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1. 发明授权

EP0397530B1 Alignment apparatus 失效
标题翻译：对齐。
公开(公告)号：EP0397530B1
公开(公告)日：1994-07-27
申请号：EP90305127.4
申请日：1990-05-11
申请人： MATSUSHITA ELECTRIC INDUSTRIAL CO., LTD.
发明人： Aoki, Shinichiro , Sato, Takeo , Yamaguchi, Katsumasa , Yamamoto, Masaki
IPC分类号： G01B11/00 , G03B41/00 , G03F9/00 , H01L21/00
CPC分类号： G03F9/7065 , G03F9/7049

2. 发明公开

EP0309281A3 Apparatus for controlling relation in position between a photomask and a wafer 失效
标题翻译：用于控制光电晶体与波导之间位置关系的装置
公开(公告)号：EP0309281A3
公开(公告)日：1990-06-20
申请号：EP88308878.3
申请日：1988-09-23
申请人： MATSUSHITA ELECTRIC INDUSTRIAL CO., LTD.
发明人： Sato, Takeo , Aoki, Shinichiro , Yamaguchi, Katsumasa , Kaneko, Tadashi , Nomura, Noboru , Koga, Keisuke , Yamashita, Kazuhiro
IPC分类号： H01L21/00
CPC分类号： G03F9/7065 , G03F9/7049 , H01L21/682
摘要： A system for controlling the relation in position between a photomask and a wafer for use in manufacturing apparatus of a highly integrated circuit such as large scale integration (LSI). The position control system includes a coherent light source for generating two light beams which are different in frequency and polarizing direction from each other. The light beams from the coherent light source is introduced into a first diffraction grating and the diffracted light from the first diffraction grating selectively pass through a telecentric lens system and are led to second and third diffraction gratings respectively disposed on the photomask and the wafer. Light beat signals are obtained in correspondance with the diffracted light from the second and third diffraction gratings and the position relation between the photomask and wafer is controlled on the basis of the phase difference between the obtained light beat signals which corresponds to the position difference between the photomask and the wafer.

3. 发明授权

EP0309281B1 Apparatus for controlling relation in position between a photomask and a wafer 失效
标题翻译：装置，用于控制光掩模和晶片之间的位置关系。
公开(公告)号：EP0309281B1
公开(公告)日：1995-03-08
申请号：EP88308878.3
申请日：1988-09-23
申请人： MATSUSHITA ELECTRIC INDUSTRIAL CO., LTD.
发明人： Sato, Takeo , Aoki, Shinichiro , Yamaguchi, Katsumasa , Kaneko, Tadashi , Nomura, Noboru , Koga, Keisuke , Yamashita, Kazuhiro
IPC分类号： H01L21/00
CPC分类号： G03F9/7065 , G03F9/7049 , H01L21/682

4. 发明公开

EP0397530A2 Alignment apparatus 失效
标题翻译： Ausrichtvorrichtung。
公开(公告)号：EP0397530A2
公开(公告)日：1990-11-14
申请号：EP90305127.4
申请日：1990-05-11
申请人： MATSUSHITA ELECTRIC INDUSTRIAL CO., LTD.
发明人： Aoki, Shinichiro , Sato, Takeo , Yamaguchi, Katsumasa , Yamamoto, Masaki
IPC分类号： G01B11/00 , G03B41/00 , G03F9/00 , H01L21/00
CPC分类号： G03F9/7065 , G03F9/7049
摘要： A light source (1) emits light having two components which have slightly-different frequencies and which have different planes of polarization. The emitted light is separated into first, second, and third parts travelling along different paths respectively (7,10,11). First (17), second (18), and third (19) reference gratings diffract the first, second, and third light parts respectively. First, second, and third illumination optical systems selectively transmit the diffracted first, second, and third light parts respectively. First (30), second (31), and third (32) mark gratings having predetermined orientations are formed on a mask (28) and are illuminated with the first, second, and third light parts coming from the first, second, and third illumination systems respectively. Similarly, first, second, and third mark gratings are formed on a wafer (29) and are illuminated with the first, second, and third light parts coming from the first, second, and third illumination systems respectively. A first device (38) detects first optical beat signals of the diffracted lights coming from the first mark grating on the mask and the first mark grating on the wafer. Similar detection is made for the diffracted lights coming from the other mark gratings on the mask and the wafer.
摘要翻译：光源（1）发射具有略微不同频率且具有不同极化平面的两个分量的光。发射的光被分离成分别沿不同路径行进的第一，第二和第三部分（7,10,11）。第一（17），第二（18）和第三（19）参考光栅分别衍射第一，第二和第三光部分。第一，第二和第三照明光学系统分别选择性地透射衍射的第一，第二和第三光部分。在掩模（28）上形成具有预定取向的第一（30），第二（31）和第三（32）标记光栅，并且被来自第一，第二和第三光源的第一，第二和第三光部分照明照明系统。类似地，第一，第二和第三标记光栅形成在晶片（29）上，并分别由来自第一，第二和第三照明系统的第一，第二和第三光部分照明。第一装置（38）检测来自掩模上的第一标记光栅的衍射光和晶片上的第一标记光栅的第一光学差拍信号。对来自掩模和晶片上的其他标记光栅的衍射光进行类似的检测。

5. 发明公开

EP0397530A3 Alignment apparatus 失效
标题翻译：对齐设备
公开(公告)号：EP0397530A3
公开(公告)日：1992-03-25
申请号：EP90305127.4
申请日：1990-05-11
申请人： MATSUSHITA ELECTRIC INDUSTRIAL CO., LTD.
发明人： Aoki, Shinichiro , Sato, Takeo , Yamaguchi, Katsumasa , Yamamoto, Masaki
IPC分类号： G01B11/00 , G03B41/00 , G03F9/00 , H01L21/00
CPC分类号： G03F9/7065 , G03F9/7049
摘要： A light source (1) emits light having two components which have slightly-different frequencies and which have different planes of polarization. The emitted light is separated into first, second, and third parts travelling along different paths respectively (7,10,11). First (17), second (18), and third (19) reference gratings diffract the first, second, and third light parts respectively. First, second, and third illumination optical systems selectively transmit the diffracted first, second, and third light parts respectively. First (30), second (31), and third (32) mark gratings having predetermined orientations are formed on a mask (28) and are illuminated with the first, second, and third light parts coming from the first, second, and third illumination systems respectively. Similarly, first, second, and third mark gratings are formed on a wafer (29) and are illuminated with the first, second, and third light parts coming from the first, second, and third illumination systems respectively. A first device (38) detects first optical beat signals of the diffracted lights coming from the first mark grating on the mask and the first mark grating on the wafer. Similar detection is made for the diffracted lights coming from the other mark gratings on the mask and the wafer.

6. 发明授权

EP0229194B1 Laser beam processing apparatus 失效
标题翻译：激光加工设备
公开(公告)号：EP0229194B1
公开(公告)日：1990-08-01
申请号：EP85114657.1
申请日：1985-11-18
申请人： MATSUSHITA ELECTRIC INDUSTRIAL CO., LTD.
发明人： Masaki, Takeshi , Kawata, Koichi , Sakagaito, Yukuo , Yamaguchi, Katsumasa , Kinoshiro, Hiromichi No. 302, Raionzu-manshon , Toba, Hiroto
IPC分类号： B23K26/06 , G02B26/04 , H01S3/121
CPC分类号： B23K26/0673 , B23K26/067 , G02B26/04

7. 发明公开

EP0309281A2 Apparatus for controlling relation in position between a photomask and a wafer 失效
标题翻译： Vorrichtung zur Kontrolle desLageverhältnisseszwischen einer Photomaske und einemPlättchen。
公开(公告)号：EP0309281A2
公开(公告)日：1989-03-29
申请号：EP88308878.3
申请日：1988-09-23
申请人： MATSUSHITA ELECTRIC INDUSTRIAL CO., LTD.
发明人： Sato, Takeo , Aoki, Shinichiro , Yamaguchi, Katsumasa , Kaneko, Tadashi , Nomura, Noboru , Koga, Keisuke , Yamashita, Kazuhiro
IPC分类号： H01L21/00
CPC分类号： G03F9/7065 , G03F9/7049 , H01L21/682
摘要： A system for controlling the relation in position between a photomask and a wafer for use in manufacturing apparatus of a highly integrated circuit such as large scale integration (LSI). The position control system includes a coherent light source for generating two light beams which are different in frequency and polarizing direction from each other. The light beams from the coherent light source is introduced into a first diffraction grating and the diffracted light from the first diffraction grating selectively pass through a telecentric lens system and are led to second and third diffraction gratings respectively disposed on the photomask and the wafer. Light beat signals are obtained in correspondance with the diffracted light from the second and third diffraction gratings and the position relation between the photomask and wafer is controlled on the basis of the phase difference between the obtained light beat signals which corresponds to the position difference between the photomask and the wafer.
摘要翻译：一种用于控制在诸如大规模集成（LSI）的高度集成电路的制造装置中使用的光掩模和晶片之间的位置关系的系统。位置控制系统包括相干光源，用于产生频率和偏振方向彼此不同的两个光束。来自相干光源的光束被引入到第一衍射光栅中，并且来自第一衍射光栅的衍射光选择性地通过远心透镜系统，并被引导到分别设置在光掩模和晶片上的第二和第三衍射光栅。根据来自第二和第三衍射光栅的衍射光获得光拍信号，并且基于获得的光拍信号之间的相位差来控制光掩模和晶片之间的位置关系，该相位差对应于第二和第三衍射光栅之间的位置差光掩模和晶片。

8. 发明公开

EP0229194A1 Laser beam processing apparatus 失效
标题翻译： Laserstrahlbearbeitungsgerät。
公开(公告)号：EP0229194A1
公开(公告)日：1987-07-22
申请号：EP85114657.1
申请日：1985-11-18
申请人： MATSUSHITA ELECTRIC INDUSTRIAL CO., LTD.
发明人： Masaki, Takeshi , Kawata, Koichi , Sakagaito, Yukuo , Yamaguchi, Katsumasa , Kinoshiro, Hiromichi No. 302, Raionzu-manshon , Toba, Hiroto
IPC分类号： B23K26/06 , G02B26/04 , H01S3/121
CPC分类号： B23K26/0673 , B23K26/067 , G02B26/04
摘要： Processing of plural works can be made simultaneously by using divided laser beams which is issued from one large C 02 laser beam source, the dividing being made by one or more rotary chopper mirror(s) comprising reflecting parts and light passing parts, and its ration and pulsive start and stop of laser oscillation are controlled in interrelated manner and by controlling the duty time of the laser oscillation in PWM manner. The distribution of powers of the laser beams divided by the rotary chopper mirrors is desirably selectable, thereby enabling simultaneous processing of plural works under the different processing conditions.
摘要翻译：可以通过使用从一个大的Co 2激光束源发出的分割激光束同时进行多个工作的处理，该分割由包括反射部分和光通过部分的一个或多个旋转斩光镜制成，其分配由以相互关联的方式控制激光振荡的脉动启动和停止，并以PWM方式控制激光振荡的占空比。由旋转斩波镜分割的激光束的功率分布是可以选择的，从而能够在不同的处理条件下同时处理多个作品。

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