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    • 6. 发明公开
    • Photosensitive compound, photosensitive composition, method for resist pattern formation, and process for device prodution
    • 方法zur Fotolack-Strukturierung und Prozess zur Herstellung eines Bausteins
    • EP1865379A1
    • 2007-12-12
    • EP07108733.2
    • 2007-05-23
    • CANON KABUSHIKI KAISHA
    • Ito, ToshikiYamaguchi, Takako
    • G03F7/004G03F7/039C07C205/35C07C205/00G03F7/023
    • C07C205/34G03F7/0045G03F7/023G03F7/039
    • A process for forming a resist pattern comprises the steps of applying on a substrate to form a photosensitive resist layer a photosensitive composition comprising at least one photosensitive compound having, in the molecule, two or more structural units represented by C 6 R 2-6 -CHR 1 -OR 7 or C 6 R 2-6 -CHR 1 -COOR 7 where R 1 is a hydrogen atom or an alkyl group, at least one of R 2 , R 3 , R 4 , R 5 , and R 6 is a nitro group, and others are selected from the group consisting of a hydrogen atom, a halogen atom, an alkyl, an alkoxy, a phenyl, a naphthyl, and an alkyl in which a part or the entire of hydrogen atoms are substituted by a fluorine atom, and R 7 is a substituted or unsubstituted phenylene or naphthylene group dissolved in an organic solvent, irradiating the resist layer selectively with a radiation ray, and developing a portion irradiated by the ray to form a pattern of the resist layer.
    • 用于形成抗蚀剂图案的方法包括以下步骤:在基材上施加光敏抗蚀剂层,所述感光组合物包含至少一种在分子中具有两个或更多个由C 6 R 2-6 - CHR 1 -OR 7或C 6 R 2-6 -CHR 1 -COOR 7其中R 1是氢原子或烷基,R 2,R 3,R 4,R 5和R 6中的至少一个是 硝基等,选自氢原子,卤素原子,烷基,烷氧基,苯基,萘基和其中一部分或全部氢原子被 氟原子,R 7为溶解在有机溶剂中的取代或未取代的亚苯基或亚萘基,用辐射线选择性地照射抗蚀剂层,并且使用该光线照射的部分显影以形成抗蚀剂层的图案。
    • 9. 发明公开
    • METHYLENE-BRIDGED SELECTIVE ANDROGEN RECEPTOR MODULATORS AND METHODS OF USE THEREOF
    • 选择性雄激素受体调节剂及其使用方法MITMETHYLENBRÜCKEN
    • EP1562594A2
    • 2005-08-17
    • EP03777598.8
    • 2003-10-14
    • University of Tennessee Research Foundation
    • DALTON, James, T.MILLER, Duane, D.
    • A61K31/44A61K31/60C07D215/16C07C205/00
    • C07C237/22A61K31/167C07C235/38C07C255/60
    • This invention provides a class of androgen receptor targeting agents (ARTA). The agents define a new subclass of compounds, which are selective androgen receptor modulators (SARM). Several of the SARM compounds have been found to have an unexpected androgenic and anabolic activity of a nonsteroidal ligand for the androgen receptor. Other SARM compounds have been found to have an unexpected antiandrogenic activity of a nonsteroidal ligand for the androgen receptor. The SARM compounds, either alone or as a composition, are useful for a) male contraception; b) treatment of a variety of hormone-related conditions, for example conditions associated with Androgen Decline in Aging Male (ADAM), such as fatigue, depression, decreased libido, sexual dysfunction, erectile dysfunction, hypogonadism, osteoporosis, hair loss, anemia, obesity, sarcopenia, osteopenia, osteoporosis, benign prostate hyperplasia, alterations in mood and cognition and prostate cancer; c) treatment of conditions associated with Androgen Decline in Female (ADIF), such as sexual dysfunction, decreased sexual libido, hypogonadism, sarcopenia, osteopenia, osteoporosis, alterations in cognition and mood, depression, anemia, hair loss, obesity, endometriosis, breast cancer, uterine cancer and ovarian cancer; d) treatment and/or prevention of acute and/or chronic muscular wasting conditions; e) preventing and/or treating dry eye conditions; f) oral androgen replacement therapy; g) decreasing the incidence of, halting or causing a regression of prostate cancer; and/or h) inducing apoptosis in a cancer cell.