会员体验
专利管家(专利管理)
工作空间(专利管理)
风险监控(情报监控)
数据分析(专利分析)
侵权分析(诉讼无效)
联系我们
交流群
官方交流:
QQ群: 891211   
微信请扫码    >>>
现在联系顾问~
热词
    • 115. 发明专利
    • Shift catalyst, method for refining gas in coal gasification plant, and gas refining equipment
    • 转炉催化剂,炼油厂气体精炼方法及气体精炼设备
    • JP2014104428A
    • 2014-06-09
    • JP2012259423
    • 2012-11-28
    • Hitachi Ltd株式会社日立製作所
    • SASAKI TAKASHIAKIYAMA TOMOKO
    • B01J23/88C01B32/50C10K3/04
    • B01J23/883B01J21/063B01J23/8877C01B3/16C01B2203/0288C01B2203/0415C01B2203/0465C10J2300/093C10J2300/165C10J2300/1675C10K1/003C10K1/08C10K1/101C10K3/04Y02P20/52
    • PROBLEM TO BE SOLVED: To provide a method for refining a gas in a coal gasification plant capable of suppressing energy loss associated with COrecovery in a coal gasification plant and capable of maintaining the soundness of a CO shift catalyst.SOLUTION: In a gas refining method provided with: a cleaning step 60 where, to a generated gas generated by gasifying a carbon-containing solid fuel and at least containing CO and HS, a water-soluble substance contained in the generated gas is removed; a CO shift step 70 in which the CO contained in the generated gas after the cleaning step is reacted with water vapor using a shift catalyst so as to be converted into COand H; and a CO/HS recovery step 80 in which the COand HS contained in the gas after the CO shift step are removed, the CO shift step is composed of two or more multistage shift reactors 20a, 20b, 20c, the shift reactors 20a, 20b on the upstream side are filled with a high temperature shift catalyst 12a, and the shift reactor 20c on the downstream side is filled with a low temperature shift catalyst 12b.
    • 要解决的问题:提供一种能够抑制煤气化装置中与COrecovery相关的能量损失的煤气化装置中的气体的精炼方法,能够保持CO变换催化剂的健全性。解决方案:在气体精炼方法 具有清洁步骤60,其中,通过气化含碳固体燃料并且至少含有CO和HS产生的产生的气体,除去产生的气体中所含的水溶性物质; CO移动步骤70,其中使用变换催化剂使清洗步骤中产生的气体中所含的CO与水蒸气反应以转化成CO和H; CO / HS回收步骤80,其中包含在CO移位步骤之后的气体中的CO和HS被除去,CO移位步骤由两个或更多个多级变换反应器20a,20b,20c,变换反应器20a,20b组成 在上游侧填充有高温变换催化剂12a,下游侧的变换反应器20c填充有低温变换催化剂12b。
    • 116. 发明专利
    • Gasification system
    • 气化系统
    • JP2012041438A
    • 2012-03-01
    • JP2010183617
    • 2010-08-19
    • Hitachi Ltd株式会社日立製作所
    • KISO FUMIHIKOSASAKI TAKASHIAKIYAMA TOMOKOSHIMODA MAKOTO
    • C10J3/46C10K1/20C10K3/04
    • PROBLEM TO BE SOLVED: To provide a gasification system that can control decline in thermal efficiency of the gasification system even if ammonium chloride deposits on the surface of a shift reaction catalyst when a gas generated by gasification of a carbon-based material is introduced directly into the shift reactor.SOLUTION: The gasification system comprises a gasification section 10, that generates a gas whose principal component is carbon monoxide and hydrogen by performing reaction of a carbon-based fuel such as coal 1 etc. with an oxidizing agent such as oxygen 3, and a shift reaction section 40 that converts the generated gas into a shift gas whose principal component is carbon dioxide and hydrogen by performing reaction with steam using a shift reaction catalyst, and the shift reaction section 40 has at least two series of shift reactors 41 and 42 equipped with a shift reaction catalyst, and the generated gas is passed through at least one series among the shift reactors 41 and 42, and a regenerated gas is passed through another series of the shift reactor, and the generated gas and the regenerated gas can be switched over, and the regenerated gas is heated up to a temperature higher than the temperature of boiling point of ammonium chloride and passed through the shift reactor 41.
    • 要解决的问题:提供一种气化系统,即使当通过碳基材料的气化产生的气体是氯化铵沉积在换档反应催化剂的表面上时也可以控制气化系统的热效率降低 直接引入换档反应器。 解决方案:气化系统包括气化段10,其通过使诸如煤1等碳系燃料与氧等氧化剂3反应而产生主要成分为一氧化碳和氢气的气体, 以及变换反应部40,其通过使用变换反应催化剂与蒸汽进行反应,将生成的气体转换成主要成分为二氧化碳和氢的变换气体,变换反应部40具有至少两个系列的变换反应器41和 42,并且所产生的气体在变换反应器41,42中通过至少一个系列,并且再生气体通过另一系列的变换反应器,并且所产生的气体和再生气体可以 将再生气体加热到高于氯化铵沸点温度的温度,并通过变换反应器41.CO PYRIGHT:(C)2012,JPO&INPIT
    • 118. 发明专利
    • Method of driving plasma display panel, and plasma display apparatus
    • 驱动等离子显示面板的方法和等离子显示装置
    • JP2009294321A
    • 2009-12-17
    • JP2008146098
    • 2008-06-03
    • Hitachi Ltd株式会社日立製作所
    • KUMAGAI JUNICHISASAKI TAKASHI
    • G09G3/20G09G3/288G09G3/291G09G3/292G09G3/293G09G3/298
    • PROBLEM TO BE SOLVED: To provide a method of driving a plasma display panel which can prevent black luminance from fluctuating by a simple configuration when all cells are reset in one field for a plurality of times, and to provide a plasma display apparatus.
      SOLUTION: In the method of driving the plasma display panel, the plasma display panel is driven by a plurality of subfields into which one field is divided. The subfield includes: a reset period during which reset discharge is carried out; an address period during which address discharge is carried out; and a sustain period during which sustain discharge is carried out. The reset discharge has two kinds of reset discharge: an all-cell reset in which all discharge cells are discharged; and an on-cell reset in which the discharge cells where the sustain discharge is carried out are discharged. The reset discharge carries out the all-cell reset in one field a plurality of times. A pulse Vra of positive potential is applied after the second time of the all-cell reset, wherein the pulse Vra has the same polarity as the reset pulse.
      COPYRIGHT: (C)2010,JPO&INPIT
    • 解决的问题:提供一种驱动等离子体显示面板的方法,其可以在一个场中多次复位所有单元时,通过简单的配置来防止黑色亮度波动,并提供等离子体显示装置 。 解决方案:在驱动等离子体显示面板的方法中,等离子体显示面板由分割一个场的多个子场驱动。 子场包括:进行复位放电的复位期间; 执行地址排放的地址期间; 以及进行维持放电的维持期间。 复位放电有两种复位放电:全单元复位,其中所有放电单元都放电; 以及进行维持放电的放电单元的放电单元的复位。 复位放电多次在一个场中执行全单元复位。 在全电池复位的第二次之后施加正电位的脉冲Vra,其中脉冲Vra具有与复位脉冲相同的极性。 版权所有(C)2010,JPO&INPIT
    • 120. 发明专利
    • Exhaust gas treating method and device
    • 排气处理方法和装置
    • JP2009028647A
    • 2009-02-12
    • JP2007195318
    • 2007-07-27
    • Hitachi Ltd株式会社日立製作所
    • SASAKI TAKASHISUGANO SHUICHIKARASAWA HIDETOSHI
    • B01D53/86B01D53/68C07B35/06C07B37/06C07B61/00C07C19/08
    • Y02C20/30
    • PROBLEM TO BE SOLVED: To provide a method which is capable of conducting the treatment of a fluoride compound discharged from a semi-conductor and liquid crystal manufacturing factory with a low running cost and high degradability. SOLUTION: In the treatment method of a fluoride compound-containing gas to decompose a gas to be treated containing the fluoride compound, the method comprises the wet removal step to remove at least either one of an acidic gas or solid matter from the gas to be treated and the fluoride compound decomposing step to decompose the fluoride compound in the gas to be treated with a catalyst. Further, the method has the hydrocarbon supplying step to supply a hydrocarbon to the gas to be treated before conducting the wet removal process or the gas to be treated that has been subjected to the wet removal process. That is, the method enhances the low temperature activities by adding a hydrocarbon represented by methane or ethylene and simultaneously treating the same, and the running cost is reduced because energy needed for elevating the temperature can be reduced by utilizing the heat of combustion of the hydrocarbon. COPYRIGHT: (C)2009,JPO&INPIT
    • 要解决的问题:提供一种能够以低运行成本和高降解性从半导体和液晶制造厂排出的氟化合​​物的处理方法。 解决方案:在含氟化合物的气体的处理方法中,为了分解含氟化合物的待处理气体,该方法包括湿法除去步骤,从中除去酸性气体或固体物质中的至少一种 待处理气体和氟化物分解步骤,以用催化剂分解待处理气体中的氟化物。 此外,该方法具有碳氢化合物供给步骤,用于在进行湿式除去过程之前向被处理气体或经过湿式除去工艺的被处理气体供给烃。 也就是说,该方法通过加入由甲烷或乙烯代表的烃并同时处理而提高低温活性,并且降低运行成本,因为通过利用烃的燃烧热可以降低提高温度所需的能量 。 版权所有(C)2009,JPO&INPIT