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1. 发明专利

JP2014175389A Method of forming alumina insulation film 审中-公开
标题翻译：形成氧化铝绝缘膜的方法
公开(公告)号：JP2014175389A
公开(公告)日：2014-09-22
申请号：JP2013045202
申请日：2013-03-07
申请人： Mitsubishi Materials Corp , 三菱マテリアル株式会社
发明人： IIDA SHINTARO , SAKURAI HIDEAKI
IPC分类号： H01L21/316
摘要： PROBLEM TO BE SOLVED: To provide a method of simply forming an alumina insulation film by a low temperature heat treatment in a relatively short period of time even for a substrate of a complex shape.SOLUTION: The method of forming an alumina insulation film includes: coating an aluminum precursor on a substrate by an electrophoresis electrodeposition method using an alumina precursor solution prepared by adding a peptizing agent composed of hydrochloric acid and such to a sol containing an aluminum compound composed of aluminum ethoxide and such; and applying a low temperature treatment to the substrate.
摘要翻译：要解决的问题：提供一种简单地通过在相对短的时间内进行低温热处理而形成氧化铝绝缘膜的方法，即使是对于复杂形状的基板。解决方案：形成氧化铝绝缘膜的方法包括：通过使用通过将由盐酸组成的胶溶剂等添加到由乙醇铝等构成的铝化合物的溶胶而制备的氧化铝前体溶液的电泳电沉积法，在基材上涂布铝前体; 以及对所述基板进行低温处理。

2. 发明专利

JP2014103226A Method for producing ferroelectric thin film 审中-公开
标题翻译：生产薄膜薄膜的方法
公开(公告)号：JP2014103226A
公开(公告)日：2014-06-05
申请号：JP2012253783
申请日：2012-11-20
申请人： Mitsubishi Materials Corp , 三菱マテリアル株式会社
发明人： IIDA SHINTARO , SAKURAI HIDEAKI
IPC分类号： H01L21/314 , C01G25/00 , H01G4/33 , H01L21/316 , H01L21/822 , H01L21/8242 , H01L21/8246 , H01L27/04 , H01L27/105 , H01L27/108 , H01L41/08 , H01L41/09 , H01L41/18 , H01L41/187 , H01L41/22 , H01L41/39
CPC分类号： H01L41/39 , H01L21/02197 , H01L21/02282 , H01L21/02315 , H01L28/55 , H01L28/65 , H01L41/318
摘要： PROBLEM TO BE SOLVED: To provide a method for simply producing a ferroelectric thin film whose crystal orientation is preferentially controlled on a (100) plane, without providing a seed layer and a buffer layer.SOLUTION: A surface of a lower electrode of a substrate that has the lower electrode having a crystal plane oriented in a (111) axial direction is irradiated with an atmospheric pressure plasma, and then a composition for forming a ferroelectric thin film is applied on the lower electrode of the substrate, heated and crystallized to produce a ferroelectric thin film on the lower electrode.
摘要翻译：要解决的问题：提供简单地生产在（100）面上优先控制晶体取向的铁电薄膜的方法，而不提供种子层和缓冲层。解决方案：基底的下电极的表面将具有沿（111）轴向取向的晶面的下电极用大气压等离子体照射，然后在基板的下电极上施加用于形成铁电薄膜的组合物，加热结晶，生成下电极上的铁电薄膜。

3. 发明专利

JP2014173110A Electrodeposition-coated object and method for manufacturing the same 有权
标题翻译：电沉积对象及其制造方法
公开(公告)号：JP2014173110A
公开(公告)日：2014-09-22
申请号：JP2013045124
申请日：2013-03-07
申请人： Mitsubishi Materials Corp , 三菱マテリアル株式会社 , Mitsubishi Cable Ind Ltd , 三菱電線工業株式会社
发明人： IIDA SHINTARO , ARIIZUMI KUMIKO , SAKURAI HIDEAKI , KAMIBAYASHI HIROYUKI , NAGATO TOYOKAZU
IPC分类号： C25D13/06 , C09D5/02 , C09D201/00 , C25D13/16
摘要： PROBLEM TO BE SOLVED: To obtain an electrodeposition-coated object having an insulating coating film devoid of pinholes and exhibiting excellent insulating characteristics and to manufacture an electrodeposition-coated object capable of forming an insulating coating film devoid of pinholes and having a flat surface easily within a safe environment.SOLUTION: In a method for manufacturing an electrodeposition-coated object wherein an insulating layer of a polymer is formed on the surface of a coating target based on an electrodeposition method using a polymer-containing electrodeposition coating material and wherein an insulating coating film consisting of the polymer is formed by baking the formed layer, the electrodeposition coating material includes a polymer-containing solvent and an organic solvent added to the electrodeposition coating material, whereas the organic solvent has a boiling point exceeding 100°C and is highly compatible with the polymer because of the Hansen solubility parameter thereof being similar to that of the other.
摘要翻译：要解决的问题：为了获得具有无针孔绝缘涂层并且具有优异的绝缘特性的电沉积涂覆物体，并且制造能够容易地形成不具有针孔并且具有平坦表面的绝缘涂层的电沉积涂覆物体一种安全的环境。解决方案：在一种电沉积涂覆物的制造方法中，基于使用含聚合物的电沉积涂料的电沉积法，在涂覆靶的表面上形成聚合物的绝缘层，并且其中绝缘涂层通过焙烧形成的层来形成由聚合物构成的膜，电沉积涂料包括添加到电沉积涂料中的含聚合物的溶剂和有机溶剂，而有机溶剂的沸点超过100℃并且高度相容与聚合物，因为汉森溶解度 y参数与其他参数相似。

4. 发明专利

JP2013207155A Ferroelectric thin film manufacturing method 审中-公开
标题翻译：电磁薄膜制造方法
公开(公告)号：JP2013207155A
公开(公告)日：2013-10-07
申请号：JP2012076096
申请日：2012-03-29
申请人： Mitsubishi Materials Corp , 三菱マテリアル株式会社
发明人： IIDA SHINTARO , SAKURAI HIDEAKI
IPC分类号： H01L21/316 , H01L21/31 , H01L21/8242 , H01L21/8246 , H01L27/105 , H01L27/108 , H01L41/18 , H01L41/187 , H01L41/39
CPC分类号： B05D1/04 , B05B5/025 , B05B5/1675 , C23C18/02 , C23C18/1216 , C23C18/1245 , C23C18/125 , C23C18/1254 , H01L21/02197 , H01L21/02282
摘要： PROBLEM TO BE SOLVED: To provide a manufacturing method of a ferroelectric thin film which has excellent material utilization efficiency, an intended film composition and excellent electrical characteristics.SOLUTION: A manufacturing method of a ferroelectric thin film on a lower electrode 20a comprises: electrostatic spraying a sol-gel solution 21 for ferroelectric thin film formation toward the lower electrode 20a of a substrate 20 having the lower electrode 20a from a discharge port 14a of a capillary 14 for coating the sol-gel solution 21 on the lower electrode 20a to form a coating film on the lower electrode 20a; and performing dehydration and calcination of the coating film and subsequently performing burning of the coating film for crystallization. A distance between the discharge port 14a of the capillary 14 and the lower electrode 20a and an applied voltage at the time of electrostatic spraying are set so as to make a refraction index after the dehydration and calcination of the coating film be 2 and over. And a fluid volume of the sol-gel solution 21 per one spray is set so as to make a film thickness when the sol-gel solution 21 by one spray is coated and calcined and subsequently burned and crystallized be within a range of 150 nm and under.
摘要翻译：要解决的问题：提供具有优异的材料利用效率，期望的膜组成和优异的电特性的铁电薄膜的制造方法。解决方案：下电极20a上的铁电薄膜的制造方法包括：静电喷涂从用于在下电极20a上涂布溶胶 - 凝胶溶液21的毛细管14的排出口14a向具有下电极20a的基板20的下电极20a形成的溶胶 - 凝胶溶液21，形成下电极20a上的涂膜; 并对涂膜进行脱水和煅烧，随后进行结晶用涂膜的燃烧。将毛细管14的排出口14a与下部电极20a之间的距离与静电喷雾时的施加电压进行设定，使得涂膜脱水和煅烧后的折射率为2以上。将溶胶 - 凝胶溶液21的每一个喷雾液体积设定为当通过一次喷雾将溶胶 - 凝胶溶液21涂覆并煅烧并随后烧结并结晶化在150nm的范围内时，使膜厚度达到下。

5. 发明专利

JP2017115120A 水分散型絶縁皮膜形成用電着液审中-公开
公开(公告)号：JP2017115120A
公开(公告)日：2017-06-29
申请号：JP2016166752
申请日：2016-08-29
申请人：三菱マテリアル株式会社 , Mitsubishi Materials Corp
发明人： ISOMURA JUNKO , IIDA SHINTARO , SAKURAI HIDEAKI
IPC分类号： C09D179/08 , C08K5/17 , C08L79/08 , C09D5/44 , C09D7/12 , C25D13/10
摘要：【課題】保存安定性に優れ、長期保存しても電着液の粘度上昇等が抑えられ、塗膜の乾燥又は焼成時に発泡が生じるのを抑制することができる水分散型絶縁皮膜形成用電着液を提供する。【解決手段】電着液11は、ポリマー粒子、有機溶媒、塩基性化合物及び水を含有し、ポリマー粒子がポリアミドイミドであり、塩基性化合物が水とのHSP距離が35以上の窒素含有化合物である。塩基性化合物はアルキルアミン化合物であることが好ましい。【選択図】図1

6. 发明专利

JP2013203611A Method for producing ferroelectric thin film 有权
标题翻译：生产薄膜薄膜的方法
公开(公告)号：JP2013203611A
公开(公告)日：2013-10-07
申请号：JP2012075448
申请日：2012-03-29
申请人： Mitsubishi Materials Corp , 三菱マテリアル株式会社
发明人： IIDA SHINTARO , SAKURAI HIDEAKI
IPC分类号： C01G25/00 , H01B3/00 , H01B3/12 , H01L21/31 , H01L21/316 , H01L21/8246 , H01L27/105
CPC分类号： H01L21/02104 , B05B5/1608 , B05B5/1675 , B05D1/06 , B05D3/007 , C23C18/1216 , C23C18/1245 , C23C18/1254 , C23C18/127 , C23C18/1279 , C23C18/1283 , H01L41/314 , H01L41/318
摘要： PROBLEM TO BE SOLVED: To obtain a dense and crack-free ferroelectric thin film after firing a thin film ejected and formed using electrostatic spray.SOLUTION: A method for producing a ferroelectric thin film on a lower electrode includes electrostatically spraying a ferroelectric thin film-forming electrostatic spray solution from a spout of a capillary toward a lower electrode of a substrate having the lower electrode so as to coat the electrostatic spray solution on the lower electrode and form a coated film, drying, calcining, and then firing the coated film so as to crystallize the coated film. In this method, the electrostatic spray solution is a mixed solution in which a ferroelectric thin film-forming sol-gel solution and powder having the same composition as the solid content of the sol-gel solution and having a particle diameter that can be ejected from the spout are uniformly mixed, and, when the mass of the metallic compound, which is converted into a mass of a metal oxide, dissolved in the sol-gel solution is represented by A and the mass of the powder is represented by B, the ratio of B with respect to (A+B) is in a range of ≥5% and ≤40%.
摘要翻译：要解决的问题：在烧制使用静电喷涂形成的薄膜之后获得致密且无裂纹的铁电薄膜。解决方案：在下电极上制造铁电薄膜的方法包括静电喷涂铁电薄膜 - 从毛细管的喷口形成静电喷雾溶液到具有下电极的基板的下电极，以便将下电极上的静电喷雾溶液涂覆在其上，形成涂膜，干燥，煅烧，然后焙烧涂膜以使涂膜结晶。在该方法中，静电喷雾溶液是其中形成铁电薄膜的溶胶 - 凝胶溶液和具有与溶胶 - 凝胶溶液的固体成分相同组成并且具有可从喷口均匀混合，当溶解在溶胶 - 凝胶溶液中的转化成金属氧化物的金属化合物的质量由A表示时，粉末的质量用B表示， B相对于（A + B）的比例在≥5％和≤40％的范围内。

7. 发明专利

JP2019094404A 絶縁皮膜形成用樹脂、ワニス、電着液、絶縁導体の製造方法审中-公开
公开(公告)号：JP2019094404A
公开(公告)日：2019-06-20
申请号：JP2017223537
申请日：2017-11-21
申请人： MITSUBISHI MATERIALS CORP
发明人： HIRANO KOJI , IIDA SHINTARO , SAKURAI HIDEAKI
IPC分类号： C09D179/08 , C09D5/25 , C09D5/44 , C25D13/00 , C25D13/06 , H01B3/30
摘要：【課題】高温環境下で長期間保存しても導体との密着性に優れる絶縁皮膜を形成することができる絶縁皮膜形成用樹脂と、ワニスと、電着液と、絶縁導体の製造方法を提供する。【解決手段】絶縁皮膜形成用樹脂は、末端がOH基又はSH基である変性ポリアミドイミド、及び末端がOH基又はSH基である変性ポリイミドの少なくとも一方を含む。ワニスは、上記の絶縁皮膜形成用樹脂と、溶剤とを含む。電着液は、上記の絶縁皮膜形成用樹脂と、極性溶媒と、水と、貧溶媒と、塩基とを含む。絶縁導体の製造方法は、上記のワニスを導体の表面に塗布して、前記導体の表面に塗布層を形成する工程と、前記塗布層を加熱して、生成した絶縁皮膜を前記導体に焼き付ける工程とを有する方法、あるいは上記の電着液を導体の表面に電着させて、前記導体の表面に電着層を形成する工程と、前記電着層を加熱して、生成した絶縁皮膜を前記導体に焼き付ける工程とを有する方法である。【選択図】なし

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