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11. 发明专利

JP2000280481A INK JET HEAD AND ITS MANUFACTURE 失效
公开(公告)号：JP2000280481A
公开(公告)日：2000-10-10
申请号：JP9479499
申请日：1999-04-01
申请人： MATSUSHITA ELECTRIC IND CO LTD
发明人： TOMITA KENJI , NAKAGAWA TORU , SOGA SANEMORI , SHIMAMOTO KEISUKE
IPC分类号： B41J2/135 , B41J2/16
摘要： PROBLEM TO BE SOLVED: To provide an ink jet head having a water-repellent thin film which is hard to separate, is superior in abrasion resistance and facilitates stable discharge of ink drops. SOLUTION: A coat liquid in which a methoxysilane or ethoxysilane compound as a precursor of a silicon oxide and an ethoxysilane or methoxysilane compound including carbon fluoride chains are dissolved is applied to a surface of a SUS base having a thickness of 20 μm. Then, after the base is dried at room temperatures for one hour, the base is baked at 200 deg.C for 30 minutes, whereby a water-repellent thin film 8 of a thickness of 10-1000 nm including molecules with fluoloalkyl chains bound to the silicon oxide is formed. A nozzle hole 4 is formed by electro-discharge machining from a rear face of the base, when a nozzle plate 5 is formed.

12. 发明专利

JPH1111983A PRODUCTION OF WATER-REPELLENT GLASS COATING 失效
公开(公告)号：JPH1111983A
公开(公告)日：1999-01-19
申请号：JP16225997
申请日：1997-06-19
申请人： MATSUSHITA ELECTRIC IND CO LTD
发明人： NAKAGAWA TORU , SOGA SANEMORI
IPC分类号： C03C17/30
摘要： PROBLEM TO BE SOLVED: To improve wear resistance and decrease in the water repellency at high temp. by subjecting a mixture soln. of a fluorocarbon compd. containing methoxysilyl groups or ethoxysilyl groups and a methoxysilane or ethoxysilane compd. to hydrolysis and dehydration polymn. in the presence of an acid catalyst and water, then applying the obtd. liquid on a solid base body, exposing the coating film to an alkali soln., drying and heat treating. SOLUTION: (A) An ethanol soln. in which a perfluoroalkylmethoxy silane and tetraethoxysilane are dissolved, and (B) an ethanol soln. in which water and hydrochloric acid are dissolved are prepared. The solution (B) is added to the solution (A) to hydrolyze the perfluoroalkylmethoxysilane and the tetraethoxy silane to produce silanols. The obtd. coating soln. is applied on a glass as a base body, and the glass is dipped in an ammonia soln. and taken out, or the glass is exposed to ammonia vapor, and then the glass is dried at room temp. and calcined to form a water-repellent glass coating film. The obtd. coating film has almost same hardness and wear resistance as glass and same or higher water-repellency as a fluorocarbon resin.

13. 发明专利

JPH08196418A INTERNAL LID AND HEAT INSULATING BOARD OF RICE COOKER AND METHOD OF PRODUCING THEM 失效
公开(公告)号：JPH08196418A
公开(公告)日：1996-08-06
申请号：JP741595
申请日：1995-01-20
申请人： MATSUSHITA ELECTRIC IND CO LTD
发明人： NOMURA YUKIO , SOGA SANEMORI , OGAWA KAZUFUMI , KURUMISAWA TOSHIMITSU , SHIBATA TSUNEO
IPC分类号： A47J27/00
摘要： PURPOSE: To provide an internal lid and a heat insulating board of a rice cooker having a good antifoulancy making the best use of the color tone of a base material and not harming the heat coductivity. CONSTITUTION: A chemical adsorption film 4 composed of a fluoroalkylsiloxane compound 2 formed on the surface of a base material 1 has such a constitution as a fluoroalkyl group is exposed on the surface side and a siloxyl group is adsorbed on the surface of the base material 1; the surface side has antifoulancy similar to fluorine coating, while the base material side is fixed by a chemical bond called siloxane bond so that it has a good adhesiveness.

14. 发明专利

JPH08192099A FORMATION OF CHEMICAL ADSORBING FILM 失效
公开(公告)号：JPH08192099A
公开(公告)日：1996-07-30
申请号：JP25597995
申请日：1995-10-03
申请人： MATSUSHITA ELECTRIC IND CO LTD
发明人： IKUTA SHIGEO , SOGA SANEMORI , OGAWA KAZUFUMI
IPC分类号： B05D3/06 , B05D7/02 , B05D7/24 , G03F7/26
摘要： PURPOSE: To selectively modify the surface of a polymer substrate by forming a fine pattern of a chemical adsorbing film as well as to modify the surface of a polymer substrate by forming a high density chemical adsorbing film on the surface of the substrate. CONSTITUTION: A polymer substrate 11 is irradiated with excimer laser light to impart hydrophilic groups such as OH groups 12 and NH groups 13 to the surface of the substrate 11. The substrate 11 is then immersed in a chemical adsorbing soln. prepd. by dissolving a chlorosilane type chemical adsorbing substance in a nonaq. solvent and the chlorosilyl groups of the chemical adsorbing substance are allowed to react with the hydrophilic groups of the substrate 11. By this reaction,-Si-O- bonds 14 and -Si-N- bonds 15 are formed and the objective chemical adsorbing film 16 is formed on the surface of the substrate 11.

15. 发明专利

JP2510054B2 失效
公开(公告)号：JP2510054B2
公开(公告)日：1996-06-26
申请号：JP616392
申请日：1992-01-17
申请人： MATSUSHITA ELECTRIC IND CO LTD
发明人： SOGA SANEMORI , OGAWA KAZUFUMI
IPC分类号： B41M5/26 , G11B7/24 , G11B7/254 , G11B7/257 , G11B7/26

16. 发明专利

JP2500178B2 失效
公开(公告)号：JP2500178B2
公开(公告)日：1996-05-29
申请号：JP19426692
申请日：1992-07-21
申请人： MATSUSHITA ELECTRIC IND CO LTD
发明人： OGAWA KAZUFUMI , SOGA SANEMORI
IPC分类号： B05D1/18 , B05D3/04 , B05D3/10 , B05D7/24 , B32B7/00 , B32B27/00

17. 发明专利

JP2500150B2 失效
公开(公告)号：JP2500150B2
公开(公告)日：1996-05-29
申请号：JP3813391
申请日：1991-02-06
申请人： MATSUSHITA ELECTRIC IND CO LTD
发明人： OGAWA KAZUFUMI , SOGA SANEMORI
IPC分类号： B32B7/00 , B32B3/20 , B32B7/02

18. 发明专利

JPH08120490A ALUMINUM OXIDIZED FILM AND ITS PRODUCTION 失效
公开(公告)号：JPH08120490A
公开(公告)日：1996-05-14
申请号：JP26018994
申请日：1994-10-25
申请人： MATSUSHITA ELECTRIC IND CO LTD
发明人： NOMURA YUKIO , NOBUTO YOSHIYASU , SHIBATA TSUNEO , SOGA SANEMORI , OZAKI SHINJI , OGAWA KAZUFUMI
IPC分类号： C25D11/18
摘要： PURPOSE: To drastically improve the corrosion resistance of aluminum by forming a chemisorption film in a porous anodized layer formed on the surface of aluminum at a room temp. to easily seal when compared to a conventional method. CONSTITUTION: The chemisorption film 5 is provided by forming the porous anodized layer 1 on the aluminum base material, chemisorbing a siloxane compound 2 on the base material by dipping the formed base material in a non- aqueous solvent containing the siloxane compound in a nitrogen atmosphere at a room temp. and polymerizing repetitively.

19. 发明专利

JPH07192970A CAPACITOR AND ITS MANUFACTURE 失效
公开(公告)号：JPH07192970A
公开(公告)日：1995-07-28
申请号：JP33091793
申请日：1993-12-27
申请人： MATSUSHITA ELECTRIC IND CO LTD
发明人： MIZOGUCHI ERIKO , TAKADA YUSUKE , SOGA SANEMORI , OGAWA KAZUFUMI
IPC分类号： C08G77/24 , C08G77/06 , H01G4/33
摘要： PURPOSE:To prevent a pinhole in the order of molecules from being caused by a method wherein a chemisorption monomolecular film which is bonded chemically to a lower-part electrode is used as an insulating film and a silver layer as an upper-part electrode is formed only on the surface of a siloxane- based chemisorption film whose surface is hydrophilic and which contains a water-repellent group at the inside of molecules. CONSTITUTION:An insulating film which is composed of a siloxane-based chemisorption monomolecular film or a siloxane-based chemisorption monomolecular accumulated layer which is siloxane-bonded and fixed to the surface of a lower-part electrode directly or indirectly via a siloxane-based monomolecular film, which contains a water-repellent group at the inside of molecules and which contains a hydrophilic group on the surface and an upper-part electrode which is composed of a silver layer which has been precipitated on the insulating layer by a silver mirror reaction are formed in a capacitor. Thereby, it is possible to obtain the manufacturing method of the capacitor which can eliminate a pinhole in the order of molecules substantially, whose capacitance is high and which can be miniaturized.

20. 发明专利

JPH07186319A POLIMERIC COMPOSITION AND ITS PREPARATION 失效
公开(公告)号：JPH07186319A
公开(公告)日：1995-07-25
申请号：JP33420693
申请日：1993-12-28
申请人： MATSUSHITA ELECTRIC IND CO LTD
发明人： TAMAKI MASAKO , NOBUTO YOSHIYASU , NOMURA YUKIO , SOGA SANEMORI , OZAKI SHINJI , OGAWA KAZUFUMI
IPC分类号： C08J7/00 , B32B9/00 , C08J7/04
摘要： PURPOSE:To provide a polymeric composition wherein endurance against repeated wash is excellent, and highly characteristic water repellency, oil repellency, and soil resistance are provided. CONSTITUTION:A SiOx (0

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