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    • 12. 发明专利
    • ANTIMICROBIAL ALUMINUM OR ALUMINUM ALLOY MATERIAL AND ITS PRODUCTION
    • JPH10147898A
    • 1998-06-02
    • JP31854496
    • 1996-11-15
    • FUJISHIMA AKIRAHASHIMOTO KAZUHITOYKK CORP
    • FUJISHIMA AKIRAHASHIMOTO KAZUHITONAKADA NOBUYUKIARAI TOSHIO
    • A01N59/16A01N59/20C25D11/18
    • PROBLEM TO BE SOLVED: To provide production by which a photocatalyst layer that shows good covering power and excellent adhesion even to an aluminum alloy base material having a complicated shape, can be formed without reducing strength of the aluminum alloy base material. SOLUTION: This production comprises: subjecting a base material 11 that consists of an aluminum alloy, to anodic oxidation treatment to form an anodic oxide coating film 12 on the base material 11; further immersing the treated material in a solution contg. suspended fine semiconductor particles 10, coating the treated material with the solution contg. suspended fine semiconductor particles 10 (liquid suspension of fine semiconductor particles 10) or subjecting the treated base material to electrophoresis treatment in the liquid suspension of fine semiconductor particles 10, to deposit the fine semiconductor particles 10 on the anodic oxide coating film 12; and thereafter, subjecting the resulting material to sealing treatment to form a photocatalyst layer consisting of a composite phase in which a swelled anodic oxide coating film 12a and the fine semiconductor particles 10 coexist, and also to improve corrosion resistance of the aluminum alloy base material 11. At this time, since the production is a wet process, the photocatalyst layer that shows good covering power even to the base material having a complicated shape, can be formed even at room temp. Thus, the formation of the photocatalyst layer also having sufficient massproductivity can be performed without any possibility of reducing strength of the aluminum alloy base material 11.
    • 16. 发明专利
    • ANTIMICROBIAL/ANTIFOULING ALUMINUM OR ALUMINUM ALLOY MATERIAL AND ITS PRODUCTION
    • JPH10195694A
    • 1998-07-28
    • JP35659096
    • 1996-12-27
    • FUJISHIMA AKIRAHASHIMOTO KAZUHITOYKK CORP
    • FUJISHIMA AKIRAHASHIMOTO KAZUHITONAKADA NOBUYUKIARAI TOSHIO
    • A61L2/02B05D5/00B05D7/14C25D11/18C25D13/00C25D13/02
    • PROBLEM TO BE SOLVED: To form a photocatalyst film which has a good throwing power even to an aluminum alloy base material having intricate shapes without degrading the strength of the base material and has an excellent adhesion property and photocatalyst activity. SOLUTION: After the base material 11 consisting of an aluminum alloy is subjected to an anodic oxidation treatment, the base material is immersed into a soln. suspended with semiconductor particulates 10 having the photocatalyst effect or the suspension of the semiconductor particulates 10 is applied thereon or an electrophoresis method is executed in the suspension of the semiconductor particulates, by which the semiconductor particulates are deposited on the anodically oxidized film 12. The film is thereafter impregnated with an inorg. high polymer 13, by which the photocatalyst film 14 consisting of the mixture composed of the semiconductor particulates and the inorg. high polymer is formed on the anodically oxidized film. This process is a process of a wet type and, therefore, the throwing power to the aluminum alloy base material 11 having the intricate shapes is good. In addition, the formation of the photocatalyst film at a low temp. is possible and, therefore, there is no possibility of degrading the strength of the aluminum alloy base material. The method for forming the photocatalyst film having the high mass productivity is thus obtd. The photocatalyst film has a high content of the semiconductor particulates and exhibits the excellent photocatalyst activity.