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1. 发明公开

EP2372743A2 Charged particle beam system with an ion generator 有权
标题翻译：蜂巢TEM TEM。。。。。。
公开(公告)号：EP2372743A2
公开(公告)日：2011-10-05
申请号：EP11172096.7
申请日：2003-09-18
申请人： FEI Company
发明人： Stewart, Diane , Knowles, Ralph , Kimball, Brian
IPC分类号： H01J37/00 , H01J37/244 , H01J37/26
CPC分类号： H01J37/26 , H01J37/244 , H01J2237/0045 , H01J2237/2448 , H01J2237/2605
摘要： A charged particle beam (306) system uses an ion generator (302) for charge neutralization on a work piece (307). Secondary or backscattered particles (320) enter a chamber (310) of the ion generator (302) to ionize an ion producing gas there. In some embodiments, the ion generator is configured to maintain an adequate gas pressure in the ion generator to generate ions, but a reduced pressure in the remainder of the vacuum chamber (308), so that another column can operate in the chamber either simultaneously or after an evacuation process that is much shorter than a process that would be required to evacuate the chamber from the full pressure required at the ion generator. The invention is particularly useful for repair of photolithography masks in a dual beam system.
摘要翻译：带电粒子束（306）系统使用离子发生器（302）在工件（307）上进行电荷中和。次级或后向散射的颗粒（320）进入离子发生器（302）的室（310），以将离子产生气体离子化。在一些实施例中，离子发生器被配置为在离子发生器中保持足够的气体压力以产生离子，而在真空室（308）的其余部分中减小压力，使得另一个柱可以同时在腔室中操作在疏散过程之后比从离子发生器所需的全部压力排空室所需的工艺要短得多。本发明对于双光束系统中的光刻掩模的修复特别有用。

2. 发明授权

EP1540692B1 PARTICLE-OPTICAL DEVICE AND DETECTION MEANS 有权
标题翻译：一个粒子检测装置和检测手段
公开(公告)号：EP1540692B1
公开(公告)日：2013-11-06
申请号：EP03759297.9
申请日：2003-09-18
申请人： FEI COMPANY
发明人： SCHOLTZ, Jacob, Johannes , KNOWLES, William, Ralph , THIEL, Bradley, Lamar , VAN VEEN, Gerardus , SCHROEMGES, Rene, Peter, Marie
IPC分类号： H01J37/244 , H01J37/26 , H01J37/00
CPC分类号： H01J37/26 , H01J37/244 , H01J2237/0045 , H01J2237/2448 , H01J2237/2605

3. 发明授权

EP1577927B1 Charged particle beam system 无效
标题翻译：带电粒子束系统
公开(公告)号：EP1577927B1
公开(公告)日：2011-05-25
申请号：EP05075600.6
申请日：2005-03-11
申请人： FEI COMPANY
发明人： Stewart, Diane K. , Knowles, Ralph W , Kimball, Brian T
IPC分类号： H01J37/28 , H01J37/317 , H01J37/02
CPC分类号： G01N23/225 , H01J37/244 , H01J2237/0045 , H01J2237/2817 , H01J2237/31737 , H01J2237/31742 , H01J2237/31798

4. 发明授权

EP0819314B1 PROCEDE ET DISPOSITIF POUR LE CONTROLE DE L'ENERGIE DE L'UNE AU MOINS DES ESPECES CHARGEES BOMBARDANT UN CORPS PLONGE DANS UN PLASMA 失效
标题翻译：方法和装置的功率控制至少一个在货物承运地点对血浆二手BODY BOMB
公开(公告)号：EP0819314B1
公开(公告)日：2001-08-22
申请号：EP96912076.5
申请日：1996-04-05
申请人： CENTRE NATIONAL DE LA RECHERCHE SCIENTIFIQUE
发明人： PELLETIER, Jacques, H. , LAGARDE, Thierry, L. , ARNAL, Yves, A. , BURKE, Rudolf, R. , COCAGNE, Jacques, R. , DEVINE, Roderick, A.
IPC分类号： H01J37/32
CPC分类号： H01J37/32623 , H01J37/32688 , H01J37/32706 , H01J2237/0045

5. 发明公开

EP0637834A1 Ion implanting apparatus and ion implanting method 失效
标题翻译： Gerätund Verfahren zur Ionenimplantierung。
公开(公告)号：EP0637834A1
公开(公告)日：1995-02-08
申请号：EP94112218.6
申请日：1994-08-04
申请人： CANON KABUSHIKI KAISHA
发明人： Hashimoto, Hiroyuki, c/o Canon Kabushiki Kaisha
IPC分类号： H01J37/02 , H01J37/317
CPC分类号： H01J37/026 , H01J37/3171 , H01J2237/0045
摘要： An ion implanting apparatus for irradiating a material, for example, a semiconductor wafer, with an ion beam generated at an ion source, for implanting the ion into the material, is provided with a magnet at a side of the material opposite to a side into which the ion is irradiated. Thereby, the implantation is performed without charging thereon and with a high yielding ratio.
摘要翻译：一种离子注入装置，用于在离子源处产生的离子束照射材料例如半导体晶片，用于将离子注入到材料中，在该材料的与侧面相反的一侧设置有磁体离子被照射。由此，在不对其进行充电的情况下以高的屈服比进行注入。

6. 发明公开

EP2372743A3 Charged particle beam system with an ion generator 有权
标题翻译：用离子发生器粒子束系统
公开(公告)号：EP2372743A3
公开(公告)日：2014-05-14
申请号：EP11172096.7
申请日：2003-09-18
申请人： FEI Company
发明人： Stewart, Diane , Knowles, Ralph , Kimball, Brian
IPC分类号： H01J37/00 , H01J37/244 , H01J37/26
CPC分类号： H01J37/26 , H01J37/244 , H01J2237/0045 , H01J2237/2448 , H01J2237/2605
摘要： A charged particle beam (306) system uses an ion generator (302) for charge neutralization on a work piece (307). Secondary or backscattered particles (320) enter a chamber (310) of the ion generator (302) to ionize an ion producing gas there. In some embodiments, the ion generator is configured to maintain an adequate gas pressure in the ion generator to generate ions, but a reduced pressure in the remainder of the vacuum chamber (308), so that another column can operate in the chamber either simultaneously or after an evacuation process that is much shorter than a process that would be required to evacuate the chamber from the full pressure required at the ion generator. The invention is particularly useful for repair of photolithography masks in a dual beam system.

7. 发明公开

EP1540693A4 CHARGED PARTICLE BEAM SYSTEM 审中-公开
标题翻译：系统带电粒子
公开(公告)号：EP1540693A4
公开(公告)日：2010-06-09
申请号：EP03797915
申请日：2003-09-18
申请人： FEI CO
发明人： STEWART DIANE K , KNOWLES RALPH W , KIMBALL BRIAN T
IPC分类号： H01J37/244 , G01N23/00 , G01Q30/20 , G01Q70/10 , H01J20060101 , H01J37/00 , H01J37/28
CPC分类号： H01J37/26 , H01J37/244 , H01J2237/0045 , H01J2237/2448 , H01J2237/2605

8. 发明公开

EP1577927A3 Charged particle beam system 无效
标题翻译：带电粒子束系统
公开(公告)号：EP1577927A3
公开(公告)日：2008-11-26
申请号：EP05075600.6
申请日：2005-03-11
申请人： FEI COMPANY
发明人： Stewart, Diane K. , Knowles, Ralph W , Kimball, Brian T
IPC分类号： H01J37/28 , H01J37/317 , H01J37/02
CPC分类号： G01N23/225 , H01J37/244 , H01J2237/0045 , H01J2237/2817 , H01J2237/31737 , H01J2237/31742 , H01J2237/31798
摘要： A charged particle beam system uses an ion generator for secondary particle detection and charge neutralization. In some embodiments, the ion generator is configured to maintain an adequate gas pressure at the ion generator to generate ions, but a reduced pressure in the remainder of the vacuum chamber, so that another column can operate in the chamber either simultaneously or after an evacuation process that is much shorter than a process that would be required to evacuate the chamber from the full pressure required at the ion generator. The invention is particularly useful for repair of photolithography masks in a dual beam system.
摘要翻译：带电粒子束系统使用离子发生器进行二次粒子检测和电荷中和。在一些实施例中，离子发生器被配置为在离子发生器处维持足够的气体压力以产生离子，但是在真空室的其余部分中减压，使得另一个塔可以同时或在排空之后在腔室中操作该过程比离子发生器所需的全压抽真空所需的过程短得多。本发明对于修复双光束系统中的光刻掩模特别有用。

9. 发明公开

EP1585166A2 Controlled charge neutralization of Ion-implanted articles 审中-公开
标题翻译： Kontrollierte中和统计学家Aufladung von Artikelnwährend离子植入
公开(公告)号：EP1585166A2
公开(公告)日：2005-10-12
申请号：EP05252111.9
申请日：2005-04-04
申请人： BURLE TECHNOLOGIES, INC.
发明人： Starcher, Ronald
IPC分类号： H01J37/317 , H01J37/02
CPC分类号： H01J37/3171 , H01J37/026 , H01J2237/0045
摘要： A means of neutralizing the excess charge on workpieces, such as semiconductor wafers, that results from ion-implantation processes, wherein the excess positive charge on a small area of the workpiece surface is locally sensed, and in response, an appropriate dose of charge-compensating electrons is delivered from an electron emission source to the area of excess charge on the workpiece. A charge-sensing probe and a voltage-controlled electron generator array are configurationally and operatively coupled in a closed feedback loop, and are made to scan the surface of the workpiece, in close but non-contacting proximity to the workpiece. Arrays of charge-sensing probes and electron generator arrays can be configured for rapid coverage of the implanted areas of the workpiece. The present invention has significant advantages over other methods, such as plasma and electron showers and plasma flood systems, for neutralizing the excess charge due to ion implantation.
摘要翻译：一种中和离子注入工艺产生的工件（例如半导体晶片）上的过量电荷的方法，其中局部检测工件表面的小区域上的过量正电荷，并且作为响应，适当剂量的电荷 - 补偿电子从电子发射源输送到工件上的过量电荷区域。电荷感测探针和电压控制的电子发生器阵列在闭合反馈回路中构造和操作地耦合，并且被制造成以与工件接近但非接触的方式扫描工件的表面。电荷感测探针和电子发生器阵列的阵列可以被配置为快速覆盖工件的注入区域。本发明与诸如等离子体和电子淋浴和等离子体淹水系统的其它方法相比具有显着的优点，用于中和由于离子注入引起的过量电荷。

10. 发明公开

EP1577927A2 Charged particle beam system 无效
标题翻译： Ladungsträgerteilchenstrahlsystem
公开(公告)号：EP1577927A2
公开(公告)日：2005-09-21
申请号：EP05075600.6
申请日：2005-03-11
申请人： FEI COMPANY
发明人： Stewart, Diane K. , Knowles, Ralph W , Kimball, Brian T
IPC分类号： H01J37/28 , H01J37/317 , H01J37/02
CPC分类号： G01N23/225 , H01J37/244 , H01J2237/0045 , H01J2237/2817 , H01J2237/31737 , H01J2237/31742 , H01J2237/31798
摘要： A charged particle beam system uses an ion generator for secondary particle detection and charge neutralization. In some embodiments, the ion generator is configured to maintain an adequate gas pressure at the ion generator to generate ions, but a reduced pressure in the remainder of the vacuum chamber, so that another column can operate in the chamber either simultaneously or after an evacuation process that is much shorter than a process that would be required to evacuate the chamber from the full pressure required at the ion generator. The invention is particularly useful for repair of photolithography masks in a dual beam system.
摘要翻译：带电粒子束系统使用离子发生器进行二次粒子检测和电荷中和。在一些实施例中，离子发生器被配置为在离子发生器处保持足够的气体压力以在真空室的其余部分中产生离子而减小压力，使得另一个柱可以同时或在排空之后在腔室中操作该过程比从离子发生器所需的全部压力排空室所需的工艺要短得多。本发明对于双光束系统中的光刻掩模的修复特别有用。

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