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1. 发明公开

EP3205639A4 PROTECTING-GROUP INTRODUCING AGENT FOR HYDROXY GROUP AND/OR MERCAPTO GROUP 有权
公开(公告)号：EP3205639A4
公开(公告)日：2018-03-21
申请号：EP15848889
申请日：2015-09-30
申请人： KYUSHU UNIV NATIONAL UNIV CORPORATION
发明人： TORIKAI KOHEI
IPC分类号： C07C43/174 , C07B41/02 , C07B51/00 , C07C15/14 , C07C22/04 , C07C41/16 , C07C43/164 , C07C309/63 , C07D209/04 , C07D215/02 , C07D333/72
CPC分类号： C07B41/02 , C07B51/00 , C07C15/14 , C07C22/04 , C07C41/16 , C07C43/164 , C07C43/174 , C07C309/63 , C07D209/04 , C07D215/02 , C07D333/72 , Y02P20/55
摘要： A novel agent for introducing a protecting group for a hydroxy group and/or a mercapto group that can be introduced and removed under mild conditions is provided. The agent for introducing a protecting group for a hydroxy group and/or mercapto group of a substrate compound having the hydroxy group and/or mercapto group is represented by the following formula (I), wherein A represents a ring structure having 1 to 5 rings in which two carbon atoms of an adjacent benzene ring are included, the ring structure comprises a substituted or unsubstituted five-membered ring or six-membered ring and optionally include a heterocycle; each of R 1 , R 2 , R 3 , and R 4 is independently a hydrogen atom or a linear or branched alkyl group having 1 to 5 carbon atoms; and X is a halogen atom or OSO 2 R 5 (R 5 = an aryl group or an alkyl group) .

2. 发明公开

EP2832761A4 POLYMER COMPOUND AND LIGHT EMITTING ELEMENT USING SAME 有权转让
标题翻译：聚合物连接和发光元件
公开(公告)号：EP2832761A4
公开(公告)日：2015-11-04
申请号：EP13768988
申请日：2013-03-26
申请人： SUMITOMO CHEMICAL CO , CAMBRIDGE DISPLAY TECH
发明人： SEKINE CHIZU , MIKAMI SATOSHI , ANRYU MAKOTO , KAKIMOTO HIDENOBU , STEUDEL ANNETTE REGINE , HUMPHRIES MARTIN JOHN , KAMTEKAR KIRAN TIMOTHY , GARCIA ELENA HOJAS , HEIDENHAIN SOPHIE , PEGINGTON RUTH
IPC分类号： C08G61/12 , C07C211/57 , C07C309/63 , C07F3/02 , C07F3/06 , C07F5/02 , C07F5/04 , C07F7/22 , C08L65/00 , C09K11/06 , H01L51/30 , H01L51/50
CPC分类号： C08G61/12 , C07C211/56 , C07C211/61 , C07C2602/06 , C07C2603/18 , C07F3/02 , C07F3/06 , C07F5/02 , C07F5/04 , C07F7/22 , C08G61/122 , C08G2261/124 , C08G2261/135 , C08G2261/1412 , C08G2261/1414 , C08G2261/148 , C08G2261/312 , C08G2261/3142 , C08G2261/3162 , C08G2261/411 , C08G2261/76 , C08L65/00 , C09K11/06 , C09K2211/1416 , C09K2211/1425 , C09K2211/1433 , H01L51/0035 , H01L51/5056
摘要： A polymer compound comprising constitutional units of formula (1) and formula (2), and a constitutional unit of formula (3) and/or (4'). [Ar 1 to Ar 4 represent an arylene group or the like, Ar 5 to Ar 7 represent an aryl group or the like, and x and y represent 0 or 1. Ar 8 represents a (2+p)-valent aromatic hydrocarbon group or the like, R 1 represents an alkyl group or the like, and p represents an integer of 1 or greater. na represents an integer of 0 to 3, nb represents an integer of 0 to 12, nA represents 0 or 1, n represents an integer of 1 to 4, Ar 10 represents a (2+n)-valent aromatic hydrocarbon group or the like, L a and L b represent an alkylene group or the like, L A represents an oxygen atom or the like, and Q 1 represents a monovalent crosslinkable group. c represents 0 or 1, Ar 20 , Ar 30 ' and Ar 40 represent an arylene group or the like, Q 2 ' to Q 4 ' represent a monovalent crosslinkable group or the like, na and ng represent an integer of 0 to 3, nb and nh represent an integer of 0 to 12, nA and nD represent 0 or 1, L a , L b , L g and L h represent an alkylene group or the like, and L A and L D represent an oxygen atom or the like.]
摘要翻译：包含式（1）和式（2）的结构单元和式（3）和/或（4'）的结构单元的聚合物化合物。 [Ar 1〜Ar 4表示亚芳基等，Ar 5〜Ar 7表示芳基等，x和y表示0或1.Ar 8表示（2 + p）价的芳香族烃基 R 1表示烷基等，p表示1以上的整数。 na表示0〜3的整数，nb表示0〜12的整数，nA表示0或1，n表示1〜4的整数，Ar 10表示（2 + n）价的芳香族烃基等 L a和L b表示亚烷基等，LA表示氧原子等，Q 1表示一价可交联基团。 c表示0或1，Ar 20，Ar 30'和Ar 40表示亚芳基等，Q 2'至Q 4'表示一价可交联基团等，na和ng表示0〜3的整数， nb和nh表示0〜12的整数，nA和nD表示0或1，L a，L b，L g和L h表示亚烷基等，LA和LD表示氧原子等。 ]

3. 发明授权

EP1320785B1 OXIME DERIVATIVES AND THE USE THEREOF AS LATENT ACIDS 有权
标题翻译：肟衍生物及其用途为递延酸
公开(公告)号：EP1320785B1
公开(公告)日：2010-02-17
申请号：EP01985295.3
申请日：2001-09-18
申请人： BASF SE
发明人： YAMATO, Hitoshi , ASAKURA, TOSHIKAGE , MATSUMOTO, Akira , OHWA, Masaki
IPC分类号： G03F7/004 , G03F7/038 , G03F7/039 , C07C309/63
CPC分类号： G03F7/0392 , B33Y70/00 , G03F7/0045 , G03F7/0382
摘要： New oxime sulfonate compounds of formula (I, II, III, IV, V, VI and VII) wherein R1 is for example C1-C18 alkylsulfonyl, R2 is halogen or C1-C10 haloalkyl; R3 is for example unsubstituted or substituted phenylenedisulfonyl, diphenylenedisulfonyl, or oxydiphenylenedisulfonyl; Ar1 is for example a direct bond, C1-C12 alkylene; -O-C-bond or a O-Si-bond which cleaves upon the action of an acid; A1, A2, A3, A4, A5, A6, A7, A8, A9, A10, A11 and A12 are for example a direct bond, -O-, or S-, or are C1-C12 alkylene or phenylene unsubstituted or substituted; Y1 is C1-C12 alkylene which is for example subsituted by OR4, or SR7; Y2 is e.g. a trivalent radical of C1-C12 alkylene; Y3 is e.g. a tetravalent radical of C1-C12 alkylene; X is halogen; Ar'1 is for example C1-C12 alkyl which is unsubstituted or substituted; Ar'1 is for example phenylene; provided that at least one of the radicals Ar'1, Ar'1, is substituted by 1 to 3 groups of (VIII), (IX), (X), (XI), (XII) and/or (XIII); M+ is e.g. (XIV); L- is for example halogen; R¿15?, R16, R17 and R18 are e.g. hydrogen or phenyl; R19, R20, R21, R22 and R23 are e.g. phenyl; are especially suitable for the preparation of photoresists.

5. 发明公开

EP1633703A2 ISOTOPICALLY LABELED CHEMICALLY STABLE REAGENTS AND PROCESS FOR THE SYNTHESIS THEREOF 有权转让
标题翻译： ISOTOPIERTE化学试剂稳定与合成方法
公开(公告)号：EP1633703A2
公开(公告)日：2006-03-15
申请号：EP04753682.6
申请日：2004-05-28
申请人： PerkinElmer LAS, Inc.
发明人： POUNDS, Jerry, Scot
IPC分类号： C07C309/63
CPC分类号： C07C303/26 , C07B59/00 , C07B59/001 , C07B59/002 , C07B2200/05 , C07C67/10 , C07C309/73 , C07D207/09 , C07D211/66 , C07D453/02 , C07C69/616
摘要： A radioisotope labeled reagent includes a compound having the general formula (I) where a in each occurrence independently is a carbon mass number between 11 and 14 inclusive, b in each occurrence independently is a hydrogen mass number between 1 and 3 inclusive, such that a in each occurrence is not 12 simultaneously with b in each occurrence being 1; L is a leaving group R1SO2-O-, R1 -S-, 12C1H3(12C1 H2)n-S-R1C(O)O-, NC-, (R1)3P-, XMg- and Li-, where n is an integer between 0 and 3 inclusive, where X is chloro, bromo or iodine, where R1 is H, aryl, a substituent containing aryl, C1-C20 alkyl, a substituent containing C1-C20 alkyl, C2-C20 alkenyl, a substituent containing C2-C20 alkenyl, C2-C20 alkynyl, and a substitute containing C2-C20 alkynyl with the proviso that when n is 0, a is 13 and b is 2 and R1 in R1-S is not aryl.

6. 发明公开

EP1320785A2 OXIME DERIVATIVES AND THE USE THEREOF AS LATENT ACIDS 有权
标题翻译： OREIMDERIVATE UND IHRE VERWENDUNG ALS LATENTESAÜRE
公开(公告)号：EP1320785A2
公开(公告)日：2003-06-25
申请号：EP01985295.3
申请日：2001-09-18
申请人： Ciba Specialty Chemicals Holding Inc.
发明人： YAMATO, Hitoshi , ASAKURA, TOSHIKAGE , MATSUMOTO, Akira , OHWA, Masaki
IPC分类号： G03F7/004 , G03F7/038 , G03F7/039 , C07C309/63
CPC分类号： G03F7/0392 , B33Y70/00 , G03F7/0045 , G03F7/0382
摘要： New oxime sulfonate compounds of formula (I, II, III, IV, V, VI and VII) wherein R1 is for example C1-C18 alkylsulfonyl, R2 is halogen or C1-C10 haloalkyl; R3 is for example unsubstituted or substituted phenylenedisulfonyl, diphenylenedisulfonyl, or oxydiphenylenedisulfonyl; Ar1 is for example a direct bond, C1-C12 alkylene; -O-C-bond or a O-Si-bond which cleaves upon the action of an acid; A1, A2, A3, A4, A5, A6, A7, A8, A9, A10, A11 and A12 are for example a direct bond, -O-, or S-, or are C1-C12 alkylene or phenylene unsubstituted or substituted; Y1 is C1-C12 alkylene which is for example subsituted by OR4, or SR7; Y2 is e.g. a trivalent radical of C1-C12 alkylene; Y3 is e.g. a tetravalent radical of C1-C12 alkylene; X is halogen; Ar'1 is for example C1-C12 alkyl which is unsubstituted or substituted; Ar'1 is for example phenylene; provided that at least one of the radicals Ar'1, Ar'1, is substituted by 1 to 3 groups of (VIII), (IX), (X), (XI), (XII) and/or (XIII); M+ is e.g. (XIV); L- is for example halogen; R¿15?, R16, R17 and R18 are e.g. hydrogen or phenyl; R19, R20, R21, R22 and R23 are e.g. phenyl; are especially suitable for the preparation of photoresists.
摘要翻译：式I，II，III，IV，V，VI和VII R 1的新的肟磺酸酯化合物是例如C 1 -C 18 >烷基磺酰基，R 2是卤素或C 1 -C 10卤代烷基; R 3是例如未取代的苯基二磺酰基，二苯基二磺酰基或氧基二苯基二磺酰基; Ar 1是例如直接键合的C 1 -C 12亚烷基; -O-C键或在酸的作用下切割的-O-Si键; A 1，N 2，A 3，A 4，A 5， A 6，A 7，A 8，A 9，A 10， A 11和A 12是例如直接键，-O-或-S-，或者是C 1 -C 3 > 12个亚烷基或亚苯基未取代或取代; Y 1是例如被OR 4取代的C 1 -C 12亚烷基或SR _{7 ; Y 2是例如。 C 1 -C 12亚烷基的三价基团; Y 3是例如。 C 1 -C 12亚烷基的四价基团; X是卤素; Ar 1'是例如未取代或取代的C 1 -C 12烷基; Ar“1”是例如亚苯基; 条件是基团Ar 1'，Ar“1'中的至少一个被1至3个例如卤素取代; R 15，R 16，R 17和R 18，例如，氢或苯基; R 19，R 20，R 21，R 22，R 23和R 23分别为例如，苯基; 特别适用于光刻胶的制备。}

7. 发明公开

EP1299774A1 PERFLUOROALKYLSULFONIC ACID COMPOUNDS FOR PHOTORESISTS 审中-公开
标题翻译：用于光化剂的全氟烷基磺酸化合物
公开(公告)号：EP1299774A1
公开(公告)日：2003-04-09
申请号：EP02725542.1
申请日：2002-04-05
申请人： Arch Specialty Chemicals, Inc.
发明人： FERREIRA, Lawrence , BLAKENEY, Andrew, J. , SPAZIANO, Gregory, Dominic , DIMOV, Ognian , KOCAB, Thomas, J. , HATFIELD, John, P.
IPC分类号： G03F7/004 , C07C303/00 , C07C309/01 , C07C309/02 , C07C309/06 , C07C309/63
CPC分类号： C07C381/12 , C07C309/10 , G03F7/0045 , G03F7/0395 , Y10S430/114 , Y10S430/115 , Y10S430/122 , Y10S430/123
摘要： A photoacid compound having general structure: R-O(CF2)nSO3X wherein n is an integer between about 1 to 4; R is selected from the group consisting of: substituted or unsubstituted C1-C12 linear or branched alkyl or alkenyl, substituted or unsubstituted araalkyl, substituted or unsubstituted aryl, substituted or unsubstituted bicycloalkyl, substituted or unsubstituted tricycloalkyl, hydrogen, alkyl sulfonic acid, substituted or unsubstituted perfluoroalkyl, the general structure F((CF2)pO)m(CF2)q- wherein p is between about 1 to 4, m is between about 0 to 3 and q is between about 1 to 4, and substituted or unsubstituted partially fluorinated alkyl, halofluoroalkyl, perfluoroalkylsulfonic, or glycidyl; and X is selected from the group consisting of: organic cations and covalently bonded organic radicals.
摘要翻译：具有通式结构的光酸化合物：R-O（CF 2）n SO 3 X其中n是约1至4的整数; R选自取代或未取代的C 1 -C 12直链或支链烷基或链烯基，取代或未取代的芳烷基，取代或未取代的芳基，取代或未取代的双环烷基，取代或未取代的三环烷基，氢，烷基磺酸，未取代的全氟烷基，通式结构F（（CF 2）p O）m（CF 2）q - ，其中p为约1至4，m为约0至3且q为约1至4，并且取代或未取代的部分氟化烷基，卤代氟烷基，全氟烷基磺酸或缩水甘油基; X选自有机阳离子和共价键合的有机基团。

8. 发明授权

EP0681713B1 SULFONSÄUREESTER, DAMIT HERGESTELLTE STRAHLUNGSEMPFINDLICHE GEMISCHE UND DEREN VERWENDUNG 失效转让
标题翻译：磺酸，这样产生的辐射敏感混合物及其用途
公开(公告)号：EP0681713B1
公开(公告)日：1998-11-18
申请号：EP93921907.7
申请日：1993-10-04
申请人： Clariant GmbH
发明人： PAWLOWSKI, Georg , SPIESS, Walter , RÖSCHERT, Horst , APPEL, Wolfgang , HERR, Walter
IPC分类号： G03F7/029 , G03F7/004 , G03F7/039 , G03F7/075 , C07C309/63
CPC分类号： C07D277/62 , C07C309/66 , C07C309/67 , C07C309/73 , C07C309/74 , C07C309/75 , C07C317/22 , C07D333/34 , G03F7/0045

9. 发明公开

EP0433806A3 Isocyanatoalkylsulfonate und ein Verfahren zu deren Herstellung 失效
标题翻译：异硫氰酸酯及其制备方法
公开(公告)号：EP0433806A3
公开(公告)日：1992-03-04
申请号：EP90123606.7
申请日：1990-12-08
申请人： BAYER AG
发明人： Schröder, Georg, Dr. , Arlt, Dieter, Prof. Dr. , Jautelat, Manfred, Dr.
IPC分类号： C07C309/63 , C07C303/30
CPC分类号： C07C309/65 , C07C309/63
摘要： Isocyanatoalkylsulfonate der allgemeinen Formel

mit den in der Beschreibung angegebenen Substituentenbedeutungen erhält man durch Umsetzung der entsprechenden Isocyanatoalkylhalogenide mit Sulfonsäureestern der Formel

worin R³ die in der Beschreibung angegebenen Bedeutungen besitzt. Sie finden Verwendung als Vernetzer in Polyaminen.

10. 发明公开

EP0430096A3 Process for the production of 3,4-epoxybutyrate and intermediate therefor 失效
标题翻译：生产3,4-环氧丁酸和其中间体的方法
公开(公告)号：EP0430096A3
公开(公告)日：1991-12-27
申请号：EP90122398.2
申请日：1990-11-23
申请人： Kanegafuchi Chemical Industry Co., Ltd.
发明人： Taoka, Naoaki , Inoue, Kenji , Hayashi, Shigeo , Ueyama, Noboru , Takahashi, Satomi
IPC分类号： C07D303/40 , C07D301/02 , C07C309/63
CPC分类号： C07D303/40 , C07C309/65 , C07C309/73
摘要： A 3,4-epoxybutyrate of the formula:
wherein R 1 is an alkyl or aralkyl group is efficiently prepared by a process comprising steps of:
(a) reacting 3,4-dihydroxybutyronitrile of the formula:
with a sulfonyl chloride of the formula: R 2 -SO 2 -CI wherein R 2 is an alkyl group or a phenyl group which may be substituted in the presence of a base to obtain a compound of the formula: (b) reacting the compound prepared in the step (a) with an alcohol of the formula: R 1 -OH in the presence of an acid to obtain a compound of the formula:
and (c) reacting the compound prepared in the step (b) with a base to obtain the 3,4-epoxybutyrate.

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