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1. 发明专利

JP2014160780A Exposure device and method for manufacturing commodity 有权
标题翻译：曝光装置和制造商品的方法
公开(公告)号：JP2014160780A
公开(公告)日：2014-09-04
申请号：JP2013031429
申请日：2013-02-20
申请人： Canon Inc , キヤノン株式会社
发明人： NAGANO KOHEI , YAGI NORIYUKI , OTE KEISUKE
IPC分类号： H01L21/027 , G03F7/20 , H01L21/68
摘要： PROBLEM TO BE SOLVED: To provide an exposure device which is advantageous in achieving improvement in the accuracy of alignment between a shot area on board and an original plate and improvement in throughput.SOLUTION: The exposure device comprises: an alignment measurement unit for detecting a first mark among a plurality of marks formed on a board via a mark of an original plate and a protection optical system, and measuring the position of the first mark on the board; an off-axis measurement unit for detecting, in parallel with detection of the first mark, a second mark different from the first mark, and measuring the position of the second mark on the board; and a control unit for controlling alignment between the original plate and each shot area. The off-axis measurement unit uses information indicating a distance between the alignment measurement unit and the off-axis measurement unit as it measures the position of the second mark on the board. The control unit uses the position of the first mark and the position of the second mark to acquire shape information, and adjusts alignment between the original plate and each shot area on the basis of the shape information so that a pattern of the original plate overlaps each shot area.
摘要翻译：要解决的问题：提供一种有利于实现板上的拍摄区域与原版之间的对准精度的提高的曝光装置，并且提高了生产量。解决方案：曝光装置包括：对准测量单元，用于检测通过原板和保护光学系统的标记在板上形成的多个标记中的第一标记，以及测量板上第一标记的位置; 离轴测量单元，用于与第一标记的检测并行地检测与第一标记不同的第二标记，并且测量板上的第二标记的位置; 以及控制单元，用于控制原版和每个拍摄区域之间的对准。离轴测量单元在测量板上第二标记的位置时使用指示对准测量单元和离轴测量单元之间的距离的信息。控制单元使用第一标记的位置和第二标记的位置来获取形状信息，并且基于形状信息调整原版和每个拍摄区域之间的对准，使得原版的图案与每个射击区域。

2. 发明专利

JP2013238670A Exposure apparatus, exposure method, method for manufacturing device, and aperture plate 审中-公开
标题翻译：曝光装置，曝光方法，制造装置的方法和孔板
公开(公告)号：JP2013238670A
公开(公告)日：2013-11-28
申请号：JP2012109930
申请日：2012-05-11
申请人： Canon Inc , キヤノン株式会社
发明人： MIYAZAKI KYOICHI , NAGANO KOHEI
IPC分类号： G03F7/22 , H01L21/027
摘要： PROBLEM TO BE SOLVED: To provide an exposure apparatus that is advantageous for controlling an end shape of a projected area formed on a substrate via a projection optical system.SOLUTION: The exposure apparatus includes a projection optical system and transfers a pattern onto a substrate by partially overlapping, in a first direction, projection areas formed on the substrate via the projection optical system as well as synchronously moving a mask and the substrate in a second direction perpendicular to the first direction. The exposure apparatus includes: an aperture plate having an aperture to define the projection area; an adjusting part for partially shielding the aperture against light to adjust an end shape in the first direction of the projection area; an acquiring part for acquiring a width in the first direction of an overlapped area where the projection areas are overlapped; and a control part for determining, on the basis of the width acquired by the acquiring part, an end shape in the first direction of the projection area to reduce an uneven illuminance distribution formed on the substrate and for controlling the adjusting part to form the determined end shape in the first direction of the projection area.
摘要翻译：要解决的问题：提供一种有利于经由投影光学系统控制形成在基板上的投影区域的端部形状的曝光装置。解决方案：曝光装置包括投影光学系统，并通过在第一方向上部分地重叠通过投影光学系统形成在基板上的投影区域，以及沿垂直于第一方向的第二方向同步地移动掩模和基板。曝光装置包括：孔板，其具有用于限定投影区域的孔; 调节部，用于部分地遮蔽光以防止光投射区域的第一方向上的端部形状; 获取部，用于获取投影区域重叠的重叠区域的第一方向上的宽度; 以及控制部分，用于基于获取部分获取的宽度，确定投影区域的第一方向上的端部形状，以减少形成在基板上的不均匀的照度分布，并且用于控制调节部件以形成确定的在投影区域的第一方向上的端部形状。

3. 发明专利

JP2012189737A Exposure equipment 审中-公开
标题翻译：曝光设备
公开(公告)号：JP2012189737A
公开(公告)日：2012-10-04
申请号：JP2011052314
申请日：2011-03-10
申请人： Canon Inc , キヤノン株式会社
发明人： NAGANO KOHEI , YAMANAKA TAKUMA
IPC分类号： G03F7/207 , H01L21/027
摘要： PROBLEM TO BE SOLVED: To provide exposure equipment solving both problems of lowering of focus accuracy due to elastic deformation of a body structure and deterioration of the number of sheets of substrate processing generated due to the use of a measuring meter for a read-ahead area.SOLUTION: The exposure equipment includes means for calculating positional displacement amount of the body structure and focus variation amount when the body structure is elastically deformed using the position of a substrate stage or an original plate stage in real time and predicting and correcting the positional displacement amount and the focus variation amount. When prediction correction amount of the focus variation amount is calculated, forcible acting force is applied to the body structure to measure displacement amount of the body structure, and at the same time, a relative position between a projection optical system and the substrate stage or a relative height between the projection optical system and the original plate stage is measured and a regression analysis is performed on the relative position or the relative height to correct the correction amount.
摘要翻译：要解决的问题：提供曝光设备，以解决由于身体结构的弹性变形而导致的聚焦精度降低的问题以及由于使用用于读取的测量计而产生的基板处理的纸张数量的劣化前方区域。解决方案：曝光设备包括：使用基板台或原版平台的位置实时地计算主体结构弹性变形时的身体结构的位置偏移量和聚焦变化量的装置，并且预测和校正位置偏移量和焦点变化量。当计算出焦点变化量的预测校正量时，对身体结构施加强制作用力，以测量身体结构的位移量，同时，投影光学系统与衬底台之间的相对位置或测量投影光学系统和原版平台之间的相对高度，并对相对位置或相对高度进行回归分析以校正校正量。版权所有（C）2013，JPO＆INPIT

4. 发明专利

JP2010286784A Stage apparatus, exposure apparatus, and method for manufacturing device 审中-公开
标题翻译：阶段装置，曝光装置和制造装置的方法
公开(公告)号：JP2010286784A
公开(公告)日：2010-12-24
申请号：JP2009142533
申请日：2009-06-15
申请人： Canon Inc , キヤノン株式会社
发明人： NAGANO KOHEI
IPC分类号： G03F9/00 , H01L21/027 , H01L21/68
摘要： PROBLEM TO BE SOLVED: To provide a stage apparatus suppressing increase in the scale of the apparatus as a whole, or the weight of an exposure stage.
SOLUTION: The stage apparatus includes a stage (1) and a driving means (7a, 7b) for driving the stage wherein the stage apparatus also includes: a position measuring means for measuring the position of the stage, including corner cubes (8a to 8c), interferometers (4, 5a, 5b) irradiating the corner cubes with a light, and driving mechanisms (13a, 13b) relatively driving the corner cubes with respect to the stage; and a control means (15) for controlling the driving mechanisms so as to continuously irradiate the corner cubes with light from the interferometers even when the stage is driven.
COPYRIGHT: (C)2011,JPO&INPIT
摘要翻译：要解决的问题：提供一种抑制整个装置的规模增加或曝光阶段的重量的舞台装置。解决方案：舞台装置包括舞台（1）和用于驱动舞台的驱动装置（7a，7b），其中舞台装置还包括：位置测量装置，用于测量舞台的位置，包括角立方体（ 8a至8c），用光照射角立方体的干涉仪（4,5a，5b）以及相对于舞台相对地驱动角立方体的驱动机构（13a，13b）以及控制装置（15），用于控制驱动机构，以便即使在该台被驱动时也能够用来自干涉仪的光来连续照射拐角立方体。版权所有（C）2011，JPO＆INPIT

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