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1. 发明授权

EP2627605B1 PROCESS FOR PRODUCING HIGHLY ORDERED NANOPILLAR OR NANOHOLE STRUCTURES ON LARGE AREAS 有权转让
标题翻译：在大范围生产高度有序的纳米柱或纳米棒结构的方法
公开(公告)号：EP2627605B1
公开(公告)日：2017-12-20
申请号：EP11769797.9
申请日：2011-10-12
申请人： Max-Planck-Gesellschaft zur Förderung der Wissenschaften e.V. , Ernst-Abbe-Hochschule Jena
发明人： MORHARD, Christoph , PACHOLSKI, Claudia , SPATZ, Joachim P. , BRUNNER, Robert
IPC分类号： B81C99/00
CPC分类号： B29C59/002 , B81C99/009 , B81C2201/0149 , B82Y30/00 , G03F7/0002

2. 发明公开

EP2850030A1 HIGHLY ORDERED ARRAYS OF MICELLES OR NANOPARTICLES ON A SUBSTRATE SURFACE AND METHODS FOR PRODUCING THE SAME 有权
标题翻译：工艺生产高顺序ARRAY胶束或者纳米颗粒对基材表面
公开(公告)号：EP2850030A1
公开(公告)日：2015-03-25
申请号：EP13722999.3
申请日：2013-05-15
申请人： Max-Planck-Gesellschaft zur Förderung der Wissenschaften e.V. , Ernst-Abbe-Hochschule Jena
发明人： WILLIGES, Christian , MORHARD, Christoph , SPATZ, Joachim, P. , BRUNNER, Robert
IPC分类号： B81C1/00 , B82Y40/00 , C09D7/00
CPC分类号： B81C1/00031 , B81B2207/056 , B81C2201/0149 , B81C2201/0198 , B82Y30/00 , B82Y40/00 , C23C18/06 , C23C18/08
摘要： The invention provides a method for increasing the order of an array of polymeric micelles or of nanoparticles on a substrate surface comprising a) providing an ordered array of micelles or nanoparticles coated with a polymer shell on a substrate surface and b) annealing the array of micelles or nanoparticles by ultrasonication in a liquid medium which is selected from the group comprising H
2 0, a polar organic solvent and a mixture of H
2 0 and a polar organic solvent. In a related aspect, the invention provides the highly ordered arrays of micelles or nanoparticles obtainable by the methods of the invention.

3. 发明授权

EP2850030B1 METHOD FOR PRODUCING HIGHLY ORDERED ARRAYS OF MICELLES OR NANOPARTICLES ON A SUBSTRATE SURFACE 有权
标题翻译：工艺生产高顺序ARRAY胶束或者纳米颗粒对基材表面
公开(公告)号：EP2850030B1
公开(公告)日：2016-08-10
申请号：EP13722999.3
申请日：2013-05-15
申请人： Max-Planck-Gesellschaft zur Förderung der Wissenschaften e.V. , Ernst-Abbe-Hochschule Jena
发明人： WILLIGES, Christian , MORHARD, Christoph , SPATZ, Joachim, P. , BRUNNER, Robert
IPC分类号： B81C1/00 , B82Y40/00 , C09D7/00 , B82Y30/00
CPC分类号： B81C1/00031 , B81B2207/056 , B81C2201/0149 , B81C2201/0198 , B82Y30/00 , B82Y40/00 , C23C18/06 , C23C18/08

4. 发明公开

EP3274312A1 FABRICATION OF NANOSTRUCTURES IN AND ON ORGANIC AND INORGANIC SUBSTRATES USING MEDIATING LAYERS 审中-实审
标题翻译：使用介质层制造有机和无机基底中的纳米结构
公开(公告)号：EP3274312A1
公开(公告)日：2018-01-31
申请号：EP15712257.3
申请日：2015-03-24
申请人： Max-Planck-Gesellschaft zur Förderung der Wissenschaften e.V.
发明人： DIRKS, Jan-Henning , CHEN, Wenwen , SPATZ, Joachim P. , BRUNNER, Robert , KRAUS, Matthias
IPC分类号： C03C17/34 , C08J7/00
CPC分类号： C03C17/34 , B82Y20/00 , B82Y40/00 , C03C17/3435 , C03C2217/73 , C03C2217/734 , C03C2217/77 , C03C2217/91 , C03C2218/33 , C03C2218/34 , C08J7/00 , C23C16/0245 , G02B1/11 , G02B1/118 , G03F7/0002 , G03F7/0005 , G03F7/001
摘要： The present invention relates to a method for creating nanostructures in and on organic or inorganic substrates comprising at least the following steps: a) providing a primary substrate having a predetermined refractive index; b) coating the primary substrate with one or more mediating layers each having a predetermined refractive index different from that of the primary substrate, wherein the sequence of the layers is arranged so that a predetermined gradient of the refractive index is generated between the primary substrate and the uppermost layer of the one or more mediating layers; c) optionally coating the uppermost layer of the one or more mediating layers with an additional top layer; d) depositing a nanostructured etching mask onto the uppermost layer of the composite substrate obtained after steps a)-b) or a)-c); e) generating protruding structures, in particular conical or pillar structures, or recessed structures, in particular holes, in at least the uppermost layer of the composite substrate by means of reactive ion etching. A further aspect of the invention relates to a composite substrate with a nanostructured surface obtainable by said method.

5. 发明公开

EP2627605A2 PROCESS FOR PRODUCING HIGHLY ORDERED NANOPILLAR OR NANOHOLE STRUCTURES ON LARGE AREAS 有权转让
标题翻译：方法对高层次HerstellingNANOSÄULEN-或纳米孔结构的大型区域
公开(公告)号：EP2627605A2
公开(公告)日：2013-08-21
申请号：EP11769797.9
申请日：2011-10-12
申请人： Max-Planck-Gesellschaft zur Förderung der Wissenschaften e.V. , Fachhochschule Jena
发明人： MORHARD, Christoph , PACHOLSKI, Claudia , SPATZ, Joachim P. , BRUNNER, Robert
IPC分类号： B81C1/00
CPC分类号： B29C59/002 , B81C99/009 , B81C2201/0149 , B82Y30/00 , G03F7/0002
摘要： The present invention relates to an improved process for producing highly ordered nanopillar or nanohole structures, in particular on large areas, which can be used as masters in NIL, hot embossing or injection molding processes. In a preferred embodiment, said process comprises at least the following steps: a) providing a primary substrate that is decorated on at least one surface with an ordered array of metal nanoparticles produced by means of a micellar block-copolymer nanolithography process; b) etching the primary substrate of step a) in a predetermined depth, preferably in the range from 50 to 500 nm, wherein the nanoparticles act as a mask and an ordered array of nanopillars or nanocones corresponding to the positions of the nanoparticles is produced; c) using the nanostructured substrate obtained in step b) as a master or stamp in nanoimprint lithographic (NIL), hot embossing or injection molding processes. In another preferred embodiment, said process comprises the steps a) and b) above and additionally c) coating the nanostructured substrate surface obtained in step b) with a continuous metal layer; d) selective etching of the product of step c) using an etching agent, e.g. HF, which removes the primary substrate but not the metal layer, resulting in a metal substrate comprising an ordered array of nanoholes which is a negative of the original array of nanopillars or nanocones.
摘要翻译：本发明涉及到改进的方法用于在大面积上，其可被用作NIL主人，热压印或注塑方法生产高度有序的纳米柱或纳米孔结构，特别是。该方法涉及在由胶束的嵌段共聚物的纳米光刻工艺来制造的金属纳米颗粒的有序阵列装饰用表面; 蚀刻所述主基板至50至500纳米，其中所述纳米颗粒充当掩模和在纳米柱或纳米锥对应于纳米颗粒如此产生的位置的有序阵列的深度; 使用该纳米结构化主站或在邮票的结构化过程。所以成品纳米结构化基底表面可以被用作牺牲主所有的涂有连续的金属层，然后将主被刻蚀掉，留下具有纳米孔的所有有序阵列，其是负纳米柱或的原始阵列的金属邮票纳米锥。

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