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    • 4. 发明公开
    • SECURITY DEVICES AND METHODS OF MANUFACTURE THEREOF
    • 赫尔辛基大酒店(DCHERHEITSVORRICHTUNGEN UND HERSTELLUNGSVERFAHRENDAFÜR
    • EP3045972A1
    • 2016-07-20
    • EP16151623.2
    • 2012-10-11
    • De La Rue International Limited
    • LISTER, Adam
    • G03C5/08G03C5/60B42D25/29B42D25/41B42D25/42
    • G03F7/38B42D25/29B42D25/342B42D25/41B42D25/42B42D2033/10B42D2033/14B42D2033/20B42D2033/30B42D2035/16B42D2035/20B42D2035/26B42D2035/44G03C5/08G03C5/60G03F7/2002
    • A method of manufacturing at least part of a security device is disclosed. The method comprises: conveying a substrate web comprising a photosensitive film along a transport path, the photosensitive film being adapted to exhibit an increase in optical density upon exposure to radiation of a predetermined wavelength and concurrent or subsequent heating, the increase in optical density being due to the formation of bubbles within the photosensitive film; exposing the photosensitive film to radiation of the predetermined wavelength through a mask, wherein the mask comprises a predetermined pattern of regions which are substantially opaque to radiation of the predetermined wavelength and at least semi-transparent to radiation of the predetermined wavelength, respectively; during the exposure, moving the mask alongside the substrate web along at least a portion of the transport path at substantially the same speed as the substrate web, such that there is substantially no relative movement between the mask and the substrate web; and heating the substrate web comprising the exposed photosensitive film. In this way, regions of the photosensitive film exposed to the radiation of the predetermined wavelength undergo an increase in optical density such that the photosensitive film displays a reproduction of the predetermined pattern. Security devices are also disclosed.
    • 公开了制造安全装置的至少一部分的方法。 该方法包括:沿着输送路径输送包含感光膜的基材网,感光膜适于在暴露于预定波长的辐射和同时或随后的加热时表现出光密度的增加,光密度的增加是由于 在感光膜内形成气泡; 通过掩模将感光膜暴露于预定波长的辐射,其中掩模包括分别对于预定波长的辐射基本上不透明并且对于预定波长的辐射至少半透明的预定图案区域; 在曝光期间,沿着衬底腹板沿传送路径的至少一部分以与衬底腹板基本相同的速度移动面罩,使得在面罩和衬底腹板之间基本上不存在相对运动; 以及加热包含曝光的感光膜的基片网。 以这种方式,暴露于预定波长的辐射的感光膜的区域经历光密度的增加,使得感光膜显示预定图案的再现。 还公开了安全装置。