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    • 11. 发明专利
    • Cylindrical sputtering target and method for manufacturing the same
    • 圆柱喷溅目标及其制造方法
    • JP2012132065A
    • 2012-07-12
    • JP2010285002
    • 2010-12-21
    • Tosoh Corp東ソー株式会社
    • YATSUTSUHA TOSHISUKEONOMI KENJISATO MASARUSHIBUTAMI TETSUO
    • C23C14/34C04B37/02
    • PROBLEM TO BE SOLVED: To provide a sputtering target capable of obtaining sufficient joining rate and strength, and remarkably suppressing the generation of cracks even under the influence of heat during sputtering, and a method for manufacturing the sputtering target.SOLUTION: A first underlayer 30 formed of nickel or copper is formed on an inner circumferential surface of a target material 20 formed of a cylindrical ceramic sintered body, or on both of the inner circumferential surface of the target material 20 formed of the cylindrical ceramic sintered body and an outer peripheral surface of a cylindrical support base material 10. A second underlayer 40 formed of tin is formed on the first underlayer 30. Thereafter, the target material 20 is arranged outside the cylindrical support base material 10 and both of them are joined together with a joining material so that the target is manufactured.
    • 要解决的问题:提供能够获得足够的接合率和强度的溅射靶,并且即使在溅射期间的热量的影响下也显着抑制裂纹的产生,以及溅射靶的制造方法。 解决方案:在由圆柱形陶瓷烧结体形成的目标材料20的内周面上或由形成于靶材料20的内部圆周表面上形成由镍或铜形成的第一底层30。 圆柱形陶瓷烧结体和圆柱形支撑基材10的外周表面。在第一底层30上形成由锡形成的第二底层40.此后,将目标材料20布置在圆柱形支撑基材10的外侧, 它们与接合材料接合在一起,从而制造目标物。 版权所有(C)2012,JPO&INPIT
    • 12. 发明专利
    • Ceramic cylindrical molding, and production method thereof
    • 陶瓷圆柱模具及其生产方法
    • JP2012139842A
    • 2012-07-26
    • JP2010292583
    • 2010-12-28
    • Tosoh Corp東ソー株式会社
    • MESHIDA MASAMISATO MASARUHARA SHINICHIITO KENICHISHIBUTAMI TETSUO
    • B28B3/00B28B21/18
    • PROBLEM TO BE SOLVED: To produce a ceramic cylindrical molding with high accuracy, particularly, high uniformity of circumferential thickness in good yield.SOLUTION: In production of a molding by filling ceramic powder in a shaping die having a columnar core rod and a cylindrical frame followed by cold isostatic pressing, the ceramic powder is filled in the shaping die by use of a funnel fixed above the shaping die while rotating the shaping die around the central axis of the columnar core rod. According to this, a ceramic cylindrical molding in which thickness unevenness in the same circumferential direction of less than 10% can be attained in 80% or more of the cylindrical portion thereof can be produced.
    • 要解决的问题:以高产率,高精度,特别是圆周厚度均匀性高的方式制造陶瓷圆柱形模制品。 解决方案:在通过在具有柱状芯棒和圆柱形框架的成型模具中填充陶瓷粉末然后进行冷等静压来生产模制品时,通过使用固定在上面的漏斗将陶瓷粉末填充在成形模具中 在成形模具围绕柱状芯棒的中心轴旋转的同时成形模具。 因此,可以制造其圆柱形部分的80%以上可以获得在圆周方向上的厚度不均匀小于10%的陶瓷圆筒状成形体。 版权所有(C)2012,JPO&INPIT
    • 13. 发明专利
    • Method for manufacturing cylindrical sputtering target
    • 制造圆柱喷溅目标的方法
    • JP2011168850A
    • 2011-09-01
    • JP2010034608
    • 2010-02-19
    • Tosoh Corp東ソー株式会社
    • SATO MASARUITO KENICHISHIBUTAMI TETSUO
    • C23C14/34
    • PROBLEM TO BE SOLVED: To provide a method for manufacturing a cylindrical sputtering target in which deviation and bending of outer peripheral surfaces of adjacent cylindrical target materials are eliminated or reduced, in the method for manufacturing the cylindrical sputtering target made of a plurality of cylindrical target materials.
      SOLUTION: In the method for manufacturing the cylindrical sputtering target by joining a cylindrical base material 10 and a plurality of cylindrical target materials 20 to one another by using a joining material, spacers capable of fixing the cylindrical target materials are inserted between adjacent cylindrical target materials so that outer peripheral surfaces of the adjacent cylindrical target materials are made coincident with each other when the cylindrical target materials are disposed with the cylindrical base material as a reference.
      COPYRIGHT: (C)2011,JPO&INPIT
    • 解决的问题:提供一种制造圆柱形溅射靶的方法,其中相邻的圆柱形靶材的外周面的偏移和弯曲被消除或减少,在由多个圆柱形靶材制成的圆柱形溅射靶的制造方法中 的圆柱形目标材料。 解决方案:在通过使用接合材料将圆柱形基材10和多个圆柱形靶材料20彼此接合来制造圆柱形溅射靶的方法中,能够将圆柱形靶材料固定的间隔件插入相邻的 当圆柱形靶材料以圆柱形基材设置为基准时,相邻的圆柱形目标材料的外周表面彼此重合。 版权所有(C)2011,JPO&INPIT
    • 14. 发明专利
    • Cylindrical sputtering target
    • 圆柱喷射目标
    • JP2010150610A
    • 2010-07-08
    • JP2008331175
    • 2008-12-25
    • Tosoh Corp東ソー株式会社
    • SATO MASARUITO KENICHISHIBUTAMI TETSUO
    • C23C14/34C04B37/02C23C6/00
    • PROBLEM TO BE SOLVED: To provide a cylindrical sputtering target whose using rate is improved, and which facilitates the injection of a solder material of In or the like, and can remarkably reduce the cleavages, cracks and peeling of solder or the like.
      SOLUTION: Regarding a plurality of cylindrical targets composed of a ceramic sintered compact such as ITO and AZO respectively, at least one of edge parts has a tapered shape and/or a stepped shape toward the inner circumference, a joining material (solder material) of In or the like is easily and smoothly injected into a gap between the cylindrical targets and a cylindrical base material, and they are joined so as to be a sputtering target. The obtained cylindrical sputtering target has high using efficiency, and has no cleavages, cracks and peeling.
      COPYRIGHT: (C)2010,JPO&INPIT
    • 要解决的问题:为了提供使用率提高的圆柱形溅射靶,并且有助于注入In等的焊料材料,并且可以显着地减少切割,裂纹和焊料等的剥离 。 解决方案:对于由诸如ITO和AZO的陶瓷烧结体组成的多个圆柱形靶,至少一个边缘部分具有朝向内周的锥形和/或阶梯形状,接合材料(焊料 材料)容易且顺利地注入圆柱形靶和圆柱形基底之间的间隙中,并且它们被接合成溅射靶。 得到的圆筒状溅射靶的使用效率高,无裂纹,龟裂,剥离。 版权所有(C)2010,JPO&INPIT
    • 16. 发明专利
    • Method for manufacturing cylindrical sputtering target
    • 制造圆柱喷溅目标的方法
    • JP2011084795A
    • 2011-04-28
    • JP2009240414
    • 2009-10-19
    • Tosoh Corp東ソー株式会社
    • SATO MASARUITO KENICHISHIBUTAMI TETSUO
    • C23C14/34
    • PROBLEM TO BE SOLVED: To provide a method for manufacturing a cylindrical sputtering target by which a uniform joining layer can be formed without incorporating air when joining of a cylindrical base material and a cylindrical target material by using a joining material to remarkably reduce cracking and peeling.
      SOLUTION: In the method in which a cylindrical target material made of a ceramics sintered compact and a cylindrical base material are joined using a joining material so as to produce a cylindrical sputtering target, when a space formed by the inside face of the cylindrical target material and the outside face of the cylindrical base material is filled with the joining material, an adaptor having a taper shape is set in the upper edge part of the cylindrical target material, and the joining material is poured through the adaptor to fill the space.
      COPYRIGHT: (C)2011,JPO&INPIT
    • 要解决的问题:提供一种用于制造圆柱形溅射靶的方法,通过使用接合材料将圆柱形基底材料和圆柱形目标材料接合时,可以形成均匀的接合层而不引入空气,从而显着降低 开裂和剥皮。 解决方案:在由陶瓷烧结体制成的圆筒状靶材和圆筒状基材使用接合材料接合以制造圆筒形溅射靶的方法中,当由内部形成的空间 圆柱形靶材料和圆筒形基材的外表面填充有接合材料,在圆柱形目标材料的上边缘部分中设置具有锥形形状的适配器,并且通过适配器将接合材料倒入以填充 空间。 版权所有(C)2011,JPO&INPIT