPO＆INPIT

18. 发明专利

JP2010149482A Mold for inprint and pattern forming method 审中-公开
标题翻译：用于印刷和图案形成方法的模具
公开(公告)号：JP2010149482A
公开(公告)日：2010-07-08
申请号：JP2008333077
申请日：2008-12-26
申请人： Toshiba Corp , 株式会社東芝
发明人： FURUDONO YOKO , INENAMI RYOICHI , NOMURA HIROSHI
IPC分类号： B29C59/02 , B29C33/38 , B81C99/00 , H01L21/027
CPC分类号： B29C37/0053 , B29C35/0888 , B29C37/0003 , B29C37/006 , B29C43/003 , B29C43/021 , B29C2035/0827 , B29C2043/025 , B29C2043/3634 , B29C2059/023 , B29K2105/0002 , B82Y10/00 , B82Y40/00 , G03F7/0002
摘要： PROBLEM TO BE SOLVED: To provide a mold for inprint suppressing the occurrence of mold defect. SOLUTION: In the mold 1 for inprint having rugged pattern 11 corresponding to a pattern to be transferred, at least a region 4 between bottoms of recessed parts of the rugged pattern 11 and faces opposite to the recessed parts and on the opposite side of a face formed with the rugged pattern has higher permeability for gas than quart. COPYRIGHT: (C)2010,JPO&INPIT
摘要翻译：要解决的问题：提供一种印模抑制模具缺陷发生的模具。解决方案：在用于印刷的模具1中，具有对应于待转印图案的凹凸图案11，至少在粗糙图案11的凹部的底部和凹部相对的面之间的区域4和相对侧形成凹凸图案的表面的气体比夸脱具有更高的渗透性。版权所有（C）2010，JPO＆INPIT

19. 发明专利

JP2010003985A Method and device for liquid-immersion exposure 审中-公开
标题翻译：用于液体暴露的方法和装置
公开(公告)号：JP2010003985A
公开(公告)日：2010-01-07
申请号：JP2008163678
申请日：2008-06-23
申请人： Toshiba Corp , 株式会社東芝
发明人： SATO TAKASHI , INENAMI RYOICHI , AZUMA TSUKASA , TOKI TATSUHIKO
IPC分类号： H01L21/027 , G03F7/20
摘要： PROBLEM TO BE SOLVED: To provide a method for liquid-immersion exposure capable of diminishing thermal shrinkages of a wafer and a wafer stage, and a device thereof. SOLUTION: The method for liquid-immersion exposure is characterized in that an immersion liquid is filled between an objective material for exposure and a projection optical system placed to face the objective material for exposure to exposure the objective material for exposure, and when the objective material for exposure is exposed, a vapor pressure of the immersion liquid in the vicinity of the position where the immersion liquid is filled, is kept a specified value higher than a vapor pressure of the immersion liquid in an exposure environment. COPYRIGHT: (C)2010,JPO&INPIT

20. 发明专利

JP2009295919A Method for manufacturing semiconductor device 有权
标题翻译：制造半导体器件的方法
公开(公告)号：JP2009295919A
公开(公告)日：2009-12-17
申请号：JP2008150627
申请日：2008-06-09
申请人： Toshiba Corp , 株式会社東芝
发明人： INENAMI RYOICHI , MIKAMI SHINJI , INOUE HIROFUMI
IPC分类号： H01L21/027
CPC分类号： G03F7/0002 , B82Y10/00 , B82Y40/00 , G03F9/7076
摘要： PROBLEM TO BE SOLVED: To reduce an influence of a rounding error to be generated in imprint.
SOLUTION: The method for manufacturing a semiconductor device includes: a design data preparation step of preparing design data for forming a plurality of patterns on a semiconductor substrate; a first pattern formation step of forming a first resist pattern on the semiconductor substrate to form a first pattern on the semiconductor substrate using the first resist pattern; and a second pattern formation step of forming a second resist pattern on the semiconductor substrate using an imprint device after the first pattern formation step to form a second pattern on the semiconductor substrate using the second pattern. In the first pattern formation step, the first pattern which is smaller than a design pattern corresponding to the design data is formed.
COPYRIGHT: (C)2010,JPO&INPIT
摘要翻译：要解决的问题：减少在压印中产生的舍入误差的影响。解决方案：半导体器件的制造方法包括：设计数据准备步骤，准备在半导体衬底上形成多个图案的设计数据; 第一图案形成步骤，在所述半导体衬底上形成第一抗蚀剂图案，以使用所述第一抗蚀图案在所述半导体衬底上形成第一图案; 以及第二图案形成步骤，在第一图案形成步骤之后，使用压印装置在半导体衬底上形成第二抗蚀剂图案，以使用第二图案在半导体衬底上形成第二图案。在第一图案形成步骤中，形成小于与设计数据对应的设计图案的第一图案。版权所有（C）2010，JPO＆INPIT

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