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1. 发明公开

EP3224677A1 SPIEGEL, INSBESONDERE KOLLEKTORSPIEGEL FÜR MIKROLITHOGRAFIE 有权
标题翻译： SPIEGEL，INSBESONDERE KOLLEKTORSPIEGELFÜRMIKROLITHOGRAFIE
公开(公告)号：EP3224677A1
公开(公告)日：2017-10-04
申请号：EP15813278.7
申请日：2015-11-26
申请人： Carl Zeiss SMT GmbH
发明人： BAUER, Markus
IPC分类号： G03F7/20 , G02B5/09 , G02B19/00 , G21K1/06
CPC分类号： G02B19/0023 , G02B5/09 , G03F7/70033 , G03F7/70158 , G03F7/70175 , G03F7/70575 , G21K1/062 , G21K2201/064
摘要： The invention relates to a collector mirror for an EUV microlithography system, which collector mirror has an optical grating (12) having an optically active mirror surface (17), which reflects useful electromagnetic rays (23, 25, 35, 42, 43) of an EUV spectral range coming from a first focal point (F1) and focuses said useful electromagnetic rays at a second focal point (F2), wherein the first focal point and the second focal point (F2) lie on a side of the optical grating (12) facing the mirror surface (17) and define an optical axis (OA), wherein the optical grating (12) is designed, in interaction with an aperture (38) arranged at the second focal point (F2), to allow the useful rays (23, 25, 35, 42, 43) to pass through the aperture (38) and to block remaining electromagnetic rays (36, 47) of a remaining spectral region different from the EUV spectral region, wherein the optical grating (12) has a blazed grating consisting of a plurality of mirror facets (14), each of which has a facet surface (15), wherein the facet surfaces (15) form the mirror surface (17) of the blazed grating, wherein, in a section plane (16) that includes the optical axis (OA), the facet surfaces (15) are arranged on a plurality of imaginary elliptical shells (18a-j), which are offset from each other along the optical axis (OA) and the common mathematical focus points of which coincide with the first and the second focal points (F1, F2), wherein the mirror surface (17) extends along the imaginary elliptical shells (18a-j).
摘要翻译： EUV微光刻系统的收集镜。集光镜包括具有光学有效镜面的光栅，该光学有效镜面反射从第一焦点发出的EUV光谱范围中的电磁使用的光线并将它们聚焦到第二焦点上。第一和第二焦点位于光栅面向镜面的一侧并且限定光轴。光栅被配置为与布置在第二焦点处的光阑相互作用，以允许使用的光线穿过光阑并阻挡剩余光谱范围中不同于EUV光谱范围的电磁剩余光线。该光栅包括由多个镜面组成的闪耀光栅，每个镜面具有小面表面。小面表面形成闪耀光栅的镜面。

2. 发明授权

EP1555575B1 Lithographic apparatus and device manufacturing method 有权
公开(公告)号：EP1555575B1
公开(公告)日：2017-09-13
申请号：EP05075105.6
申请日：2005-01-14
申请人： ASML Netherlands B.V.
发明人： Moors, J.H.J. , Franken, J.C.L. , Mickan, Uwe , Voorma, Harm-Jan
IPC分类号： G03F7/20
CPC分类号： B82Y10/00 , G03F7/70166 , G03F7/70175 , G03F7/70891

3. 发明授权

EP2480936B1 SOURCE COLLECTOR APPARATUS, LITHOGRAPHIC APPARATUS AND DEVICE MANUFACTURING METHOD 有权
标题翻译： SOURCE集热装置，光刻设备和方法制造器件
公开(公告)号：EP2480936B1
公开(公告)日：2015-03-18
申请号：EP10762638.4
申请日：2010-09-24
申请人： ASML Netherlands BV , Cymer, Inc.
发明人： LOOPSTRA, Erik , BANINE, Vadim , SWINKELS, Gerardus , PEKELDER, Sven , LABETSKI, Dzmitry , STAMM, Uwe , PARTLO, William N.
IPC分类号： H05G2/00 , G03F7/20 , C01B3/50 , G21K1/06
CPC分类号： G03F7/70933 , G03F7/70033 , G03F7/70175 , G03F7/70808 , G03F7/70908 , G03F7/70916 , G03F7/70925 , H05G2/003 , H05G2/005

4. 发明公开

EP2181448A4 GAS MANAGEMENT SYSTEM FOR A LASER-PRODUCED-PLASMA EUV LIGHT SOURCE 有权转让
标题翻译：基于等离子体LASERERZEUGTEM气体处理系统用于EUV光源
公开(公告)号：EP2181448A4
公开(公告)日：2012-02-08
申请号：EP08795347
申请日：2008-08-15
申请人： CYMER INC
发明人： BYKANOV ALEXANDER N , ERSHOV ALEXANDER I , FOMENKOV IGOR V , BRANDT DAVID C
IPC分类号： G21G4/00
CPC分类号： H05G2/003 , G03F7/70033 , G03F7/70175 , G03F7/70916 , H05G2/005 , H05G2/008 , Y10S422/906
摘要： Devices and corresponding methods of use are described herein which may comprise an enclosing structure defining a closed loop flow path and a system generating a plasma at a plasma site, e.g. laser produced plasma system, where the plasma site may be in fluid communication with the flow path. For the device, a gas may be disposed in the enclosing structure which may include an ion-stopping buffer gas and/or an etchant. A pump may be provided to force the gas through the closed loop flow path. One or more heat exchangers removing heat from gas flowing in the flow path may be provided. In some arrangements, a filter may be used to remove at least a portion of a target species from gas flowing in the flow path.

5. 发明公开

EP1730763A4 EUV LIGHT SOURCE 有权
标题翻译： EUV光源
公开(公告)号：EP1730763A4
公开(公告)日：2010-08-11
申请号：EP05714037
申请日：2005-02-24
申请人： CYMER INC
发明人： PARTLO WILLIAM N , BOWERING NORBERT R , ERSHOV ALEXANDER I , FOMENKOV IGOR V , OLIVER I ROGER , VIATELLA JOHN , JACQUES ROBERT N
IPC分类号： H01J35/20 , G03F7/20 , G21K1/06 , H05G2/00
CPC分类号： G03F7/70033 , B82Y10/00 , G03F7/70175 , G03F7/70916 , G21K1/062 , G21K2201/061 , G21K2201/065 , G21K2201/067 , H05G2/003 , H05G2/005 , H05G2/006 , H05G2/008

6. 发明公开

EP2199857A1 Radiation source, lithographic apparatus and device manufacturing method 有权
标题翻译：辐射源，用于制造装置的光刻设备和方法
公开(公告)号：EP2199857A1
公开(公告)日：2010-06-23
申请号：EP09169802.7
申请日：2009-09-09
申请人： ASML Netherlands B.V.
发明人： Schimmel, Hendrikus , Banine, Vadim , Loopstra, Erik
IPC分类号： G03F7/20 , H05G2/00
CPC分类号： G03F7/70916 , G03F7/70033 , G03F7/70175 , H05G2/003
摘要： A radiation source for generation of extreme ultraviolet radiation or use in high resolution lithography includes a plasma formation site where fuel is contacted by a radiation beam to form a plasma (12) generating EUV radiation. A mirrored collector (10) collects and reflects the EUV radiation generated at a first focus towards a second focus (F2). A contamination barrier (20) is positioned such the periphery of the contamination barrier does not occlude more than 50% of the solid angle subtended by the mirror at the second focus, such that EUV radiation reflected by the collector mirror is not excessively attenuated by passing through the contamination barrier. The contamination barrier serves to trap fuel material such as ions, atoms, molecules or nanodroplets from the plasma to prevent their deposition onto the collector mirror where they reduce the mirror's effective lifetime. Gas extraction ports may be provided near the plasma formation site to suppress diffusion of fuel debris and contamination towards the collector mirror.
摘要翻译：用于产生极紫外辐射或用在高分辨率光刻的辐射源包括：等离子体形成部位，其中燃料是由辐射束接触而形成等离子体（12）产生EUV辐射。甲镜像集电极（10）收集并反映第一焦点朝向第二焦点（F2）所产生的EUV辐射。甲污染的屏障（20）被定位寻求污染屏障不阻塞在第二焦点被反射镜所对的立体角的50％以上的外周，谋求确实由所述收集器反射镜反射的EUV辐射不被过度通过使衰减通过污染的屏障。污染阻隔起到陷阱燃料材料：诸如来自等离子体的离子，原子，分子或纳米液滴以防止它们沉积到收集器反射镜，他们减少反射镜的有效寿命。气体抽取口可在等离子体形成部位以抑制朝向收集器反射镜燃料碎片和污染物的扩散附近设置。

8. 发明公开

EP2154574A2 Radiation sources and methods of generating radiation 有权
标题翻译： Strahlungsquelle und Verfahren zur Strahlungserzeugung
公开(公告)号：EP2154574A2
公开(公告)日：2010-02-17
申请号：EP09165403.8
申请日：2009-07-14
申请人： ASML Netherlands BV
发明人： Loopstra, Erik , Schimmel, Hendrikus
IPC分类号： G03F7/20 , H05G2/00
CPC分类号： G03F7/70175 , G03F7/70033 , G21K1/06 , G21K2201/064 , G21K2201/067 , H05G2/003 , H05G2/005 , H05G2/006 , H05G2/008
摘要： A radiation source is configured to generate radiation. The radiation source includes a fuel droplet generator (6) constructed and arranged to generate a stream of droplets of fuel (34) that are directed to a plasma generation site (32); a laser constructed and arranged to generate a laser beam (4) that is directed to the plasma generation site, an angle between the direction of movement of the stream of droplets and the direction of the laser beam being less than about 90°; and a collector (8) constructed and arranged to collect radiation generated by a plasma formed at the plasma formation site when the beam of radiation and a droplet collide. The collector is configured to reflect the radiation substantially along an optical axis of the radiation source. The laser beam is directed to the plasma generation site through an aperture provided in the collector.
摘要翻译：辐射源被配置成产生辐射。辐射源包括燃料液滴发生器（6），燃料液滴发生器（6）被构造和布置成产生引导到等离子体产生位置（32）的燃料流（34）流; 构造和布置成产生被引导到等离子体产生位置的激光束（4）的激光器，液滴流的移动方向与激光束的方向之间的角度小于约90°; 以及收集器（8），其被构造和布置成当辐射束和液滴碰撞时收集由等离子体形成部位形成的等离子体产生的辐射。收集器被配置为基本上沿辐射源的光轴反射辐射。激光束通过设置在收集器中的孔引导到等离子体产生位置。

9. 发明公开

EP2034490A1 High efficiency collector for laser plasma EUV source 审中-公开
标题翻译：激光等离子体激光等离子体激光器
公开(公告)号：EP2034490A1
公开(公告)日：2009-03-11
申请号：EP08020476.1
申请日：2003-11-20
申请人： University of Central Florida Foundation, Inc.
发明人： Arenberg, Jonathan W.
IPC分类号： G21K1/06 , G03F7/20 , H05G2/00 , G02B5/09 , F21V7/04
CPC分类号： B82Y10/00 , G03F7/70033 , G03F7/70175
摘要： Collector optics (70) for an EUV radiation source (10) for collecting EUV radiation (78). The collector optics (70) includes an elliptical dish reflector (72) where light generated at a focal point (76) of the reflector (72) is collected by the reflector (72) and is directed to a collection location (82). A frustal annular reflector (90) is positioned around an outer edge (84) of the dish reflector (72) to collect more of the EUV radiation (78) that may otherwise be lost. The radiation (78) reflected by the annular reflector (90) is directed to a center axicon reflector (94) positioned between the focal point (76) of the dish reflector (72) and the collection location (82) to redirect the radiation (78) reflected by the annular reflector (90) to be within a predetermined collection angle.
摘要翻译：用于收集EUV辐射的EUV辐射源（10）的收集器光学器件（70）（78）。收集器光学器件（70）包括椭圆形的餐具反射器（72），其中在反射器（72）的焦点（76）处产生的光由反射器（72）收集并被引导到收集位置（82）。锥形环形反射器（90）围绕盘反射器（72）的外边缘（84）定位，以收集更多的否则可能丢失的EUV辐射（78）。由环形反射器（90）反射的辐射（78）被引导到位于盘反射器（72）的焦点（76）和收集位置（82）之间的中心旋转三棱镜反射器（94），以重定向辐射 78）由环形反射器（90）反射到预定的收集角度内。

10. 发明公开

EP2005252A1 DISPOSITIF DE COLLECTE DE FLUX DE RAYONNEMENT ELECTROMAGNETIQUE DANS L'EXTREME ULTRAVIOLET 有权
标题翻译：用于收集溪无线电波在极端紫外线范围
公开(公告)号：EP2005252A1
公开(公告)日：2008-12-24
申请号：EP07731249.4
申请日：2007-04-04
申请人： SAGEM Défense Sécurité
发明人： GEYL, Roland , PATOZ, Vincent , RIGUET, François , DUFRESNE DE VIREL, François
IPC分类号： G03F7/20
CPC分类号： G03F7/70175
摘要： Device for collecting a flux of electromagnetic radiation in the extreme ultraviolet (EUV) emitted by a source (S), comprising a main, first collector stage (E1), with a concave collector mirror (2) placed in front of the source (S) at a distance of greater than 250 mm and pierced by a central hole (3) and a convex mirror (4) placed behind the concave mirror level with the source and pierced by a central hole (5), and at least a second collector stage (E2) with a concave collector mirror (7) placed in front of the stage (E1) and pierced by a central hole (8) and a convex mirror (9) placed behind the concave mirror.

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