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91. 发明专利

JP4951454B2 How to create a lithographic printing plate 有权
公开(公告)号：JP4951454B2
公开(公告)日：2012-06-13
申请号：JP2007256787
申请日：2007-09-28
申请人：富士フイルム株式会社
发明人：修平山口 , 重克藤井 , 圭一足立
IPC分类号： G03F7/035 , G03F7/00 , G03F7/038 , G03F7/32
CPC分类号： G03F7/033 , G03F7/035 , G03F7/0388 , G03F7/322

92. 发明专利

JP2012032544A Actinic ray-sensitive or radiation-sensitive resin composition, and resist film and pattern forming method using the same 有权
标题翻译：丙烯酸类敏感性或辐射敏感性树脂组合物，耐蚀膜和使用其的图案形成方法
公开(公告)号：JP2012032544A
公开(公告)日：2012-02-16
申请号：JP2010171085
申请日：2010-07-29
申请人： Fujifilm Corp , 富士フイルム株式会社
发明人： TAKAHASHI TOSHIYA , TSUBAKI HIDEAKI , TAMAKI HIROSHI , TAKAHASHI HIDETOMO
IPC分类号： G03F7/039 , G03F7/004 , H01L21/027
CPC分类号： G03F7/0397 , G03F7/0045 , G03F7/0046 , G03F7/0392 , G03F7/0758 , G03F7/20 , G03F7/2037 , G03F7/2039 , G03F7/30 , G03F7/322
摘要： PROBLEM TO BE SOLVED: To provide an actinic ray-sensitive or a radiation-sensitive resin composition which simultaneously satisfies high sensitivity, high resolution, excellent roughness characteristics and the reduction of development defects, and a resist film and pattern forming method using the resin composition.SOLUTION: An actinic ray-sensitive or a radiation-sensitive resin composition includes a resin (P) including a repeating unit (A) which decomposes under exposure to an actinic ray or radiation so as to generate acid and a repeating unit (B) which has a structure that solubility in an alkali developer is increased by decomposing due to the action of the acid, and a compound (U) which is constituted to be unevenly distributed on the surface of a film when the film is formed.
摘要翻译：解决的问题：提供同时满足高灵敏度，高分辨率，优异的粗糙度特性和显影缺陷的降低的光化射线敏感性或辐射敏感性树脂组合物，以及使用树脂组合物。光敏性或辐射敏感性树脂组合物包括包含重复单元（A）的树脂（P），其在曝光于光化射线或辐射下分解以产生酸和重复单元（ B）具有通过由于酸的作用而分解而在碱性显影剂中的溶解度增加的结构，以及当膜形成时在膜表面上分布不均匀的化合物（U）。版权所有（C）2012，JPO＆INPIT

94. 发明专利

JP2011221522A Method for manufacturing lithograph printing plate 审中-公开
标题翻译：制造光刻印版的方法
公开(公告)号：JP2011221522A
公开(公告)日：2011-11-04
申请号：JP2011066807
申请日：2011-03-24
申请人： Fujifilm Corp , 富士フイルム株式会社
发明人： ARIMURA KEISUKE
IPC分类号： G03F7/11 , G03F7/00 , G03F7/32
CPC分类号： G03F7/092 , B41C1/1016 , B41C2201/02 , B41C2201/04 , B41C2201/10 , B41C2201/12 , B41C2201/14 , B41C2210/04 , B41C2210/06 , B41C2210/10 , B41C2210/22 , B41C2210/24 , G03F7/322
摘要： PROBLEM TO BE SOLVED: To provide a method for manufacturing a lithograph printing plate, whereby excellent processing stability in which occurrence of development waste is less and developability is satisfactorily maintained is satisfied during running even in the manufacture of a lithograph printing plate including the step of simultaneously removing a protective layer and the photosensitive layer of a non-exposed portion and a developing process step including no water washing step, and whereby a lithograph printing plate excellent in plate wear resistance can be produced.SOLUTION: The method for manufacturing the lithograph printing plate includes the step of exposing the lithograph printing plate, the lithograph printing plate having, in the following order, (i) a hydrophilic support (ii) a photosensitive layer containing (A) polymerization initiator, (B) polymerization compound, (C) sensitizing dye, and (D) binder polymer, and (iii) the protective layer containing a polymer having a repeating unit of a specific structure, and simultaneously removing the protective layer and the photosensitive layer of the non-exposed portion in the presence of a developing liquid containing a surfactant. The method does not include the water-washing step.
摘要翻译：解决问题的方法为了提供一种平版印刷版的制造方法，即使在制造平版印刷版的印刷版的印刷版的制造中也满足了即使令人满意地保持显影废物的发生和显影性的良好的加工稳定性，包括同时除去未曝光部分的保护层和感光层的步骤以及不包括水洗步骤的显影处理步骤，从而可以制备出耐磨性优异的平版印刷版。解决方案：用于制造平版印刷版的方法包括以下步骤使平版印刷版，平版印刷版曝光：（i）亲水载体（ii）含有（A）的感光层的步骤，聚合引发剂，（B）聚合化合物，（C）增感染料和（D）粘合剂聚合物，和（iii）包含具有特定结构重复单元的聚合物的保护层，同时除去保护层和感光在含有表面活性剂的显影液的存在下，未曝光部分的层。该方法不包括水洗步骤。版权所有（C）2012，JPO＆INPIT

95. 发明专利

JP2011215617A Composition and method for reducing pattern collapse 审中-公开
标题翻译：用于减少图案褶皱的组合物和方法
公开(公告)号：JP2011215617A
公开(公告)日：2011-10-27
申请号：JP2011075226
申请日：2011-03-30
申请人： Tokyo Electron Ltd , 東京エレクトロン株式会社
发明人： SOMERVELL MARK
IPC分类号： G03F7/004 , C07D313/00 , H01L21/027
CPC分类号： G03F7/0046 , G03F7/0048 , G03F7/322
摘要： PROBLEM TO BE SOLVED: To provide a composition and a method for reducing pattern collapse.SOLUTION: A radiation-sensitive composition and a method for using the composition to reduce the probability of pattern collapse are provided. The radiation-sensitive composition includes a bulk matrix of radiation-sensitive material with a base-reactive, surface-modifying agent dispersed throughout the matrix. The base-reactive, surface-modifying agent is reactive to hydroxide and increases the surface hydrophobicity of a pattern formed in a layer of the radiation-sensitive composition upon treatment with a basic developing solution during lithographic processing of a substrate.
摘要翻译：要解决的问题：提供减少图案塌陷的组合物和方法。解决方案：提供一种辐射敏感组合物和使用该组合物降低图案塌陷概率的方法。辐射敏感组合物包括辐射敏感材料的体基质，其具有分散在整个基质中的碱反应性表面改性剂。碱反应性表面改性剂与氢氧化物反应，并且在基材的光刻加工过程中用碱性显影液处理时增加在辐射敏感组合物的层中形成的图案的表面疏水性。

96. 发明专利

JP2011191558A Method of preparing lithographic printing plate 有权
标题翻译：制备平版印刷板的方法
公开(公告)号：JP2011191558A
公开(公告)日：2011-09-29
申请号：JP2010058390
申请日：2010-03-15
申请人： Fujifilm Corp , 富士フイルム株式会社
发明人： TAGUCHI TAKANORI
IPC分类号： G03F7/027 , G03F7/00 , G03F7/033 , G03F7/32
CPC分类号： G03F7/027 , G03F7/30 , G03F7/322
摘要： PROBLEM TO BE SOLVED: To provide a method of preparing a lithographic printing plate which is excellent not only in developing property, sensitivity and ink-receptive property but also in printing durability and reproducibility of halftone dot and inhibits the generation of development scum in a developer to be excellent in processing property, in spite of conducting the development using a developer having pH from 2 to 11. SOLUTION: The method of preparing a lithographic printing plate includes (A) an exposure step of image exposure of a lithographic printing plate precursor including a hydrophilic support, a photosensitive layer containing (i) a binder polymer, (ii) an ethylenically unsaturated compound having a hydrophilic group selected from the group consisting of at least one of an acid group and a salt thereof, an onium salt and a polyalkyleneoxy group and (iii) a polymerization initiator, and a protective layer in this order, and (B) a development step of removing an unexposed area of the photosensitive layer and the protective layer of the lithographic printing plate precursor with a one bath using a developer having pH from 2 to 11. COPYRIGHT: (C)2011,JPO&INPIT
摘要翻译：要解决的问题：提供一种制备平版印刷版的方法，该平版印刷板不仅具有显影性，灵敏度和油墨接受性，而且在印花耐久性和半色调点的再现性方面优异，并且抑制了显影浮渣的产生在显影剂中具有优异的加工性能，尽管使用pH为2〜11的显影剂进行显影。解决方案：制备平版印刷版的方法包括（A）曝光步骤，包括亲水性载体的平版印刷版原版，含有（i）粘合剂聚合物的感光层，（ii）具有选自酸基和其盐中的至少一种的亲水基团的烯属不饱和化合物，鎓盐和聚亚烷基氧基，和（iii）聚合引发剂和保护层，以及（B）除去未反应的显影步骤使用pH为2〜11的显影剂，使用一个浴，感光层和平版印刷版前体的保护层的面积。（C）2011，JPO＆INPIT

97. 发明专利

JP2011180291A Method for preparing planographic printing plate and developer solution for master planographic printing plate 有权
标题翻译：制备平面印刷板的方法和主平面印刷板的开发者解决方案
公开(公告)号：JP2011180291A
公开(公告)日：2011-09-15
申请号：JP2010043130
申请日：2010-02-26
申请人： Fujifilm Corp , 富士フイルム株式会社
发明人： INNO NORIBUMI
IPC分类号： G03F7/32 , G03F7/00 , G03F7/004 , G03F7/027 , G03F7/035
CPC分类号： G03F7/322 , G03F7/32
摘要： PROBLEM TO BE SOLVED: To provide a method for preparing a planographic printing plate, which enables a one-liquid-one-step simple process not requiring a washing step, exhibits excellent developability, and can provide a planographic printing plate which has good printing durability and does not produce print stains. SOLUTION: In the method for preparing a planographic printing plate, a master planographic printing plate which has on a hydrophilic support body a photosensitive layer which contains (A) a polymerization initiator, (B) a polymerizable compound, (C) a sensitizing dye and (D) a binder polymer and a protective layer, in this order, is laser-exposed, and thereafter the protective layer and the photosensitive layer of the unexposed portion are removed in the presence of a developer solution, wherein the developer solution has pH of ≥2 and COPYRIGHT: (C)2011,JPO&INPIT
摘要翻译：要解决的问题：提供一种制备平版印刷版的方法，其能够进行不需要洗涤步骤的单液体一步简单方法，显示出优异的显影性，并且可以提供平版印刷版，其具有良好的印刷耐久性，不会产生印刷污渍。解决方案：在平版印刷版的制备方法中，在亲水性支持体上具有含有（A）聚合引发剂的感光层的主平版印刷版，（B）可聚合化合物，（C）增感染料和（D）粘合剂聚合物和保护层依次被激光曝光，然后在显影剂溶液存在下除去未曝光部分的保护层和感光层，其中显影剂溶液 pH为≥2且<10，并含有两性离子表面活性剂和具有烯化氧链的非离子表面活性剂。版权所有（C）2011，JPO＆INPIT

98. 发明专利

JP2011175256A Lithographic printing plate precursor and method of preparing lithographic printing plate 有权
标题翻译：平版印刷机前驱体及其制备方法
公开(公告)号：JP2011175256A
公开(公告)日：2011-09-08
申请号：JP2011017309
申请日：2011-01-28
申请人： Fujifilm Corp , 富士フイルム株式会社
发明人： ISHIGURO YURIKO , ARIMURA KEISUKE
IPC分类号： G03F7/11 , G03F7/00 , G03F7/031 , G03F7/32
CPC分类号： G03F7/11 , G03F7/16 , G03F7/322
摘要： PROBLEM TO BE SOLVED: To provide a lithographic printing plate precursor and a method of preparing a lithographic printing plate each of which can prevent the occurrence of fingerprint trace stain and is capable of conducting one solution processing.
SOLUTION: The lithographic printing plate precursor comprises a support and an image-recording layer comprising (A) a sensitizing dye, (B) a polymerization initiator, (C) a polymerizable compound and (D) a binder polymer, wherein a surface of the support is treated with a hydroxycarboxylate salt or a layer adjacent to the support contains a hydroxycarboxylate salt. The method of preparing a lithographic printing plate comprises developing the lithographic printing plate precursor with a developer having pH of 2-11.
COPYRIGHT: (C)2011,JPO&INPIT
摘要翻译：要解决的问题：提供平版印刷版原版和制备平版印刷版的方法，每种平版印刷版可以防止指纹痕迹染色的发生，并且能够进行一种溶液处理。平版印刷版原版包括载体和图像记录层，其包含（A）敏化染料，（B）聚合引发剂，（C）可聚合化合物和（D）粘合剂聚合物，其中a 用羟基羧酸盐处理载体的表面或与载体相邻的层包含羟基羧酸盐。制备平版印刷版的方法包括用pH为2-11的显影剂显影平版印刷版前体。版权所有（C）2011，JPO＆INPIT

99. 发明专利

JP2011170198A Method of manufacturing planographic printing plate 有权
标题翻译：制作平面印刷版的方法
公开(公告)号：JP2011170198A
公开(公告)日：2011-09-01
申请号：JP2010035192
申请日：2010-02-19
申请人： Fujifilm Corp , 富士フイルム株式会社
发明人： SHIRAISHI YUICHI
IPC分类号： G03F7/095 , G03F7/00 , G03F7/004 , G03F7/039 , G03F7/32
CPC分类号： G03F7/322 , B41C1/1008 , B41C1/1016 , B41C2201/06 , B41C2201/10 , B41C2210/02 , B41C2210/06 , B41C2210/14 , B41C2210/22 , B41C2210/24 , B41C2210/262 , B41C2210/266 , G03F7/095
摘要： PROBLEM TO BE SOLVED: To provide a method of manufacturing a planographic printing plate having excellent developability and restraining the occurrence of development foreign matter with the lapse of time even in the case of using an alkali liquid developer with comparatively low +.
SOLUTION: The method of manufacturing a planographic printing plate includes: an exposure process of image exposing a positive type planographic printing plate original including an image recording layer sequentially having a lower layer containing a copolymer containing at least a structural unit derived from an infrared absorber, an alkali soluble resin and acrylonitrile and a structural unit derived from styrene, and an upper layer containing water insoluble and alkali soluble resin; and a development process of developing an image exposed positive type planographic printing plate original with an aqueous alkali solution with pH of 8.5-10.8 containing an anionic surfactant in order.
COPYRIGHT: (C)2011,JPO&INPIT
摘要翻译：要解决的问题：提供一种具有优异显影性的平版印刷版的制造方法，即使在使用比较低的碱液显影剂的情况下也能够抑制显影异物的发生。解决方案：平版印刷版的制造方法包括：曝光正型平版印刷版原版的图像的曝光处理，其包括依次具有下层的图像记录层，所述下层含有至少包含衍生自红外吸收剂，碱溶性树脂和丙烯腈以及由苯乙烯衍生的结构单元，以及含有水不溶性和碱溶性树脂的上层; 以及依次用含有阴离子表面活性剂的pH为8.5-10.8的碱性水溶液开发出图像曝光的正型平版印刷版的显影方法。版权所有（C）2011，JPO＆INPIT

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