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    • 4. 发明公开
    • Optical recording medium and optical disk device
    • Optisches Aufzeichnungsmedium und optische Plattenvorrichtung
    • EP2189980A1
    • 2010-05-26
    • EP10151873.6
    • 2001-11-20
    • Sony Corporation
    • Ichimura, IsaoOsato, KiyoshiNakano, JunMasuhara, Shin
    • G11B7/007
    • G11B7/24G11B7/007G11B7/00718G11B7/24079G11B7/24082
    • The present invention provides an optical recording medium and an optical disk device realizing prevention of crosswrite and uniformity of playback signals and capable of easily securing compatibility with a read only disk. It provides an optical recording medium on which light LB condensed by a lens (12, 14) having a numerical aperture of 0.85±0.1 and a wavelength of 405±5 nm is focused for recording or playback, having a substrate 1 formed with a groove 2 in its surface, an optical recording layer 3 formed on the substrate and having topography corresponding to the groove, and a light transmission type protection layer 4 formed on the optical recording layer; used when light for recording or playback is focused from the protection layer side to the optical recording layer; using as a recording area only the optical recording layer of one of a side far from the emitting side of the light for recording or playback, that is, a portion corresponding to a recessed portion of the topography, and a side close to it, that is, a portion corresponding to a projecting portion; having a track pitch of 0.32±0.01 µm; and having a depth D2 of a recessed portion with respect to a projecting portion in the range of 19 to 24 nm.
    • 本发明提供了一种光记录介质和光盘装置,其实现了防止重放信号的横向和均匀性并且能够容易地确保与只读盘的兼容性。 它提供了一种光学记录介质,其上聚焦有数字孔径为0.85±0.1和波长为405±5nm的透镜(12,14)的光LB用于记录或重放,其具有形成有凹槽 2,形成在基板上并且具有对应于凹槽的形貌的光学记录层3和形成在光学记录层上的光透射型保护层4; 当用于记录或回放的光从保护层侧聚焦到光学记录层时使用; 仅使用远离用于记录或重放的光的发射侧的一侧的光记录层,即与形貌的凹部相对应的部分和靠近其的一侧的光记录层, 是对应于突出部分的部分; 轨道间距为0.32±0.01μm; 并且具有相对于在19至24nm范围内的突出部分的凹部的深度D2。
    • 6. 发明公开
    • Method of manufacturing an optical recording medium
    • Verfahren zur Herstellung eines optischen Aufzeichnungsmedium
    • EP1184860A2
    • 2002-03-06
    • EP01129109.3
    • 1999-02-22
    • SONY CORPORATION
    • Masuhara, Shin
    • G11B7/26
    • G11B11/10582G11B7/24G11B7/24085G11B7/261G11B7/263
    • There is provided a method of manufacturing an optical recording medium. This method comprises the steps of forming a photoresist layer (21) on a substrate (20); exposing a predetermined area (R) of the photoresist layer (21) formed on the substrate (20) to form a plurality of trains of depressions in the photoresist layer (21); removing the photoresist layer (21) between the adjoining depression trains to form a master (50); plating the master (50) with a metal (51); separating the metal (51) coating to form a master stamper (52); replicating the master stamper (52) repeatedly an odd number of times to form a mother stamper (55); replicating the mother stamper (55) to form a resin substrate; and forming at least a light-transparent layer on a surface of the resin substrate on which the mother stamper (55) is replicated. The method can mold a pattern of microscopic depressions and projections with a high accuracy.
    • 提供了一种制造光记录介质的方法。 该方法包括在基板(20)上形成光致抗蚀剂层(21)的步骤。 使形成在基板上的光致抗蚀剂层(21)的预定区域(R)暴露在光致抗蚀剂层(21)中形成多个凹陷列; 去除邻接的凹陷列之间的光致抗蚀剂层(21)以形成主机(50); 用金属(51)电镀母板(50); 分离金属(51)涂层以形成主压模(52); 重复地复制主压模(52)奇数次以形成母模(55); 复制母模(55)以形成树脂基板; 以及在复印有母模(55)的树脂基板的表面上形成至少一透光层。 该方法可以高精度地模制微观凹凸图案。
    • 9. 发明公开
    • Electron beam irradiation apparatus, electron beam irradiation method, original disk, stamper, and recording medium
    • 电子束照射装置,电子束照射方法,原盘,压模和记录介质
    • EP1152417A2
    • 2001-11-07
    • EP01104999.6
    • 2001-03-01
    • SONY CORPORATION
    • Aki, YuichiKondo, TakaoTakeda, MinoruYamamoto, MasanobuMasuhara, ShinKashiwagi, Toshiyuki
    • G11B23/00G11B7/26H01J37/30H01J37/301H01J37/18H01J37/317
    • G11B7/261G11B23/0057H01J37/301H01J2237/188
    • There is provided an electron beam irradiation apparatus, an electron beam irradiation method, an original disc, a stamper, and a recording medium, capable of effectively avoiding scattering of an electron beam and avoiding provision of a large scale vacuum chamber. An electron beam irradiation apparatus includes a support section (4) for supporting an electron beam irradiation subject (3) to be irradiated with an electron beam (2), and an electron beam irradiation head (6) opposed to the electron beam irradiation subject via a minute space, the electron beam irradiation head (6) having an electron beam emission hole (5) for irradiating the electron beam irradiation subject (3) with the electron beam (2). In the electron beam irradiation head (6), an electron beam path (20) communicating with the electron beam emission hole (5) is provided, and in addition one or more ring shaped gas suction grooves (61) and (62) opened from a surface of the electron beam irradiation head facing the electron beam irradiation subject is formed around the electron beam emission hole (5). Vacuum pumps are coupled to the electron beam path (20) and the ring shaped gas suction grooves (61) and (62), and the electron beam path is held in a high vacuum state.
    • 提供能够有效地避免电子束散射并且避免提供大规模真空室的电子束照射设备,电子束照射方法,原始盘,压模和记录介质。 一种电子束照射设备包括:用于支撑要用电子束(2)照射的电子束照射对象(3)的支撑部分(4);以及与电子束照射对象相对的电子束照射头(6) 电子束照射头(6)具有用于向电子束照射对象(3)照射电子束(2)的电子束发射孔(5)。 在电子束照射头(6)中,设置有与电子束发射孔(5)连通的电子束路径(20),并且另外还有一个或多个环形气体抽吸槽(61)和(62)从 在电子束发射孔(5)周围形成电子束照射头面向电子束照射对象的表面。 真空泵与电子束路径(20)和环形吸气槽(61)和(62)耦合,并且电子束路径保持在高真空状态。