会员体验
专利管家(专利管理)
工作空间(专利管理)
风险监控(情报监控)
数据分析(专利分析)
侵权分析(诉讼无效)
联系我们
交流群
官方交流:
QQ群: 891211   
微信请扫码    >>>
现在联系顾问~
热词
    • 12. 发明专利
    • IMAGE FORMING DEVICE
    • JPH01281462A
    • 1989-11-13
    • JP11192388
    • 1988-05-09
    • SEIKO EPSON CORP
    • KURIHARA HAJIMESHIMURA EIJI
    • B41J2/385G03G15/00G03G15/05
    • PURPOSE:To eliminate the need of electrostatically charging and image exposing and forming processes and to make the title device smaller in size and lower in cost by making an image forming member interpose between a member for supporting conductive powder and an electrode head divided into plural and impressing a voltage corresponding to an image. CONSTITUTION:By impressing the specified voltage between the conductive powder 1 and the electrode head 8 divided into the plural, charges are injected into the conductive powder 1 from the member for supporting the conductive powder 1. At the same time, the opposite charges are injected into the image forming member 5 from the electrode head 8 corresponding to respective picture elements or the image forming member 5 is made to generate spontaneous polarization. The conductive powder 1 is thus held on the image forming member 5 with an electrostatic force to form a desirable image (character, picture and dotted picture, etc.). After forming the desirable image, the image is transferred on other image forming member (fine-quality paper, middle-quality paper, low-ranking paper and OHP paper, etc.) by using at least one force out of heat, pressure, magnetic force and electric force. Thus, the device can be made smaller in size and lower in cost.
    • 18. 发明专利
    • Solid state image pickup device
    • 固态图像拾取器件
    • JPS61142769A
    • 1986-06-30
    • JP26564484
    • 1984-12-17
    • Seiko Epson Corp
    • TAKESHITA TETSUYOSHIKURIHARA HAJIMEOKA HIDEAKIHASEGAWA KAZUMASA
    • H01L27/146H04N1/028H04N5/335H04N5/359H04N5/374
    • H01L27/14665
    • PURPOSE:To obtain a solid-state image pickup device having a large S/N ratio and a large amount of saturated light without reducing a light receiving area, by laminating an additional capacitor part at the lower part of a thin film light receiving element. CONSTITUTION:On an insulating substrate 101, the following parts are formed by ordinary forming method of a polycrystalline silicon TFT: a non-doped polycrystalline Si layer 102, a gate electrode 103, source and drain electrodes, an interlayer insulating film 104, a vertical line 105 and an interlayer insulating film 106. A contact hole is formed in the interlayer insulating film. A conducting thin film as an individual electrode 107 for forming an additional capacitor is formed. A dielectric thin film as an insulating film 108 or an oxide film, which is obtained by oxidizing the electrode 107, is formed. A common electrode 109 for a light receiving element is formed on the individual electrode 107 so as to hold said insulating film. The electrode 109 is commonly used as the common electrode for the additional capacitor. A light receiving thin film 10 is deposited. A contact hole and a transparent conducting thin film 111 are formed at the position of the individual electrode 107. An additional capacitor is provided at the lower part of the light receiving element in electrically parallel with the light receiving element.
    • 目的:通过在薄膜光接收元件的下部层叠附加的电容器部分,获得具有大S / N比和大量饱和光的固态摄像装置,而不会降低光接收面积。 构成:在绝缘基板101上,通过多晶硅TFT的普通成形方法形成以下部件:非掺杂多晶硅层102,栅极103,源极和漏极,层间绝缘膜104,垂直 线路105和层间绝缘膜106.在层间绝缘膜中形成接触孔。 形成作为用于形成附加电容器的单独电极107的导电薄膜。 形成通过氧化电极107而获得的绝缘膜108或氧化膜的电介质薄膜。 在单独电极107上形成用于光接收元件的公共电极109,以便保持所述绝缘膜。 电极109通常用作附加电容器的公共电极。 沉积光接收薄膜10。 在单独电极107的位置处形成接触孔和透明导电薄膜111.另外的电容器设置在光接收元件的下部,与光接收元件电并联。
    • 20. 发明专利
    • Solid-state image pickup sensor
    • 固态图像拾取传感器
    • JPS61108165A
    • 1986-05-26
    • JP23094984
    • 1984-11-01
    • Seiko Epson Corp
    • OKA HIDEAKITAKESHITA TETSUYOSHIKURIHARA HAJIME
    • H01L27/14H01L27/146H01L31/0248H01L31/09H01L31/10H04N5/335H04N5/361H04N5/369
    • H01L27/14665H01L31/095
    • PURPOSE:To obtain a light current close to a theoritical value even at a low voltage with a dark current being suppressed to a low level, by laminating a plurality of specified amorphous semiconductor layers on an amorphous semiconductor layer including silicon, and mixing an adequate amount of impurities in said layers. CONSTITUTION:On a transparent electrode 11, the following layers are laminat ed: an amorphous semiconductor layer 12 inclusing silicon; an amorphous semi conductor layer 13, which includes at least one element among carbon, oxygen and nitrogen, in addition to silicon; an amorphous semiconductor layer 14 includ ing silicon and corbon; and an amorphous semiconductor layer 15. An adequate amount of impurities such as elements in the II-b group or the V-b group in the element periodic table and oxygen in the layers 14 and 15. Thus injection of holes from an electrode 16 is prevented, and a dark current can be suppressed. Even if a voltage, which is applied to a sensor is low, a light current to a theroritical value can be obtained. The above described characteristics can be obtained with good reproducibility without depending on the material quality of the electrode.
    • 目的:即使在暗电流被抑制到低电平的情况下,即使在低电压下也能获得接近正常值的光电流,通过在包括硅的非晶半导体层上层叠多个指定的非晶半导体层,并将足量的 的所述层中的杂质。 构成:在透明电极11上,层叠以下层:包含硅的非晶半导体层12; 除了硅之外,还包括碳,氧和氮中的至少一种元素的无定形半导体层13; 包括硅和金属的非晶半导体层14; 和非晶半导体层15.适当量的诸如元素周期表II-b族中的元素或元素周期表中的Vb基的元素以及层14和15中的氧。因此,防止了从电极16注入空穴, 并且可以抑制暗电流。 即使施加到传感器的电压低,也可以获得达到临界值的光电流。 可以在不依赖于电极的材料质量的情况下以良好的再现性获得上述特征。