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    • 1. 发明公开
    • Non-volatile semiconductor storage device
    • 非易失性半导体存储装置
    • EP0942432A2
    • 1999-09-15
    • EP99103972.8
    • 1999-03-10
    • NEC CORPORATION
    • Kobatake, Hiroyuki
    • G11C16/06
    • G11C16/30G11C16/10
    • Disclosed herein is a non-volatile semiconductor storage device having a plurality of non-volatile memory cells formed by cell transistors (CTr1) in which a first voltage is applied to a word line (WL) through an address selection circuit (11) and a second voltage lower than the first voltage is applied to the transistors (STr1 and STr2) through a selection line (SL) and/or a bit line (BL). The voltage applied to the transistors (CTr1, STr1 and STr2) is lower than that conventionally employed. Accordingly, a withstand voltage of the transistor (CTr1, STr1 and STr2) can be reduced to decrease the occupied area of the transistors (CTr1, STr1 and STr2) and the like to realize higher integration.
    • 本发明公开了一种非易失性半导体存储装置,其具有由单元晶体管(CTr1)形成的多个非易失性存储单元,其中第一电压通过地址选择电路(11)施加到字线(WL) 通过选择线(SL)和/或位线(BL)将低于第一电压的第二电压施加到晶体管(STr1和STr2)。 施加到晶体管(CTr1,STr1和STr2)的电压低于常规使用的电压。 因此,可以降低晶体管(CTr1,STr1和STr2)的耐受电压以减小晶体管(CTr1,STr1和STr2)等的占用面积以实现更高的集成度。
    • 7. 发明公开
    • Non-volatile semiconductor memory device with write circuit having a latch and a transfer gate
    • Schreibschaltung mit Verriegelungschaltung undÜbertragungstransistorin einernichtflüchtigenSpeicherzellenanordnung
    • EP0880180A1
    • 1998-11-25
    • EP98109119.2
    • 1998-05-19
    • NEC CORPORATION
    • Kobatake, Hiroyuki
    • H01L27/115G11C16/06
    • G11C16/10
    • A non-volatile semiconductor memory device of the present invention has a write circuit and bit line coupled to the latch circuit. Write data is latched in a latch circuit. Output from the write circuit is sent to corresponding bit line by a transfer gate. During data write term, a write voltage is applied to the bit line when writing a "0" and zero volts is applied to the bit line when writing a "1". The bit line therefore is not left in a floating state when writing either a "0" or a "1". A rise in voltage potential of a bit line due to noise is prevented from occurring, thereby eliminating data writing errors.
    • 本发明的非易失性半导体存储器件具有耦合到锁存电路的写入电路和位线。 写数据被锁存在锁存电路中。 来自写入电路的输出通过传输门发送到相应的位线。 在数据写入期间,当写入“0”时,写入电压被施加到位线,写入“1”时将零电压施加到位线。 因此,当写入“0”或“1”时,位线不会处于浮动状态。 由于噪声引起的位线的电压电位的上升被防止发生,从而消除数据写入错误。
    • 8. 发明公开
    • Read-only semiconductor memory device
    • 只读与浮动栅极的半导体存储器件
    • EP0820102A2
    • 1998-01-21
    • EP97112090.2
    • 1997-07-15
    • NEC CORPORATION
    • Kobatake, Hiroyuki
    • H01L27/115
    • H01L27/115
    • An n-type drain diffusion layer (11), an n-type source diffusion layer (12) and an n-type control gate diffusion layer (14) are formed on the surface of a p-type semiconductor substrate (10). Furthermore, an n-type well (15) is connected to the control gate diffusion layer (14). A control gate electrode (54) of aluminum is connected to the well (15). An isolation oxide layer (17) is formed between the control gate electrode (54) and the control gate diffusion layer (14). On the other hand, a first insulation layer (19a,19b) is formed on the drain diffusion layer (11), the source diffusion layer (12) and the control gate diffusion layer (14). Also, a floating gate (13) is formed on the first insulation layer (19a, 19b). The upper portion and the side portion of the floating gate (13) are covered with a second insulation layer (20). The floating gate (13) is completely covered with a protective gate (18) via the second insulation layer (20). The end edge of the protective gate (18) opposes to the well (15) via the isolation oxide layer (17). Also, the drain diffusion layer (11) and the protective gate are (18) connected to each other to have the same potential.