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131. 发明专利

JPH11165366A PRODUCTION OF PHOSPHOR PATTERN 失效
公开(公告)号：JPH11165366A
公开(公告)日：1999-06-22
申请号：JP33335497
申请日：1997-12-03
申请人： HITACHI CHEMICAL CO LTD
发明人： SATO KAZUYA , TANAKA HIROYUKI , NOJIRI TAKESHI , KIMURA NAOKI , TAI SEIJI , KAKUMARU HAJIME
IPC分类号： G03F7/004 , B32B7/02 , C08F20/20 , C09K11/00 , C09K11/02 , H01J9/227 , H01J17/49
摘要： PROBLEM TO BE SOLVED: To form a phosphor pattern in a good yield in a uniform film thickness with tolerance over the whole of the inner surface of the recessed part surrounded by the barrier rib wall surface of a substrate having uneveness such as a substrate for a plasma disk panel or the like and the bottom surface thereof. SOLUTION: (I) A process forming (A) a phosphor-containing photosensitive resin compsn. layeron the uneven surface of a substrate having unevenness, (II) a process imagewise irradiating (A) the phosphor-containing photosensitive resin compsn. layer on the substrate after the process (I) with active rays through a photomask by using a scanning type exposure machine, (III) a process selectively removing the unnecessary part of (A) the phosphor-containing photosensitive resin compsn. layer to form a pattern, and (IV) a process removing the unnecessary part from the pattern by baking are provided.

132. 发明专利

JPH10334793A MANUFACTURE OF BACK PLATE FOR PLASMA DISPLAY PANEL 失效
公开(公告)号：JPH10334793A
公开(公告)日：1998-12-18
申请号：JP30426397
申请日：1997-11-06
申请人： HITACHI CHEMICAL CO LTD
发明人： SATO KAZUYA , TANAKA HIROYUKI , NOJIRI TAKESHI , KIMURA NAOKI , TAI SEIJI , SUDO TETSUYA , MUKAI IKUO , TACHIKI HIDEYASU
IPC分类号： H01J9/02 , H01J9/227
摘要： PROBLEM TO BE SOLVED: To enhance the yield of product, and easily manufacture a large screen with high dimensional precision by baking at least one of a barrier rib forming part consisting of a barrier rib precursor mixture and an electrode pattern, and a multicolor pattern including a phosphor and an organic material on a base in the state where they are formed in a prescribed arrangement. SOLUTION: A non-hardened barrier rib forming part 2a is formed on a base 1, the barrier rib forming part 2a is hardened to provide a barrier rib forming part 2b consisting of a barrier rib precursor mixture. An electrode pattern 5 is formed, and patterns 4a, 4b, 4c of a first color, a second color and a third color are formed. Baking is performed in this state to form a barrier rib 2c after baking, an electrode pattern 7, and phosphor patterns 6a, 6b, 6c of the first color, the second color and the third color. Thus, the number of processes is reduced, the positioning is facilitated, and the manufacture can be performed with good workability low energy, and excellent dimensional precision in a good yield.

133. 发明专利

JPH10172431A MANUFACTURE OF PHOSPHOR PATTERN 失效
公开(公告)号：JPH10172431A
公开(公告)日：1998-06-26
申请号：JP33010696
申请日：1996-12-11
申请人： HITACHI CHEMICAL CO LTD
发明人： TANAKA HIROYUKI , TACHIKI HIDEYASU , NOJIRI TAKESHI , WADA YUMIKO , TAI SEIJI
IPC分类号： C09D4/06 , H01J9/227
摘要： PROBLEM TO BE SOLVED: To realize superior color precision without phosphor color mixture by closing in advance a recess other than that attempting to form a given phosphor pattern during forming thereof. SOLUTION: On a substrate for a plasma display panel on which a barrier rib is formed for a substrate having a recess to be a discharge space, a positive film in which decomposing property to a developer is found by irradiation of active light is pressure-welded, a desired site at which a phosphor is to be formed is light-exposed and developed as an image, and a positive film of the light exposure site is eliminated. After eliminating an unnecessary part, since a specified one color of a phosphor pattern is formed at a recess of the left, it is not closed by the positive film, and since a phosphor pattern is formed at the center and right-end recess parts, a top part thereof is closed by the positive film. Instead of the positive film, even if a negative film is employed, a given recess can be closed similarly.

134. 发明专利

JPH09288973A PHOTOSENSITIVE RESIN COMPOSITION, PHOTOSENSITIVE FILM USING IT, MANUFACTURE OF FLUORESCENT PATTER, AND MANUFACTURE OF PLASMA DISPLAY PANEL BACK SURFACE PLATE USING THE MANUFACTURE 失效
公开(公告)号：JPH09288973A
公开(公告)日：1997-11-04
申请号：JP26713996
申请日：1996-10-08
申请人： HITACHI CHEMICAL CO LTD
发明人： TANAKA HIROYUKI , TACHIKI HIDEYASU , NOJIRI TAKESHI , UEJIMA KOICHI , TAI SEIJI , TANNO SEIKICHI , KAKUMARU HAJIME
IPC分类号： G03F7/004 , B32B7/02 , C09D4/00 , C09D4/06 , G03F7/033 , H01J9/227
摘要： PROBLEM TO BE SOLVED: To provide a photosensitive resin composition, having no viscosity increase tendency for a long time, and excellent in shelf-life stability, by constituting a photosensitive resin composition, composed of a compound having a carboxyl group, a photopolymerizable compound having an ethylenic unsaturated group, and a photo- initiator and the like. SOLUTION: A photosensitive resin composition is composed of (A) a compound having a carboxyl group, (B) resin having a carboxyl group, (C) a photopolymerizable unsaturated compound having an ethylenic unsaturated group, (D) a photo-initiator for producing a free radical by irradiating active light, and (E) a phosphor. These respective components are melted to be mixed into a dissolvable or diffuseable solvent, to be adopted as a uniformly diffused solution. The blended quantity of a solvent is preferably made 10-500 wt. parts to the total quantity of 100 wt. parts of the (B) or (D) component. Also, dispersant is added for improving the diffusion of a phosphor, and a binder is used for preventing the separation of the phosphor from a substrate after baking.

135. 发明专利

JPH09265906A MANUFACTURE OF PHOSPHOR PATTERN, PHOSPHOR PATTERN AND BACK PLATE FOR PLASMA DISPLAY PANEL 失效
公开(公告)号：JPH09265906A
公开(公告)日：1997-10-07
申请号：JP853597
申请日：1997-01-21
申请人： HITACHI CHEMICAL CO LTD
发明人： NOJIRI TAKESHI , TACHIKI HIDEYASU , TANAKA HIROYUKI , TAI SEIJI , WADA YUMIKO , TANNO SEIKICHI , KAKUMARU HAJIME
IPC分类号： H01J9/227 , H01J9/02 , H01J9/20 , H01J11/22 , H01J11/34 , H01J11/36 , H01J11/42 , H01J11/02
摘要： PROBLEM TO BE SOLVED: To provide a phosphor pattern in which embedding performance into the space of a substrate for PDP (the formation performance of a photosensitive resin composition layer containing phosphor on the barrier rib wall face and the space bottom face of the substrate for PDP) is superior, accuracy is high, shapes are uniform, and brightness is superior, a back plate for a plasma display panel equipped with it, and its manufacture. SOLUTION: On a barrier rib 2-formed substrate for plasma display panel 1, in a state where a thermoplastic resin layer 6 is arranged on a phosphor- containing photosensitive resin composite layer 5, the layer 6 is heated and pressing bound 7. Active rays 9 are imaging irradiated onto the photosensitive resin composite layer 5, and the photosensitive resin composite layer 5 is selectively removed by development so as to form a pattern. An unnecessary portion is removed by burning so as to form a phosphor pattern.

136. 发明专利

JPH09265182A PHOTOSENSITIVE ELEMENT AND PRODUCTION OF PHOSPHOR PATTERN FORMED BY USING THE SAME 失效
公开(公告)号：JPH09265182A
公开(公告)日：1997-10-07
申请号：JP7496396
申请日：1996-03-28
申请人： HITACHI CHEMICAL CO LTD
发明人： NOJIRI TAKESHI , TACHIKI HIDEYASU , TANAKA HIROYUKI , WADA YUMIKO , TAI SEIJI
IPC分类号： G03F7/004 , C08F20/10 , C08F20/20 , C09K11/08 , G03F7/027 , G03F7/028 , G03F7/40 , H01J9/227
摘要： PROBLEM TO BE SOLVED: To provide a photosensitive element capable of forming phosphor patterns of a uniform shape with high accuracy and good workability and a process for producing the phosphor patterns with allowance. SOLUTION: This photosensitive element has a thermoplastic resin layer on a base film and has a photosensitive rein compsn. layer contg. an photoinitiator which forms free radicals by irradiation with active light and is liable to deactivate the formed free radicals by oxygen and the phosphors there-on. This process for producing the phosphor patterns comprises thermally press bonding such photosensitive element one a substrate having ruggedness in such a manner that the photosensitive resin compsn. layer comes into contact therewith. The photosensitive element is irradiated imagewise with the active rays in the state that air contg. oxygen exists on the photosensitive resin layer and the unnecessary parts are removed by development. Further, the unnecessary parts are removed by baking.

137. 发明专利

JPH09127685A PHOTOSENSITIVE RESIN COMPOSITION AND PRODUCTION OF PHOTOSENSITIVE FILM AND FLUORESCENT PATTERN USING SAME 失效
公开(公告)号：JPH09127685A
公开(公告)日：1997-05-16
申请号：JP28578995
申请日：1995-11-02
申请人： HITACHI CHEMICAL CO LTD
发明人： UEJIMA KOICHI , TACHIKI HIDEYASU , NOJIRI TAKESHI , TANAKA HIROYUKI , TAI SEIJI , TANNO SEIKICHI , KAKUMARU HAJIME
IPC分类号： G03F7/004 , G03F7/027 , G03F7/028 , G03F7/033 , G03F7/40 , H01J9/227
摘要： PROBLEM TO BE SOLVED: To obtain a resin compsn. not increasing its viscosity over a long period of time and excellent in shelf stability by incorporating a specified phosphor, a specified resin, a photopolymerizable unsatd. compd. and a photo- initiator. SOLUTION: This resin compsn. contains a phosphor (A) surface-treated with a resin, a resin (B) having carboxyl groups, a photopolymerizable unsatd. compd. (C) having an ethylenically unsatd. group and a photo-initiator (D) generating free radicals when irradiated with active light as essential components. The phosphor A is obtd. usually by surface-treating a metal oxide-base phosphor with a resin. The resin B is obtd. by copolymerizing unsatd. carboxylic acid with one or more kinds of other unsatd. monomers each copolymerizable with the carboxylic acid. Any known photopolymerizable monofunctional monomer may be used as the unsatd. compd. C. The photo-initiator D is not especially limited.

138. 发明专利

JPH08199094A COATING VARNISH COMPOSITION AND ANTIFOULING COATING COMPOSITION 失效
公开(公告)号：JPH08199094A
公开(公告)日：1996-08-06
申请号：JP1215495
申请日：1995-01-30
申请人： HITACHI CHEMICAL CO LTD
发明人： TENDOU KAZUYOSHI , TAI SEIJI
IPC分类号： C09D5/16 , C08L101/16 , C09D177/00 , C09D177/04
摘要： PURPOSE: To obtain a coating varnish compsn. free from the fear of affecting an ecosystem and capable of forming a coating film capable of keeping excellent antifouling properties for a long period by using an amino acid polymer. CONSTITUTION: This coating varnish compsn. comprises an amino acid polymer having constituent units of the formula (wherein n is 1 or 2; R is a linear, branched or cyclic alkyl group, an aryl group, a heterocyclic group, or an aralkyl group). In order to prevent attachment of underwater life to underwater constructions, there have heretofore been used antifouling coatings comprising a (co)polymer of an organotin-contg. unsatd. monomer as the resin component. Since the organotin discharged from these coatings into water is hardly decomposed, however, the use of these coatings has come to be restricted. The coating varnish compsn. does not involve the risk involved in the (co)polymer of the organotin-coatg. unsatd. monomer and the fear of affecting an ecosystem even when dissolved out into seawater because of its biodegradability with microorganisms, and can be formed into a coating film capable of keeping excellent antifouling properties for a long period.

139. 发明专利

JPH08151549A VARNISH COMPOSITION FOR COATING, ANTIFOULING COATING COMPOSITION AND METHOD FOR ANTIFOULING 失效
公开(公告)号：JPH08151549A
公开(公告)日：1996-06-11
申请号：JP25287295
申请日：1995-09-29
申请人： HITACHI CHEMICAL CO LTD
发明人： TENDOU KAZUYOSHI , TAI SEIJI , UEJIMA KOICHI , TANAKA HIROYUKI
IPC分类号： C08K5/05 , C08K5/109 , C08K5/205 , C08K5/315 , C08K5/3445 , C08K5/521 , C08L101/16 , C09D5/16 , C09D129/00 , C09D129/10 , C09D131/02 , C09D133/04 , C09D133/14 , C09D135/00 , C09D137/00
摘要： PURPOSE: To obtain the subject composition containing a biologically degradable polymer having specific structural units and other biodegradable structural units, excellent in biodegradability, an antifouling property, etc., and useful for preventing the adhesion of aquatic organisms to underwater structures. CONSTITUTION: This composition contains a biodegradable polymer having (A) structural units of formula I (R and R are independently H, Cl, Br, methyl, ethyl, phenyl), formula II [R and R are independently H, Cl, Br, (substituted) methyl, (substituted) ethyl], and/or formula III [R and R are independently H, methyl, ethyl; R is (substituted) alkyl, aryl, etc.,], and (B) biodegradable structural units except the structural units (A), preferably structural units of formula IV [n is 0, 1; X is O, S, etc.; R is alkyl, aryl, acyl, etc., (but when the structural unit A has the structural unit of formula I, the structural unit B (wherein n is 0; X is O; R is 1-2C alkyl or 1-5C acyl) is excluded].

140. 发明专利

JPH07150104A VARNISH COMPOSITION FOR COATING MATERIAL AND ANTIFOULING COATING COMPOSITION 失效
公开(公告)号：JPH07150104A
公开(公告)日：1995-06-13
申请号：JP29481993
申请日：1993-11-25
申请人： HITACHI CHEMICAL CO LTD
发明人： UEJIMA KOICHI , TAI SEIJI , TANAKA HIROYUKI
IPC分类号： C09D5/14 , C09D5/16 , C09D133/02 , C09D133/06 , C09D133/14 , C09D135/00
摘要： PURPOSE:To provide the title varnish composition which is freed from the danger of an organotin copolymer, shows film dissolution and antifouling performance equivalent to those of the copolymer and can form a coating film having excellent antifouling propprties for a long time. CONSTITUTION:This varnish composition is prepared by mixing a polymer obtained by polymerizing at least one unsaturated carboxylic acid with at least another unsaturated monomer copolymerizable therewith with at least one additive selected from among a triazole derivative, a thiazole derivative and a benzothiazole derivative. This coating composition is prepared by mixing the varnish composition with an antifouling agent based on a copper compound.

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