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1. 发明专利

JPH02306797A INFORMATION COLLECTION DEVICE FOR CHARACTER GRAPH INFORMATION NETWORK SYSTEM 失效
公开(公告)号：JPH02306797A
公开(公告)日：1990-12-20
申请号：JP12838089
申请日：1989-05-22
申请人： KAWAMOTO MASATOMO , HITACHI LTD , TOSHIBA CORP , MITSUBISHI ELECTRIC CORP , JAPAN RADIO CO LTD , FUJITSU LTD
发明人： KAMIBAYASHI YOSHIYUKI , YAMAZAKI TAKEO , FUKAZAWA YOSHIO , SHIMAUCHI SHIGEYUKI , ICHIKAWA AKIHIKO , SATO TETSUO , MISAWA YASUO , SUZUKI YOICHI , URUNO TORU , DOI MASAYUKI , MIYAMOTO SUSUMU , OGUCHI MASASHI
IPC分类号： H04Q9/00 , H04B3/54
摘要： PURPOSE:To attain more accurate information service by using a missing data monitor means to find out the missing data if there is any missing data in the sent observed information and using a missing data interpolation input means so as to interpolate the missing information. CONSTITUTION:The observed information is subjected to reception processing at a reception processing section 18 in an information center 12 and the presence of a fault of a reception data is detected by a data detection section 20. When the data detection section 20 detects the presence of a fault in the data, the missing data monitor section 28 monitors the presence of the missing data and when the missing data is detected, the missing data is subjected to interpolation processing by a missing data interpolation processing section 30. Then a data pattern edit processing section 22 processes the observed information sent from an observing device 10 in on-line or off-line and stored in a data file 24 and required pattern information offered to a subscriber is edited from the observed information in the data file 24 and stored in the pattern file 26. Thus, the required pattern information is generated efficiently.

2. 发明专利

JPS6418381A IMAGE RECEIVING METHOD 失效
公开(公告)号：JPS6418381A
公开(公告)日：1989-01-23
申请号：JP17541387
申请日：1987-07-14
申请人： KASEN JOHO CENTER , HITACHI LTD , TOSHIBA CORP , MITSUBISHI ELECTRIC CORP , JAPAN RADIO CO LTD , FUJITSU LTD
发明人： KAMIBAYASHI YOSHIYUKI , NAKAO TADAHIKO , KOIWAI YASUO , SHIMAUCHI SHIGEYUKI , SATO TETSUO , MISAWA YASUO , SUZUKI YOICHI , URUNO TORU , SUZUKI SHIGERU , MIYAMOTO SUSUMU
IPC分类号： G01W1/02 , G06F13/00 , H04N7/12 , H04N7/173 , H04N7/24 , H04N19/00 , H04N19/423 , H04N19/70
摘要： PURPOSE:To cope with the occurrence of an urgent situation and to offer infor mation to a demanding person terminal without any delay by receiving only data on an image which does not vary with time previously and storing them in a terminal, and receiving only plural data which vary at need at the time of receiving image data by a CAPTAIN (Character and Pattern Telephone Access Information Network System) terminal. CONSTITUTION:A CAPTAIN system consists of an information center 10, a communication network 30, and the CAPTAIN terminal 50, and off-line/on-line data is converted by the CAPTAIN screen editing processor 12 of the center 10 into image data, which is outputted. The terminal 50 receives to data obtained by superposing plural data which are edited by the processor 12 and vary with elapsed time upon an image which does not vary with short elapsed time. The CPU 56 of this terminal 50 stores a RAM 60 previously with only the data which do not vary among image data received by a CPU 56 according to a program in a ROM 58. Then only the plural image data which vary are received at need and sent out corresponding to the occurrence of an urgent situation.

3. 发明专利

JPH01276864A AUTOMATIC RECEIVING TERMINAL EQUIPMENT IN CAPTAIN SYSTEM 失效
公开(公告)号：JPH01276864A
公开(公告)日：1989-11-07
申请号：JP10573988
申请日：1988-04-27
申请人： KASEN JOHO CENTER , HITACHI LTD , TOSHIBA CORP , MITSUBISHI ELECTRIC CORP , JAPAN RADIO CO LTD , FUJITSU LTD
发明人： KAMIBAYASHI YOSHIYUKI , NAKAO TADAHIKO , KOIWAI YASUO , SHIMAUCHI SHIGEYUKI , SATO TETSUO , MISAWA YASUO , SUZUKI YOICHI , URUNO TORU , DOI MASAYUKI , SUZUKI SHIGERU , MIYAMOTO SUSUMU
IPC分类号： H04M11/00 , H04N7/173
摘要： PURPOSE:To timely present information, etc., to many persons by providing a timing means and a time setting means at a receiving terminal device to receive respective types of information pictures while the device is connected through a center side and a public line network and automatically receiving and reproducing a desired information picture for the time set beforehand. CONSTITUTION:An automatic receiving terminal equipment 50 to use a public communication network 30 provides a timing means 74, a time setting means 58, an activation control means 76 and an action schedule setting means 72. The terminal equipment is automatically activated by the activation control means 76 at the time set beforehand by the time setting means 58 and a prescribed action is automatically executed in accordance with the schedule set beforehand. Thus, an automatic receiving terminal equipment can be activated and stopped at the time set beforehand by a user and the desired information picture can be received at a desired time by an automatic request.

4. 发明专利

JPH08213360A MANUFACTURING EQUIPMENT AND MANUFACTURING METHOD FOR MANUFACTURING SEMICONDUCTOR DEVICE 失效
公开(公告)号：JPH08213360A
公开(公告)日：1996-08-20
申请号：JP1816495
申请日：1995-02-06
申请人： MITSUBISHI ELECTRIC CORP
发明人： SATO TETSUO , MATSUMOTO JUNKO
IPC分类号： H01L21/302 , H01L21/3065
摘要： PURPOSE: To improve the effect of eliminating corrosive product which is generated when aluminum on a wafer is etched. CONSTITUTION: Corrosive product like chlorine compound 5, fluorine compound 6, etc., which are reliesed from a wafer 1 is sucked by a sucking plate 11. Thereby corrosive product in an atmosphere arround the wafer 1 can be reduced. The effect of eliminating the corrosive product from the wafer 1 can be improved by reducing the corrosive product attaching again to the wafer 1.

5. 发明专利

JPH0621022A MANUFACTURE OF SEMICONDUCTOR DEVICE 失效
公开(公告)号：JPH0621022A
公开(公告)日：1994-01-28
申请号：JP19913592
申请日：1992-06-30
申请人： MITSUBISHI ELECTRIC CORP
发明人： SATO TETSUO
IPC分类号： H01L21/302
摘要： PURPOSE:To remove deterioration of processing accuracy due to level difference of underlying layer in etching processing. CONSTITUTION:When so forming a film 4 to be etched as to cover the surface of the base layer 1 made on a semiconductor substrate 10 and the semiconductor substrate being exposed in its level difference part, occurrence of notching by the ions or active seeds in etching processing can be suppressed since the surface at the level difference part of the underlying layer beneath the film to be etched is roughened.

6. 发明专利

JPH04364726A PATTERN FORMATION 失效
公开(公告)号：JPH04364726A
公开(公告)日：1992-12-17
申请号：JP16892491
申请日：1991-06-11
申请人： MITSUBISHI ELECTRIC CORP
发明人： SATO TETSUO
IPC分类号： H01L21/30 , H01L21/027 , H01L21/302 , H01L21/3065
摘要： PURPOSE:To pattern a thin film simply and high-precisely. CONSTITUTION:A resist 2, an SiO2 film 3, and an upper resist 4 are formed one after another on a substrate 1 whose surface is patterned, and the resist 4 is patterned. The SiO2 film 3 is etched with the resist 4 as the mask, and with the SiO2 film 3 as the mask the resist is worked into an overhang shape by anisotropic dryetching. A part of the substrate 1 surface is exposed, and thin films 6, 6a made of a pattern material are formed on the surface of the resist 2 except an etching side wall and the exposed surface of the substrate 1 to lift off the thin film from top of the resist, so that patterns can be formed simply and high-precisely.

7. 发明专利

JPH0454756B2 失效
公开(公告)号：JPH0454756B2
公开(公告)日：1992-09-01
申请号：JP21209986
申请日：1986-09-08
申请人： MITSUBISHI ELECTRIC CORP
发明人： NAGAO EIICHI , SATO TETSUO
IPC分类号： C25D7/00 , G11B5/31

8. 发明专利

JPS6414710A PRODUCTION OF THIN FILM MAGNETIC HEAD 失效
公开(公告)号：JPS6414710A
公开(公告)日：1989-01-18
申请号：JP17002387
申请日：1987-07-08
申请人： MITSUBISHI ELECTRIC CORP
发明人： NAGAO EIICHI , ODERA SUSUMU , SATO TETSUO
IPC分类号： G11B5/31
摘要： PURPOSE:To reduce the film thickness of a drawing electrode and to reduce manufacturing cost by piercing a protection film formed on drawing conductive film patterned on a substrate to form the drawing electrode. CONSTITUTION:After patterning the drawing conductive film 12 on the substrate 11 by electrolytic plating method, the surface protection film 17 is formed by sputtering, a photoresist film 14 is formed on the film 17 so that the film 17 on the conductive film 12 is exposed and a taper-like hole is pierced on the film 17 by chemical etching so that the conductive film 12 is exposed. After removing the film 14, a ground metallic film 13 is formed as a plating ground film. Then, the film 14 is pattered so that the conductive film 12 is exposed, a metallic electrode film 19 to be the drawing electrode is formed on the exposed part of the film 13 by using the film 14 as a mask, and then the films 14, 13 are removed. Consequently, the film thickness of the protection film 17 can be reduced and the manufacturing cost can be also reduced.

9. 发明专利

JP2003347408A Semiconductor integrated circuit device and method for manufacturing the same 有权
标题翻译：半导体集成电路装置及其制造方法
公开(公告)号：JP2003347408A
公开(公告)日：2003-12-05
申请号：JP2002149671
申请日：2002-05-23
申请人： Mitsubishi Electric Corp , 三菱電機株式会社
发明人： KOYAMA SATOSHI , SATO TETSUO
IPC分类号： H01L23/52 , H01L21/3205 , H01L21/82 , H01L21/822 , H01L23/485 , H01L23/50 , H01L23/528 , H01L27/04
CPC分类号： H01L24/06 , H01L23/50 , H01L23/528 , H01L24/49 , H01L2224/05554 , H01L2224/05599 , H01L2224/49175 , H01L2224/85399 , H01L2924/00014 , H01L2924/01004 , H01L2924/01006 , H01L2924/01014 , H01L2924/01021 , H01L2924/01033 , H01L2924/01039 , H01L2924/01068 , H01L2924/01082 , H01L2924/13091 , H01L2924/14 , H01L2224/45099
摘要： PROBLEM TO BE SOLVED: To easily realize different kinds of semiconductor integrated circuit devices. SOLUTION: A main circuit block 12 and sub-circuit blocks 22, 32 are parallelly formed on the main surface of a semiconductor substrate. Bonding pads 13, 14 are arranged on the circumference of the main circuit block 12 and therewith wiring lines 15, 16 connected to the main block 12. Wiring lines 25, 36 are arranged on the sub-circuit blocks 22, 32 formed with the lines 15, 16 and the lines 25, 36, which are connected to the main block 12. COPYRIGHT: (C)2004,JPO

10. 发明专利

JPH0846173A SEMICONDUCTOR DEVICE AND MANUFACTURE OF THE SAME 失效
公开(公告)号：JPH0846173A
公开(公告)日：1996-02-16
申请号：JP17445994
申请日：1994-07-26
申请人： MITSUBISHI ELECTRIC CORP
发明人： KAWAI KENJI , SATO TETSUO
IPC分类号： H01L21/28 , H01L21/336 , H01L21/768 , H01L21/8242 , H01L23/522 , H01L27/108 , H01L29/41 , H01L29/78
摘要： PURPOSE:To obtain a semiconductor device capable of performing electric connection of shared source/drain regions and wirings. CONSTITUTION:Two MOS transistors having a pair of source/drain regions 3 and 4 one 4 which is shared, gate electrodes 7, insulating overlay films 9, a pair of side walls 10 are formed. An oxide film 11 is formed on the insulating overlay films 9 and the side walls 10. On the oxide film 11, a nitride film 12 whose thickness above the gate electrodes 7 and obliquely above the upside shoulder parts of the gate electrodes 7 is thicker than that above the source/ drain region 4 is formed. On the nitride film 12 an interlayer insulating layer 13 is formed. By etching the insulating film 13, the nitride film 12 and the oxide film 11 on the source/drain region 4 respectively, a contact hole 13a and an opening are formed respectively. A wiring layer 14 to be connected to the source/drain region 4 is formed through the contact hole 13a and the opening.

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