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11. 发明专利

JP2012219164A Method for producing resin 有权
标题翻译：生产树脂的方法
公开(公告)号：JP2012219164A
公开(公告)日：2012-11-12
申请号：JP2011085270
申请日：2011-04-07
申请人： Sumitomo Chemical Co Ltd , 住友化学株式会社
发明人： KAMABUCHI AKIRA , YAMASHITA HIROKO
IPC分类号： C08F8/12 , G03F7/039 , H01L21/027
摘要： PROBLEM TO BE SOLVED: To provide a method for producing a resin for resist compositions capable of giving excellent line width roughness.SOLUTION: The method for producing the resin having structural units represented by formulas (I) and (II) includes the first step of polymerizing a monomer represented by formula (III) and a monomer represented by formula (IV), and the second step of hydrolyzing the product obtained in the first step to convert -O-CO-Rinto -OH, wherein Rand Rare each alkyl, a hydrogen atom or a halogen atom; R-Rare each alkyl or an alicyclic hydrocarbon group; Rand Rare bound to each other to form a divalent hydrocarbon group; Xand Xare each a single bond or a divalent linking group; Rand Rare each alkyl, or are bound to each other to form a divalent hydrocarbon group.
摘要翻译：要解决的问题：提供一种能够提供优异的线宽粗糙度的抗蚀剂组合物树脂的制造方法。解决方案：具有由式（I）和（II）表示的结构单元的树脂的制造方法包括使由式（III）表示的单体和式（IV）表示的单体聚合的第一步骤，水解第一步中获得的产物的第二步骤是将-O-CO-R 7 转化为-OH，其中R 1 2 -R 4 分别为烷基或脂环族烃基; R 2 和R 3 彼此结合形成二价烃基; X 1 和X 2 分别为单键或二价连接基团; R 7 和R 8 各自为烷基，或彼此结合形成二价烃基。版权所有（C）2013，JPO＆INPIT

12. 发明专利

JP2012153641A Annulene derivative, method of manufacturing the same, and resist composition 审中-公开
标题翻译：蒽醌衍生物，其制备方法和耐药组合物
公开(公告)号：JP2012153641A
公开(公告)日：2012-08-16
申请号：JP2011013887
申请日：2011-01-26
申请人： Sumitomo Chemical Co Ltd , 住友化学株式会社
发明人： MUKAI YUICHI , YAMASHITA HIROKO , TAKEMOTO KAZUKI
IPC分类号： C07C39/23 , C07C41/06 , C07C41/16 , C07C43/215 , C07C67/31 , C07C69/736 , G03F7/004 , G03F7/039
摘要： PROBLEM TO BE SOLVED: To provide a new annulene derivative useful for a resist composition or the like and a new resist composition containing the annulene derivative.SOLUTION: This new annulene derivative is represented by formula (IX), for example. In the formula, substituent R is a group having a saturated aliphatic ring and ester bond part, a group having a hydrocarbon group and acetal bond part, or a hydroxyl group. All of Rs are not hydroxyl groups.
摘要翻译：要解决的问题：提供可用于抗蚀剂组合物等的新的环状衍生物和含有芳烃衍生物的新型抗蚀剂组合物。
解决方案：例如，该新的芳烃衍生物由式（IX）表示。在该式中，取代基R是具有饱和脂肪族环和酯键部分的基团，具有烃基和缩醛键部分的基团或羟基。所有的Rs都不是羟基。版权所有（C）2012，JPO＆INPIT

13. 发明专利

JP2012118515A Resist composition and method for producing resist pattern 审中-公开
标题翻译：耐蚀组合物及其制造方法
公开(公告)号：JP2012118515A
公开(公告)日：2012-06-21
申请号：JP2011240870
申请日：2011-11-02
申请人： Sumitomo Chemical Co Ltd , 住友化学株式会社
发明人： YAMASHITA HIROKO , ANDO NOBUO
IPC分类号： G03F7/039 , C07C65/10 , C07C211/63 , C07C309/17 , C07C381/12 , C08F220/10 , C08F220/30 , G03F7/004 , H01L21/027
摘要： PROBLEM TO BE SOLVED: To provide a highly sensitive resist composition used for EUV lithography or electron beam lithography.SOLUTION: A resist composition contains: (A) a resin which has a particular structural unit, and which is insoluble or hardly soluble in an alkali aqueous solution and becomes soluble in an alkali aqueous solution by an action of an acid; (B) an acid generator; (D) a solvent; and (E) a compound expressed by the formula (a). [In the formula (a), Rrepresents an aliphatic hydrocarbon group having 1-10 carbon atoms and so on, and Rrepresents a hydrogen atom, an aliphatic hydrocarbon group or an aromatic hydrocarbon group.]
摘要翻译：要解决的问题：提供用于EUV光刻或电子束光刻的高灵敏度抗蚀剂组合物。抗蚀剂组合物包含：（A）具有特定结构单元的树脂，其在碱性水溶液中不溶或难溶，并通过酸的作用溶于碱性水溶液中; （B）酸发生剂; （D）溶剂; 和（E）由式（a）表示的化合物。 [式（a）中，R 3表示具有1-10个碳原子的脂族烃基等，R 3 SP>表示氢原子，脂族烃基或芳香族烃基。]（C）2012，JPO＆INPIT

14. 发明专利

JP2011059277A Compound and resist composition 审中-公开
标题翻译：化合物和组合物
公开(公告)号：JP2011059277A
公开(公告)日：2011-03-24
申请号：JP2009207477
申请日：2009-09-08
申请人： Sumitomo Chemical Co Ltd , 住友化学株式会社
发明人： SUGIHARA MASAKO , HASHIMOTO KAZUHIKO , ANDO NOBUO , YAMASHITA HIROKO
IPC分类号： G03F7/004 , C07C215/74 , C07D213/30 , C07D233/64 , G03F7/039 , H01L21/027
摘要： PROBLEM TO BE SOLVED: To provide a resist composition, from which a fine resist pattern can be formed. SOLUTION: The resist composition contains a compound expressed by formula (C1) and an acid generator allows formation of a fine resist pattern. In formula (C1), m3 represents an integer of 4 to 10; R c1 represents a hydroxyl group or the like; n3 represents an integer of 1 to 4; R c2 represents a group expressed by formula (2-1) or formula (2-2). In formula (2-1) and formula (2-2), L c1 represents a divalent hydrocarbon group; L c2 represents a single bond or a divalent hydrocarbon group; R c3 and R c4 each represent a hydrogen atom or an aliphatic hydrocarbon group; and R c5 represents a cyclic group containing a nitrogen atom as an atom constituting the ring. COPYRIGHT: (C)2011,JPO&INPIT
摘要翻译：要解决的问题：提供可以形成精细抗蚀剂图案的抗蚀剂组合物。解决方案：抗蚀剂组合物含有由式（C1）表示的化合物，并且酸发生剂允许形成精细的抗蚀剂图案。式（C1）中，m 3表示4〜10的整数， R c1表示羟基等; n3表示1〜4的整数， R 2表示由式（2-1）或式（2-2）表示的基团。在式（2-1）和式（2-2）中，L c1 表示二价烃基; L c2表示单键或二价烃基; R 3和R 4各自表示氢原子或脂肪族烃基; 并且R c5 表示含有氮原子作为构成环的原子的环状基团。版权所有（C）2011，JPO＆INPIT

15. 发明专利

JP2011037835A New compound, resist composition, and method for forming pattern 有权
标题翻译：新化合物，抗蚀剂组合物和形成图案的方法
公开(公告)号：JP2011037835A
公开(公告)日：2011-02-24
申请号：JP2010155689
申请日：2010-07-08
申请人： Sumitomo Chemical Co Ltd , 住友化学株式会社
发明人： ICHIKAWA KOJI , SUGIHARA MASAKO , YAMASHITA HIROKO
IPC分类号： C07C381/12 , C07C53/10 , C07C62/24 , C07C63/08 , C07D333/76 , C08F20/38 , C09K3/00 , G03F7/004 , G03F7/039
CPC分类号： G03F7/066 , C07C62/22 , C07C63/08 , C07C69/63 , C07C69/712 , C07C69/753 , C07C69/757 , C07C205/57 , C07C309/17 , C07C381/12 , C07C2603/74 , C07D333/76 , C08F8/12 , C08F12/24 , C08F20/38 , C08F28/02 , C08F28/06 , C08F212/14 , C08F220/18 , C09D125/18 , G03F7/0045 , G03F7/038 , G03F7/0397 , G03F7/38 , Y10S430/106 , Y10S430/111 , Y10S430/122 , Y10S430/123 , C08F12/22 , C08F2220/1883 , C08F2220/1891 , C08F220/20 , C08F2220/283 , C08F220/38
摘要： PROBLEM TO BE SOLVED: To provide a compound capable of forming patterns having excellent pattern resolution and line edge roughness, and to provide a resist composition using the same.
SOLUTION: There is provided a compound represented by formula (I-Pb), [wherein, X
Pb is a single bond or -O-; R
Pb is a single bond, a divalent aliphatic hydrocarbon group, an alicyclic hydrocarbon group or an aromatic hydrocarbon group; methylene groups contained in the aliphatic hydrocarbon group and the alicyclic hydrocarbon group each may be replaced by oxygen atom or a carbonyl group; Y
Pb is a polymerizable group; Z
Pb is an organic group; X
Pc is a single bond or an alkylene group; R
Pc is an aliphatic hydrocarbon group, an alicyclic hydrocarbon group or an aromatic hydrocarbon group which may have one or more substituents; methylene groups contained in the aliphatic hydrocarbon group and the alicyclic hydrocarbon group each may be replaced by an oxygen atom or a carbonyl group].
COPYRIGHT: (C)2011,JPO&INPIT
摘要翻译：要解决的问题：提供能够形成具有优异的图案分辨率和线边缘粗糙度的图案的化合物，并提供使用其的抗蚀剂组合物。提供由式（I-Pb）表示的化合物[其中，X Pb 是单键或-O-; R Pb 是单键，二价脂族烃基，脂环族烃基或芳香族烃基; 脂肪族烃基和脂环式烃基中所含的亚甲基各自可以被氧原子或羰基取代; Y Pb 是可聚合基团; Z Pb 是有机基团; X Pc 是单键或亚烷基; R P是脂族烃基，脂环族烃基或可具有一个或多个取代基的芳香族烃基; 脂族烃基和脂环族烃基中所含的亚甲基各自可以被氧原子或羰基取代]。版权所有（C）2011，JPO＆INPIT

16. 发明专利

JP2011037834A New compound, resist composition and method for forming pattern 有权
标题翻译：新化合物，抗蚀剂组合物和形成图案的方法
公开(公告)号：JP2011037834A
公开(公告)日：2011-02-24
申请号：JP2010155687
申请日：2010-07-08
申请人： Sumitomo Chemical Co Ltd , 住友化学株式会社
发明人： ICHIKAWA KOJI , SUGIHARA MASAKO , YAMASHITA HIROKO
IPC分类号： C07C381/12 , C07C25/02 , C07C57/055 , C07C63/64 , C07C69/54 , C08F20/38 , G03F7/004 , G03F7/039
CPC分类号： C08F22/02 , C07C25/18 , C07C57/03 , C07C57/28 , C07C63/64 , C07C63/66 , C07C69/54 , C07C309/17 , C07C381/12 , C07C2603/74 , C08F20/38 , C08F32/08 , G03F7/0045 , G03F7/0397 , G03F7/30 , Y10S430/122 , Y10S430/123
摘要： PROBLEM TO BE SOLVED: To provide a compound capable of forming patterns having excellent pattern resolution and line edge roughness, and to provide a resist composition using the same. SOLUTION: There is provided a compound represented by formula (I-Pb), [wherein, X Pb is a single bond or -O-; R Pb is a single bond, a divalent aliphatic hydrocarbon group, an alicyclic hydrocarbon group or an aromatic hydrocarbon group; methylene groups contained in the aliphatic hydrocarbon group and the alicyclic hydrocarbon group each may be replaced by an oxygen atom or a carbonyl group; Y Pb is a polymerizable group; Z Pb is an organic group; X Pc is a single bond or an alkylene group; R Pc is an aliphatic hydrocarbon group, an alicyclic hydrocarbon group or an aromatic hydrocarbon group which may have one or more substituents; methylene groups contained in the aliphatic hydrocarbon group and the alicyclic hydrocarbon group each may be replaced by oxygen atom or a carbonyl group]. COPYRIGHT: (C)2011,JPO&INPIT
摘要翻译：要解决的问题：提供能够形成具有优异的图案分辨率和线边缘粗糙度的图案的化合物，并提供使用其的抗蚀剂组合物。提供由式（I-Pb）表示的化合物[其中，X Pb 是单键或-O-; R Pb 是单键，二价脂族烃基，脂环族烃基或芳香族烃基; 脂族烃基和脂环族烃基中所含的亚甲基各自可以被氧原子或羰基取代; Y Pb 是可聚合基团; Z Pb 是有机基团; X Pc 是单键或亚烷基; R P是脂族烃基，脂环族烃基或可具有一个或多个取代基的芳香族烃基; 脂族烃基和脂环族烃基中所含的亚甲基可以被氧原子或羰基取代]。版权所有（C）2011，JPO＆INPIT

17. 发明专利

JP2014040387A Salt, resist composition, and method for producing resist pattern 审中-公开
标题翻译：盐，抗蚀剂组合物和生产耐火图案的方法
公开(公告)号：JP2014040387A
公开(公告)日：2014-03-06
申请号：JP2012182971
申请日：2012-08-22
申请人： Sumitomo Chemical Co Ltd , 住友化学株式会社
发明人： YOSHIDA ISAO , YAMASHITA HIROKO , ICHIKAWA KOJI
IPC分类号： C07C309/17 , C07C381/12 , C09K3/00 , G03F7/004 , G03F7/039 , H01L21/027
摘要： PROBLEM TO BE SOLVED: To provide a salt for an acid generator, which is used for a resist composition capable of producing a resist pattern excellent in pattern collapse margin (PCM).SOLUTION: The salt is represented by formula (I). [In the formula (I), Qand Qeach independently represent a fluorine atom or a C1-C6 perfluoroalkyl group; Lrepresents a C1-C17 divalent saturated hydrocarbon group; ring Wrepresents a C6-C18 aromatic ring; Rrepresents a hydroxy group or a C1-C6 alkyl group; t represents an integer of 0-2; Rand Reach independently represent a hydrogen atom or a C1-C12 monovalent hydrocarbon group; Rrepresents a C1-C20 monovalent hydrocarbon group; n represents 1 or 2; and Zrepresents an organic cation.]
摘要翻译：要解决的问题：提供一种酸产生剂的盐，其用于能够产生图案崩塌边缘（PCM）优异的抗蚀剂图案的抗蚀剂组合物。溶液：盐由式（I）表示。 [式（I）中，Q和Q独立地表示氟原子或C1-C6全氟烷基。表示C1-C17二价饱和烃基; 环W表示C6-C18芳环; R表示羟基或C1-C6烷基; t表示0-2的整数; Rand Reach独立地表示氢原子或C1-C12单价烃基; R表示C1-C20单价烃基; n表示1或2; Z代表有机阳离子。]

18. 发明专利

JP2013092598A Resist composition 审中-公开
标题翻译：耐腐蚀组合物
公开(公告)号：JP2013092598A
公开(公告)日：2013-05-16
申请号：JP2011233616
申请日：2011-10-25
申请人： Sumitomo Chemical Co Ltd , 住友化学株式会社
发明人： KIN KYOCHU , KAMABUCHI AKIRA , YAMASHITA HIROKO
IPC分类号： G03F7/004 , C07C211/63 , C07D213/80 , C07D215/48 , C08F220/28 , G03F7/039 , H01L21/027
摘要： PROBLEM TO BE SOLVED: To provide a resist composition by which a resist pattern excellent in resolution can be manufactured.SOLUTION: A resist composition includes a resin which contains a group unstable to an acid and decomposes by the action of an acid to increase solubility with an aqueous alkali solution, an acid generator, and a compound represented by the formula (I). In the formula (I), a ring Hrepresents a 3-20C aromatic heterocycle which may have a substituent, and R, R, Rand Reach independently represent a 1-20C alkyl group.
摘要翻译：解决的问题：提供可以制造分辨率优异的抗蚀剂图案的抗蚀剂组合物。解决方案：抗蚀剂组合物包括含有对酸不稳定的基团并通过酸的作用分解以增加与碱水溶液，酸产生剂和由式（I）表示的化合物的溶解度的树脂的树脂，。在式（I）中，环H 1 表示可以具有取代基的3-20C芳族杂环，R 1 ，R 2 ，R 3 和R 4 各自独立地表示 1-20C烷基。版权所有（C）2013，JPO＆INPIT

19. 发明专利

JP2013082665A Salt, resist composition, and method for producing resist pattern 有权
标题翻译：盐，抗蚀剂组合物和生产耐火图案的方法
公开(公告)号：JP2013082665A
公开(公告)日：2013-05-09
申请号：JP2012076373
申请日：2012-03-29
申请人： Sumitomo Chemical Co Ltd , 住友化学株式会社
发明人： ICHIKAWA KOJI , YOSHIDA ISAO , YAMASHITA HIROKO
IPC分类号： C07C309/17 , C07C381/12 , C09K3/00 , G03F7/004 , G03F7/039 , H01L21/027
CPC分类号： C07C309/17 , C07C25/18 , C07C303/32 , C07C309/06 , C07C309/07 , C07C309/12 , C07C309/19 , C07C381/12 , C07C2601/14 , C07C2603/74 , C07D333/46 , G03F7/0045 , G03F7/0046 , G03F7/0392 , G03F7/0397 , Y10S430/111 , Y10S430/122 , Y10S430/123
摘要： PROBLEM TO BE SOLVED: To provide a resist composition with which a resist pattern with excellent line edge roughness (LER) is produced and which includes a predetermined salt as an acid generator.SOLUTION: The salt is represented by formula (I) (in formula (I), each of Qand Qindependently represents a fluorine atom or the like; Lrepresents a 1-17C divalent saturated hydrocarbon group or the like; each of Land Lindependently represents a single bond, a 1-6C divalent saturated hydrocarbon group or the like; each of a ring Wand a ring Windependently represents a 3-36C hydrocarbon ring; each of Rand Rindependently represents a hydrogen atom or 1-6C alkyl group, Rrepresents a 1-6C alkyl group; t denotes an integer of 0 to 2; and Zrepresents an organic counter ion).
摘要翻译：要解决的问题：提供一种抗蚀剂组合物，其具有优异的线边缘粗糙度（LER）的抗蚀剂图案，并且包括作为酸产生剂的预定盐。解决方案：盐由式（I）表示（在式（I）中，Q 1 和Q 2 < SP>独立地表示氟原子等; L 1 表示1-17C的二价饱和烃基等; L 2 和L 3 独立地表示单键，1-6C二价饱和烃基等;环W 1 和环W 2 独立地表示3-36C烃环; R 1 SP POS =“POST”> 2 独立地表示氢原子或1-6C烷基，R“表示1-6C烷基; t表示整数为0〜2; Z + 表示有机抗衡离子）。版权所有（C）2013，JPO＆INPIT

20. 发明专利

JP2013079228A Salt and resist composition 审中-公开
标题翻译：盐和组合物
公开(公告)号：JP2013079228A
公开(公告)日：2013-05-02
申请号：JP2012189596
申请日：2012-08-30
申请人： Sumitomo Chemical Co Ltd , 住友化学株式会社
发明人： SAKAMOTO HIROSHI , YAMASHITA HIROKO , ICHIKAWA KOJI
IPC分类号： C07C309/17 , C07C381/12 , C08F20/18 , G03F7/004 , G03F7/039 , H01L21/027
摘要： PROBLEM TO BE SOLVED: To provide an acid generator that composes a resist composition in which line edge roughness (LER) is excellent when manufacturing a resist pattern.SOLUTION: A hydroxyl aromatic derivative has a group shown by formula (1). In the formula, Qand Qidentically or differently denote a fluorine atom or a 1-6C perfluoroalkyl group; Ldenotes a 1-17C divalent aliphatic saturated hydrocarbon group, wherein a methylene group that composes the divalent aliphatic saturated hydrocarbon group may be replaced with an oxygen atom or a carbonyl group; Zdenotes an organic cation; and * denotes a bond with a hydroxyl aromatic ring.
摘要翻译：要解决的问题：提供构成抗蚀剂图案的制造中线边缘粗糙度（LER）优异的抗蚀剂组合物的酸发生剂。解决方案：羟基芳族衍生物具有式（1）所示的基团。在该式中，相同或不同地表示氟原子或1-6C全氟烷基的Q 1 和Q 2 L 1 表示1-17C的二价脂族饱和烃基，其中构成二价脂族饱和烃基的亚甲基可以被氧原子或羰基取代; Z + 表示有机阳离子; 和*表示与羟基芳环的键。版权所有（C）2013，JPO＆INPIT

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