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1. 发明公开

EP1689907A2 PLASMA PRODUCTION DEVICE AND METHOD AND RF DRIVER CIRCUIT WITH ADJUSTABLE DUTY CYCLE 审中-公开
标题翻译：等离子体生产装置和具有可调节占空比的射频驱动器电路
公开(公告)号：EP1689907A2
公开(公告)日：2006-08-16
申请号：EP04755834.1
申请日：2004-06-21
申请人： Plasma Control Systems LLC
发明人： PRIBYL, Patrick
IPC分类号： C23C16/00 , C23F1/02
CPC分类号： H05H1/46 , H01Q1/26
摘要： A reactive circuit is disclosed as part of a method and system for generating high-density plasma that does not require the use of a dynamic matching network for directly driving a plasma exhibiting a dynamic impedance. The reactive network is designed to provide a small total reactance when the plasma reactance is at a first plasma reactance and presents a reactance that does not exceed a specified limit at a second plasma reactance. The first and second plasma reactance span a substantially fraction of an expected dynamic plasma reactance range. The first and second plasma reactance values may, for example, correspond to a high-expected plasma reactance limit and a low expected plasma reactance limit respectively or the first plasma reactance may correspond to an average expected plasma reactance.
摘要翻译：作为产生高密度等离子体的方法和系统的一部分公开了一种电抗电路，其不需要使用动态匹配网络来直接驱动表现出动态阻抗的等离子体。当等离子体电抗处于第一等离子体电抗并且在第二等离子体电抗下呈现不超过规定极限的电抗时，反应网络被设计为提供小的总电抗。第一和第二等离子体电抗跨越预期动态等离子体电抗范围的基本部分。第一和第二等离子体电抗值可以例如分别对应于高预期等离子体电抗极限和低预期等离子体电抗极限，或者第一等离子体电抗可以对应于平均预期等离子体电抗。

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