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1. 发明专利

JP5695527B2 インプリント用硬化性組成物、パターン形成方法およびパターン有权
公开(公告)号：JP5695527B2
公开(公告)日：2015-04-08
申请号：JP2011184530
申请日：2011-08-26
申请人：富士フイルム株式会社
发明人：児玉邦彦 , 後藤雄一郎
IPC分类号： C08F20/70 , B29C59/02 , H01L21/027

2. 发明专利

JP2012201727A Method for producing polyacrylonitrile copolymer, method for producing carbon fiber precursor fiber and method for producing carbon fiber 审中-公开
标题翻译：生产聚丙烯腈共聚物的方法，生产碳纤维前体纤维的方法和生产碳纤维的方法
公开(公告)号：JP2012201727A
公开(公告)日：2012-10-22
申请号：JP2011065481
申请日：2011-03-24
申请人： Toray Ind Inc , 東レ株式会社
发明人： ITO KATSUHIRO , YASUI KENTA , YAMAGUCHI MASAHIRO
IPC分类号： C08F20/70 , D01F6/18 , D01F6/38 , D01F9/22
摘要： PROBLEM TO BE SOLVED: To provide a method for producing a polyacrylonitrile copolymer, suppressing the development of a covalent bond-based polyacrylonitrile high-order structure without impairing its productivity.SOLUTION: The method for producing a polyacrylonitrile copolymer, with two or more kinds of nitrile-based compounds including acrylonitrile as a polymerization feedstock, is provided, being characterized in that: the concentration of straight-chain unsaturated nitrile-based compounds other than acrylonitrile is 0.05 pt.mass or higher based on 100 pts.mass of the acrylonitrile.
摘要翻译：待解决的问题：提供聚丙烯腈共聚物的制造方法，抑制共价键系聚丙烯腈高级结构的发展而不损害其生产率。解决方案：提供具有两种或更多种腈基化合物（包括丙烯腈作为聚合原料）的聚丙烯腈共聚物的制备方法，其特征在于：其中直链不饱和腈基化合物的浓度其它基于丙烯腈为100pts.mass，丙烯腈为0.05pt.mass以上。版权所有（C）2013，JPO＆INPIT

3. 发明专利

JP3860053B2 Positive photosensitive composition 有权
公开(公告)号：JP3860053B2
公开(公告)日：2006-12-20
申请号：JP2002065444
申请日：2002-03-11
申请人：富士フイルムホールディングス株式会社
发明人：亨藤森
IPC分类号： G03F7/004 , C08F20/22 , C08F20/38 , C08F20/54 , C08F20/68 , C08F20/70 , G03F7/033 , G03F7/039 , H01L21/027
摘要： PROBLEM TO BE SOLVED: To provide a positive photosensitive composition decreased in the occurrence of development defects. SOLUTION: The positive photosensitive composition is characterized in that it contains (A) a compound which generates an acid by irradiation of active rays or radiation, (B) a resin which decomposes by the effect to increase the solubility with an alkali developer, and (C) a specified fluoro-aliphatic group- containing polymer obtained from a monomer expressed by general formula (1). In general formula (1), R 1 represents hydrogen atom or methyl group, X represents oxygen atom, sulfur atom or -N(R 2 )-, m represents an integer from 1 to 6, n represents an integer from 2 to 4, and R 2 represents hydrogen atom or a 1-4C alkyl group. COPYRIGHT: (C)2003,JPO

4. 发明专利

JP2003262952A POSITIVE PHOTOSENSITIVE COMPOSITION 审中-公开
公开(公告)号：JP2003262952A
公开(公告)日：2003-09-19
申请号：JP2002065444
申请日：2002-03-11
申请人： FUJI PHOTO FILM CO LTD
发明人： FUJIMORI TORU
IPC分类号： G03F7/004 , C08F20/22 , C08F20/38 , C08F20/54 , C08F20/68 , C08F20/70 , G03F7/033 , G03F7/039 , H01L21/027
摘要： PROBLEM TO BE SOLVED: To provide a positive photosensitive composition decreased in the occurrence of development defects. SOLUTION: The positive photosensitive composition is characterized in that it contains (A) a compound which generates an acid by irradiation of active rays or radiation, (B) a resin which decomposes by the effect to increase the solubility with an alkali developer, and (C) a specified fluoro-aliphatic group- containing polymer obtained from a monomer expressed by general formula (1). In general formula (1), R 1 represents hydrogen atom or methyl group, X represents oxygen atom, sulfur atom or -N(R 2 )-, m represents an integer from 1 to 6, n represents an integer from 2 to 4, and R 2 represents hydrogen atom or a 1-4C alkyl group. COPYRIGHT: (C)2003,JPO

5. 发明专利

JPS63152645A PREPREG 失效
公开(公告)号：JPS63152645A
公开(公告)日：1988-06-25
申请号：JP29927286
申请日：1986-12-16
申请人： DAINIPPON INK & CHEMICALS
发明人： YUMITATE YASUHIKO , ITO TETSUO , KAMEDA MAMORU
IPC分类号： C08J5/24 , C08F20/70 , C08F220/10
摘要： PURPOSE:To obtain a prepreg having excellent moldability, giving a molded article having high strength and useful as various materials for aircraft industry and space industry, etc., by impregnating a fibrous material with a resin solution containing a bismaleimide compound and a resin having unsaturated bond as main components. CONSTITUTION:The objective prepreg having a resin content of preferably 35-50wt.% is produced by (1) impregnating a fibrous material with a resin solution having a viscosity of preferably 10-500cps and containing (A) bismaleimide compounds containing preferably >=45wt.% compound having >=2 imide groups in one molecule and (B) a resin having unsaturated bond, preferably having >=2 unsaturated bonds in one molecule, especially a vinyl ester resin and preferably an unsaturated monomer (e.g. diallyl phthalate) at a weight ratio (A/B) of 6/4-4/6 and, if necessary, (2) heating the product at 80-130 deg.C to remove the solvent and simultaneously convert a part of the resin to semi-cured state.

6. 发明专利

JP2016193869A 重合性化合物及び光学異方体审中-公开
标题翻译：可聚合化合物和光学各向异性体
公开(公告)号：JP2016193869A
公开(公告)日：2016-11-17
申请号：JP2015075100
申请日：2015-04-01
申请人： DIC株式会社
发明人：青木良夫 , 堀口雅弘
IPC分类号： C08F20/26 , C08F20/70 , C08G65/22 , C07C69/94 , C07C69/757 , C09K19/38 , G02B5/30 , C07D207/452 , C07D305/06 , A61K8/37 , C07C69/54
摘要：【課題】本発明が解決しようとする課題は、重合性組成物に添加した際に結晶の析出等が起こらず高い保存安定性を有するような重合性化合物を提供し、当該重合性化合物を含有する重合性組成物を重合して得られる重合物を作製した際に均一なホメオトロピック配向が形成される重合性組成物を提供することである。更に、当該重合性組成物を重合させることで得られるヘイズが少なく、ムラが少ない重合体及び当該重合体を用いた光学異方体を提供することである。【解決手段】本願発明は一般式(I) 【化1】で表される化合物を提供し、併せて当該化合物を含有する組成物、当該組成物を重合させることにより得られる重合体及び当該重合体を用いた光学異方体等を提供する。【選択図】なし
摘要翻译：要解决的问题：为了提供一种可聚合的化合物，当加入到可聚合组合物中时，不会发生晶体析出，而具有高稳定性，可提供含有上述聚合性化合物的聚合性组合物，在聚合性组合物聚合而得到的聚合物中，并提供通过使上述聚合性组合物聚合得到的雾度值小，不均匀性小的聚合物和使用该聚合物的光学各向异性体。本发明提供通式（I）所示的化合物，上述化合物，通过聚合组合物获得的聚合物和使用聚合物的光学各向异性体等。选择图：无

7. 发明专利

JP2013046003A Curable composition for imprint, pattern forming method, and pattern 有权
标题翻译：用于印刷，图案形成方法和图案的可固化组合物
公开(公告)号：JP2013046003A
公开(公告)日：2013-03-04
申请号：JP2011184530
申请日：2011-08-26
申请人： Fujifilm Corp , 富士フイルム株式会社
发明人： KODAMA KUNIHIKO , GOTO YUICHIRO
IPC分类号： H01L21/027 , B29C59/02 , C08F20/70
摘要： PROBLEM TO BE SOLVED: To provide a curable composition for imprint, which is excellent in pattern forming property and heat resistance.SOLUTION: The curable composition for imprint contains a polymerizable compound (Ax) having a maleimide structure.
摘要翻译：待解决的问题：提供图案形成性和耐热性优异的用于印刷的可固化组合物。解决方案：用于压印的可固化组合物含有具有马来酰亚胺结构的可聚合化合物（Ax）。版权所有（C）2013，JPO＆INPIT

8. 发明专利

JP4166443B2 Acid decomposition photosensitive composition and acid decomposition type lithographic printing plate 有权
公开(公告)号：JP4166443B2
公开(公告)日：2008-10-15
申请号：JP2001115595
申请日：2001-04-13
申请人：富士フイルム株式会社
发明人：一人國田
IPC分类号： C08L33/18 , G03F7/039 , C08F20/70 , C08K5/00 , C08L33/04 , G03F7/00 , H01L21/027

9. 发明专利

JP4039281B2 Cyclopropane compounds and polymers 有权
公开(公告)号：JP4039281B2
公开(公告)日：2008-01-30
申请号：JP2003070643
申请日：2003-03-14
申请人：チッソ株式会社 , チッソ石油化学株式会社
发明人：孝加藤
IPC分类号： C07C69/54 , G02F1/1337 , C07C69/60 , C07C69/92 , C08F20/10 , C08F20/70 , C08F22/10 , C09K19/14 , C09K19/20 , C09K19/30 , C09K19/32 , C09K19/38 , G02F1/1335 , G02F1/13363

10. 发明专利

JP2002264556A IMAGE FORMING MATERIAL AND ORIGINAL PLATE FOR LITHOGRAPHIC PRINTING PLATE 失效
公开(公告)号：JP2002264556A
公开(公告)日：2002-09-18
申请号：JP2001072569
申请日：2001-03-14
申请人： FUJI PHOTO FILM CO LTD
发明人： MAKINO NAONORI
IPC分类号： G03F7/004 , B41N1/14 , C08F12/14 , C08F12/32 , C08F20/70 , G03F7/00 , G03F7/033
摘要： PROBLEM TO BE SOLVED: To provide an image forming material capable of suitably using a lithographic printing plate for scanning exposure conforming to a heat mode recording method, that is, the image forming material having a high sensitivity of an oscillation wavelength of a short-wavelength semiconductor laser and having good storage stability, exhibiting good on-press developability capable of developing with water or aqueous solution and further improving a plate wear resistance on a printing surface. SOLUTION: The image forming material comprises a polymer having at least one type of repeating units represented by formulae (I) to (III) each having specific structure.

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