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1. 发明公开

EP3332281A1 SUBMICRON WAFER ALIGNMENT 审中-公开
公开(公告)号：EP3332281A1
公开(公告)日：2018-06-13
申请号：EP16734149.4
申请日：2016-06-23
申请人： Qualcomm Incorporated
发明人： GEORGIEV, Todor Georgiev
IPC分类号： G02B13/00 , G01M11/02 , G02B27/32 , G02B27/62
CPC分类号： G02B13/0085 , B32B7/005 , B32B2307/412 , B32B2551/00 , B32B2559/00 , G01B11/14 , G02B7/003 , G02B27/1073 , G02B27/144 , G02B27/32 , G02B27/62 , H01L27/14625 , H01L27/14632
摘要： Certain aspects relate to systems and techniques for submicron alignment in wafer optics. One disclosed method of alignment between wafers to produce an integrated lens stack employs a beam splitter (that is, a 50% transparent mirror) that reflects the alignment mark of the top wafer when the microscope objective is focused on the alignment mark of the bottom wafer. Another disclosed method of alignment between wafers to produce an integrated lens stack implements complementary patterns that can produce a Moiré effect when misaligned in order to aid in visually determining proper alignment between the wafers. In some embodiments, the methods can be combined to increase precision.

2. 发明公开

EP3278303A1 ELEVATION ANGLE ESTIMATING DEVICE AND METHOD FOR USER TERMINAL PLACEMENT 有权转让
公开(公告)号：EP3278303A1
公开(公告)日：2018-02-07
申请号：EP16774110.7
申请日：2016-03-30
申请人： Worldvu Satellites Limited
发明人： NI, Melvin, S.
IPC分类号： G06T7/40
CPC分类号： G01B11/26 , G01C1/00 , G01C15/002 , G02B17/08 , G02B27/32
摘要： A device and method for estimating the elevation angle of one or more objects surrounding a user terminal include a convex image-reflecting surface, a transparent sighting surface disposed above the convex image-reflecting surface, and an elevation limit marking formed on or in the sighting surface. The elevation limit marking generates a reflected image in the convex image-reflecting surface that defines an elevation angle above a horizon of the earth that the one or more objects in a field of view of the convex image-reflecting surface must remain below so that the user terminal has an unobstructed view of the sky in all azimuthal directions.

3. 发明授权

EP3006985B1 OPTICAL SIGHT 失效
标题翻译：光学视点
公开(公告)号：EP3006985B1
公开(公告)日：2017-11-22
申请号：EP14807953.6
申请日：2014-04-01
申请人： RusOpticalSystem Ltd.
发明人： BLAGOV, Pavel Andreevich , TSIVILEV, Evgeny Viktorovich
IPC分类号： G02B23/10 , F41G1/38 , G02B23/02 , G02B27/32
CPC分类号： F41G1/38 , G02B17/08 , G02B23/02 , G02B23/10 , G02B27/32
摘要： The invention relates to optical instrumentation, and specifically to optical sights used in the firing of firearms. The technical result, which the claimed invention is intended to achieve, is a simpler design while maintaining functional capabilities and, correspondingly, increased reliability and a decreased cost of the product overall. Said technical result is achieved in that the optical sight includes a common eyepiece, and two optical channels which are arranged in parallel and which have different magnifications, each of which contains, arranged along the path of light, a lens, mesh and a relay system; the common eyepiece is provided on the axis of the lower-magnification channel, the lenses of both channels have equal focal lengths, the mesh is provided in the common focal plane of the channels, and the higher-magnification channel is additionally provided with an optical element which is positioned in front of the focal field and which is capable of shifting the axis of the higher-magnification optical channel.

4. 发明公开

EP3238446A1 3D IMAGE CAPTURE APPARATUS WITH COVER WINDOW FIDUCIALS FOR CALIBRATION 审中-公开
标题翻译：用于校准的具有遮盖窗口功能的3D图像捕获设备
公开(公告)号：EP3238446A1
公开(公告)日：2017-11-01
申请号：EP15874127.2
申请日：2015-12-14
申请人： 3M Innovative Properties Company
发明人： STEGALL, David B. , KRYZHNIY, Vladimir V. , HANSEN, Eric S. , EID, Aya , SCOTT, Shannon D. , YUN, Zhisheng , GRAHAM, James L. II
IPC分类号： H04N13/02 , H04N13/00
CPC分类号： H04N13/257 , A61B1/00057 , A61B1/00096 , A61B1/00172 , A61B1/00177 , A61B1/24 , A61C9/0053 , G02B27/0075 , G02B27/32 , G03B17/17 , H04N5/2252 , H04N5/2253 , H04N5/2256 , H04N13/236 , H04N13/246 , H04N17/002
摘要： A 3D imaging apparatus with enhanced depth of field to obtain electronic images of an object for use in generating a 3D digital model of the object. The apparatus includes a housing having mirrors positioned to receive an image from an object external to the housing and provide the image to an image sensor. The optical path between the object and the image sensor includes an aperture element having apertures for providing the image along multiple optical channels with a lens positioned within each of the optical channels. The apparatus also includes a transparent cover positioned within the optical path and having a plurality of fiducials. The depth of field of the apparatus includes the cover, allowing the fiducials to be used to calibrate the apparatus or verify and correct the existing calibration of it.
摘要翻译：一种具有增强景深的3D成像设备，用于获得用于生成物体的3D数字模型的物体的电子图像。该设备包括具有反射镜的外壳，该反射镜被定位成接收来自外壳外部的物体的图像并将该图像提供给图像传感器。物体与图像传感器之间的光路包括孔径元件，孔径元件具有用于沿着多个光学通道提供图像的孔径，透镜位于每个光学通道内。该设备还包括位于光路内并具有多个基准点的透明盖。装置的景深包括盖，允许基准点用于校准装置或验证并校正其现有校准。

5. 发明公开

EP3099513A1 COMPOSANT OPTIQUE DE SECURITE A EFFET PLASMONIQUE, FABRICATION D'UN TEL COMPOSANT ET DOCUMENT SECURISÉ EQUIPÉ D'UN TEL COMPOSANT 有权
标题翻译：电浆光学安全装置，制造这样的一个组成部分，这样的分量EQUIPPED安全文档
公开(公告)号：EP3099513A1
公开(公告)日：2016-12-07
申请号：EP14830963.6
申请日：2014-12-24
申请人： SURYS
发明人： SAUVAGE-VINCENT, Jean
IPC分类号： B42D15/00 , G02B5/00 , G02B5/18 , G02B5/20 , G02B27/32
CPC分类号： G02B5/008 , B42D25/324 , B42D25/351 , B42D25/373 , B42D25/45 , G02B5/1809 , G02B5/204 , G02B27/32
摘要： The invention relates to a plasmonic optical security component comprising two layers (2, 4) made of transparent dielectric material and a metal layer (3) arranged between said transparent dielectric material layers in order to form two dielectric-metal interfaces (31, 32). The metal layer is structured to form, on a first coupling region, a first periodic, two-dimensional coupling array (C
1 ) which is capable of coupling surface plasmon modes, which are supported by said dielectric-metal interfaces, to an incident light ray, the first coupling array having a profile which does not have point symmetry in any of the directions thereof, and, on a second coupling region, a second periodic, two-dimensional coupling array (C
2 ) which is capable of coupling surface plasmon modes, which are supported by said dielectric-metal interfaces, to an incident light ray, the second coupling array having a profile which does not have point symmetry in any of the directions thereof and is different from that of the first coupling array.

6. 发明公开

EP2439575A4 IMMERSION LENS HOLDING DEVICE 有权
标题翻译：用于浸渍生产线的夹持装置
公开(公告)号：EP2439575A4
公开(公告)日：2012-10-31
申请号：EP10783336
申请日：2010-05-28
申请人： HAMAMATSU PHOTONICS KK
发明人： ARATA IKUO , TERADA HIROTOSHI , ISHIZUKA TOSHIMICHI
IPC分类号： G02B21/00 , G02B7/02 , G02B7/14 , G02B27/32
CPC分类号： G02B21/33 , G02B7/16 , G02B21/248 , G02B27/32

7. 发明公开

EP2232307A1 SYSTEME DE POINTAGE D'UN LASER 有权
标题翻译：激光表演系统
公开(公告)号：EP2232307A1
公开(公告)日：2010-09-29
申请号：EP08862886.2
申请日：2008-12-05
申请人： THALES
发明人： DOITTAU, François-Xavier , POCHOLLE, Jean-Paul
IPC分类号： G02B5/08 , G02B23/14
CPC分类号： G02B5/08 , G01S7/4811 , G02B23/14 , G02B27/1006 , G02B27/1093 , G02B27/143 , G02B27/148 , G02B27/32
摘要： The invention relates to a laser-beam pointing system characterised in that it comprises: at least one treatment laser source (S1) for emitting a treatment laser beam (FS1, FS2) towards a target (C1), said treatment beam (FS1) being emitted through a non-reflecting area (Z1) of a first mirror (M1), said mirror (M1) enabling the feedback towards an imaging system (CA) receiving a lighting beam (FR2) reflected by the target, said low-reflection coefficient area (Z1) of the first mirror (M1) generating a shadow area (ZA) towards said imaging system (CA); a second mirror (M2) for receiving the treatment beam and for orienting and reflecting the same towards the target; a lighting source (E1) for lighting said target with the lighting beam (FE1); a first control circuit (CC) for controlling the orientation of said pointing system towards the target; a second control circuit (CT) for angularly offsetting the treatment beam (FS1) by a predetermined angle, for measuring, from an image obtained by the imaging system, the distance (D2) between the position of an area (P1) of the target and the position of the spot of the treatment beam, and for offsetting the lighting beam in the opposite direction by an angle corresponding to the measured distance (D2), the angular offset of the treatment beam having an amplitude such that the shadow area does not interfere in the measurement of the target position. The invention can be used in laser imaging systems.

8. 发明授权

EP1336130B1 MITIGATION OF MULTILAYER DEFECTS ON A RETICLE 有权
标题翻译：失败的投影屏幕还原
公开(公告)号：EP1336130B1
公开(公告)日：2010-03-17
申请号：EP01966608.0
申请日：2001-09-05
申请人： EUV Limited Liability Corporation
发明人： STEARNS, Daniel, G. , SWEENEY, Donald, W. , MIRKARIMI, Paul, B.
IPC分类号： G03F1/14 , G02B5/08 , G03F1/00
CPC分类号： G02B5/285 , B82Y10/00 , B82Y40/00 , G02B5/0891 , G02B27/32 , G03F1/24 , G03F1/72 , G21K1/062 , G21K2201/067
摘要： A method is provided for repairing defects in a multilayer coating layered onto a reticle blank used in an extreme ultraviolet lithography (EUVL) system. Using high lateral spatial resolution, energy is deposited in the multilayer coating in the vicinity of the defect. Thiscan be accomplished using a focused electron beam, focused ion beam or a focused electromagnetic radiation. The absorbed energy will cause a structural modification of the film,producing a localized change in the film thickness. The change in film thickness can be controlled with sub-nanometer accuracy by adjusting the energy dose. The lateral spatial resolution of the thickness modification is controlled by the localization of the energy deposition. The film thickness is adjusted locally to correct the perturbation of the reflectedfield. For example, when the structural modification is a localized film contraction, the repairof a defect consists of flattening a mound or spreading out the sides of a depression.

9. 发明公开

EP1690060A2 APPARATUS AND METHOD FOR CALCULATING AIMING POINT INFORMATION 审中-公开
标题翻译：设备和方法计算瞄准点信息
公开(公告)号：EP1690060A2
公开(公告)日：2006-08-16
申请号：EP04810925.0
申请日：2004-11-12
申请人： Horus Vision, LLC
发明人： SAMMUT, Dennis, J. , BUELL, Dickinson , CHAO, Lawrence
IPC分类号： F41G1/00
CPC分类号： F41G3/06 , F41G1/38 , F41G1/387 , F41G1/473 , F41G3/08 , G02B23/14 , G02B27/32
摘要： The present invention relates to target acquisition and related devices, and more particularly to telescopic gunsights and associated equipment used to achieve shooting accuracy at, for example, close ranges, medium ranges and extreme ranges at stationary and moving targets.

10. 发明授权

EP1070977B1 Système de visée optique 有权
标题翻译：光学瞄准系统
公开(公告)号：EP1070977B1
公开(公告)日：2003-09-17
申请号：EP00402022.8
申请日：2000-07-13
申请人： Aerospatiale Matra Missiles
发明人： Adda, Maurice
IPC分类号： G02B27/32 , F41G3/00
CPC分类号： G02B27/32

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