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91. 发明专利

JP2007297900A Repairing method for concrete water-passage wall and structure of the same 有权
标题翻译：混凝土采水墙及其结构的修复方法
公开(公告)号：JP2007297900A
公开(公告)日：2007-11-15
申请号：JP2006253669
申请日：2006-09-20
申请人： Nippon Electric Glass Co Ltd , 日本電気硝子株式会社
发明人： TAKEUCHI YOSHIO
IPC分类号： E02B5/02 , C04B14/44 , C04B24/24 , C04B24/26 , C04B28/02 , C04B111/72
CPC分类号： C04B41/5076 , C04B41/009 , C04B41/5022 , C04B41/5035 , C04B41/5315 , C04B41/483 , C04B41/4869 , C04B41/4876 , C04B28/02
摘要： PROBLEM TO BE SOLVED: To provide a repairing method for a concrete water-passage wall by which a degraded part appearing on a wall surface of a concrete water-passage structure used for hydraulics-related facilities like an industrial water-passage or an agricultural water-passage is removed and fine cracks or the like formed in the surface after the construction can be restrained by improving the strength, as well as to provide the concrete water-passage wall structure.
SOLUTION: The repairing method for the concrete water-passage wall includes a foundation treatment process for removing the weakened part of the wall including an area of the surrounding normal wall part to expose a sound part inside the normal concrete, and a coating process for coating the sound part with a mortar base material including an organic fiber. The repairing method also includes a successive laying process in which an embedding material is embedded in the mortar base material of a successive joint part of a side face and a floor face of the water-passage wall. The concrete water-passage wall structure 10 has an alkali-resistant glass fiber sheet F and mortar base material layers 12, 13 including a chopped fiber which are formed on a structural cross section perpendicular to the direction of flow of the water passage W by means of the repairing method for the concrete water-passage wall.
COPYRIGHT: (C)2008,JPO&INPIT
摘要翻译：要解决的问题：提供一种用于混凝土水通道的修复方法，通过该修复方法，出现在用于诸如工业水道的水力相关设施的混凝土水道结构的壁表面上的退化部分或除去农业水通道，通过提高强度来抑制施工结束后的表面形成的微细裂纹等，以及提供混凝土水通道壁结构。解决方案：混凝土水通道墙体的修复方法包括一个基础处理工艺，用于去除围墙的弱化部分，包括周围的正常壁部分的区域，以露出普通混凝土内部的声部，涂层用包含有机纤维的砂浆基材涂覆声部的方法。修补方法还包括连续铺设过程，其中嵌入材料嵌入在水通道壁的侧面和地板面的连续接合部分的砂浆基材中。混凝土水通道壁结构10具有耐碱玻璃纤维片F和包括短切纤维的砂浆基材层12,13，该短切纤维片形成在垂直于水通道W的流动方向的结构横截面上，的混凝土水道墙修复方法。版权所有（C）2008，JPO＆INPIT

92. 发明专利

JP3993330B2 The method of forming the SiO2-based ceramic film 有权
公开(公告)号：JP3993330B2
公开(公告)日：2007-10-17
申请号：JP17599
申请日：1999-01-04
申请人：クラリアントインターナショナルリミティド
发明人：一博山田 , 徹舟山
IPC分类号： B32B9/00 , C03B19/12 , C04B41/50
CPC分类号： C04B41/009 , C04B41/5035 , C04B41/4554 , C04B35/00

93. 发明专利

JP3924928B2 Ferroelectric material and a ferroelectric memory 失效
公开(公告)号：JP3924928B2
公开(公告)日：2007-06-06
申请号：JP17327498
申请日：1998-06-19
申请人：ヤマハ株式会社
发明人：秀樹坪井 , 升宏岡田 , 邦夫樋山
IPC分类号： C04B35/49 , C04B41/50 , H01B3/12 , H01L21/8242 , H01L21/8246 , H01L21/8247 , H01L27/10 , H01L27/105 , H01L27/108 , H01L29/788 , H01L29/792
CPC分类号： C04B41/009 , C04B41/5035 , C04B2111/00422 , C04B2111/00844 , C04B35/491
摘要： PROBLEM TO BE SOLVED: To improve the fatigue characteristics and to make the formation of capacitor electrodes easy when a ferroelectric material is used as a capacitor insulation film by incorporating Li into the PZT ferroelectric material containing Pb, Zr and Ti. SOLUTION: The compsn. of this ferroelectric material is expressed by the general formula of PbyZr(1-x)TixO3 and includes Li in it. In the formula, x and y are preferably 0.3 to 0.7 and 0.9 to 1.1, respectively and the amt. of Li is preferably 0.2 to 20 mol.% to the amt. of PbyZr(1-x)TixO3. Since the Li is incorporated into the PZT ferroelectric material having high spontaneous polarization, the standard energy of formation is low and oxygen voids can be prevented. Thereby, the decrease in the polarization amt. is prevented and high fatigue characteristics can be obtd. A dielectric memory using this material can have a capacitor insulating film of 50 to 500 nm film thickness. A ferroelectric film can be manufactured for example, by using a solgel method.

94. 发明专利

JP2006264311A Protective layer for barrier coating of silicon containing substrate and method for manufacturing it 审中-公开
标题翻译：含硅基板的阻挡层涂层保护层及其制造方法
公开(公告)号：JP2006264311A
公开(公告)日：2006-10-05
申请号：JP2006009437
申请日：2006-01-18
申请人： General Electric Co , ゼネラル・エレクトリック・カンパニイGeneral Electric Company
发明人： GOVERN CHRISTINE , SPITSBERG IRENE , HAZEL BRIAN T
IPC分类号： B32B9/00 , B32B18/00 , F01D5/28 , F02C7/00
CPC分类号： F01D5/288 , C04B41/009 , C04B41/52 , C04B41/89 , C23C28/042 , F05D2230/90 , F05D2300/611 , C04B41/0072 , C04B41/4556 , C04B41/5035 , C04B41/4527 , C04B41/5024 , C04B41/5037 , C04B41/5045 , C04B41/4529 , C04B41/5031 , C04B41/5042 , C04B41/522 , C04B35/565 , C04B35/584 , C04B35/806
摘要： PROBLEM TO BE SOLVED: To provide a protective layer for a barrier coating of a silicon containing substrate and a method for manufacturing it.
SOLUTION: The article (10) comprises a silicon containing substrate (30), an outer barrier layer (66), a steam resistant barrier coating (42) which covers the substrate (30) and a corrosion resistant metal silicate protective layer (74) which covers the outer barrier layer (66) and is adjacent to the outer barrier layer (66), the outer barrier layer (66) comprising substantially an alkali earth metal silicate/alumino silicate. A method is also provided to form the corrosion resistant metal silicate protective layer (74).
COPYRIGHT: (C)2007,JPO&INPIT
摘要翻译：要解决的问题：提供用于含硅基板的阻挡涂层的保护层及其制造方法。解决方案：物品（10）包括含硅基材（30），外阻挡层（66），覆盖基材（30）的耐蒸汽阻隔涂层（42）和耐腐蚀金属硅酸盐保护层（74），其覆盖所述外阻挡层（66）并且邻近所述外阻挡层（66），所述外阻挡层（66）基本上包含碱土金属硅酸盐/铝硅酸盐。还提供了形成耐腐蚀金属硅酸盐保护层（74）的方法。版权所有（C）2007，JPO＆INPIT

100. 发明专利

JP2005501176A Insulated and functionalization method of a metal-containing fine particles having a conformal ultrathin film 有权
公开(公告)号：JP2005501176A
公开(公告)日：2005-01-13
申请号：JP2003513771
申请日：2002-07-16
申请人：ザ・リージエンツ・オブ・ザ・ユニバーシテイ・オブ・コロラド
发明人：ウェイマー、アラン・ダブリュー , ジョージ、スチーブン・エム , ファーガソン、ジョン・ディー , ワンク、ジェフリー・アール
IPC分类号： A61K47/02 , A61K49/00 , B01J2/00 , B01J21/04 , B01J23/755 , B01J27/24 , B01J35/02 , B01J37/02 , B01J37/08 , B22F1/02 , B32B9/00 , C01B21/064 , C04B35/628 , C04B41/45 , C04B41/52 , C04B41/81 , C04B41/89 , C08K9/02 , C08L101/00 , C23C8/02 , C23C10/06 , C23C16/40 , C23C16/44 , C23C16/455 , C23C30/00 , H01L23/29 , H01L23/373
CPC分类号： C23C16/45525 , B01J2/006 , B01J21/04 , B01J23/755 , B01J27/24 , B01J37/0207 , B01J37/0238 , B01J37/024 , B01J37/086 , B22F1/02 , B22F1/025 , C04B35/62807 , C04B35/62813 , C04B35/62897 , C04B41/009 , C04B41/4584 , C04B41/52 , C04B41/81 , C04B41/89 , C04B2235/386 , C23C8/02 , C23C10/06 , C23C16/402 , C23C16/403 , C23C16/4417 , C23C30/00 , H01L23/295 , H01L23/3737 , H01L2924/0002 , Y02T50/67 , C04B41/4531 , C04B41/5031 , C04B41/5027 , C04B41/51 , C04B41/5035 , C04B35/00 , C04B35/583 , H01L2924/00
摘要：原子層成膜法を用い、超薄膜コンフォーマル皮膜を有する粒子を作製する。ベース粒子には、セラミック材料や金属材料が含まれる。皮膜は又セラミック材料又は金属材料であってもよく、これらは二元連続反応工程で成膜することができる。被膜された粒子は電子機器実装用途の充填材としてだけではなく、セラミック又はサーメット部品製造用や触媒担体として用いられたり、その他の用途に使われる。

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