专利快速检索-快速检索全球专利，免费商用专利数据库-IPRDB

91. 发明专利

JP2003311275A Electric deionization apparatus 有权
标题翻译：电动除尘装置
公开(公告)号：JP2003311275A
公开(公告)日：2003-11-05
申请号：JP2002122626
申请日：2002-04-24
申请人： Kurita Water Ind Ltd , 栗田工業株式会社
发明人： SATO SHIN , MORIBE TAKAYUKI , MIWA MASAYUKI
IPC分类号： B01D61/48 , C02F1/44 , C02F1/469 , C25B9/00
摘要： PROBLEM TO BE SOLVED: To provide an electric deionization apparatus which has simple structure and can be easily manufactured.
SOLUTION: A cation exchange membrane 3 and an anion exchange membrane 4 are arranged between a cathode 1 and an anode 2. A concentrating chamber and cathode chamber 5 is formed between the cathode 1 and the cation exchange membrane 3. A concentrating chamber and anode chamber 6 is formed between the anode 2 and the anion exchange membrane 4. A desalting chamber 7 is formed between the cation exchange membrane 3 and the anion exchange membrane 4. The concentrating chamber and cathode chamber 5 and the concentrating chamber and anode chamber 6 are respectively formed of a recess 11 of a plate 10 and of a recess 21 of a plate 20. Mesh-shaped membrane electrodes 1, 2 are respectively formed by sputtering or the like at bottom surfaces of the recesses 11, 21.
COPYRIGHT: (C)2004,JPO
摘要翻译：要解决的问题：提供一种结构简单且易于制造的电去离子装置。解决方案：阳极交换膜3和阴离子交换膜4布置在阴极1和阳极2之间。在阴极1和阳离子交换膜3之间形成浓缩室和阴极室5.浓缩室并且阳极室6形成在阳极2和阴离子交换膜4之间。在阳离子交换膜3和阴离子交换膜4之间形成脱盐室7.浓缩室和阴极室5以及浓缩室和阳极室 6分别由板10的凹部11和板20的凹部21形成。网状薄膜电极1,2分别通过溅射等形成在凹部11,21的底面。
版权所有（C）2004，JPO

92. 发明专利

JP2003136063A ELECTRIC DEIONIZER 审中-公开
公开(公告)号：JP2003136063A
公开(公告)日：2003-05-13
申请号：JP2001334950
申请日：2001-10-31
申请人： KURITA WATER IND LTD
发明人： MIWA MASAYUKI , SATO SHIN
IPC分类号： B01D61/48 , C02F1/469
摘要： PROBLEM TO BE SOLVED: To provide an electric deionize which supplies the necessary amount of electric current even when impressed voltage between electrodes is lowered, thereby performing deionization sufficiently. SOLUTION: A cation exchange membrane 3 and an anion exchange membrane 4 are disposed between a cathode 1 and an anode 2. A concentration and cathode chamber 5 is formed between the cathode 1 and the cation exchange membrane 3. A concentration and anode chamber 6 is formed between the anode 2 and the anion exchange membrane 4. A desalting chamber 7 is formed between the cation exchange membrane 3 and the anion exchange membrane 4. The concentration and cathode chamber 5 and the concentration and anode chamber 6 are filled with a cation exchange resin 8 respectively. The desalting chamber 7 is filled with the cation exchange resin 8 and an anion exchange resin 9 in a state where they are mixed.

93. 发明专利

JP2000263059A ELECTRIC DESALTING APPARATUS 失效
公开(公告)号：JP2000263059A
公开(公告)日：2000-09-26
申请号：JP7225599
申请日：1999-03-17
申请人： KURITA WATER IND LTD
发明人： SATO SHIN
IPC分类号： B01D61/46 , C02F1/469
摘要： PROBLEM TO BE SOLVED: To provide an electric desalting apparatus preventing the precipitation of a hardness component and capable of performing desalting operation extremely reduced in the lowering of capacity with the elapse of time. SOLUTION: Water to be desalted flows in a desalting chamber 8 from an inflow port 6 to flow zigzag and flows out of a desalted water outflow part 7. During this process, anions and cations in water to be desalted permeate anion exchange membranes 4 or cation exchange membranes 5 to move into first and second concn. chambers 10, 20. Conc. water flows through the first and second concn. chambers 10, 20 and ions transferred to first and second cone. waters flow out of the conc. water outflow ports 12, 22 of the first and second concn. chambers 10, 20 on the rearmost side. The first conc. water and second conc. water flowing out of conc. water outflow ports 12, 22 are circulated to an inflow port 11 of first cone. water and an outflow port 12 of second conc. water without being mixed.

94. 发明专利

JP2000229223A ELECTROLYTICALLY DEIONIZING DEVICE AND ITS OPERATION 失效
公开(公告)号：JP2000229223A
公开(公告)日：2000-08-22
申请号：JP2895599
申请日：1999-02-05
申请人： KURITA WATER IND LTD
发明人： MORIBE TAKAYUKI , SATO SHIN
IPC分类号： B01D61/46 , B01D61/52 , B01D61/54 , C02F1/469
摘要： PROBLEM TO BE SOLVED: To effectively suppress the deposition of scale in a concentration chamber by providing a means for controlling the temp. of water supplied to the concentration chamber to equal to or above a specific value in an electrolytically deionizing device constituted so as to alternately form the concentration chamber and a desalination chamber by alternately arranging plural anion exchange membranes and plural cation exchange membranes. SOLUTION: A part of raw water successively pretreated in an activated carbon column 1 and an RO membrane separation device 2 is supplied to a concentration chamber 3B of the electrolytically deionizing device 3, the remainder is supplied to the desalination chamber 3A and treated and the flow-out water from the desalination chamber 3A is taken out as a treated water (product water). On the other hand, a part of the flow-out water from the concentration chamber 3B is discharged out of the system and the remainder is circulated to the supply side of the concentration chamber 3B by a pump 6. The feed water, composed of the raw water and the circulated water, to the concentration chamber 3B is heated to >=25 deg.C by a heat exchanger 4, in which a hot water valve is opened and closed by being linked with a thermometer 5. As a result, the deposition of the scale in the concentration chamber 3B is effectively suppressed and stable operation is continued over a long period.

95. 发明专利

JPH11188359A PURE WATER PRODUCING APPARATUS 失效
公开(公告)号：JPH11188359A
公开(公告)日：1999-07-13
申请号：JP36011797
申请日：1997-12-26
申请人： KURITA WATER IND LTD
发明人： SATO SHIN
IPC分类号： B01D61/48 , C02F1/44 , C02F1/469 , C02F1/58
摘要： PROBLEM TO BE SOLVED: To provide a pure water producing apparatus which can increase a baron removal ratio remarkably in an electric deionization device in the production of pure water of reduced boron concentration which is used in electronics fields including semiconductor production or related fields. SOLUTION: An apparatus is equipped with an alkali addition device 1 which adds alkali into boron-containing water to adjust the pH at 9.2 or above, an alkali resistant reverse osmosis membrane device 2 through which the pH- adjusted boron-containing water is passed, an electric deionization device 3 through which water which passed through the device 2 is passed, a reverse osmosis membrane device 11 through which boron-containing water is passed, an alkali addition device 12 which adds alkali into water which passed through the device 11 and adjusts the pH at 9.2 or above, and an electric deionization device 13 through which the pH-adjusted water which passed through the device 11 is passed.

96. 发明专利

JPH11138165A TREATMENT OF BORON-CONTAINING WATER 失效
公开(公告)号：JPH11138165A
公开(公告)日：1999-05-25
申请号：JP30887897
申请日：1997-11-11
申请人： KURITA WATER IND LTD
发明人： SATO SHIN
IPC分类号： B01D61/02 , C02F1/44 , C02F1/58 , C02F5/00
摘要： PROBLEM TO BE SOLVED: To eliminate the lowering of permeability due to the generation of calcium scales and to keep the amt. of permeated water much for a long time by adding an antiscaling agent to the boron-contg. water to be passed through a reverse-osmosis membrane. SOLUTION: The raw water contg. boron is regulated to >= pH 9.2 by adding an alkali, then an antiscaling agent is added, and the water is passed through a reverse-osmosis membrane 1 to remove boron. Otherwise, an acid is added to the boron-contg. raw water to make it acidic transiently, carbon dioxide is removed by a degasification membrane 2, an alkali is added to the boron- contg. water freed from carbon dioxide to >=pH 9.2, the antiscaling agent is added, and the water is passed through the reverse-osmosis membrane 1 to remove boron. Consequently, calcium scales are formed on, the membrane 1 surface, the amt. of the water passed through the membrane is not decreased, and the boron-contg. water is passed through the reverse-osmosis membrane under high pH conditions.

97. 发明专利

JPH11128922A APPARATUS FOR PRODUCING PURE WATER 失效
公开(公告)号：JPH11128922A
公开(公告)日：1999-05-18
申请号：JP30078397
申请日：1997-10-31
申请人： KURITA WATER IND LTD
发明人： SATO SHIN
IPC分类号： B01D61/04 , B01D61/08 , C02F1/44 , C02F1/58
摘要： PROBLEM TO BE SOLVED: To provide an apparatus for producing pure water having high resistivity and remarkably reduced boron concentration suitable for the production of pure water or ultra-pure water to be used in electronics industries such as semiconductor production and in the field of pharmaceutical industries. SOLUTION: This apparatus is equipped with an alkali addition device for adding alkali into boron-containing water to adjust its pH to 9.2 or above, an alkali resistant reverse osmosis membrane for treating the pH adjusted water, and one or two positively charged reverse osmosis membranes for treating the water which passed through the alkali resistant reverse osmosis membrane.

98. 发明专利

JPH1110150A PURE WATER PREPARATION PROCESS 失效
公开(公告)号：JPH1110150A
公开(公告)日：1999-01-19
申请号：JP16738997
申请日：1997-06-24
申请人： KURITA WATER IND LTD
发明人： SATO SHIN , FURUKAWA MASAHIRO
IPC分类号： B01D61/04 , C02F1/00 , C02F1/44 , C02F9/00
摘要： PROBLEM TO BE SOLVED: To prevent the clogging of a reverse osmosis(RO) membrane separation device generated by a Cu hydroxide by doping a chelate agent into Cu containing water of specified pH value and then reverse osmosis separated in the case of preparing pure water by the reverse osmosis membrane separation of Cu containing water. SOLUTION: When Cu exists in used ultrapure water in a semiconductor manufacturing process and a liquid crystal manufacturing process, a Cu hydroxide is formed in a pure water preparation process formed of a carbonic acid removal device 1, ultraviolet oxidization device 2, a preparation filter membrane separation device 3 and RO membrane separation devices 4 and 5, and the generation of the problem of clogging of RO membranes is feared. A chelate agent, therefore, is doped into a section positioned all over from the latter part of an HCl doped site in the preceding stage of a carbonic acid removal device 1 to the preceding stage of an NaOH doped site in the preceding stage of the ultraviolet oxidization device 2 wherein the pH of water is 5 or less, preferably between a reducing agent doped site and the NaOH doped site. Cu ions are turned into a Cu compound stabilized chemically to prevent the formation of Cu(OH)2 by the arrangement.

99. 发明专利

JPH10314735A PURE WATER PREPARATION PROCESS 失效
公开(公告)号：JPH10314735A
公开(公告)日：1998-12-02
申请号：JP12401397
申请日：1997-05-14
申请人： KURITA WATER IND LTD
发明人： SATO SHIN
IPC分类号： B01D61/58 , B01D19/00 , C02F1/20 , C02F1/44
摘要： PROBLEM TO BE SOLVED: To remove efficiently not only carbonic acid but also ammonia in raw water by deaerating raw water under the acid condition, also deaerating under the base condition, and then carrying out the pH adjustment and deionizing by a reverse osmosis membrane separating device disposed in the series multistage. SOLUTION: Water of pH of 4.7-4.8 prepared by adding acid from a raw water tank 1 into raw water by an acid adding means 11 is deaerated by a membrane deaeration device 2, and water of pH of 6.0 thus prepared is passed through an active carbon column 3, and then alkali is added therein by an alkali adding means 13 to prepare water of pH of 9.5, which is deaerated by a membrane deaeration device 4. Then, acid is added into outflow water in the membrane deaeration device 4 to prepare water of pH of 8.0, which is passed through a first reverse osmosis membrane separating device 5 disposed in the series multistage by a high pressure pump, a second reverse osmosis membrane separating device 6 and a third reverse osmosis membrane separating device 7 successively and deaerated. Not only carbonic acid but also ammonia in the raw water can be removed efficiently by the arrangement.

100. 发明专利

JP2565110B2 失效
公开(公告)号：JP2565110B2
公开(公告)日：1996-12-18
申请号：JP24499993
申请日：1993-09-30
申请人： KURITA WATER IND LTD
发明人： OOMI TADAHIRO , SATO SHIN , TAKADOI TADASHI
IPC分类号： C02F1/58

你已经成功收藏专利！

检索式保存成功!

IPRDB

热门服务

关于我们

友情链接

联系方式