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    • 12. 发明专利
    • Magnetic signal measuring method and magnetic signal measuring instrument
    • 磁信号测量方法和磁信号测量仪器
    • JP2009294062A
    • 2009-12-17
    • JP2008147560
    • 2008-06-05
    • Hitachi Ltd株式会社日立製作所
    • TSUKAMOTO AKIRAKANDORI AKIHIKOMIZOGUCHI TAKAKO
    • G01N27/72
    • PROBLEM TO BE SOLVED: To make it easy to detect the magnetic signal of a foreign matter by eliminating the magnetization of an inspection material by applying a cancelling magnetic field in a reverse direction to the inspection material after the magnetization of the inspection material.
      SOLUTION: This magnetic signal measuring instrument is equipped with a feed mechanism capable of moving a sample, a magnetic shield part for forming an inspection region where the sample is inspected, the magnetic sensor installed in the magnetic shield part, a magnetizing magnetic field applying mechanism for applying a magnetizing magnetic field to the sample, a cancelling magnetic field applying mechanism for applying the cancelling magnetic field in the direction reverse to the direction of the magnetizing magnetic field to the sample, and an arithmetic part for recording the result measured by the magnetic sensor within the inspection region as measured data and executing analysis on the basis of the measured data to determine the quality of the sample.
      COPYRIGHT: (C)2010,JPO&INPIT
    • 要解决的问题:为了通过在检查材料的磁化之后通过在与检查材料相反的方向上施加取消磁场来消除检查材料的磁化来容易地检测异物的磁信号 。 解决方案:该磁信号测量仪器配备有能够移动样品的进给机构,用于形成检查样品的检查区域的磁屏蔽部分,安装在磁屏蔽部分中的磁传感器,磁化磁体 用于向样品施加磁化磁场的场施加机构,用于将与抵消磁化方向相反的方向的取消磁场施加到样本的消除磁场施加机构,以及用于记录测量结果的运算部分 由检测区域内的磁传感器作为测量数据,并根据测量数据进行分析,以确定样品的质量。 版权所有(C)2010,JPO&INPIT
    • 16. 发明专利
    • SUPERCONDUCTING CIRCUIT
    • JP2000357823A
    • 2000-12-26
    • JP17051799
    • 1999-06-17
    • HITACHI LTDINT SUPERCONDUCTIVITY TECH
    • TARUYA YOSHINOBUSAITO KAZUOTAKAGI KAZUMASAFUKAZAWA TOKUMISAOTOME ETSUHISATSUKAMOTO AKIRA
    • H03K19/195H01L39/22
    • PROBLEM TO BE SOLVED: To readily mount a resistance element on a circuit at a low resistance by connecting a superconducting junction wherein a magnetic field current of a superconducting junction constituting a resistance element is set to be a current as specified or lower at a specified temperature or lower in series in two or more stages and connecting them in parallel. SOLUTION: A superconducting junction 20 is formed at a position wherein oxide superconducting films 12, 15 are close through an oxide thin film 14. The superconducting junction 20 is connected in series by the oxide superconducting thin film 15 and is connected to the oxide superconducting thin film 12 as a wiring pattern. When a resistance element is constituted, it has a superconducting critical current of 5 to 10 μA at a low temperature of a liquid helium temperature or lower and a zero voltage current is not detected. This is because an electrode between junctions wherein the resistance element 1 is connected in series to allow phase difference of each junction to fluctuate independently even in parallel connection is isolated and phase difference changes mutually independently, and a voltage is generated in each junction even if a superconducting current flows.
    • 20. 发明专利
    • MULTI-SOURCE VAPOR DEPOSITION DEVICE
    • JPH02196008A
    • 1990-08-02
    • JP1392189
    • 1989-01-25
    • HITACHI LTD
    • TSUKAMOTO AKIRAAIDA TOSHIYUKIIMAGAWA KAZUSHIGEFUKAZAWA TOKUMIMIYAUCHI KATSUMI
    • C01B13/28C01B13/20C01G1/00C01G3/00C23C14/24H01B12/06H01B13/00H01L39/24
    • PURPOSE:To restrain the decrease of raw material and to control precisely by separating plural vapor deposition source with partition plates to prevent the interference to the monitor of film thickness, and disposing base plates so that they can move above the vapor deposition sources. CONSTITUTION:Two or more vapor coating source raw materials 19, such as Ba, are received in K-cells 18 in a vacuum vessel 26 of multi-source vapor deposition device, and partition plates 23 are fixed. Then, base plates 12 of Si, etc., are fixed to a rotary holder 10, and the inside of the vessel 26 is evacuated to about 10 Torr by a pump 28. Then, the base plates 12 are heated to 400-900 deg.C by a heater 9 and rotated with 10-60r.p.m. Then, the reactive gas O2 of high purity is introduced, the microwave of 60-300W is generated through a magnetron 1, the critical state is made by a magnet 6, and O2-plasma is generated in a discharge tube 5. After the vaporization of raw material 19, the vapor deposition accumulation velocity and the plasma generation are put in stable states, a shutter 11 is opened to coat the base plates 12 for about 90 minutes. Then, the shutter 11 is closed, an electric power source 34 is turned off, and the base plates 12 is cooled to produce the film of high temp. oxide superconductive body having critical temp. of not lower than the temp. of liquefied nitrogen.