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    • 3. 发明公开
    • X-RAY ANALYSIS APPARATUS PROVIDED WITH A DOUBLE COLLIMATOR MASK
    • 提供双重定位掩模的X射线分析装置
    • EP0877930A1
    • 1998-11-18
    • EP97941147.0
    • 1997-10-03
    • Koninklijke Philips Electronics N.V.
    • VAN DER WAL, Hendricus, Gerardus, Maria
    • G01N23G21K1H01J37
    • G01N23/223G01N2223/076H01J2237/24425
    • A Soller slit (16) in an X-ray spectrometer can parallelize fluorescent radiation which emanates from a specimen (4) and is to be analyzed according to wavelength by an analyzer crystal (18). Because the aim is to irradiate an as large as possible surface of the specimen (4) by means of primary X-rays (10), inevitably disturbing fluorescent radiation is also generated by the environment of the specimen, for example the specimen holder (6). In order to intercept this disturbing radiation so that it cannot reach the X-ray detector, a collimator mask (12) is arranged in a fixed location in the beam path. In the case of varying specimen dimensions it is not always possible to choose such dimensions for this mask that the disturbing radiation is intercepted. Therefore, a second collimator mask (28) is provided (behind the Soller slit (16)) in order to intercept the disturbing radiation in cooperation with the first mask (12).
    • 在X射线分光计中的索勒狭缝(16)可以平行化从样品(4)发出并且将由分析仪晶体(18)根据波长进行分析的荧光辐射。 因为目标是通过初级X射线(10)照射试样(4)的尽可能大的表面,所以试样的环境也会产生不可避免的干扰荧光辐射,例如样品架(6 )。 为了拦截该干扰辐射以使其不能到达X射线探测器,准直器掩模(12)布置在光路中的固定位置。 在样品尺寸不同的情况下,选择这种掩模的尺寸并不总是可能的,即干扰辐射被截断。 因此,提供第二准直器掩模(28)(在索勒狭缝(16)后面)以便与第一掩模(12)协作地拦截干扰辐射。