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11. 发明专利

JP2011172644A X-ray image diagnostic apparatus and x-ray image processing method 有权
标题翻译： X射线图像诊断装置和X射线图像处理方法
公开(公告)号：JP2011172644A
公开(公告)日：2011-09-08
申请号：JP2010037300
申请日：2010-02-23
申请人： Toshiba Corp , Toshiba Medical Systems Corp , 東芝メディカルシステムズ株式会社 , 株式会社東芝
发明人： TANAKA MANABU , SAKAKIBARA ATSUSHI , KANEKO MAKOTO
IPC分类号： A61B6/00 , G06T1/00
CPC分类号： A61B6/504 , A61B6/0457 , A61B6/4441 , A61B6/4464 , A61B6/463 , A61B6/469 , A61B6/481 , A61B6/5241 , A61B6/527 , A61B6/541 , A61B6/542
摘要： PROBLEM TO BE SOLVED: To provide an X-ray image diagnostic apparatus capable of sliding a top panel or an imaging unit to the next stage matched with the flow of a contract medium and performing stepping DSA imaging.
SOLUTION: The X-ray image diagnostic apparatus includes: an imaging unit that supports an X-ray generation unit and an X-ray detection unit facing each other and is capable of taking an image of a subject placed on a top panel of a bed; a control unit that executes control to move at least one of the imaging unit and the top panel stepwise in the body axial direction of the subject and take the image of the subject at a plurality of stages; and an image processing unit that processes image data taken at the plurality of the stages. The control unit sets a plurality of regions of interest in the body axial direction of the subject when injecting a contrast medium into the subject and taking an image, measures a change of an image level in the region of interest to detect the flow of the contrast medium, and moves at least one of the imaging unit and top panel to the next imaging stage based on the detection result.
COPYRIGHT: (C)2011,JPO&INPIT
摘要翻译：要解决的问题：提供一种能够将顶板或成像单元滑动到与合同介质的流动匹配的下一级并执行步进DSA成像的X射线图像诊断装置。解决方案：X射线图像诊断装置包括：成像单元，其支撑彼此面对的X射线产生单元和X射线检测单元，并且能够拍摄放置在顶板上的被摄体的图像一张床控制单元，其执行控制以使所述成像单元和所述顶板中的至少一个在所述被摄体的体轴方向上逐步移动，并且在多个阶段拍摄所述被摄体的图像; 以及处理在所述多个阶段拍摄的图像数据的图像处理单元。控制单元在将造影剂注射到被摄体中并拍摄图像时，在被检体的体轴方向上设置多个感兴趣区域，测量感兴趣区域中的图像水平的变化，以检测对比度的流动介质，并且基于检测结果将成像单元和顶板中的至少一个移动到下一个成像阶段。版权所有（C）2011，JPO＆INPIT

12. 发明专利

JP2010068978A X-ray image diagnosis apparatus 审中-公开
标题翻译： X射线图像诊断装置
公开(公告)号：JP2010068978A
公开(公告)日：2010-04-02
申请号：JP2008239020
申请日：2008-09-18
申请人： Toshiba Corp , Toshiba Medical Systems Corp , 東芝メディカルシステムズ株式会社 , 株式会社東芝
发明人： HAYASHI YOSHIYASU , ISHIKAWA TAKAYUKI , OISHI SATORU , MATSUMOTO KUNITOSHI , KANEKO MAKOTO
IPC分类号： A61B6/00
摘要： PROBLEM TO BE SOLVED: To provide an X-ray image diagnosis apparatus reducing radiation hazard to a subject. SOLUTION: This X-ray image diagnosis apparatus includes: an operation section 80 inputting examination information for examining a subject P; an X-ray irradiation section 10 irradiating the subject P with an X-ray; an X-ray detection section 30 detecting the X-ray transmitting through the subject P and generating X-ray projection data; an image data generation section 50 processing the X-ray projection data generated by the X-ray detection section 30 and generating image data; an exposure information creation section 60 creating exposure information of the subject P; and a display section 70 displaying the image data generated by the image data generation section 50. The exposure information creation section 60 creates the exposure information of the subject P corresponding to the image data generated by the image data generation section 50 based on the examination information input from the operation section 80, and the display section 70 displays the image data generated by the image data generation section 50 and the exposure information created by the exposure information creation section 60. COPYRIGHT: (C)2010,JPO&INPIT
摘要翻译：要解决的问题：提供减少对受试者的辐射危害的X射线图像诊断装置。解决方案：该X射线图像诊断装置包括：输入检查对象P的检查信息的操作部80; 用X射线照射被检体P的X射线照射部10; 检测通过被检体P发送的X射线并生成X射线投影数据的X射线检测部30; 处理由X射线检测部30生成的X射线投影数据并生成图像数据的图像数据生成部50; 创建被摄体P的曝光信息的曝光信息生成部60; 以及显示部70，显示由图像数据生成部50生成的图像数据。曝光信息生成部60基于检查信息，生成与图像数据生成部50生成的图像数据对应的被摄体P的曝光信息从显示部70显示由图像数据生成部50生成的图像数据和曝光信息生成部60生成的曝光信息。（C）2010，JPO＆INPIT

13. 发明专利

JP2005270286A Radiation exposure evaluating system and evaluating method therefor 有权
标题翻译：辐射曝光评估系统及其评估方法
公开(公告)号：JP2005270286A
公开(公告)日：2005-10-06
申请号：JP2004086702
申请日：2004-03-24
申请人： Toshiba Corp , Toshiba Medical Systems Corp , 東芝メディカルシステムズ株式会社 , 株式会社東芝
发明人： UEHARA HISAYUKI , KANEMITSU SHINGO , KAKIMURA MASAHITO , KOBAYASHI HIROMASA , FUJITA NAOYA , KANEKO MAKOTO
IPC分类号： G21K5/00 , A61B6/00 , A61N5/10 , G21K5/02
摘要： PROBLEM TO BE SOLVED: To appropriately determine the reasonableness of a diagnosis or a treatment program of a required region of a required patient before the diagnosis or the treatment.
SOLUTION: A radiation exposure evaluating system 10 is equipped with a means 12 for setting/storing tolerable radiation exposure for setting/storing tolerable radiation exposure for each patient and each region from individual information and the radiation exposure limit for each region, a means 13 for setting/storing expected radiation exposure for setting/storing expected radiation exposure for each condition of a radiography apparatus 11 and each region, and a means 14 for evaluating expected radiation exposure/actual cumulative radiation exposure which sets the required patient, the required region, and the required conditions of the radiography apparatus 11, reads the required tolerable radiation exposure corresponding to the required patient and the required region from the means 12, reads the required expected radiation exposure corresponding to the required conditions and the required region from the means 13, compares the required tolerable radiation exposure with the required expected radiation exposure, and evaluates the level of the risk of the required expected radiation exposure for each required region.
COPYRIGHT: (C)2006,JPO&NCIPI
摘要翻译：要解决的问题：为了在诊断或治疗之前适当确定所需患者的所需区域的诊断或治疗程序的合理性。解决方案：辐射曝光评估系统10配备有用于设置/存储可容忍的辐射照射的装置12，用于根据各个区域的个体信息和辐射暴露极限为每个患者和每个区域设置/存储可容忍的辐射照射，用于设置/存储用于设置/存储放射线照相设备11和每个区域的每个条件的预期辐射照射的预期辐射照射的装置13以及用于评估设定所需患者的预期辐射照射/实际累积辐射暴露的装置14，区域，并且放射摄影装置11的所需条件从装置12读取对应于所需患者和所需区域的所需容许辐射暴露，从装置中读取对应于所需条件和所需区域的所需预期辐射照射 13，将要求的可耐受辐射暴露与要求进行比较红色预期的辐射暴露，并评估每个所需区域所需预期辐射暴露的风险水平。版权所有（C）2006，JPO＆NCIPI

14. 发明专利

JP2012202866A Pattern inspection apparatus and pattern inspection method 审中-公开
标题翻译：模式检查装置和模式检查方法
公开(公告)号：JP2012202866A
公开(公告)日：2012-10-22
申请号：JP2011068507
申请日：2011-03-25
申请人： Toshiba Corp , 株式会社東芝
发明人： WATABIKI MITSUTOSHI , YAMAZAKI YUICHIRO , KANEKO MAKOTO , IIDA YUSUKE , FUJII TAKAMASA , KONNO YUSAKU , IMAI SHINICHI
IPC分类号： G01N21/956
CPC分类号： G01N21/9501 , G01N21/95607
摘要： PROBLEM TO BE SOLVED: To improve detection sensitivity of a defect.SOLUTION: A pattern detection apparatus includes stage driving means, a light source, detection means, an optical system, focus position variation means, control means, and determination means. The stage driving means moves a stage for supporting a substrate on which a pattern to be inspected is formed in a direction horizontal to the surface of the substrate. The detection means detects reflected light from the substrate and outputs a signal. The optical system guides light applied from the light source to the substrate and guides reflected light from the substrate to the detection means. The focus position variation means varies a focus position of light applied to the substrate in a direction vertical to the surface of the substrate. The control means controls the stage driving means and the focus position variation means so that the focus position is varied by making the movement of the stage correspond to the irradiation of light to the pattern position. The determination means determines existence of a defect on the pattern based on the signal from the detection means.
摘要翻译：要解决的问题：提高缺陷的检测灵敏度。解决方案：图案检测装置包括台驱动装置，光源，检测装置，光学系统，聚焦位置变化装置，控制装置和确定装置。台架驱动装置移动用于支撑在其上形成有待检查图案的基板的台阶在与基板的表面水平的方向上。检测装置检测来自基板的反射光并输出信号。光学系统将从光源施加的光引导到基板，并将来自基板的反射光引导到检测装置。聚焦位置变化装置在垂直于基板的表面的方向上改变施加到基板的光的焦点位置。控制装置控制舞台驱动装置和对焦位置变化装置，使得通过使舞台的运动对应于光的照射到图案位置来改变焦点位置。确定装置基于来自检测装置的信号确定模式上的缺陷的存在。版权所有（C）2013，JPO＆INPIT

15. 发明专利

JP2012202862A Pattern inspection apparatus and pattern inspection method 审中-公开
标题翻译：模式检查装置和模式检查方法
公开(公告)号：JP2012202862A
公开(公告)日：2012-10-22
申请号：JP2011068485
申请日：2011-03-25
申请人： Toshiba Corp , 株式会社東芝
发明人： KANEKO MAKOTO , YAMAZAKI YUICHIRO , WATABIKI MITSUTOSHI , IIDA YUSUKE , FUJII TAKAMASA , KONNO YUSAKU , IMAI SHINICHI
IPC分类号： G01N21/956 , G01N21/84 , H01L21/66
CPC分类号： G01N21/95607 , G01N21/9501
摘要： PROBLEM TO BE SOLVED: To detect a defect at a high SN ratio without depending on the height (depth) of the defect.SOLUTION: A pattern inspection apparatus includes irradiation means, illumination means, detection means, image formation means, and image processing means. The irradiation means generates light beams having mutually different wavelengths and emits the generated beams. The illumination means applies the beams of the different wavelengths applied from the irradiation means to the same area of a substrate on which a pattern to be inspected is formed. The detection means detects reflected light beams of a plurality of mutually different wavelengths reflected on the substrate and outputs signals of respective wavelengths. The image formation means guides the reflected light beams, makes the reflected light beams incident on the detection means and forms images on the detection surface of the detection means. The image processing means generates added image data including information of wavelengths and signal intensity by additionally processing the signals of respective wavelengths correspondingly to the incident positions on the detection surface, determines whether or not a defect exists on the pattern to be inspected based on the added image data, and when determining the existence of a defect, detects the position of the defect in a direction vertical to the substrate.
摘要翻译：要解决的问题：以高SN比检测缺陷，而不依赖于缺陷的高度（深度）。解决方案：图案检查装置包括照射装置，照明装置，检测装置，图像形成装置和图像处理装置。照射装置产生具有相互不同波长的光束并发射所产生的光束。照明装置将从照射装置施加的不同波长的光束施加到其上形成有待检查图案的基板的相同区域。检测装置检测在基板上反射的多个相互不同的波长的反射光束，并输出各波长的信号。图像形成装置引导反射光束，使入射到检测装置上的反射光束在检测装置的检测表面上形成图像。图像处理装置通过附加地处理与检测表面上的入射位置对应的各个波长的信号来生成包括波长信息和信号强度的附加图像数据，基于添加的图像判断是否存在待检查图案上的缺陷图像数据，并且当确定缺陷的存在时，在垂直于基板的方向上检测缺陷的位置。版权所有（C）2013，JPO＆INPIT

16. 发明专利

JP2005253801A X-ray diagnostic equipment and data processing method of x-ray diagnostic equipment 有权
标题翻译： X射线诊断设备的X射线诊断设备和数据处理方法
公开(公告)号：JP2005253801A
公开(公告)日：2005-09-22
申请号：JP2004071633
申请日：2004-03-12
申请人： Toshiba Corp , 株式会社東芝
发明人： KOBAYASHI HIROMASA , TAKAHASHI KATSUO , KAKIMURA MASAHITO , KANEKO MAKOTO , UEHARA HISAYUKI , KANEMITSU SHINGO , FUJITA NAOYA
IPC分类号： A61B6/00 , A61B6/10
CPC分类号： A61B6/00 , A61B18/1492
摘要： PROBLEM TO BE SOLVED: To provide X-ray diagnostic equipment that can prevent skin trouble caused by X rays from occurring even in the case that an irradiation dose to a test subject with the X rays can reach a threshold level that may cause skin trouble, and to provide a data processing method of the X-ray diagnostic equipment.
SOLUTION: X-ray diagnostic equipment 1 comprises an X-ray source irradiating the test subject with the X ray, an X-ray detection means detecting the X ray that has transmitted through the test subject, a skin irradiation dose estimation means 32 estimating the irradiation dose to the skin of the test subject, and irradiatable dose index estimation means 34 and 35 obtaining an irradiatable dose index that indicates a dose to be irradiated with the X rays continuously on the basis of the skin irradiation dose of the test subject estimated by the skin irradiation dose estimation means 32.
COPYRIGHT: (C)2005,JPO&NCIPI
摘要翻译：要解决的问题：为了提供X射线诊断设备，即使在X射线的受检者的照射剂量可以达到可能导致的阈值水平的情况下，也能够防止由X射线引起的皮肤问题皮肤问题，并提供X射线诊断设备的数据处理方法。解决方案：X射线诊断设备1包括用X射线照射测试对象的X射线源，检测透过测试对象的X射线的X射线检测装置，皮肤照射剂量估计装置 32，估计被检对象的皮肤的照射剂量，以及可照射剂量指标推测单元34,35，基于试验的皮肤照射剂量，连续获得表示X射线照射剂量的可照射剂量指标由皮肤照射剂量估计装置32估计的受试者。（C）2005年，JPO和NCIPI

17. 发明专利

JP2013122393A Defect inspection device and defect inspection method 审中-公开
标题翻译：缺陷检查装置和缺陷检查方法
公开(公告)号：JP2013122393A
公开(公告)日：2013-06-20
申请号：JP2011270317
申请日：2011-12-09
申请人： Toshiba Corp , 株式会社東芝
发明人： IIDA YUSUKE , WATABIKI MITSUTOSHI , KANEKO MAKOTO , YOSHINO KIMINORI , FUJII TAKAMASA , KONNO YUSAKU
IPC分类号： G01N21/956
摘要： PROBLEM TO BE SOLVED: To provide a defect inspection device and a defect inspection method that make defect inspection with high sensitivity with respect to a three-dimensional device possible.SOLUTION: First imaging means IU1 disposed at a first surface side of a specimen W includes: a first illumination optical system for illuminating a first surface with first light A; and a first imaging optical system that guides and detects first scattered light containing reflection light Aof the first light Agenerated by illumination of the first light Aand outputs a first signal. Second imaging means IU2 disposed at a second surface side opposite to the first surface of the specimen W includes: a second illumination optical system for illuminating a second surface with second light B; and a second imaging optical system that guides and detects second scattered light containing reflection light Bof the second light Bgenerated by illumination of the second light Band outputs a second signal. Imaging processing means 25 generates a plurality of dark field optical images from the signals, combines the plurality of dark field optical images and acquires a composite image. Defect detecting means 26 detects a defect of the specimen W from a difference image between the composite image and a reference image.
摘要翻译：要解决的问题：提供一种相对于三维装置可以进行高灵敏度的缺陷检查的缺陷检查装置和缺陷检查方法。解决方案：设置在试样W的第一表面侧的第一成像装置IU1包括：第一照明光学系统，用于用第一光A 照亮第一表面; 以及第一成像光学系统，其引导并检测包含由第一光A O 的反射光A R 的第一散射光，照亮第一光A o 并输出第一信号。设置在与样本W的第一表面相对的第二表面侧的第二成像装置IU2包括：第二照明光学系统，用于用第二光B 照亮第二表面。以及第二成像光学系统，其引导和检测包含由第二光B 生成的第二光B 的反射光B R 第二光B o 的照明，并输出第二信号。成像处理装置25从信号中产生多个暗场光学图像，组合多个暗场光学图像并获取合成图像。缺陷检测装置26从合成图像和参考图像之间的差分图像检测样本W的缺陷。版权所有（C）2013，JPO＆INPIT

18. 发明专利

JP2013061185A Pattern inspection device and pattern inspection method 审中-公开
标题翻译：模式检验装置和模式检验方法
公开(公告)号：JP2013061185A
公开(公告)日：2013-04-04
申请号：JP2011198656
申请日：2011-09-12
申请人： Toshiba Corp , 株式会社東芝
发明人： FUJII TAKAMASA , KONNO YUSAKU , KANEKO MAKOTO , YAMAZAKI YUICHIRO , WATABIKI MITSUTOSHI , YOSHINO KIMINORI , IIDA YUSUKE
IPC分类号： G01N21/956 , H01L21/66
CPC分类号： G01J3/42 , G01J3/2803 , G01J5/0007 , G01N21/95607
摘要： PROBLEM TO BE SOLVED: To provide a pattern inspection device capable of precisely detecting defects at high speed throughput even when an appropriate wavelength fluctuates due to variation of the structure and defects on the wafer.SOLUTION: The pattern inspection device includes a light source that generates a light beam and a collector that shapes the light beam into a line beam and irradiates the wafer therewith. The device further includes a spectrometer that disperses the line beam reflected by the wafer. The device further includes a two-dimensional detector that detects the line beam dispersed by the spectrometer and outputs a signal including a piece of spectrum information of the line beam. The device further includes a comparator that compares the spectrum information obtained from corresponding portions of repeated patterns on the wafer and a determination section that determines presence or absence of defects included in the wafer based on the comparison result of the spectrum information.
摘要翻译：要解决的问题：提供一种即使当适当的波长由于晶片的结构和缺陷的变化而波动时，能够以高速吞吐量精确地检测缺陷的图案检查装置。解决方案：图案检查装置包括产生光束的光源和将光束成形为线束并用其照射晶片的集电体。该装置还包括分散由晶片反射的线束的光谱仪。该装置还包括检测由光谱仪分散的线束的二维检测器，并输出包括线束的一条光谱信息的信号。该装置还包括比较器，其比较从晶片上的重复图案的相应部分获得的频谱信息和基于频谱信息的比较结果确定晶片中包含的缺陷的存在或不存在的确定部分。版权所有（C）2013，JPO＆INPIT

19. 发明专利

JP2011203061A Pattern measuring method and pattern measuring apparatus 审中-公开
标题翻译：图案测量方法和图案测量装置
公开(公告)号：JP2011203061A
公开(公告)日：2011-10-13
申请号：JP2010069798
申请日：2010-03-25
申请人： Toshiba Corp , 株式会社東芝
发明人： KANEKO MAKOTO , ISHIBASHI YASUHIKO
IPC分类号： G01B15/04
CPC分类号： G01N23/201
摘要： PROBLEM TO BE SOLVED: To provide a pattern measuring method and a pattern measuring apparatus capable of accurate measurement without lengthening measurement time in measuring a pattern shape by irradiating a periodical structure pattern with electromagnetic waves.SOLUTION: The pattern measuring method includes: an irradiation step of irradiating, from a plurality of different incident directions, a periodical structure pattern in which a plurality of patterns are periodically arrayed and partially overlap one another with electromagnetic waves; a detection step of detecting the electromagnetic waves scattered by the periodical structure pattern and detecting their scattering profiles; and a measurement step of measuring a pattern shape of the periodical structure pattern from the detected scattering profiles. In the irradiation step, each of the plurality of the different incident directions is an incident direction in which the patterns included in the periodical structure pattern do not partially overlap one another.
摘要翻译：要解决的问题：提供一种图案测量方法和图案测量装置，其能够通过用电磁波照射周期性结构图案来测量图形形状而不延长测量时间，而不会延长测量时间。解决方案：图案测量方法包括：照射步骤从多个不同的入射方向照射多个图案周期性排列并且部分地用电磁波重叠的周期结构图案; 检测步骤，检测由周期性结构图案散射的电磁波，并检测其散射曲线; 以及测量步骤，根据所检测的散射曲线来测量周期性结构图案的图案形状。在照射步骤中，多个不同的入射方向中的每一个是包括在周期结构图案中的图案彼此不部分重叠的入射方向。

20. 发明专利

JP2004180805A X-ray diagnostic apparatus and x-ray photographing method 审中-公开
公开(公告)号：JP2004180805A
公开(公告)日：2004-07-02
申请号：JP2002349411
申请日：2002-12-02
申请人： Toshiba Corp , 株式会社東芝
发明人： KANEKO MAKOTO , UEHARA HISAYUKI , TEZUKA AKIO , WATANABE IZUMI , HIRAYAMA KAZUTOYO , YAMAHANA AKIKO
IPC分类号： A61B6/00 , G06T1/00 , H04N1/393
摘要： PROBLEM TO BE SOLVED: To generate X-ray image data having a high spatial resolution in magnification photography using a plane detector.
SOLUTION: This X-ray diagnostic apparatus includes an X-ray generation section 1 emitting X rays in a prescribed direction, an X-ray detection section 2 detecting an X ray emitted by the X-ray generation section 1 and a detector inclination mechanism 43 setting the angle of the plane detector 21 with respect to the X-ray irradiation direction in the X-ray detection section 2. The detector inclination mechanism 43 effectively uses picture elements of the plane detector 21 by detecting X rays by giving a prescribed inclination angle to the plane detector 21 in magnification photography. An image correction circuit 12 performs image distortion and sensitivity corrections for X-ray image data acquired by the plane detector 21.
COPYRIGHT: (C)2004,JPO&NCIPI

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