专利快速检索-快速检索全球专利，免费商用专利数据库-IPRDB

1. 发明公开

EP2589951A1 Cleaning apparatus, measurement method and calibration method 有权
标题翻译： Kalibrationsverfahren
公开(公告)号：EP2589951A1
公开(公告)日：2013-05-08
申请号：EP12180106.2
申请日：2012-08-10
申请人： Siltronic AG
发明人： Haibara, Teruo , Mori, Yoshihiro , Kubo, Etsuko , Uchibe, Masashi
IPC分类号： G01N21/27 , G01N21/70 , G01N21/71 , B08B3/12 , G01H9/00 , G01N29/24
CPC分类号： G01N21/274 , G01N21/70 , G01N21/71 , G01N29/2418 , G01N2021/8416
摘要： Subject: To provide a cleaning apparatus capable of cleaning substrates effectively and stably, a method for calibrating a device for measuring the concentration of a dissolved gas used in the cleaning apparatus, and a measurement method for measuring the concentration of a dissolved gas.
Solving Means: A calibration method according to this invention is a calibration method for calibrating a measurement device for measuring a concentration of a gas dissolved in a liquid. In the calibration method, a step (S10) of varying the concentration of the gas dissolved in the liquid, and predetermining, as a reference concentration, a concentration of the gas at which an intensity of luminescence produced when the liquid is irradiated with ultrasonic waves shows a peak, is conducted. Next, a step (S20) of measuring a concentration of the gas in the liquid with the measurement device to be calibrated when the intensity of the luminescence shows a peak by irradiating the liquid with ultrasonic waves while varying the concentration of the gas in the liquid, to determine a measured value of the concentration of the gas, is conducted. A step (S30) of calibrating the measurement device to be calibrated based on the measured value and the reference concentration is conducted.
摘要翻译：题目：提供能够有效且稳定地清洗基板的清洗装置，用于校准用于测量清洁装置中使用的溶解气体的浓度的装置的方法和测量溶解气体的浓度的测量方法。解决方法：根据本发明的校准方法是用于校准用于测量溶解在液体中的气体的浓度的测量装置的校准方法。在校准方法中，改变溶解在液体中的气体的浓度的步骤（S10），并且预先确定当用超声波照射液体时产生的发光强度作为参考浓度的浓度显示峰值，进行。接下来，在通过用超声波照射液体而发光的强度显示出峰值的同时，改变液体中的气体浓度的同时，测量待校准的测量装置的液体中的气体浓度的步骤（S20），以确定气体浓度的测量值。进行基于测量值和参考浓度来校准要校准的测量装置的步骤（S30）。

2. 发明授权

EP2589951B1 Calibration method 有权
标题翻译：校准
公开(公告)号：EP2589951B1
公开(公告)日：2013-10-23
申请号：EP12180106.2
申请日：2012-08-10
申请人： Siltronic AG
发明人： Haibara, Teruo , Mori, Yoshihiro , Kubo, Etsuko , Uchibe, Masashi
IPC分类号： G01N21/27 , G01N21/70 , G01N21/71
CPC分类号： G01N21/274 , G01N21/70 , G01N21/71 , G01N29/2418 , G01N2021/8416
摘要： Subject: To provide a cleaning apparatus capable of cleaning substrates effectively and stably, a method for calibrating a device for measuring the concentration of a dissolved gas used in the cleaning apparatus, and a measurement method for measuring the concentration of a dissolved gas. Solving Means: A calibration method according to this invention is a calibration method for calibrating a measurement device for measuring a concentration of a gas dissolved in a liquid. In the calibration method, a step (S10) of varying the concentration of the gas dissolved in the liquid, and predetermining, as a reference concentration, a concentration of the gas at which an intensity of luminescence produced when the liquid is irradiated with ultrasonic waves shows a peak, is conducted. Next, a step (S20) of measuring a concentration of the gas in the liquid with the measurement device to be calibrated when the intensity of the luminescence shows a peak by irradiating the liquid with ultrasonic waves while varying the concentration of the gas in the liquid, to determine a measured value of the concentration of the gas, is conducted. A step (S30) of calibrating the measurement device to be calibrated based on the measured value and the reference concentration is conducted.

3. 发明授权

EP2666552B1 Ultrasonic cleaning method and ultrasonic cleaning apparatus 失效
标题翻译：超声波清洗方法和超声波清洗装置
公开(公告)号：EP2666552B1
公开(公告)日：2015-07-08
申请号：EP13167904.5
申请日：2013-05-15
申请人： Siltronic AG
发明人： Kubo, Etsuko , Haibara, Teruo , Mori, Yoshihiro , Uchibe, Masashi
IPC分类号： B08B3/12 , H01L21/02
CPC分类号： H01L21/02052 , B08B3/12

4. 发明授权

EP2666551B1 Ultrasonic cleaning method 失效
标题翻译：超声波清洗方法
公开(公告)号：EP2666551B1
公开(公告)日：2017-09-06
申请号：EP13167577.9
申请日：2013-05-14
申请人： Siltronic AG
发明人： Mori, Yoshihiro , Uchibe, Masashi , Haibara, Teruo , Kubo, Etsuko
IPC分类号： B08B3/12
CPC分类号： B08B3/12

5. 发明授权

EP2666553B1 Ultrasonic cleaning method and ultrasonic cleaning apparatus 失效
标题翻译： Ultraschallreinigungsverfahren und Ultraschallreinigungsvorrichtung
公开(公告)号：EP2666553B1
公开(公告)日：2015-12-30
申请号：EP13167906.0
申请日：2013-05-15
申请人： Siltronic AG
发明人： Haibara, Teruo , Kubo, Etsuko , Mori, Yoshihiro , Uchibe, Masashi
IPC分类号： B08B3/12 , H01L21/67
CPC分类号： H01L21/67057 , B08B3/12

6. 发明公开

EP2666554A1 Ultrasonic cleaning method and ultrasonic cleaning apparatus 审中-公开
标题翻译： Ultraschallreinigungsverfahren und Ultraschallreinigungsvorrichtung
公开(公告)号：EP2666554A1
公开(公告)日：2013-11-27
申请号：EP13168559.6
申请日：2013-05-21
申请人： Siltronic AG
发明人： Uchibe, Masashi , Mori, Yoshihiro , Haibara, Teruo , Kubo, Etsuko
IPC分类号： B08B3/12
CPC分类号： H01L21/02052 , B08B3/12
摘要： Subject: There is provided an ultrasonic cleaning method and an ultrasonic cleaning apparatus by which a high particle removal rate is obtained in a stable manner.
Means for solving the problem: An ultrasonic cleaning method for cleaning an object to be cleaned in a liquid in which a gas is dissolved, by irradiating the liquid with ultrasonic waves, the method comprising the following steps: The liquid in which the gas is dissolved is prepared (S10). The object to be cleaned is cleaned while ultrasonic waves are applied to the liquid so that a region where a spatial rate of change of a refractive index of the liquid in which the gas is dissolved is large relative to a case where ultrasonic waves are not applied appears along a direction in which the ultrasonic waves travel (S40) .
摘要翻译：题目：提供了一种超声波清洗方法和超声波清洗装置，其以稳定的方式得到高的颗粒去除率。解决问题的手段：通过用超声波照射液体来清洗溶解有气体的液体中的待清洁物体的超声波清洗方法，其特征在于，包括以下步骤：气体溶解的液体（S10）。清洗物体被清洗，同时对液体施加超声波，使得相对于不施加超声波的情况，溶解气体的液体的折射率的空间变化率的区域大沿着超声波行进的方向出现（S40）。

7. 发明公开

EP2666553A1 Ultrasonic cleaning method and ultrasonic cleaning apparatus 失效
标题翻译：超声波清洗方法和超声波清洗装置
公开(公告)号：EP2666553A1
公开(公告)日：2013-11-27
申请号：EP13167906.0
申请日：2013-05-15
申请人： Siltronic AG
发明人： Haibara, Teruo , Kubo, Etsuko , Mori, Yoshihiro , Uchibe, Masashi
IPC分类号： B08B3/12
CPC分类号： H01L21/67057 , B08B3/12
摘要： Subject: There is provided an ultrasonic cleaning method and an ultrasonic cleaning apparatus by which a high particle removal rate is obtained in a stable manner.
Means for solving the problem: An ultrasonic cleaning method for cleaning an object to be cleaned in a liquid in which a gas is dissolved, by irradiating the liquid with ultrasonic waves, the method having the following steps: The liquid in which the gas is dissolved is prepared (S10). The liquid is stirred while the liquid is irradiated with the ultrasonic waves, and a state where bubbles containing the gas dissolved in the liquid continue to be generated is realized (S20). The object to be cleaned is cleaned in the state where the bubbles containing the gas continue to be generated (S30).
摘要翻译：主题：提供了一种稳定获得高颗粒去除率的超声波清洁方法和超声波清洁装置。解决问题的手段：一种超声波清洗方法，用于通过用超声波照射液体来清洗溶解有气体的液体中的待清洗物体，所述方法具有以下步骤：将气体溶解于其中的液体（S10）。在液体被超声波照射的同时搅拌液体，并且实现包含溶解在液体中的气体的气泡持续产生的状态（S20）。在包含气体的气泡持续产生的状态下清洁要清洁的物体（S30）。

8. 发明公开

EP2666552A1 Ultrasonic cleaning method and ultrasonic cleaning apparatus 失效
标题翻译：超声波清洗方法和超声波清洗装置
公开(公告)号：EP2666552A1
公开(公告)日：2013-11-27
申请号：EP13167904.5
申请日：2013-05-15
申请人： Siltronic AG
发明人： Kubo, Etsuko , Haibara, Teruo , Mori, Yoshihiro , Uchibe, Masashi
IPC分类号： B08B3/12
CPC分类号： H01L21/02052 , B08B3/12
摘要： Subject: There is provided an ultrasonic cleaning method and an ultrasonic cleaning apparatus by which a high particle removal rate is obtained in a stable manner.
Means for solving the problem: An ultrasonic cleaning method for cleaning an object to be cleaned in a liquid in which a gas is dissolved, by irradiating the liquid with ultrasonic waves, the method having the following steps. The liquid in which the gas is dissolved is prepared (S10). Bubbles are generated in the liquid while the liquid is irradiated with the ultrasonic waves, and a state where the bubbles containing the gas dissolved in the liquid continue to be generated is realized (S20). The object to be cleaned is cleaned in the state where the bubbles containing the gas continue to be generated (S30).
摘要翻译：主题：提供了一种稳定获得高颗粒去除率的超声波清洁方法和超声波清洁装置。解决问题的手段：一种通过用超声波照射液体来清洁溶解有气体的液体中的待清洁物体的超声波清洁方法，该方法具有以下步骤。准备溶解有气体的液体（S10）。（S20）实现在液体被超声波照射的同时在液体中产生气泡，并且继续产生包含溶解在液体中的气体的气泡的状态（S20）。在包含气体的气泡持续产生的状态下清洁要清洁的物体（S30）。

9. 发明公开

EP2666551A1 Ultrasonic cleaning method and ultrasonic cleaning apparatus 失效
标题翻译：超声波清洗方法和超声波清洗装置
公开(公告)号：EP2666551A1
公开(公告)日：2013-11-27
申请号：EP13167577.9
申请日：2013-05-14
申请人： Siltronic AG
发明人： Mori, Yoshihiro , Uchibe, Masashi , Haibara, Teruo , Kubo, Etsuko
IPC分类号： B08B3/12
CPC分类号： B08B3/12
摘要： Subject: There is provided an ultrasonic cleaning method and an ultrasonic cleaning apparatus by which a high particle removal rate is obtained in a stable manner.
Means for solving the problem: An ultrasonic cleaning method for cleaning an object to be cleaned in a liquid in which a gas is dissolved, by irradiating the liquid with ultrasonic waves, the method comprising the following steps: The liquid in which the gas is dissolved is prepared (S10). The object to be cleaned is cleaned while ultrasonic waves are applied to the liquid so that the ratio determined by dividing a vibration strength of the liquid at a fourth-order frequency of the ultrasonic waves by a vibration strength of the liquid at a fundamental frequency of the ultrasonic waves is larger than 0.8/1000 (S40).
摘要翻译：主题：提供了一种稳定获得高颗粒去除率的超声波清洁方法和超声波清洁装置。解决问题的手段：一种超声波清洗方法，用于通过用超声波照射液体来清洗溶解有气体的液体中的待清洗物体，所述方法包括以下步骤：将气体溶解于其中的液体（S10）。在对液体施加超声波的同时清洁要清洁的物体，使得通过将超声波的四阶频率处的液体的振动强度除以基频处的液体的振动强度超声波大于0.8 / 1000（S40）。

你已经成功收藏专利！

检索式保存成功!

IPRDB

热门服务

关于我们

友情链接

联系方式