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1. 发明专利

JP2014051489A Salt, resist composition and method for producing resist pattern 有权
标题翻译：盐，抗性组合物和生产耐药图案的方法
公开(公告)号：JP2014051489A
公开(公告)日：2014-03-20
申请号：JP2013160191
申请日：2013-08-01
申请人： Sumitomo Chemical Co Ltd , 住友化学株式会社
发明人： SAKAMOTO HIROSHI , YAMASHITA HIROKO , ICHIKAWA KOJI
IPC分类号： C07D233/60 , C07C381/12 , C07D307/00 , C07D307/33 , C08F220/18 , G03F7/004 , G03F7/038
摘要： PROBLEM TO BE SOLVED: To provide a salt to be used for a resist composition that allows production of a resist pattern with good line edge roughness.SOLUTION: The salt is expressed by the formula (I). In the formula, Qand Qrepresent a fluorine atom or a perfluoroalkyl group having 1 to 6 carbon atoms; Lrepresents a divalent saturated hydrocarbon group having 1 to 20 carbon atoms; Yrepresents a group expressed by the formula (Iy); R' represents a hydrogen atom, an alkyl group having 1 to 6 carbon atoms which may have a fluorine atom, or a hydroxyl group; X' represents a single bond, -O-, *-CO-O-, or the like; Ar represents a phenylene group; Rand Rrepresent an aliphatic hydrocarbon group having 1 to 10 carbon atoms which may have a substituent, an alicyclic hydrocarbon group having 4 to 36 carbon atoms which may have a substituent, an aromatic hydrocarbon group having 6 to 36 carbon atoms which may have a substituent, or a heterocyclic group having 6 to 36 carbon atoms which may have a substituent; and Lrepresents a divalent hydrocarbon group having 1 to 36 carbon atoms which may have a substituent.
摘要翻译：要解决的问题：提供用于抗蚀剂组合物的盐，其允许制备具有良好线边缘粗糙度的抗蚀剂图案。溶液：盐由式（I）表示。在该式中，Q表示氟原子或碳原子数1〜6的全氟烷基， L表示碳原子数为1〜20的二价饱和烃基; Y表示由式（Iy）表示的组; R'表示氢原子，可以具有氟原子的具有1〜6个碳原子的烷基或羟基; X'表示单键，-O-，* -CO-O-等; Ar表示亚苯基; 兰德R表示可以具有取代基的碳原子数为1〜10的脂肪族烃基，可以具有取代基的碳原子数为4〜36的脂肪族烃基，可以具有取代基的碳原子数为6〜36的芳香族烃基，或可具有取代基的碳原子数为6〜36的杂环基; 并且L表示可以具有取代基的具有1至36个碳原子的二价烃基。

2. 发明专利

JP2013083957A Resist composition and method of manufacturing resist pattern 审中-公开
标题翻译：电阻组合物和制造电阻图案的方法
公开(公告)号：JP2013083957A
公开(公告)日：2013-05-09
申请号：JP2012207889
申请日：2012-09-21
申请人： Sumitomo Chemical Co Ltd , 住友化学株式会社
发明人： SUGIHARA MASAKO , ANDO NOBUO , YAMASHITA HIROKO
IPC分类号： G03F7/039 , C08F20/18 , G03F7/004 , H01L21/027
摘要： PROBLEM TO BE SOLVED: To provide a resist composition to manufacture a resist pattern with excellent line edge roughness.SOLUTION: A resist composition contains a compound represented by the formula (I), resin and an acid generation agent. The resin contains a structural unit represented by the formula (a1-0) and is insoluble or poorly soluble in an aqueous alkali solution but becomes soluble in the aqueous alkali solution by the action of acid.
摘要翻译：要解决的问题：提供抗蚀剂组合物以制造具有优异的线边缘粗糙度的抗蚀剂图案。解决方案：抗蚀剂组合物含有式（I）表示的化合物，树脂和酸产生剂。树脂含有由式（a1-0）表示的结构单元，并且在碱性水溶液中不溶或难溶，但通过酸作用而溶于碱水溶液中。版权所有（C）2013，JPO＆INPIT

3. 发明专利

JP2013033229A Resist composition and production method of resist pattern 审中-公开
标题翻译：抗性图案的耐蚀组合物和生产方法
公开(公告)号：JP2013033229A
公开(公告)日：2013-02-14
申请号：JP2012143826
申请日：2012-06-27
申请人： Sumitomo Chemical Co Ltd , 住友化学株式会社
发明人： SUGIHARA MASAKO , YAMASHITA HIROKO , ADACHI YUKAKO , ICHIKAWA KOJI
IPC分类号： G03F7/004 , C07C309/17 , C07C381/12 , C07D295/02 , C07D295/20 , C08F220/26 , G03F7/039 , H01L21/027
摘要： PROBLEM TO BE SOLVED: To provide a resist composition from which a resist pattern with better line edge roughness (LER) can be produced.SOLUTION: The resist composition contains: a resin (A) having an acid decomposable group; a salt (B3) expressed by formula (B3); and a salt (E1) expressed by formula (E1). In formula (B3), Arepresents an organic cation having an acid decomposable group and no nitrogen atom; and Xrepresents an organic sulfonic acid anion having neither acid decomposable group nor nitrogen atom. In formula (E1), Arepresents an organic cation having a nitrogen atom; and Xrepresents an organic sulfonic acid anion having no nitrogen atom.
摘要翻译：要解决的问题：提供可以制造具有更好的线边缘粗糙度（LER）的抗蚀剂图案的抗蚀剂组合物。抗蚀剂组合物含有：具有酸分解性基团的树脂（A）由式（B3）表示的盐（B3）; 和由式（E1）表示的盐（E1）。在式（B3）中，A a + 表示具有酸分解性基团且不含氮原子的有机阳离子; 并且X 表示不具有可酸分解基团和氮原子的有机磺酸阴离子。在式（E1）中，A N 表示具有氮原子的有机阳离子; 并且X 表示无氮原子的有机磺酸阴离子。版权所有（C）2013，JPO＆INPIT

4. 发明专利

JP2012219162A Method for producing resin 有权
标题翻译：生产树脂的方法
公开(公告)号：JP2012219162A
公开(公告)日：2012-11-12
申请号：JP2011085268
申请日：2011-04-07
申请人： Sumitomo Chemical Co Ltd , 住友化学株式会社
发明人： KAMABUCHI AKIRA , YAMASHITA HIROKO
IPC分类号： C08F8/12 , G03F7/039 , H01L21/027
摘要： PROBLEM TO BE SOLVED: To provide a method for producing a resin for resist compositions having excellent line width roughness.SOLUTION: The method for producing the resin having structural units represented by formulas (I) and (II) includes the first step of polymerizing a monomer represented by formula (III) and a monomer represented by formula (IV), and the second step of hydrolyzing the product obtained in the first step to convert -O-CO-Rinto -OH. [wherein, Rand Rare each alkyl which may have a halogen atom, hydrogen atom or halogen atom; R-Rare each alkyl or an alicyclic hydrocarbon group; Rand Rare bound to each other to form a divalent hydrocarbon group; Xand Xare each a single bond or a divalent linking group].
摘要翻译：解决的问题：提供一种线宽粗糙度优异的抗蚀剂组合物树脂的制造方法。解决方案：具有由式（I）和（II）表示的结构单元的树脂的制造方法包括使由式（III）表示的单体和式（IV）表示的单体聚合的第一步骤，水解第一步中获得的产物的第二步是将-O-CO-R 7 转化成-OH。 [其中，可以具有卤素原子，氢原子或卤素原子的烷基，R 4，R 6，R 6， R 2 -R 4 分别为烷基或脂环族烃基; R 2 和R 3 彼此结合形成二价烃基; X 1 和X 2 分别为单键或二价连接组]。版权所有（C）2013，JPO＆INPIT

5. 发明专利

JP2012137750A Resist composition 有权
标题翻译：耐腐蚀组合物
公开(公告)号：JP2012137750A
公开(公告)日：2012-07-19
申请号：JP2011264374
申请日：2011-12-02
申请人： Sumitomo Chemical Co Ltd , 住友化学株式会社
发明人： KAMABUCHI AKIRA , YAMASHITA HIROKO
IPC分类号： G03F7/039 , C08F12/22 , C08F220/28 , G03F7/004 , H01L21/027
摘要： PROBLEM TO BE SOLVED: To provide a resist composition capable of producing a resist pattern having excellent resolution.SOLUTION: A resist composition comprises a resin which has an acid-labile group, is insoluble or poorly soluble in an alkali aqueous solution and can be dissolved in an alkali aqueous solution by the action of an acid, an acid generator and a compound represented by formula (I), in which the resin has a structural unit derived from a monomer represented by formula (a2-0). [Rto Rrepresent an alkyl group, a saturated cyclic hydrocarbon group or an alkenyl group which may have a substituent and Arepresents a halogenated alkyl group.]
摘要翻译：要解决的问题：提供能够产生具有优异分辨率的抗蚀剂图案的抗蚀剂组合物。解决方案：抗蚀剂组合物包含具有酸不稳定基团的树脂，其在碱性水溶液中不溶或难溶，并且可以通过酸，酸发生剂和由式（I）表示的化合物，其中树脂具有衍生自由式（a2-0）表示的单体的结构单元。 R 1 到R 4 表示可以具有取代基的烷基，饱和环状烃基或烯基， A 1 表示卤代烷基。] 版权所有（C）2012，JPO＆INPIT

6. 发明专利

JP2012077071A Compound and resist composition 审中-公开
标题翻译：化合物和组合物
公开(公告)号：JP2012077071A
公开(公告)日：2012-04-19
申请号：JP2011192479
申请日：2011-09-05
申请人： Sumitomo Chemical Co Ltd , 住友化学株式会社
发明人： TAKEMOTO KAZUKI , ANDO NOBUO , YAMASHITA HIROKO
IPC分类号： C07C69/736 , C07C67/343 , G03F7/004 , G03F7/038 , H01L21/027
摘要： PROBLEM TO BE SOLVED: To provide a new compound to be included in a resist composition giving a pattern having excellent line edge roughness.SOLUTION: There is provided, for example, a compound expressed by formula (III-2) obtained by reacting a compound expressed by formula (I-1) with a compound expressed by formula (II-2).
摘要翻译：要解决的问题：提供一种包含在抗蚀剂组合物中的新化合物，其具有优异的线边缘粗糙度的图案。解决方案：提供例如由式（I-1）表示的化合物与式（II-2）表示的化合物反应得到的式（III-2）表示的化合物。版权所有（C）2012，JPO＆INPIT

7. 发明专利

JP2011170111A Resist composition 审中-公开
标题翻译：耐腐蚀组合物
公开(公告)号：JP2011170111A
公开(公告)日：2011-09-01
申请号：JP2010034041
申请日：2010-02-18
申请人： Sumitomo Chemical Co Ltd , 住友化学株式会社
发明人： ICHIKAWA KOJI , ANDO NOBUO , YAMASHITA HIROKO
IPC分类号： G03F7/004 , C07C69/712 , C07D311/96 , C08F8/36 , C08F12/30 , G03F7/039 , H01L21/027
摘要： PROBLEM TO BE SOLVED: To provide a resist composition which ensures excellent resolution and shape of a pattern obtained therefrom. SOLUTION: The resist composition comprises an aromatic compound and an acid generator, wherein the aromatic compound has an acid-labile group and a molecular weight of 300-2,000, and the acid generator is a resin having a structural unit represented by formula (I), wherein R 1 represents a hydrogen atom, a halogen atom or a 1-6C alkyl group which may have a halogen atom; L represents a single bond or a divalent 1-17C saturated hydrocarbon group which may have a substituent; W represents a divalent 3-36C alicyclic hydrocarbon group which may have a substituent or a divalent 6-36C aromatic hydrocarbon group which may have a substituent; X 1 represents a divalent 1-17C saturated hydrocarbon group which may have a substituent; R d represents a hydrogen atom or a 1-6C alkyl group; Q a and Q b each independently represent a fluorine atom or a 1-6C perfluoroalkyl; Z a+ represents an organic cation; and * represents a bond. COPYRIGHT: (C)2011,JPO&INPIT
摘要翻译：要解决的问题：提供一种保证从其获得的图案的优异分辨率和形状的抗蚀剂组合物。解决方案：抗蚀剂组合物包含芳族化合物和酸产生剂，其中芳族化合物具有酸不稳定基团和分子量为300-2,000，并且酸产生剂是具有由式（I），其中R 1表示氢原子，卤素原子或可具有卤素原子的1-6C烷基; L表示可以具有取代基的单键或二价1-17C饱和烃基; W表示可以具有取代基的二价3-36C脂环族烃基或可以具有取代基的二价6-36C芳族烃基; X 1 表示可以具有取代基的二价1-17C饱和烃基; R d 表示氢原子或1-6C烷基; Q a 和Q b 各自独立地表示氟原子或1-6C全氟烷基; Z a + 表示有机阳离子; 和*代表债券。版权所有（C）2011，JPO＆INPIT

8. 发明专利

JP2011150282A Resist composition 有权
标题翻译：耐腐蚀组合物
公开(公告)号：JP2011150282A
公开(公告)日：2011-08-04
申请号：JP2010167946
申请日：2010-07-27
申请人： Sumitomo Chemical Co Ltd , 住友化学株式会社
发明人： KAMABUCHI AKIRA , YAMASHITA HIROKO
IPC分类号： G03F7/004 , C08F12/24 , C08F20/18 , G03F7/039 , H01L21/027
摘要： PROBLEM TO BE SOLVED: To provide a resist composition which provides a pattern having excellent resolution. SOLUTION: The resist composition contains a resin which has an acid-labile group, and is insoluble or poorly soluble in an alkali aqueous solution but becomes soluble in the alkali aqueous solution by the action of an acid, an acid generator, and a compound represented by the formula (I'), wherein R' 1 , R' 2 , R' 3 and R' 4 independently each represent a 1-8Calkyl group, and A' 1 represents a 3-36C divalent saturated cyclic hydrocarbon group which may contain one or more heteroatoms and may have one or more substituents or a 6-20C divalent aromatic hydrocarbon group which may contain one or more heteroatoms and may have one or more substituents. COPYRIGHT: (C)2011,JPO&INPIT
摘要翻译：要解决的问题：提供提供具有优异分辨率的图案的抗蚀剂组合物。解决方案：抗蚀剂组合物含有具有酸不稳定基团的树脂，并且在碱性水溶液中不溶或难溶，但是通过酸，酸发生剂和酸产生剂的作用而溶于碱性水溶液中由式（I'）表示的化合物，其中R 1，R 2，R 2，R 3，R'，SP 3， 4个独立地各自表示1-8个C烷基，并且A' 1表示3-36C二价饱和环烃基，其可以含有一个或多个杂原子并且可以具有一个或多个取代基或可以含有一个或多个杂原子并且可以具有一个或多个取代基的6-20C二价芳族烃基。版权所有（C）2011，JPO＆INPIT

9. 发明专利

JP2014051488A Salt, resist composition and method for producing resist pattern 有权
标题翻译：盐，抗性组合物和生产耐药图案的方法
公开(公告)号：JP2014051488A
公开(公告)日：2014-03-20
申请号：JP2013160190
申请日：2013-08-01
申请人： Sumitomo Chemical Co Ltd , 住友化学株式会社
发明人： ICHIKAWA KOJI , YAMASHITA HIROKO , MASUYAMA TATSURO
IPC分类号： C07D233/60 , C07C381/12 , G03F7/004 , G03F7/039 , H01L21/027
摘要： PROBLEM TO BE SOLVED: To provide a salt to be used for a resist composition that allows production of a resist pattern with excellent pattern collapse resistance.SOLUTION: The salt is expressed by the formula (I). In the formula, Qand Qrepresent a fluorine atom or a perfluoroalkyl group having 1 to 6 carbon atoms; Lrepresents a carbonyl group or -CF-; Xrepresents a single bond, a divalent saturated hydrocarbon group having 1 to 14 carbon atoms which may have a substituent, or a group expressed by formula (a-1); c is 0 or 1; and X, X, A, Aand Aeach represent a specified group.
摘要翻译：要解决的问题：提供用于抗蚀剂组合物的盐，该抗蚀剂组合物允许制备具有优异的抗塌陷性的抗蚀剂图案。溶液：盐由式（I）表示。在该式中，Q表示氟原子或碳原子数1〜6的全氟烷基， L代表羰基或-CF-; X表示单键，可以具有取代基的碳原子数1〜14的二价饱和烃基或由式（a-1）表示的基团。 c为0或1; X，X，A，A和Aeach表示一个指定的组。

10. 发明专利

JP2013127612A Resist composition and method for producing resist pattern 审中-公开
标题翻译：耐蚀组合物及其制造方法
公开(公告)号：JP2013127612A
公开(公告)日：2013-06-27
申请号：JP2012249018
申请日：2012-11-13
申请人： Sumitomo Chemical Co Ltd , 住友化学株式会社
发明人： YAMASHITA HIROKO , ANDO NOBUO
IPC分类号： G03F7/039 , G03F7/004 , H01L21/027
CPC分类号： G03F7/0382 , G03F7/0045 , G03F7/0046 , G03F7/0392 , G03F7/0397
摘要： PROBLEM TO BE SOLVED: To provide a resist composition capable of giving a resist pattern having excellent resolution.SOLUTION: The resist composition comprises a compound expressed by formula (I) and a salt expressed by formula (B1). In the formulae, R, R, R, R, R, R, Rand Rrepresent a hydrogen atom, an aliphatic hydrocarbon group or the like; R, R, R, and Rrepresent a group expressed by formula (II), where ring Wand ring Wrepresent a 3-36C aliphatic ring or a 6-36C aromatic ring and Lrepresents a single bond or a 1-10C divalent aliphatic hydrocarbon group; Qand Qrepresent a fluorine atom or a 1-6C perfluoroalkyl group; and Land Lrepresent a single bond or a 1-17C divalent hydrocarbon group.
摘要翻译：要解决的问题：提供能够提供具有优异分辨率的抗蚀剂图案的抗蚀剂组合物。解决方案：抗蚀剂组合物包含由式（I）表示的化合物和由式（B1）表示的盐。在公式中，R 1 ，R 2 ，R 4 ，R 8 ，R 5 ，R 7 ，R 10 和R 11 表示氢原子，脂族烃基等; R 3 ，R 6 ，R 9 ，R 12 表示由公式（II）表示的组，其中环W 1 ，并且环W 2 < SP>表示3-36C脂族环或6-36C芳香环，L 1 和Q 2 表示氟原子或1-6C全氟烷基; 和L 2 和L 3 表示单键或1-17C二价烃基。版权所有（C）2013，JPO＆INPIT

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