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    • 5. 发明公开
    • PROCESS FOR PRODUCING CHROMAN COMPOUND
    • VERFAHREN ZUR HERSTELLUNG EINER CHROMANVERBINDUNG
    • EP1710239A1
    • 2006-10-11
    • EP05704261.6
    • 2005-01-28
    • MITSUBISHI GAS CHEMICAL COMPANY, INC.
    • TANAKA, Kazuo Mitsubishi Gas Chemical Company Inc.KYUUKO, Youichi, Mitsubishi Gas Chemical Co. Inc.HIDAKA, Toshio Mitsubishi Gas Chemical CompanyInc
    • C07D311/66C07D311/72
    • C07D311/66C07D311/62
    • The invention provides a process for producing a chroman compound represented by formula (1) (wherein each of substituents R 1 to R 6 and X represents a hydrogen atom, a halogen atom, a hydroxyl group, a methoxy group, an ethoxy group, a carboxyl group, a C1 to C12 alkyl group which may have a substituent, a C6 to C12 aryl group which may have a substituent, a C7 to C12 aralkyl group which may have a substituent, or an ester residue; R 1 to R 4 may be linked to one another; and at least one of the substituents X and R 6 is an ester residue), characterized in that the process includes allowing a phenol, an olefin, and a formaldehyde to react in the absence of catalyst and in the presence of water in an amount by mole 1 to 10 times that of the phenol.
      According to the present invention, a high-purity chroman compound can be produced in the absence of catalyst and under mild conditions. In addition, the invention provides an industrial means for producing the compound, without using a large amount of an acid or a base serving as a reaction promoter or a catalyst, which would otherwise cause side reactions, apparatus corrosion, etc.
      [F1]
    • 本发明提供一种制备式(1)表示的苯并二氢吡喃化合物的方法(其中取代基R 1至R 6和X各自表示氢原子,卤素原子,羟基,甲氧基,乙氧基, 羧基,可具有取代基的C1〜C12烷基,可具有取代基的C6〜C12芳基,可具有取代基的C7〜C12芳烷基或酯残基; R 1〜R 4可以 彼此连接;至少一个取代基X和R 6是酯残基),其特征在于该方法包括使苯酚,烯烃和甲醛在不存在催化剂的情况下和在存在下进行反应 的水的量为酚的1〜10倍。 根据本发明,可以在不存在催化剂的情况下,在温和的条件下制备高纯度色满化合物。 此外,本发明提供了一种用于生产化合物的工业方法,不用大量的酸或作为反应促进剂或催化剂的碱,否则会引起副反应,装置腐蚀等。[F1]