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11. 发明专利

JP4597046B2 Sublimation purification equipment 有权
公开(公告)号：JP4597046B2
公开(公告)日：2010-12-15
申请号：JP2005364279
申请日：2005-12-19
申请人：株式会社協真エンジニアリング
发明人：亮一郎村田 , 勝河原 , 征吾河原 , 敦史藤田
IPC分类号： B01D7/00 , H01L51/50 , H05B33/10

12. 发明专利

JP4503201B2 Valve device 有权
公开(公告)号：JP4503201B2
公开(公告)日：2010-07-14
申请号：JP2001139522
申请日：2001-05-10
申请人：株式会社協真エンジニアリング
发明人：勝河原
IPC分类号： F16K1/02 , F16K27/02 , F16K1/34 , F16K41/04

13. 发明专利

JP4443879B2 High-precision high-pressure annealing device 有权
公开(公告)号：JP4443879B2
公开(公告)日：2010-03-31
申请号：JP2003311638
申请日：2003-09-03
申请人：株式会社協真エンジニアリング
发明人：勝河原
IPC分类号： G02F1/1368 , H01L21/31 , H01L21/324

14. 发明专利

JP2010021558A High precision and high pressure annealing apparatus 审中-公开
标题翻译：高精度和高压退火设备
公开(公告)号：JP2010021558A
公开(公告)日：2010-01-28
申请号：JP2009171995
申请日：2009-07-23
申请人： Kyoshin Engineering:Kk , 株式会社協真エンジニアリング
发明人： KAWAHARA MASARU
IPC分类号： H01L21/31 , G02F1/13 , H01L21/324
摘要： PROBLEM TO BE SOLVED: To provide an apparatus performing annealing work more efficiently by simplifying the structure of a high pressure annealing apparatus, and an apparatus performing the annealing work more precisely by equalizing the temperature distribution within a container in which the annealing work is performed. SOLUTION: The high precision and high pressure annealing apparatus has: a pressure container 16; a reaction container 20 that is disposed in the pressure container, defines therein an anneal processing chamber 24 for anneal processing a work 25, and is constituted of a tube body 21 and an end cap 22 which are mutually seal coupled by a sealing means 23; heating means 28, 34; a quartz glass plate 27; a temperature control sensor 26; a pure water supply means 33 for supplying pure water into the reaction container; a portion 29 disposed in the reaction container to hold the pure water supplied from the pure water supply means; and a pressure control means for controlling the pressure in the reaction container. COPYRIGHT: (C)2010,JPO&INPIT
摘要翻译：要解决的问题：通过简化高压退火装置的结构来提供更有效地进行退火工作的装置，以及通过使退火工作的容器内的温度分布相等来更精确地进行退火工作的装置被执行。高精度高压退火装置具有压力容器16，设置在压力容器中的反应容器20在其中限定了用于对工件25进行退火处理的退火处理室24，并且由通过密封装置23相互密封连接的管体21和端盖22构成; 加热装置28,34; 石英玻璃板27; 温度控制传感器26; 用于向反应容器供给纯水的纯水供给装置33; 设置在反应容器中以保持从纯水供应装置供应的纯水的部分29; 以及用于控制反应容器中的压力的压力控制装置。版权所有（C）2010，JPO＆INPIT

15. 发明专利

JP2009216302A High-temperature high-pressure generating device 审中-公开
标题翻译：高温高压发生装置
公开(公告)号：JP2009216302A
公开(公告)日：2009-09-24
申请号：JP2008060505
申请日：2008-03-11
申请人： Kyoshin Engineering:Kk , 株式会社協真エンジニアリング
发明人： FUJITA ATSUSHI , KAWAHARA MASARU
IPC分类号： F27B17/00 , B22D27/09 , F16J12/00
摘要： PROBLEM TO BE SOLVED: To inexpensively provide a device having a structure capable of easily enduring high temperature of about 1,000°C as a temperature inside of a container, and simultaneously enduring high pressure of about 50 MPa as its pressure in safety.
SOLUTION: This high-temperature high-pressure generating device is composed of a surrounding body 42, a cover body 43, a heat-resistant pressure container 35, an airtight stopper 36, a heating means 38, a heat-resistant cement 39, a heat-resistant waterproof means 40, a gas supply source 47, a water supply pump 57, an accumulator 45, gas supply pipes 46, 44, water supply pipes 61, 56, an opening/closing valve 51, and an opening/closing valve 62.
COPYRIGHT: (C)2009,JPO&INPIT
摘要翻译：要解决的问题：为了廉价地提供具有容易耐受约1000℃的高温作为容器内部的温度的结构的装置，同时承受约50MPa的高压作为其安全的压力。解决方案：该高温高压发生装置由周围主体42，盖体43，耐热压力容器35，气密塞36，加热装置38，耐热水泥 39，耐热防水装置40，气体供给源47，供水泵57，蓄液器45，供气管46,44，供水管61,56，开闭阀51，开口 /关闭阀62.版权所有（C）2009，JPO＆INPIT

16. 发明专利

JP2009216257A Inert gas atmosphere furnace device 审中-公开
标题翻译： INERT气体大气炉装置
公开(公告)号：JP2009216257A
公开(公告)日：2009-09-24
申请号：JP2008057734
申请日：2008-03-07
申请人： Kyoshin Engineering:Kk , 株式会社協真エンジニアリング
发明人： SAITO MISAO , KAWAHARA MASARU
IPC分类号： F27D7/06 , F27B5/04 , F27B5/06 , F27B9/30 , F27B17/00
摘要： PROBLEM TO BE SOLVED: To provide a drying processing device or a firing processing device capable of minimizing an opening for taking in and out a workpiece to prevent or minimize leakage of an inert gas.
SOLUTION: An insert gas atmosphere furnace device for processing a processed workpiece under an inert gas atmosphere, is composed of a furnace body and a big door 14, and includes a plurality of workpiece holding means, at least one workpiece transferring opening, a small door 34, a big door moving means 30, a small door opening and closing means, a workpiece transferring robot, a sealing means 20 and a clamp means, and a seal means.
COPYRIGHT: (C)2009,JPO&INPIT
摘要翻译：要解决的问题：提供一种干燥处理装置或焙烧处理装置，其能够最小化用于吸入和取出工件的开口，以防止或最小化惰性气体的泄漏。解决方案：一种用于在惰性气体环境下处理加工工件的嵌入式气体气氛炉装置，由炉体和大门14组成，包括多个工件保持装置，至少一个工件传送开口，小门34，大门移动装置30，小门打开和关闭装置，工件传送机器人，密封装置20和夹紧装置以及密封装置。版权所有（C）2009，JPO＆INPIT

17. 发明专利

JP4168810B2 Pure water supply tank unit against to the high-pressure annealing apparatus 有权
公开(公告)号：JP4168810B2
公开(公告)日：2008-10-22
申请号：JP2003101610
申请日：2003-04-04
申请人：株式会社協真エンジニアリング
发明人：勝河原
IPC分类号： H01L21/31

18. 发明专利

JP2007209921A Residue removing method 审中-公开
标题翻译：残留移除方法
公开(公告)号：JP2007209921A
公开(公告)日：2007-08-23
申请号：JP2006033773
申请日：2006-02-10
申请人： Kyoshin Engineering:Kk , 株式会社協真エンジニアリング
发明人： FUJITA ATSUSHI , MURATA RYOICHIRO , KAWAHARA SEIGO , KAWAHARA MASARU
IPC分类号： B08B7/00 , B08B9/087
摘要： PROBLEM TO BE SOLVED: To provide a residue removing method which enables the complete removal of the residue before a following reaction working is carried out, in order to resolve the problem that a heating reaction in a chamber vessel made from quartz glass may cause wastes after the heating reaction, nonvolatile impurities, impurities having high vaporization temperature, material such as cannot be captured in a capturing vessel after the heating reaction, and the like, to remain as the residue on the inner surface of a reaction chamber, and that the continuance of a reaction working while the residue is left as it is may cause a part of the residue to give influences to the reaction working to retard a suitable reaction working.
SOLUTION: The residue removing method from the chamber made from quartz glass is a method for removing the residue adhered on the inner surface of the chamber when the heating reaction is carried out in the chamber vessel made from quartz glass, wherein the chamber vessel, on which the residue adhered after the working is finished, is quickly cooled, the residue is separated from the surface of the chamber vessel, the residue separated from the surface of the vessel is scraped from the chamber vessel.
COPYRIGHT: (C)2007,JPO&INPIT
摘要翻译：要解决的问题：为了提供在进行后续反应工作之前能够完全除去残留物的残渣去除方法，为了解决由石英玻璃制成的室容器中的加热反应的问题在加热反应之后引起废物，不挥发性杂质，具有高蒸发温度的杂质，在加热反应后不能捕获在捕获容器中的材料等，作为残留物残留在反应室的内表面上，以及当残留物原样保持时反应工作的持续性可能会导致一部分残留物对反应的影响，从而延缓合适的反应工作。解决方案：从石英玻璃制成的室中的残渣去除方法是当在由石英玻璃制成的室容器中进行加热反应时，去除附着在室内表面上的残留物的方法，其中室容器在工作完成后附着的残留物被快速冷却，残留物从腔室容器的表面分离，从容器表面分离的残余物从腔室容器中刮下。版权所有（C）2007，JPO＆INPIT

19. 发明专利

JP2007181793A Quartz glass chamber means 审中-公开
标题翻译： QUARTZ玻璃窗户
公开(公告)号：JP2007181793A
公开(公告)日：2007-07-19
申请号：JP2006002209
申请日：2006-01-10
申请人： Kyoshin Engineering:Kk , 株式会社協真エンジニアリング
发明人： FUJITA ATSUSHI , MURATA RYOICHIRO , KAWAHARA SEIGO , KAWAHARA MASARU
IPC分类号： B01J3/00 , H01L21/31
摘要： PROBLEM TO BE SOLVED: To provide a quartz glass chamber that does not easily breaks down with a little shock. SOLUTION: The quartz glass chamber means comprised of a quartz glass chamber 12 constituting a work space 14, a protective shield 22 covering the outer circumference of the chamber 12, a support plate 26 that supports the protective shield 22, a seal ring 28 that seals and holds the protective shield 22 and the support plate 26, an elastic O ring 24 that seals and holds the support plate 26 and the chamber 12, and a sealed space 30 formed and disposed between the protective shield 22 and the chamber 12 comprises a pressurization and de-pressurization means capable of controlling the pressure of the sealed space 30 according to the pressure of the work space 14 to almost eliminate the pressure difference between the inside and the outside of the quartz glass chamber 12. COPYRIGHT: (C)2007,JPO&INPIT
摘要翻译：要解决的问题：提供一个不易发生轻微冲击的石英玻璃室。解决方案：石英玻璃室装置由构成工作空间14的石英玻璃室12，覆盖室12的外周的保护罩22，支撑保护罩22的支承板26，密封圈 28，其密封并保持保护屏蔽22和支撑板26，密封并保持支撑板26和室12的弹性O形环24以及形成并设置在保护屏蔽22和腔室12之间的密封空间30 包括能够根据工作空间14的压力来控制密封空间30的压力的加压和减压装置，以几乎消除石英玻璃室12的内部和外部之间的压力差。（C）2007，JPO＆INPIT

20. 发明专利

JP3779961B2 Fast liquid crystal injection method and a liquid crystal panel formed using the method 有权
公开(公告)号：JP3779961B2
公开(公告)日：2006-05-31
申请号：JP2003137666
申请日：2003-05-15
申请人：株式会社協真エンジニアリング
发明人：勝河原
IPC分类号： G02F1/1341

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