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    • 5. 发明公开
    • RELATIVE AND ABSOLUTE PRESSURE SENSOR COMBINED ON CHIP
    • 芯片上组合相对和绝对压力传感器
    • EP3029445A2
    • 2016-06-08
    • EP15197628.9
    • 2015-12-02
    • Melexis Technologies NVX-FAB Semiconductor Foundries AG
    • VAN DER WIEL, Appolonius JacobusSCHWARZ, UweDE WINTER, Rudi
    • G01L15/00G01L9/00
    • G01F1/34B81B7/04B81B2201/0264B81C1/00214G01F15/14G01L9/008G01L15/00
    • A method (100) for manufacturing a system (200) in a wafer (210) for measuring an absolute and a relative pressure. In a first step (110) a shallow (220) and a deep (230) cavity are etched in the wafer (210). In a second step (120) a top wafer (510) is applied and in a third step (125) the top wafer is thinned for forming a first respectively second membrane (262, 272) over the shallow respectively deep cavity (220, 230), and for forming in the top wafer (510) first respectively second bondpads (261, 271) at the first respectively second membrane (262, 272) resulting in a first respectively second sensor (260, 270). A third step (130) back grinding the wafer (210) resulting in a opened deep cavity (230) and a still closed shallow cavity (220). The first bondpads (261) of the first sensor (260) for measuring an absolute pressure and the second bondpads (271) of the second sensor (270) a relative pressure. The etching in the first step defines the edges of the first membrane and of the second membrane in respectively the sensors formed from the shallow and the deep cavity.
    • 一种用于制造用于测量绝对压力和相对压力的晶片(210)中的系统(200)的方法(100)。 在第一步骤(110)中,在晶片(210)中蚀刻浅(220)和深(230)腔。 在第二步骤(120)中施加顶部晶片(510),并且在第三步骤(125)中,将顶部晶片变薄以在浅的相应深腔(220,230)上形成第一和第二隔膜(262,272) ),并且用于在第一和第二薄膜(262,272)处在顶部晶片(510)中分别形成第一和第二分别的第二键合焊盘(261,271),从而形成第一或第二传感器(260,270)。 第三步(130)背面研磨晶片(210),产生敞开的深腔(230)和仍然闭合的浅腔(220)。 用于测量绝对压力的第一传感器(260)的第一键合焊盘(261)和第二传感器(270)的第二键合焊盘(271)具有相对压力。 第一步骤中的蚀刻分别限定了由浅腔和深腔形成的传感器中的第一膜和第二膜的边缘。
    • 6. 发明公开
    • HYBRID MEMS FABRICATION METHOD AND NEW OPTICAL MEMS DEVICE
    • 用于生产混合MEMS和新的光学MEMS器件
    • EP1461287A2
    • 2004-09-29
    • EP02795482.5
    • 2002-07-17
    • Rockwell Scientific Licensing, LLC
    • DE NATALE, Jeffrey, F.
    • B81B3/00G02B26/08
    • G02B6/3518B81B3/0083B81B2201/042B81C1/00214B81C2201/053G02B6/3584
    • A new hybrid method of fabricating optical micro electro mechanical system (MEMS) devices is disclosed that uses both bulk and surface micromachining techniques, and a new optical MEMS device is also disclosed that is fabricated using the new method. The method includes the step of mounting a handle layer to one or more layers of MEMS structural material (12). Layers of structural and sacrificial material are then built up on the MEMS structural material using surface micromachining techniques (14). Drive electronics are mounted to the layers of structural and sacrificial material (17). The handle layer is removed (18) to reveal the MEMS structural layer and the sacrificial material within the various layers is dissolved (20). The new method is particularly applicable to fabricating optical MEMS devices, with the handle layer (54) being adjacent to a Si mirror layer (52). The surface micromachining layers form electrode (66) and spring structures (67, 68). Drive electronics (92) are then mounted on the layers of structural material, so that a bias can be applied to the MEMS structures. The handle layer (54) is removed from the mirror layer (52) to reveal the mirror's reflective surface, and the sacrificial material (64) is dissolved away, freeing the MEMS structures to operate. For optical or other MEMS arrays, a linking framework (70) can be included to attach the MEMS devices.