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    • 11. 发明专利
    • Electron beam alloying method
    • 电子束合金方法
    • JP2013111612A
    • 2013-06-10
    • JP2011260473
    • 2011-11-29
    • Mitsubishi Electric Corp三菱電機株式会社
    • YAMAMOTO YOSHIHIROHARADA MASAYUKIMAEDA TETSUSHIFUJIMOTO TETSUYA
    • B23K15/00C23C26/00
    • PROBLEM TO BE SOLVED: To provide an electron beam alloying method capable of performing stable alloying by suppressing the occurrence of uneven processing, forming a uniform alloy layer, and shortening the processing time regardless of the size of a processing region of a processing object.SOLUTION: A first irradiation point sequence 100 in which a plurality of irradiation points of electron beams are lined in one sequence at a prescribed interval in an X-axis direction on a surface of the processing object, and a second irradiation point sequence 200 in which a plurality of irradiation points are lined in one sequence at a prescribed interval in the X-axis direction away from the first irradiation point sequence 100 in a Y-axis direction by a prescribed distance are set as one irradiation region 300. Electron beams are irradiated from one end toward the other end of the first irradiation point sequence 100 and the second irradiation point sequence 200 at a prescribed cycle, alternately to the first irradiation point sequence 100 and the second irradiation point sequence 200.
    • 要解决的问题:提供一种能够通过抑制不均匀加工的发生,形成均匀的合金层而实现稳定的合金化,并且缩短处理时间,而不管处理的处理区域的尺寸如何 目的。 解决方案:第一照射点序列100,其中电子束的多个照射点在处理对象的表面上沿X轴方向以规定的间隔以一个顺序排列,并且第二照射点序列 200,其中多个照射点以沿X轴方向的X轴方向以规定间隔沿Y轴方向排列一定距离的多个照射点被设定为一个照射区域300.电子 光束以规定的周期从第一照射点序列100和第二照射点序列200的一端向另一端照射到第一照射点序列100和第二照射点序列200.版权所有: (C)2013,JPO&INPIT
    • 12. 发明专利
    • Device and method for surface treatment with electron beam
    • 用电子束表面处理的装置和方法
    • JP2008091230A
    • 2008-04-17
    • JP2006271482
    • 2006-10-03
    • Mitsubishi Electric Corp三菱電機株式会社
    • MIYAKE HIDETAKAIMAI YOSHIHITOYAMAMOTO YOSHIHIRO
    • H01J37/30
    • PROBLEM TO BE SOLVED: To provide a device and method for surface treatment with electron beams capable of obtaining a superb treatment face by controlling treatment temperature of even an object for treatment of a three-dimensional shape.
      SOLUTION: The device includes an electron beam generating means for generating electron beams, an electron beam focusing means for focusing electron beams, an electron beam deflecting means deflecting the focused electron beams and scanning it on the object for treatment, a control means connected to the electron beam generating means, the electron beam focusing means, and the electron beam deflecting means for controlling these means, a simulator connected with the control means, and a storage means storing information of the object for treatment. The simulator calculates a temperature distribution of the object for treatment under the surface treatment with the use of information of the object for treatment stored in the storage means, and the control means controls the electron beam generating means, the electron beam focusing means, and the electron beam deflecting means with the use of electron beam irradiation conditions selected based on the temperature distribution.
      COPYRIGHT: (C)2008,JPO&INPIT
    • 要解决的问题:提供一种能够通过控制即使是用于处理三维形状的物体的处理温度来获得优异处理面的电子束进行表面处理的装置和方法。 解决方案:该装置包括用于产生电子束的电子束产生装置,用于聚焦电子束的电子束聚焦装置,使聚焦的电子束偏转并将其扫描在待处理物体上的电子束偏转装置,控制装置 连接到电子束产生装置,电子束聚焦装置和用于控制这些装置的电子束偏转装置,与控制装置连接的模拟器以及存储对象进行处理的信息的存储装置。 模拟器使用存储在存储装置中的处理对象的信息来计算表面处理对象的温度分布,并且控制装置控制电子束发生装置,电子束聚焦装置和 使用基于温度分布选择的电子束照射条件的电子束偏转装置。 版权所有(C)2008,JPO&INPIT
    • 15. 发明专利
    • ELECTRON BEAM PROCESSING MACHINE
    • JPH0441083A
    • 1992-02-12
    • JP15076990
    • 1990-06-07
    • MITSUBISHI ELECTRIC CORP
    • YAMAMOTO YOSHIHIROHAYASHI TAKAHISA
    • B23K15/00
    • PURPOSE:To reduce the size of the electron beam processing machine and to simplify its construction by disposing a power source for a high-voltage power source adjacent to the high-voltage power source and integrating both. CONSTITUTION:The electron beam processing machine is constituted to have an electron gun 1 which executes electron beam processing, the high-voltage power source 2 which is disposed near the electron gun, is directly coupled thereto and supplies the power source for heating the cathode of the electron gun 1 and the power source for accelerating the electron beam, and the inverter power source 8 which is disposed near the high-voltage power source 2, is directly coupled and integrated to and with this power source and supplies the power source to the high-voltage power source 2. The need for housing the power source for the high-voltage power source together with control circuits, etc., in a control panel is eliminated in this way and the entire part of the electron beam processing machine is reduced, by which the constitution is simplified.
    • 16. 发明专利
    • WELD LINE DETECTOR FOR ELECTRON BEAM WELDING MACHINE
    • JPH02207984A
    • 1990-08-17
    • JP2888789
    • 1989-02-08
    • MITSUBISHI ELECTRIC CORP
    • YAMAMOTO YOSHIHIRO
    • B23K15/00
    • PURPOSE:To prevent the degradation in the sensitivity of an X-ray sensor which detects the X-ray radiated from the position where an electron beam is irradiated without requiring specific parts and to effectively utilize the space in a welding chamber by providing the X-ray sensor in an electron gun for scanning the electron beam. CONSTITUTION:The X-ray sensor 7 is installed in the electronic gun 4. Namely, the X-ray sensor 7 is mounted in the part deeper than a cylinder 10 provided on the electron beam exit side of the electronic gun 4. The cylinder 10 limits the angle range where metal vapor can intrude as far as possible to suppress the amt. of the metal vapor to be intruded to the electron gun 4 body to the permissible amt. or below. The cylinder 10 is applied in this way to the prevention of the metal vapor to the X-ray sensor 7 as well, by which the inside of the welding chamber 1 is effectively utilized without having the need for separately providing the intricate metal sticking preventive mechanism requiring a large space and the detecting sensitivity of the weld line position is always well maintained.
    • 17. 发明专利
    • DEVIATION WORKING METHOD BY ELECTRON BEAM
    • JPS63119991A
    • 1988-05-24
    • JP26389986
    • 1986-11-07
    • MITSUBISHI ELECTRIC CORP
    • NOGUCHI HIROSHIYAMAMOTO YOSHIHIRO
    • B23K15/00
    • PURPOSE:To improve a working accuracy and to shorten a working time by adding a high speed deflecting function to the deflecting function of an electron beam and performing the time share of a beam deflecting pattern as well as multi-beading one beam. CONSTITUTION:A high speed deflecting function is given with its adding to the deflecting function of the electron beam emitted from an electron gun 1 and the deflecting pattern of an electron beam 4 is optionally time-shared as well. Namely the electron beam 4 is made a multi beading by its deflection via a deflecting coil 3 and in case of forming a welding bead on a work 5, a beam deflecting pattern is subjected to time sharing by performing a center bead forming, etc., after forming the preceding bead at both sides. With this method the bead 4 having a smooth surface is formed by preventing an undercut forming. Consequently a microworking is enabled and a working distorsion is reduced as well. Namely the improvement in working accuracy and the shortening in working time are made possible.
    • 18. 发明专利
    • RECTIFIER CIRCUIT
    • JPS6369460A
    • 1988-03-29
    • JP21482786
    • 1986-09-10
    • MITSUBISHI ELECTRIC CORP
    • YAMAMOTO YOSHIHIROOKAMURA HITOSHI
    • H02M7/06H02M7/10H02M7/12
    • PURPOSE:To suppress rush current effectively, by a method wherein a plurality of inrush resistors are used and connected in series to a single-phase half-wave rectifier circuit. CONSTITUTION:A rectifier circuit of automatic changing type is composed of a switch 21, a resistor to suppress rush current at ON-state (inrush resistor) 3, a thyristor 4 changing single-phase half-wave rectifier type and voltage multiplying rectifier type, rectifier diodes 5-6, and first-second capacitors 7-8. When voltage of an AC power source 1 is higher than reference voltage, the thyristor 4 is turned off and the single-phase half-wave rectifier is constituted and power is supplied to a load 9. In this case, in addition to the inrush resistor 3, a second inrush resistor 10 is installed. In this constitution, in the single-phase half-wave rectifier at high input voltage state that the rush current becomes large, the first and second inrush resistors 3, 10 becomes sum of series connection thereby the rush current can be suppressed effectively, and consumption power of the resistor 3 at stable state can be made small.
    • 19. 发明专利
    • Resistance welding device for gratinglike welded structure
    • 电镀焊接结构的电阻焊接装置
    • JPS5732882A
    • 1982-02-22
    • JP10994980
    • 1980-08-08
    • Mitsubishi Electric Corp
    • YAMAMOTO YOSHIHIROOCHI NORIAKIKUWABARA TSUTOMU
    • B23K11/14
    • PURPOSE: To perform locating of the weld points of a gratinglike welded structure accurately and quickly by using a rotary type transducer for a locating detector and combining this with a programmed control device.
      CONSTITUTION: When one piece of cross bars 1AW1n of a gratinglike structure and a bearing bar 2AW2n are welded, a welding electrode 3 moves upward, and a disc brake device 11 and a rotary type transducer 21 move in order to detect the weld point of the next step. The pinion 21a of the transducer 21 revolves and its moving distance is detected with a moving distance detector of an automatic locating control device 23. The output thereof is compared with the welding process of a preprogrammed welding process control circuit 25 in a comparator 26, and when it goes equal to a target, a pitch feed driving device 10 is stopped. When the welding point of the next step is detected by this, the bearing bars 1AW1n are pulled up to the next point, and are welded to one unwelded piece out of the cross bars 1AW1n of the next step by resistance.
      COPYRIGHT: (C)1982,JPO&Japio
    • 目的:通过使用定位检测器的旋转式传感器,并将其与编程的控制装置进行组合,来精确而快速地对格栅焊接结构的焊点进行定位。 构成:当焊接有格栅状结构的一块横杆1A-1n和支撑杆2A-2n时,焊接电极3向上移动,并且盘式制动装置11和旋转式换能器21移动以检测 焊接点下一步。 换能器21的小齿轮21a旋转,并且利用自动定位控制装置23的移动距离检测器检测其移动距离。其输出与比较器26中的预编程焊接过程控制电路25的焊接过程进行比较, 当它等于目标时,俯仰进给驱动装置10停止。 当检测到下一步骤的焊接点时,将轴承棒1A-1n拉到下一点,并通过阻力从下一步骤的横杆1A-1n焊接到一个未焊接的部件。
    • 20. 发明专利
    • FLASH BUTT WELDING DEVICE
    • JPS5719187A
    • 1982-02-01
    • JP9465380
    • 1980-07-08
    • MITSUBISHI ELECTRIC CORP
    • KUWABARA TSUTOMUYAMAMOTO YOSHIHIROMIURA AKIRA
    • B23K11/24
    • PURPOSE:To make stable flash butt welding of high quality possible by measuring the quantity of heat for flash charging to be applied to flash welding articles, and controlling flash voltage and the feed of a moving table in such a manner that this quantity of heat is kept constant. CONSTITUTION:The end face of an object 2 to be welded grasped by moving side electrodes 5, 6 under pressing force P is collided against the end face of an object 1 to be welded grasped by stationary side electrodes 3, 4, under pressing force P at a velocity V by the movement of a moving frame 8 directly coupled to a driving device 9. Flash is generated between the end faces of the objects 1, 2 by the flash current I2 generated by this collision. Further, the object 2 is repeatedly moved at the velocity V, so that the end faces of the objects 1, 2 are melted and welded by pressure. During this time, the quantity of heat for flash charging is detected 22, and is compared with the set reference quantity of heat having beforehand set 23 depending upon the quantities and sectional areas of the materials 1, 2. The result of the comparison thereof is fed back to the feed control for the moving table, and the speed of the frame 8 is so controlled by the device that the quantity of heat for flash charging and the reference quantity of heat are kept always equqal.