会员体验
专利管家(专利管理)
工作空间(专利管理)
风险监控(情报监控)
数据分析(专利分析)
侵权分析(诉讼无效)
联系我们
交流群
官方交流:
QQ群: 891211   
微信请扫码    >>>
现在联系顾问~
热词
    • 4. 发明专利
    • JUDGMENT METHOD FOR EXFOLIATION OF WALL TILE FROM BUILDING
    • JPH0980033A
    • 1997-03-28
    • JP23643095
    • 1995-09-14
    • TAKENAKA KOMUTEN CO
    • WATANABE HIROSHIMIKAMI FUMIHIKOTAKAHASHI HIROSHITSUBOUCHI NOBUROSOU DAISAKU
    • G01N29/12G01M7/02G01N19/08
    • PROBLEM TO BE SOLVED: To obtain a judgment method in which the exfoliation of a wall tile from a building is judged by a low-cost apparatus, quickly, with high accuracy, quantitatively and easily by a method wherein the surface of the tile is vibrated mechanically and vibrating levels at a plurality of frequency bands are recorded so as to be discriminated by using a specific expression. SOLUTION: By using an exciter 1, a tile 5 is scanned by using an apparatus in which an oscillation exciting roller 2 and a receiving disk 3 connected to an accelerometer 4 are arranged in parallel. When the existence of an exfoliation is discrimineted, levels at respective vibration octave bands in a plurality of known sound places and exfoliated places are measured. For example, levels at seven octave bands from 64Hz to 4kHz are measured, vibration levels at seven frequency bands are designated respectively as x1 to x7 , and factors a1 to a7 are set by using the discriminating analysis of expression I. Then, the same measurement is executed to a wall surface to be investigated, obtained data is substituted for expression I, the value of Ya is compared with a threshold, and the existence of an exfoliation is estimated. Then, by using expression II, values of factors b1 to b7 are set, the value of Yb obtained by substituting data for expression II is compared with a threshold, and the position of an exfoliation face is estimated.
    • 8. 发明专利
    • MECHANICAL MICRO DISPLACEMENT ELEMENT
    • JPH04127588A
    • 1992-04-28
    • JP24979790
    • 1990-09-19
    • TAKENAKA KOMUTEN CO
    • OGAWA TAKATOSHIOKADA KATSUYATSUBOUCHI NOBUROSAITO TOSHIO
    • G01B7/34B23Q5/22C25B1/02F03G7/00G01Q10/04G01Q60/10G02B6/44H01L49/00
    • PURPOSE:To enable a displacement element to output a force as large as prescribed in any displacement range by a method wherein a potential is applied between a hydrogen storing alloy thin film and a high rigid film on another side. CONSTITUTION:A hydrogen storing alloy thin film 17 is brought into close contact with one side of a porous insulator 15 charged with electrolytic solution. A high rigid film 18 high in density of nickel, glass, or ceramic is brought into close contact with the upside of the hydrogen storing alloy thin film 17, and a conductive dense film 19 of nickel or the like is made to adhere closely to the other side of the porous insulator 15. A load voltage 20 is applied between the hydrogen storing alloy thin film 17 and the conductive dense film 19. A displacement element of this design serves as a displacement driving body depending on the expansion or shrinkage of the hydrogen storing alloy thin film 17 in the thicknesswise direction. For instance, when a negative potential is applied, hydrogen ions in an electrolytic solution are gradually absorbed by the hydrogen storing alloy thin film 17, and the thin film 17 reaches to hydrogen concentration equilibrating with a pressure. The hydrogen storing alloy thin film 17 is expanded in thickness corresponding to the concentration of hydrogen, in result a displacement element is increased in thickness.