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    • 114. 发明专利
    • Low melting point glass and its production method
    • 低熔点玻璃及其生产方法
    • JP2005336018A
    • 2005-12-08
    • JP2004158654
    • 2004-05-28
    • Central Glass Co Ltdセントラル硝子株式会社
    • YANO TAICHI
    • C03C8/10C03C8/24
    • C03C8/245C03C8/10
    • PROBLEM TO BE SOLVED: To provide low melting point glass which is free from yellowing by silver reaction, has high visible light transmittance, and is useful for developing an electronic material substrate represented by a plasma display panel.
      SOLUTION: The transparent insulative low melting glass is characterized by having a glass composition comprising, by weight, 10-27% SiO
      2 , 0.5-7% B
      2 O
      3 , 50-70% PbO and 1-15% ZnO, and as essential components, 0.01-1% CuO and 0.01-1% MnO
      2 , and being pulverized in a wet pulverization process using ion exchange water. Further, the low melting point glass is characterized in that the whole light visible light transmittance is ≥80% when the thickness is 30 mm, the linear visible light transmittance is ≥60%, and the value of b
      * on a silver electrode substrate is ≤7.0 after being fired at 500-600°C.
      COPYRIGHT: (C)2006,JPO&NCIPI
    • 要解决的问题:为了提供通过银反应没有变黄的低熔点玻璃,具有高可见光透射率,并且可用于显影由等离子体显示面板表示的电子材料基板。 解决方案:透明绝缘低熔点玻璃的特征在于具有玻璃组合物,该玻璃组合物按重量计包含10-27%的SiO 2 SB 2,0.5-7%的B SB 2, 50-70%PbO和1-15%ZnO,作为必要组分,0.01-1%的CuO和0.01-1%的MnO 2 SBB,并被粉碎 在使用离子交换水的湿法粉碎过程中。 此外,低熔点玻璃的特征在于,当厚度为30mm,线性可见光透射率≥60%时,整个可见光透射率为≥80%,b * 在500-600℃下焙烧时,银电极基材的含量≤7.0。 版权所有(C)2006,JPO&NCIPI