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1. 发明授权

EP2399707B1 Method for manufacturing electronic grade synthetic quartz glass substrate 有权
标题翻译：一种用于生产电子上水平的合成石英玻璃基板的制造方法
公开(公告)号：EP2399707B1
公开(公告)日：2017-02-22
申请号：EP11171429.1
申请日：2011-06-27
申请人： Shin-Etsu Chemical Co., Ltd.
发明人： Okafuji, Daiyu , Takeuchi, Masaki , Yamazaki, Hiroyuki
IPC分类号： B24B7/24 , C03C15/02 , B24B19/03 , B24B7/22
CPC分类号： B24B7/241 , B24B7/228 , B24B19/03 , C03C15/02

2. 发明公开

EP3004007A1 PROCÉDÉ DE TRAITEMENT D'UNE SURFACE ET DISPOSITIF MIS EN UVRE 有权
标题翻译： VERFAHREN ZUM BEHANDELN EINEROBERFLÄCHEUND APARATFÜRDIESES VERFAHREN
公开(公告)号：EP3004007A1
公开(公告)日：2016-04-13
申请号：EP14729639.6
申请日：2014-06-06
申请人： Commissariat à l'Énergie Atomique et aux Énergies Alternatives
发明人： PILON, Fabien , BELLEVILLE, Philippe , LAMBERT, Sébastien , RONDEAU, Olivier , THOMAS, Sandrine
IPC分类号： C03C15/02 , B08B13/00 , C03C23/00 , C09K13/02 , C09K13/04 , C23F1/16
CPC分类号： C03C15/02 , C03C23/0075 , C09K13/02 , C09K13/04 , C09K13/08 , C23F1/08 , C23F1/20 , C23F1/36
摘要： The invention relates to a method for treating a surface of an object, comprising steps consisting in bringing the surface to be treated in contact with a diffusion intermediate, then maintaining said surface to be treated in contact with said diffusion intermediate without any relative movement in relation to each other, said diffusion intermediate being impregnated with a corrosive solution before or during the contact being maintained. The invention also relates to a device implemented during such a method.
摘要翻译：本发明涉及一种用于处理物体表面的方法，该方法包括以下步骤：将待处理的表面与扩散中间体接触，然后保持待处理的表面与所述扩散中间体接触，而不会相对移动所述扩散中间体在接触之前或在所述接触期间用腐蚀性溶液浸渍。本发明还涉及在这种方法期间实现的装置。

3. 发明公开

EP2776523A4 ADDITIVE MIXTURE AND COMPOSITION AND METHOD FOR POLISHING GLASS SUBSTRATES 有权
标题翻译：抛光玻璃基板复合添加剂和成分，以便与方法
公开(公告)号：EP2776523A4
公开(公告)日：2015-07-08
申请号：EP11875545
申请日：2011-11-09
申请人： RHODIA OPERATIONS
发明人： GONG QIANG , HUANG AIMIN
IPC分类号： C09G1/02 , C08L33/02
CPC分类号： C09G1/02 , C03C15/02 , C03C15/025

4. 发明公开

EP2646384A2 METHODS OF FORMING HIGH-DENSITY ARRAYS OF HOLES IN GLASS 审中-公开
标题翻译：格拉斯维尔的VERFAHREN ZUR HERSTELLUNG VON HOCHDICHTEN LOCHANORDNUNGEN
公开(公告)号：EP2646384A2
公开(公告)日：2013-10-09
申请号：EP11799537.3
申请日：2011-11-30
申请人： Corning Incorporated
发明人： BOEK, Heather Debra , BURKET, Robert C. , HARVEY, Daniel Ralph , STRELTSOV, Alexander Mikhailovich
IPC分类号： C03C15/00 , C03C23/00
CPC分类号： C03B33/082 , B23K26/382 , B23K26/384 , B23K26/386 , B23K26/389 , B23K26/40 , B23K26/402 , B23K2103/50 , C03C15/00 , C03C15/02 , C03C23/0025 , G02B6/1225 , G02B6/136
摘要： A method of fabricating a high-density array of holes in glass is provided, comprising providing a glass piece having a front surface, then irradiating the front surface of the glass piece with a UV laser beam focused to a focal point within +/−100 μm of the front surface of the glass piece most desirably within +/−50 μm of the front surface. The lens focusing the laser has a numerical aperture desirably in the range of from 0.1 to 0.4, more desirably in the range of from 0.1 to 0.15 for glass thickness between 0.3 mm and 0.63 mm, even more desirably in the range of from 0.12 to 0.13, so as to produce open holes extending into the glass piece 100 from the front surface 102 of the glass piece, the holes having an diameter the in range of from 5 to 15 μm, and an aspect ratio of at least 20:1. For thinner glass, in the range of from 0.1-0.3 mm, the numerical aperture is desirably from 0.25 to 0.4, more desirably from 0.25 to 0.3, and the beam is preferably focused to within +/−30 μm of the front surface of the glass. The laser is desirable operated at a repetition rate of about 15 kHz or below. An array of holes thus produced may then be enlarged by etching. The front surface may be polished prior to etching, if desired.
摘要翻译：提供一种在玻璃中制造高密度孔阵列的方法，包括提供具有前表面的玻璃片，然后用聚焦在+/- 100内的焦点的UV激光束照射玻璃片的前表面玻璃片的前表面的μm最理想地在前表面的+/-50μm内。聚焦激光器的透镜的数值孔径希望在0.1至0.4的范围内，更优选在0.1至0.15的范围内，对于玻璃厚度在0.3mm至0.63mm之间，甚至更优选在0.12至0.13的范围内，以便从玻璃片的前表面102产生延伸到玻璃片100中的孔，孔的直径范围为5至15μm，纵横比至少为20:1。对于较薄的玻璃，在0.1-0.3mm的范围内，数值孔径期望地为0.25至0.4，更期望地为0.25至0.3，并且该光束优选地被聚焦在该光束的前表面的+/-30μm内玻璃。期望激光器以约15kHz或更低的重复频率操作。然后可以通过蚀刻来扩大由此产生的孔阵列。如果需要，前表面可以在蚀刻之前进行抛光。

5. 发明授权

EP1761471B1 PROCESS FOR POLISHING GLASS SUBSTRATE 有权
标题翻译：方法用于抛光的玻璃基板
公开(公告)号：EP1761471B1
公开(公告)日：2011-08-10
申请号：EP05751349.1
申请日：2005-06-14
申请人： Asahi Glass Company, Limited
发明人： OTSUKA, Kouji c/o Asahi Glass Company, Limited , ITO, Masabumi c/o Asahi Glass Company, Limited
IPC分类号： C03C15/02
CPC分类号： C03C15/02
摘要： A process for polishing a glass substrate required to have high-degree of flatness and smoothness, is provided. A preliminarily polished glass substrate (7) is applied with a surface treatment by a first-step gas-cluster ion (3) beam etching to improve the flatness, and then, the glass substrate (7) is applied with a surface treatment by a second-step gas-cluster ion (3) beam etching having different irradiation conditions of those of the first-step gas-cluster ion (3) beam etching to improve the surface roughness, whereby the glass substrate is finish-polished to have a flatness of at most 0.05 µm and a surface roughness (Rms) of at most 0.25 nm.

6. 发明公开

EP2338849A1 Preparation of synthetic quartz glass substrates 有权
标题翻译： Herstellung von synthetischem Quarzglassubstrat
公开(公告)号：EP2338849A1
公开(公告)日：2011-06-29
申请号：EP10252135.8
申请日：2010-12-16
申请人： Shin-Etsu Chemical Co., Ltd.
发明人： Harada, Daijitsu Shin-Etsu Chemical Co., Ltd. , Takeuchi, Masaki Shin-Etsu Chemical Co., Ltd.
IPC分类号： C03C15/02 , C03C19/00 , C03C23/00 , C09G1/02 , C09K3/14
CPC分类号： C03C15/02 , C03C19/00 , C03C23/0075 , C09G1/02 , C09K3/1463
摘要： A synthetic quartz glass substrate is prepared by (1) polishing a synthetic quartz glass substrate with a polishing slurry comprising colloidal particles, an ionic organic compound having an electric charge of the same type as the colloidal particles, and water, and (2) immersing the polished substrate in an acidic or basic solution for etching the substrate surface to a depth of 0.001-1 nm. The method produces a synthetic quartz glass substrate while preventing formation of defects of a size that is detectable by the high-sensitivity defect inspection tool, and providing the substrate with a satisfactory surface roughness.
摘要翻译：合成石英玻璃基板是通过（1）用包含胶体颗粒，具有与胶体颗粒相同类型的电荷的离子有机化合物和水的研磨浆料和水来研磨合成石英玻璃基板，以及（2）浸渍抛光的基底在酸性或碱性溶液中，用于蚀刻基底表面至0.001-1nm的深度。该方法产生合成石英玻璃基板，同时防止由高灵敏度缺陷检查工具检测到的尺寸缺陷的形成，并为基板提供令人满意的表面粗糙度。

7. 发明授权

EP1511697B1 PH ADJUSTMENT OF A MELT FOR USE IN MICROETCHING GLASS SUBSTRATES 有权
标题翻译： pH控制的熔体FOR USE IN微蚀刻玻璃基板
公开(公告)号：EP1511697B1
公开(公告)日：2009-10-21
申请号：EP03727666.4
申请日：2003-05-15
申请人： International Business Machines Corporation
发明人： JENSEN, Terry, Lee , MARIER, John, William , PILTINGSRUD, Douglas, Howard , SPRAGUE, Rick, Allan
IPC分类号： C03C21/00 , C03C15/02 , C03C23/00
CPC分类号： C03C23/0075 , C03C15/02 , C03C21/002 , Y10T428/315
摘要： A method of adjusting the pH of a strengthening melt to provide an adjusted melt for use in microetching glass substrates, such as glass disk substrates for use in data storage devices. A base is added to the strengthening melt to raise its pH. A desired degree of microetch is provided on an aluminosilicate glass disk substrate, for example, by immersion for 2-4 hours at 360 DEG C in a melt adjusted to have a pH of 10. This single operation both strengthens and microetches the glass substrate. A slight etching of the surface of a glass substrate, i.e., microetching, improves the performance and durability of a data storage disk made from the substrate. To avoid an overly aggressive etch that can create undesirable damage to the substrate surface, an acid may be added to the melt if the pH is subsequently determined to have shifted to above an upper limit.

8. 发明公开

EP1422203A4 SURFACE TREATING FLUID FOR FINE PROCESSING OF MULTI-COMPONENT GLASS SUBSTRATE 审中-公开
标题翻译：表面处理液精细加工MEHRKOMPONENTIGEM玻璃基板
公开(公告)号：EP1422203A4
公开(公告)日：2009-02-18
申请号：EP02762954
申请日：2002-09-02
申请人： STELLA CHEMIFA KK
发明人： KIKUYAMA HIROHISA , MIYASHITA MASAYUKI , YABUNE TATSUHIRO , OHMI TADAHIRO
IPC分类号： C03C15/00 , G02F1/1333 , C03C15/02
CPC分类号： C03C15/00 , C03C15/02
摘要： The object of the present invention is to provide a surface treatment solution for finely processing a glass substrate containing multiple ingredients like the one used for the construction of a liquid crystal-based or organic electroluminescence-based flat panel display device, without evoking crystal precipitation and surface roughness. An etching solution of the invention contains, in addition to hydrofluoric acid (HF), at least one acid whose dissociation constant is larger than that of HF. The concentration of the acid in the solution is adjusted as follows. If such an acid-added etching solution with the concentration x of the acid varied is applied to a silicon oxide film heated to as high a temperature as required for etching, and the etching rate f(x) Ä ANGSTROM /minÜ is plotted as a function of the concentration x of the acid in the solution, and it is found that f(x) takes a minimum f(x1) when x = x1, and the concentration x of the acid which gives f(x) equal to f(x=0)=äf(x2)ü/2 is taken as x2, the concentration x of the acid in the solution is adjusted to be (2/5)*x1

9. 发明公开

EP1761471A1 PROCESS FOR POLISHING GLASS SUBSTRATE 有权
标题翻译：抛光玻璃基板的工艺
公开(公告)号：EP1761471A1
公开(公告)日：2007-03-14
申请号：EP05751349.1
申请日：2005-06-14
申请人： Asahi Glass Company, Limited
发明人： OTSUKA, Kouji c/o Asahi Glass Company, Limited , ITO, Masabumi c/o Asahi Glass Company, Limited
IPC分类号： C03C15/02
CPC分类号： C03C15/02
摘要： A process for polishing a glass substrate required to have high-degree of flatness and smoothness, is provided. A preliminarily polished glass substrate (7) is applied with a surface treatment by a first-step gas-cluster ion (3) beam etching to improve the flatness, and then, the glass substrate (7) is applied with a surface treatment by a second-step gas-cluster ion (3) beam etching having different irradiation conditions of those of the first-step gas-cluster ion (3) beam etching to improve the surface roughness, whereby the glass substrate is finish-polished to have a flatness of at most 0.05 µm and a surface roughness (Rms) of at most 0.25 nm.
摘要翻译：提供一种需要具有高平坦度和平滑度的用于抛光玻璃基板的工艺。通过第一步骤的气体团簇离子（3）束蚀刻对表面进行预处理以提高平坦度，然后通过表面处理对玻璃基板（7）进行表面处理第二步气体团簇离子（3）束刻蚀具有与第一步气体团簇离子（3）束刻蚀不同的照射条件以改善表面粗糙度，由此玻璃基板被精抛光以具有平坦度至多0.05μm和至多0.25nm的表面粗糙度（Rms）。

10. 发明公开

EP1515923A1 VERFAHREN ZUR VERMINDERUNG UND KONTROLLE DER HEXAFLUOROSILICAT-KONZENTRATION BEIM POLIEREN VON GLASGEGENSTÄNDEN IN EINEM SCHWEFELSÄURE UND FLUSSSÄURE ENTHALTENDEN POLIERBAD 审中-公开
标题翻译：方法以减少和玻璃波兰六氟浓度控制对象硫酸和FLOW含抛光
公开(公告)号：EP1515923A1
公开(公告)日：2005-03-23
申请号：EP03740288.0
申请日：2003-06-18
申请人： Sälzle, Erich , Sälzle, Marcus
发明人： Sälzle, Erich , Sälzle, Marcus
IPC分类号： C03C15/02
CPC分类号： C03C15/02
摘要： The invention relates to a method for reducing and controlling the concentration of hexafluorosilicate ions arising when glass objects are polished in a polishing bath containing sulphuric acid and hydrofluoric acid. Potassium floride, potassium sulphate, sodium fluoride, sodium sulphate or aluminium sulphate is added to the polishing bath or sulphuric acid rinsing bath in quantities such that a drop in the concentration of fluoride ions below the optimum working range is avoided.

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