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1. 发明授权

EP3086174B1 METHOD FOR PREPARING HALFTONE PHASE SHIFT PHOTOMASK BLANK 有权
标题翻译：一种制备半色调相移光刻空白的方法
公开(公告)号：EP3086174B1
公开(公告)日：2017-11-15
申请号：EP16160126.5
申请日：2016-03-14
申请人： Shin-Etsu Chemical Co., Ltd.
发明人： KOSAKA, Takuro , INAZUKI, Yukio
IPC分类号： G03F1/28 , G03F1/32
CPC分类号： G03F1/32 , G03F1/28 , G03F1/68

2. 发明公开

EP3196698A1 HALFTONE PHASE SHIFT PHOTOMASK BLANK AND MAKING METHOD 有权
标题翻译：半色调相移照相空白及制作方法
公开(公告)号：EP3196698A1
公开(公告)日：2017-07-26
申请号：EP17150778.3
申请日：2017-01-10
申请人： Shin-Etsu Chemical Co., Ltd.
发明人： KOSAKA, Takuro , INAZUKI, Yukio , KANEKO, Hideo
IPC分类号： G03F1/32 , G03F1/68
CPC分类号： G03F1/32 , G03F1/68
摘要： A halftone phase shift film is formed on a transparent substrate by reactive sputtering using a silicon target, an inert gas, and a nitrogen-containing reactive gas. A hysteresis curve is drawn by sweeping the flow rate of the reactive gas, and plotting the sputtering voltage or current during the sweep versus the flow rate of the reactive gas. In a transition mode sputtering step of sputtering in a region corresponding to a range from more than the lower limit of reactive gas flow rate providing the hysteresis to less than the upper limit, the target power, the inert gas flow rate and/or the reactive gas flow rate is increased or decreased continuously or stepwise.
摘要翻译：通过使用硅靶，惰性气体和含氮反应气体的反应性溅射在透明基板上形成半色调相移膜。通过扫描反应气体的流速绘制滞后曲线，并绘制扫描期间的溅射电压或电流与反应气体的流速的关系曲线。在对应于从大于提供滞后的反应气体流量的下限的范围到小于上限的范围的区域中的溅射的过渡模式溅射步骤中，目标功率，惰性气体流量和/或反应性气体流量连续或逐步增加或减少。

3. 发明公开

EP3086174A1 METHOD FOR PREPARING HALFTONE PHASE SHIFT PHOTOMASK BLANK 有权
标题翻译： VERFAHREN ZUR HERSTELLUNG VON HALBTONPHASENVERSCHIEBER-FOTOMASKENROHLINGEN
公开(公告)号：EP3086174A1
公开(公告)日：2016-10-26
申请号：EP16160126.5
申请日：2016-03-14
申请人： Shin-Etsu Chemical Co., Ltd.
发明人： KOSAKA, Takuro , INAZUKI, Yukio
IPC分类号： G03F1/28 , G03F1/32
CPC分类号： G03F1/32 , G03F1/28 , G03F1/68
摘要： A halftone phase shift film containing Si and N and/or O is deposited on a transparent substrate by reactive sputtering of a Si-containing target with a reactive gas containing N and/or O. One layer is sputter deposited while the reactive gas flow rate is set equal to or lower than the lower limit of the reactive gas flow rate in the hysteresis region, and another layer is sputter deposited while the reactive gas flow rate is set inside the lower and upper limits of the reactive gas flow rate in the hysteresis region. The phase shift film exhibits satisfactory in-plane uniformity of optical properties.
摘要翻译：含有Si和N和/或O的半色调相移膜通过含有Si的靶与含有N和/或O的反应性气体的反应溅射沉积在透明衬底上。一层溅射沉积，而反应气体流速被设定为等于或低于滞后区域中的反应气体流量的下限，并且另外的层被溅射沉积，同时反应气体流量设定在迟滞中的反应气体流量的下限和上限内地区。相移膜表现出令人满意的光学性能的面内均匀性。

4. 发明授权

EP1860499B1 Verfahren zum Herstellen einer Druckform 失效
标题翻译：一种用于生产印刷形式的方法，
公开(公告)号：EP1860499B1
公开(公告)日：2015-02-11
申请号：EP07014526.3
申请日：1997-11-03
申请人： SPGPrints B.V.
发明人： Rückl, Siegfried
IPC分类号： G03F7/20 , G03F7/095 , G03F7/12
CPC分类号： G03F7/12 , G03F1/68 , G03F7/0952 , G03F7/202 , Y10S430/128

5. 发明公开

EP2824511A1 The use of surfactants having at least three short-chain perfluorinated groups in formulations for photo mask cleaning 审中-公开
标题翻译：在制剂中用于清洁光掩模使用具有至少三个短链全氟化基团的表面活性剂的
公开(公告)号：EP2824511A1
公开(公告)日：2015-01-14
申请号：EP13176102.5
申请日：2013-07-11
申请人： BASF SE
发明人： Klipp, Andreas, Dr. , Honcluc, Andrei, Dr. , Yang, Chu-Ya
IPC分类号： G03F1/68 , G03F1/82
CPC分类号： G03F1/82 , C11D1/004 , G03F1/22 , G03F1/24 , G03F1/68 , G03F7/20 , G03F7/32
摘要： The use of surfactants A, a 1% by weight, aqueous solutions of which exhibit a static surface tension
摘要翻译：使用表面活性剂A，由1重量％，米其表现出的wässrige解决方案的静态表面张力<25个MN /时，所说的表面活性选自含至少三个短链全氟化基团RF由......组成三氟甲基，五氟乙基，1-七氟丙基，2-七氟丙基，和五氟硫烷基为清洁具有用于制造半导体衬底，通过使用掩模的清洁溶液包含表面活性剂甲纳米包括具有低于60最小线间距尺寸的图案的图案的光掩模。增加的颗粒去除效率，更宽的工艺窗口物理治疗力，无雾的缺陷，无水纹，无CD损失进行观察。

6. 发明公开

EP1903390A3 Mask data generation program, mask data generation method, mask fabrication method, exposure method, and device manufacturing method 审中-公开
标题翻译：屏蔽数据生成程序，屏蔽数据生成方法中，掩模制造方法，曝光方法，以及用于制备所述设备
公开(公告)号：EP1903390A3
公开(公告)日：2013-03-13
申请号：EP07018091.4
申请日：2007-09-14
申请人： CANON KABUSHIKI KAISHA
发明人： Yamazoe, Kenji
IPC分类号： G03F7/20
CPC分类号： G03F7/70466 , G03F1/68 , G03F7/70425
摘要： A mask data generation program (47) causes the computer (1) to execute: Fourier-Transforming a function indicating an effective light source to generate a coherent map (42) expressing a coherence distribution on the object plane of the projection optical system (140), on which the mask (130) is arranged; specifying a reference vector from the origin of the coherent map to a region where the coherence is less than a reference value; selecting one element from a pattern including a plurality of elements, and removing, from the pattern, an element existing at a position matching the terminal point of the reference vector arranged such that the center of the selected element serves as the starting point, to generate data of a first pattern different from the pattern; and generating data of a second pattern including the element removed in generating the data of the first pattern.

7. 发明公开

EP2437120A2 An inkjet printable flexography substrate and method of using 审中-公开
标题翻译： Mittels Tintenstrahldruck bedruckbares Flexodrucksubstrat和Verwendungsverfahren
公开(公告)号：EP2437120A2
公开(公告)日：2012-04-04
申请号：EP11005783.3
申请日：2011-07-12
申请人： Chemence, Inc.
发明人： Battisti, Peter D. , Rach, Joseph F. , Maneira, John P.
IPC分类号： G03F7/20
CPC分类号： G03F7/2018 , B41M2205/14 , G03F1/68 , G03F7/2032
摘要： A flexography substrate for making I-plates with liquid photopolymers has, in addition to the tie-coat applied to one side to hold the photopolymers in place on the substrate, a micro-porous coating applied to the other side, enabling a masking image to be applied to it using an inkjet printer. In this way, one single sheet of film performs the dual role of substrate and I-plate masking film. By eliminating a sheet of film, the invention provides cost, quality, and environmental benefits.
摘要翻译：用于制备具有液体光聚合物的I板的柔性版印刷基板除了施加到一侧以将光聚合物保持在基板上的适当位置之外，还具有施加到另一侧的微孔涂层，使得能够将掩模图像使用喷墨打印机应用于它。以这种方式，一片薄膜执行基板和I板掩模膜的双重作用。通过消除薄膜，本发明提供了成本，质量和环境方面的优点。

8. 发明公开

EP2416217A1 MEMBER FOR MASKING FILM, PROCESS FOR PRODUCING MASKING FILM USING SAME, AND PROCESS FOR PRODUCING PHOTOSENSITIVE RESIN PRINTING PLATE 有权
标题翻译： ELEMENT FOR A的屏蔽薄膜，用于生产掩膜用这一点，一种用于生产感光树脂压盘
公开(公告)号：EP2416217A1
公开(公告)日：2012-02-08
申请号：EP10758856.8
申请日：2010-03-25
申请人： LINTEC Corporation
发明人： IKEDA, Takeshi , TSUTSUI, Toshihiro , MITSUHASHI, Masafumi
IPC分类号： G03F1/00 , G03F7/00
CPC分类号： G03F7/202 , G03F1/68 , G03F7/20
摘要： A member for masking films which includes a base film transparent to ultraviolet rays and, on one surface thereof, an ultraviolet-shielding resin layer capable of being removed by irradiation with laser light beams and haivng an average thickness of 0.1 to 30 µm, wherein the ultraviolet-shielding resin layer is a multilayer structure composed of two or more layers including a resin layer (A) having a high carbon black content and a resin layer (B) having a low carbon black content, the layer (A) and the layer (B) being located on the base-film side and on the printing-plate side of ultraviolet-shielding resin layer, respectively, and the ultraviolet-shielding resin layer has specific optical properties. This member for masking films has the following features: the accurate and precise removal of the ultraviolet-shielding resin layer using a low-energy laser beam gives areas with uniform light transmittance; the ultraviolet-shielding resin is resistant to scratches; and positioning is easy, and when making close contact with a plate, air trapping is less likely to occur so that the entire surface easily comes into close contact with a printing material.
摘要翻译：一种用于掩蔽膜部件，其包括基膜，透明的紫外线，并且在其一个表面上，以紫外线屏蔽能够通过用激光束和haivng到的0.1〜30微米的平均厚度照射而除去树脂层，worin的紫外线屏蔽性树脂层是两层或更多层包括具有高炭黑含量的树脂层（A）和具有低炭黑含量，层（A）的树脂层（B）构成的多层结构，并且该层（B）位于所述基膜侧和上分别紫外线屏蔽树脂层，印刷板侧，紫外线屏蔽性树脂层具有特定的光学特性。此构件用于掩蔽膜具有以下特征：所述准确和精确的去除使用低能量的激光束得到具有均匀的光透射率区域中的紫外线屏蔽性树脂层的; 紫外线屏蔽树脂是耐划痕; 和定位是容易的，并与制版紧密接触时，空气滞留是不太可能发生这样做的整个表面容易与印刷材料紧密接触。

9. 发明公开

EP2321840A2 METHOD FOR OPTICAL PROXIMITY CORRECTION, DESIGN AND MANUFACTURING OF A RETICLE USING VARIABLE SHAPED BEAM LITHOGRAPHY 有权
标题翻译：方法校正光学邻近效应，设计和分划板制造用不同形状的束光刻
公开(公告)号：EP2321840A2
公开(公告)日：2011-05-18
申请号：EP09810441.7
申请日：2009-08-10
申请人： D2S, Inc.
发明人： FUJIMURA, Akira , GLASSER, Lance
IPC分类号： H01L21/027 , G03F7/20
CPC分类号： B82Y40/00 , B82Y10/00 , G03F1/36 , G03F1/68 , G03F1/78 , H01J37/3174
摘要： The present invention describes a method for using variable shaped beam (VSB) shots to form a desired pattern on a surface, where the union of the plurality of VSB shots deviates from the desired pattern. Additionally, the VSB shots are allowed to overlap each other, and the dosages of the shots are allowed to vary. Similar methods are disclosed for optical proximity correction (OPC), fracturing, mask data preparation, and proximity effect correction. A method for creating glyphs is also disclosed, in which patterns that would result on a surface from one or a group of VSB shots are pre-calculated. In some embodiments, an optimization technique may be used to minimize shot count. The method of the present disclosure may be used, for example, in the process of manufacturing an integrated circuit by optical lithography using a reticle, or in the process of manufacturing an integrated circuit using direct write.
摘要翻译：本发明描述用于使用可变成形波束（VSB）发射，以形成表面，其中，VSB发射的多个联合与期望图案上叉开所希望的图案的方法。另外，所述VSB发射被允许重叠海誓山盟，和镜头的剂量被允许改变。类似的方法是光盘为游离缺失光学邻近校正（OPC），压裂，掩模数据准备和邻近效应校正。一种用于创建图示符gibt游离缺失盘，其中图案做将导致从一个表面或一组VSB发射的上方法是预先计算的。在一些实施例中，在优化技术可以被用来最小化发射次数。可以使用掩模版可以使用本公开的方法中，例如，在制造集成电路的过程中通过光学光刻，或者在制造使用直接写入集成电路的过程。

10. 发明公开

EP2321839A2 METHOD FOR DESIGN AND MANUFACTURE OF A RETICLE USING VARIABLE SHAPED BEAM LITHOGRAPHY 审中-公开
标题翻译：方法设计和生产螺纹CROSS用不同形状的束光刻
公开(公告)号：EP2321839A2
公开(公告)日：2011-05-18
申请号：EP09810459.9
申请日：2009-08-18
申请人： D2S, Inc.
发明人： FUJIMURA, Akira , TUCKER, Michael
IPC分类号： H01L21/027 , G03F7/00 , G03F7/20
CPC分类号： H01J37/3174 , B82Y10/00 , B82Y40/00 , G03F1/68 , G03F1/78 , Y10S430/143
摘要： A method is disclosed for using non-overlapping variable shaped beam (VSB) shots in the design and manufacture of a reticle, where the union of the plurality of shots deviates from the desired pattern. Methods are described for fracturing or mask data preparation or proximity effect correction of a desired pattern to be formed on a reticle; for forming a pattern on a reticle using charged particle beam lithography; and for optical proximity correction (OPC) of a desired pattern. Dosages of the shots may be allowed to vary with respect to each other. The plurality of shots may be determined such that a pattern on the surface calculated from the plurality of shots is within a predetermined tolerance of the desired pattern. In some embodiments, an optimization technique may be used to minimize shot count.
摘要翻译：一种方法是游离缺失盘用于在光罩，其中拍摄的多个联合与期望图案的叉开的设计和制造使用非重叠的可变形束（VSB）发射。方法被描述用于向期望形成在标线片的图案的压裂或掩模数据准备或邻近效应校正的; 用于形成上使用带电粒子束光刻的标线片的图案; 和用于所希望的图案的光学邻近校正（OPC）。的镜头的剂量可以被允许相对于海誓山盟变化。拍摄主体的多元化可能是确定的开采搜索的确从拍摄的多个计算的表面上的图案是期望图案的预定公差范围内。在一些实施例中，在优化技术可以被用来最小化发射次数。

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