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    • 2. 发明授权
    • THICKNESS MEASUREMENT USING AN ATOMIC FORCE MICROSCOPE
    • WITH A原子力显微镜测量DICK
    • EP1269112B1
    • 2004-06-09
    • EP01912979.0
    • 2001-02-21
    • ADVANCED MICRO DEVICES INC.
    • PHAN, Khoi, A.RANGARAJAN, BharathSINGH, Bhanwar
    • G01B7/34G01B21/08H01L21/66G01B21/18G01N27/00
    • G01B21/18G01B7/066G01B21/08G01Q30/04G01Q80/00H01L22/12Y10S977/852
    • The present invention relates to a method (100) of determining a film thickness and comprises identifying (114) a depth associated with a defect (106) in an underlying material (108) and forming (116) the film (130) over the underlying material (108). The method (100) further comprises identifying (118) a depth associated with the defect (106) in the film (108) and then using (124) the identified depths to determine the film thickness. The present invention also relates to a system (200) for determining a film thickness and comprises a defect inspection tool (204) operable to identify a location of one or more defects (106) in an underlying material (108) and a topology measurement tool (208) operable to measure a change in topology of a surface. The system (200) also comprises a controller (206) operably coupled to the defect inspection tool (204) and the topology measurement tool (208). The controller (206) is adapted to receive location information from the defect inspection tool (204) relating to the one or more defects (106) and use the location information to generate and transmit one or more control signals to the topology measurement tool (208) to evaluate a topology of an underlying material (108) and a film (130) at the location corresponding to the one or more defects (106) to thereby generate topology information. Lastly, the controller (206) is adapted to receive the topology information from the topology measurement tool (208) and determine a film thickness using the topology information.
    • 8. 发明公开
    • Scanning probe microscope
    • Rastersondenmikroskop
    • EP0890821A1
    • 1999-01-13
    • EP98305530.2
    • 1998-07-10
    • Jeol Ltd.
    • Kitamura, Shinichi
    • G01B7/34G01N27/00G01N27/22
    • G01Q60/30Y10S977/849Y10S977/852Y10S977/86Y10S977/868Y10S977/871Y10S977/873
    • There is disclosed a scanning probe microscope capable of producing a topographic image at a high resolution with a cantilever of a large spring constant and, at the same time, a surface potential image at a high resolution. This microscope can take the form of an atomic force microscope that detects the surface potential of a sample, using a gradient of the force acting between the probe tip and a sample. The gradient is represented by the output from a frequency-to-voltage converter. The frequency of an AC voltage applied across the probe tip and the sample is so set that a z-signal fed back to the cantilever to maintain constant the shift in the resonance frequency of the cantilever can sufficiently follow the AC voltage.
    • 公开了一种扫描探针显微镜,其能够以高弹性常数的悬臂以高分辨率产生地形图像,同时以高分辨率产生表面电位图像。 该显微镜可以采用原子力显微镜的形式,其使用在探针尖端和样品之间作用的力的梯度来检测样品的表面电位。 梯度由频率 - 电压转换器的输出表示。 跨越探针尖端和样品施加的交流电压的频率被设定为使得反馈到悬臂的z信号保持不变,悬臂的谐振频率的偏移可以充分地跟随交流电压。