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1. 发明公开

EP1671772A1 APPARATUS FOR PRODUCING POLYMER 审中-公开
标题翻译： VORRICHTUNG ZUR HERSTELLUNG冯聚合物
公开(公告)号：EP1671772A1
公开(公告)日：2006-06-21
申请号：EP04772395.2
申请日：2004-08-24
申请人： OHMI, Tadahiro , ZEON CORPORATION
发明人： OHMI, Tadahiro , TADA, Mitsushi , JIMBO, Toshihiko
IPC分类号： B29B7/84 , C08F6/10
CPC分类号： B29C47/762 , B29C47/0021 , B29K2067/00 , C08F6/005
摘要： An apparatus for producing a polymer, wherein the surface of a member contacting with the polymer of a device for melting and molding a raw material polymer has been subjected to a passivation treatment and is covered by a passive film, wherein ultra-pure water is used as a solvent to be injected into a molten polymer, to prevent the incorporation of a contaminant, and wherein an inert gas is fed to the line for discharging a gas, to prevent the contamination by back diffusion. As the above passive film, an aluminum oxide film or a chromium oxide film is preferred.
摘要翻译：一种聚合物的制造装置，其中与原料聚合物熔融成型装置的聚合物接触的部件的表面进行了钝化处理，被钝化膜覆盖，其中使用超纯水作为注入熔融聚合物的溶剂，以防止污染物的引入，并且其中惰性气体被供给到用于排放气体的管线，以防止反向扩散污染。作为上述钝化膜，优选氧化铝膜或氧化铬膜。

2. 发明公开

EP1429380A1 CONTAINER FOR PRECISION SUBSTRATE 审中-公开
标题翻译： BEHÄLTERFÜREINPRÄZISIONSSUBSTRAT
公开(公告)号：EP1429380A1
公开(公告)日：2004-06-16
申请号：EP02760759.7
申请日：2002-08-28
申请人： Zeon Corporation , Ohmi, Tadahiro
发明人： OHMI, Tadahiro , JIMBO, T., c/o Zeon Corp., Res & Dev. Center , MURAKAMI, T., c/o Zeon Corp., Res & Dev. Center
IPC分类号： H01L21/68 , C08L5/00 , B29B13/06 , B29C45/00 , B65D85/86 , C08L65/00 , C08L101/00
CPC分类号： H01L21/67303 , H01L21/67306 , H01L21/67313 , H01L21/67316 , H01L21/6732 , H01L21/67323 , H01L21/67326 , H01L21/6733 , H01L21/67353 , H01L21/67359 , H01L21/67386 , Y10T428/13 , Y10T428/1303 , Y10T428/1352 , Y10T428/1359 , Y10T428/1386 , Y10T428/139
摘要： A container for precision substrate having one or more component formed by molding a thermoplastic resin, characterized in that the component satisfies characteristics [1] and [2] below. [1] When being brought to contact ultra high purity argon gas (impurity concentration: 1 ppb or less) at 25°C having a flow rate of 1.2 L/min., a water amount in said argon gas after 300 minutes is 30 ppb or less per a surface area 1 cm 2 of the component. [2] When being placed in the air at 100°C, an increase amount of organics in the air in 300 minutes is 150 ng or less per weight 1 g of the component. According to the container, demands for low contamination can be satisfied.
摘要翻译：一种用于通过模制热塑性树脂形成的具有一种或多种组分的精密基材的容器，其特征在于，该组分满足以下特征Ä1Ü和Ä2Ü。 Ä1Ü当接触流量为1.2升/分钟的25℃的超高纯度氩气（杂质浓度：1ppb以下）时，300分钟后的氩气中的水量为30ppb以下每个表面积1厘米2的组分。 Ä2Ü当放置在100℃的空气中时，300分钟内空气中有机物的增加量为每重量150纳克1g组分。根据容器，可以满足低污染的要求。

3. 发明公开

EP1731931A1 OPTICAL MEMBER AND MANUFACTURING METHOD THEREOF 审中-公开
标题翻译：优质产品在德国大理石公司（HERSTELLUNGSVERFAHRENDAFÜR）上展出
公开(公告)号：EP1731931A1
公开(公告)日：2006-12-13
申请号：EP05727995.2
申请日：2005-03-31
申请人： OHMI, Tadahiro , ZEON CORPORATION
发明人： OHMI, Tadahiro , TANAHASHI, Naoki , HAYASHI, Masahiko, ZEON CORPORATION
IPC分类号： G02B5/18 , G02B5/30 , G02B1/10
CPC分类号： G02B1/118 , G02B5/008
摘要： An optical member utilizing diffraction, which comprises a substrate having a fine structure comprising microstructures with an interval of 50-1,000 nm between the adjacent microstructures on a substrate surface, wherein the substrate has a surface layer portion comprising a region containing fluorine atoms in an amount larger than that in the inner layer portion thereof. The microstructures are preferably micro-protrusions each tapering toward the tip in the direction perpendicular to the substrate surface. The optical member is manufactured by a method comprising a step of exposing the surface of the substrate having a fine structure comprising microstructures with an interval of 50-1, 000 nm between the adjacent microstructures to an atmosphere containing a fluorine gas.
摘要翻译：一种利用衍射的光学部件，其包括具有精细结构的基板，该基板具有在基板表面上的相邻微结构之间的间隔为50-1,000nm的微结构，其中所述基板具有包含含有氟原子的区域的表面层部分大于其内层部分的尺寸。微结构优选为在垂直于衬底表面的方向上朝尖端渐缩的微突起。光学构件通过以下方法制造：将相邻微结构之间的间隔为50-1000nm的微结构的微结构的基板的表面暴露于含有氟气体的步骤。

4. 发明公开

EP1744092A1 APPARATUS FOR PRODUCING GAS, VESSEL FOR SUPPLYING GAS AND GAS FOR USE IN MANUFACTURING ELECTRONIC DEVICE 审中-公开
标题翻译：设备用于气体关于将喂养和瓦斯的电子设备的制造生产，煤气罐
公开(公告)号：EP1744092A1
公开(公告)日：2007-01-17
申请号：EP05719181.9
申请日：2005-02-16
申请人： OHMI, Tadahiro , ZEON CORPORATION
发明人： OHMI, Tadahiro , SHIRAI, Yasuyuki , KATO, Takeyoshi c/o ZEON CORPORATION , TANAKA, Kimiaki c/o ZEON CORPORATION , NAKAMURA, Masahiro c/o ZEON CORPORATION , TANAKA, Katsutomo c/o ZEON CORPORATION
IPC分类号： F17C1/10 , C23C4/10 , C23C8/16 , C23C8/18
CPC分类号： C23C30/00 , C23C4/11 , C23C8/02
摘要： An apparatus for producing a gas using a raw material gas having high reactivity, in particular, a fluorinated hydrocarbon, or a vessel for supplying the gas, characterized in that the surface of a portion thereof contacting with the gas has an average roughness of 1 µm or less in terms of a center line average roughness Ra. It is preferred that an oxide-based passivated film such as a film based on chromium oxide, aluminum oxide, yttrium oxide, magnesium oxide or the like is formed on the surface having a roughness controlled as above. The above apparatus and vessel can be suitably used for preventing the contamination of a raw material gas originated from a gas production apparatus or a vessel for supplying the gas.
摘要翻译：使用的原料气体产生的气体具有高的反应性，特别是氟化烃，或用于供给气体的容器，在一个部分的DASS模具表面特征的其与气体接触的装置具有以平均1微米的粗糙度或以中心线平均粗糙度Ra计为以下。优选确实到氧化物膜基钝化：诸如基于氧化铬，氧化铝，氧化钇，氧化镁或类似的膜具有控制如上的粗糙度的表面上形成。上述装置和容器可以合适地用于防止源自气生产装置或用于供给气体的容器的原料气体的污染。

5. 发明公开

EP1691340A1 THIN FILM TRANSISTOR INTEGRATED CIRCUIT DEVICE, ACTIVE MATRIX DISPLAY DEVICE, AND MANUFACTURING METHOD OF THE SAME 审中-公开
标题翻译： INTEGRIERTEDÜNNFILMTRANSISTOR-SCHALTUNGSEINRICHTUNG，AKTIVMATRIX-DISPLAY-EINRICHTUNG UND HERSTELLUNGSVERFAHRENDAFÜR
公开(公告)号：EP1691340A1
公开(公告)日：2006-08-16
申请号：EP04820127.1
申请日：2004-11-26
申请人： OHMI, Tadahiro , ZEON CORPORATION
发明人： OHMI, Tadahiro , MORIMOTO, Akihiro , SUZUKI, Teruhiko, Zeon Corporation , KATO, Takeyoshi, Zeon Corporation
IPC分类号： G09F9/30 , G02F1/1368 , H01L29/786 , H01L21/3205 , H05B33/14
CPC分类号： G02F1/1368 , G02F2001/133357 , H01L27/12 , H01L27/124 , H01L27/1248 , H01L27/1285 , H01L27/1292 , H01L29/41733 , H01L29/66742 , H01L29/78636
摘要： There is provided an active matrix display device including a flattening layer formed so as to surround a source electrode wiring, a drain electrode wiring, and a signal line, so that the source electrode wiring, the drain electrode wiring, and the signal line form substantially the same surface with the flattening layer.
摘要翻译：提供了一种有源矩阵显示装置，包括形成为围绕源极电极布线，漏极布线和信号线的平坦化层，使得源极电极布线，漏极布线和信号线基本形成与平整层相同的表面。

6. 发明公开

EP1651018A1 SUBSTRATE AND PROCESS FOR PRODUCING THE SAME 审中-公开
标题翻译： SUBSTRAT UND PROZESS ZU SEINER HERSTELLUNG
公开(公告)号：EP1651018A1
公开(公告)日：2006-04-26
申请号：EP04735653.0
申请日：2004-06-01
申请人： OHMI, Tadahiro , ZEON CORPORATION
发明人： OHMI, Tadahiro , MORIMOTO, Akihiro , SUZUKI, Teruhiko, c/o Zeon Corporation , KATO, Takeyoshi, c/o Zeon Corporation
IPC分类号： H05K3/10 , G09F9/30
CPC分类号： H05K3/107 , H05K3/0023 , H05K3/143 , H05K2201/0108
摘要： A photosensitive transparent resin film, provided selectively with a groove reaching a transparent substrate is formed on the transparent substrate, and a wiring portion is provided in the groove substantially in flush with the photosensitive transparent resin film. The wiring portion can be formed quickly while controlling the thickness easily by preprocessing the surface of the photosensitive transparent resin film or the bottom face of the groove before the wiring portion is set in the groove.
摘要翻译：选择性地设置到达透明基板的槽的光敏透明树脂膜形成在透明基板上，并且布线部分设置在基本上与感光透明树脂膜齐平的槽中。在将布线部分设置在槽中之前，可以通过预处理感光性透明树脂膜的表面或槽的底面来容易地控制厚度，同时可以快速形成布线部分。

7. 发明授权

EP1439571B1 DEVICE AND METHOD FOR MICROWAVE PLASMA PROCESSING AND MICROWAVE POWER SUPPLY DEVICE 有权
标题翻译： DEVICE AND METHOD FOR微波等离子体处理和微波功率器件
公开(公告)号：EP1439571B1
公开(公告)日：2016-09-14
申请号：EP02775374.8
申请日：2002-10-18
申请人： Goto, Naohisa , Ohmi, Tadahiro , TOKYO ELECTRON LIMITED
发明人： GOTO, Naohisa , OHMI, Tadahiro , HIRAYAMA, Masaki , GOTO, Tetsuya
IPC分类号： H01J37/32
CPC分类号： H01J37/32229 , H01J37/32192

8. 发明授权

EP1265279B1 METHOD OF FABRICATING A FLASH MEMORY DEVICE 有权
标题翻译：用于生产的闪速存储器模块
公开(公告)号：EP1265279B1
公开(公告)日：2009-10-14
申请号：EP01912317.3
申请日：2001-03-13
申请人： Ohmi, Tadahiro
发明人： OHMI, Tadahiro , SUGAWA, Shigetoshi, Dept of Electronic Engineering
IPC分类号： H01L21/8247 , H01L29/788 , H01L29/792 , H01L27/115 , H01L21/316 , H01L21/318
CPC分类号： H01L21/31641 , C23C8/02 , C23C8/36 , H01L21/0217 , H01L21/02238 , H01L21/02247 , H01L21/02252 , H01L21/02323 , H01L21/02329 , H01L21/0234 , H01L21/3105 , H01L21/3144 , H01L21/31612 , H01L21/31637 , H01L21/31662 , H01L21/3185 , H01L27/105 , H01L27/115 , H01L27/11521 , H01L27/11526 , H01L27/11546 , H01L29/42324
摘要： A method of forming an insulation film includes the steps of forming an insulation film on a substrate, and modifying a film quality of the insulation film by exposing the insulation film to atomic state oxygen O* or atomic state hydrogen nitride radicals NH* formed with plasma that uses Kr or Ar as inert gas.

9. 发明授权

EP1486714B1 FLUID COUPLING 有权
标题翻译：流量离合器
公开(公告)号：EP1486714B1
公开(公告)日：2008-08-27
申请号：EP02705285.1
申请日：2002-03-18
申请人： Fujikin Incorporated , Ohmi, Tadahiro
发明人： OHMI, Tadahiro , YAMAJI, Michio Fujikin Incorporated , NOJIMA, Shinya Fujikin Incorporated , KATSUMI, Yukito Fujikin Incorporated , SHINOHARA, Tsutomu Fujikin Incorporated
IPC分类号： F16L19/00 , F16J15/10
CPC分类号： F16J15/02 , F16J15/062 , F16J15/104 , F16L19/00 , F16L19/0212 , F16L19/0218 , F16L25/0018 , F16L27/082 , F16L27/0828 , Y10S277/925 , Y10S285/917
摘要： At the abutting end faces of coupling members (1, 2), annular recesses (3, 4) having annular protrusions (5, 6) on the bottom face are provided while surrounding fluid channels (1a, 2a). A gasket (10) comprises a seal part (11) interposed between the protrusions (5, 6) of the coupling members (1, 2) while having an outside diameter smaller than the diameter of the annular recesses (3, 4), and a guide part (12) disposed on the outside of the seal part (11) while having an outside diameter being fitted in the annular recesses (3, 4). When the coupling members (1, 2) are fastened properly, the end faces thereof abut each other. An annular groove (14) is made in the outer circumference of the seal part (11) and a snap ring (13) fitted in the annular groove (14) couples the seal part (11) and the guide part (12).

10. 发明授权

EP1126347B1 METHOD FOR DETECTING ABNORMAL FLOW RATE FOR PRESSURE FLOW RATE CONTROLLER 有权
标题翻译：检测方法的异常流量在流量控制的加压流体
公开(公告)号：EP1126347B1
公开(公告)日：2007-09-12
申请号：EP00948265.4
申请日：2000-07-27
申请人： TOKYO ELECTRON LIMITED , FUJIKIN INCORPORATED , Ohmi, Tadahiro , Iida, Seiichi
发明人： OHMI, Tadahiro , IIDA, Seiichi , KAGATSUME, Satoshi, Tokyo Electron Yamanashi Ltd. , HIROSE, Jun, Tokyo Electron Yamanashi Ltd. , FUKASAWA, Kazuo, Tokyo Electron Yamanashi Ltd. , KOIZUMI, Hiroshi, Tokyo Electron Yamanashi Ltd. , NAGAOKA, Hideki, Tokyo Electron Yamanashi Ltd. , UNO, Tomio, Fujikin Incorporated , NISHINO, Kouji, Fujikin Incorporated , IKEDA, Nobukazu, Fujikin Incorporated , DOHI, Ryousuke, Fujikin Incorporated , IDETA, Eiji, Fujikin Incorporated
IPC分类号： G05B23/02 , F16K17/22 , G05D7/06 , G01D21/00
CPC分类号： G05B23/0235 , G05B23/0256 , G05D7/0635 , Y10T137/0396 , Y10T137/7759 , Y10T137/7761 , Y10T137/8326
摘要： A method for detecting abnormal flow rate by easily detecting an obstruction of an orifice while a fluid pressure flow rate controller using an orifice is controlling the flow rate. The method uses a flow rate controller (FCS) so as to calculate the flow rate Qc on the downstream side when the upstream-side pressure P1 is maintained at a value about twice or more the downstream-side pressure P2 from Qc=KP1 (K: constant) and to control the operation of a control valve (CV) according to a signal Qy representing the difference between the calculated flow rate Qc and a preset flow rate Qs. A testing circuit or flow rate setting circuit provided separately outputs a testing signal ΔQs having a testing amplitude V0 to the control valve (CV). The pressure amplitude V of a pressure variation ΔP1 of the upstream-side pressure P1 occurring in response to the opening/closing of the control valve (CV) is measured. When the pressure amplitude V decreases below a limit amplitude Vt, the obstruction of the orifice is announced, thus implementing the method. If the testing signal ΔQs is superimposed on a steady-state preset flow rate signal Qs0 and outputted together from the testing circuit or the flow rate setting circuit to the control valve (CV), an abnormal flow rate can be detected while controlling the flow rate by using the steady-state preset flow rate signal Qs0.

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