专利快速检索-快速检索全球专利，免费商用专利数据库-IPRDB

1. 发明授权

EP0309281B1 Apparatus for controlling relation in position between a photomask and a wafer 失效
标题翻译：装置，用于控制光掩模和晶片之间的位置关系。
公开(公告)号：EP0309281B1
公开(公告)日：1995-03-08
申请号：EP88308878.3
申请日：1988-09-23
申请人： MATSUSHITA ELECTRIC INDUSTRIAL CO., LTD.
发明人： Sato, Takeo , Aoki, Shinichiro , Yamaguchi, Katsumasa , Kaneko, Tadashi , Nomura, Noboru , Koga, Keisuke , Yamashita, Kazuhiro
IPC分类号： H01L21/00
CPC分类号： G03F9/7065 , G03F9/7049 , H01L21/682

2. 发明公开

EP0309281A3 Apparatus for controlling relation in position between a photomask and a wafer 失效
标题翻译：用于控制光电晶体与波导之间位置关系的装置
公开(公告)号：EP0309281A3
公开(公告)日：1990-06-20
申请号：EP88308878.3
申请日：1988-09-23
申请人： MATSUSHITA ELECTRIC INDUSTRIAL CO., LTD.
发明人： Sato, Takeo , Aoki, Shinichiro , Yamaguchi, Katsumasa , Kaneko, Tadashi , Nomura, Noboru , Koga, Keisuke , Yamashita, Kazuhiro
IPC分类号： H01L21/00
CPC分类号： G03F9/7065 , G03F9/7049 , H01L21/682
摘要： A system for controlling the relation in position between a photomask and a wafer for use in manufacturing apparatus of a highly integrated circuit such as large scale integration (LSI). The position control system includes a coherent light source for generating two light beams which are different in frequency and polarizing direction from each other. The light beams from the coherent light source is introduced into a first diffraction grating and the diffracted light from the first diffraction grating selectively pass through a telecentric lens system and are led to second and third diffraction gratings respectively disposed on the photomask and the wafer. Light beat signals are obtained in correspondance with the diffracted light from the second and third diffraction gratings and the position relation between the photomask and wafer is controlled on the basis of the phase difference between the obtained light beat signals which corresponds to the position difference between the photomask and the wafer.

3. 发明公开

EP0309281A2 Apparatus for controlling relation in position between a photomask and a wafer 失效
标题翻译： Vorrichtung zur Kontrolle desLageverhältnisseszwischen einer Photomaske und einemPlättchen。
公开(公告)号：EP0309281A2
公开(公告)日：1989-03-29
申请号：EP88308878.3
申请日：1988-09-23
申请人： MATSUSHITA ELECTRIC INDUSTRIAL CO., LTD.
发明人： Sato, Takeo , Aoki, Shinichiro , Yamaguchi, Katsumasa , Kaneko, Tadashi , Nomura, Noboru , Koga, Keisuke , Yamashita, Kazuhiro
IPC分类号： H01L21/00
CPC分类号： G03F9/7065 , G03F9/7049 , H01L21/682
摘要： A system for controlling the relation in position between a photomask and a wafer for use in manufacturing apparatus of a highly integrated circuit such as large scale integration (LSI). The position control system includes a coherent light source for generating two light beams which are different in frequency and polarizing direction from each other. The light beams from the coherent light source is introduced into a first diffraction grating and the diffracted light from the first diffraction grating selectively pass through a telecentric lens system and are led to second and third diffraction gratings respectively disposed on the photomask and the wafer. Light beat signals are obtained in correspondance with the diffracted light from the second and third diffraction gratings and the position relation between the photomask and wafer is controlled on the basis of the phase difference between the obtained light beat signals which corresponds to the position difference between the photomask and the wafer.
摘要翻译：一种用于控制在诸如大规模集成（LSI）的高度集成电路的制造装置中使用的光掩模和晶片之间的位置关系的系统。位置控制系统包括相干光源，用于产生频率和偏振方向彼此不同的两个光束。来自相干光源的光束被引入到第一衍射光栅中，并且来自第一衍射光栅的衍射光选择性地通过远心透镜系统，并被引导到分别设置在光掩模和晶片上的第二和第三衍射光栅。根据来自第二和第三衍射光栅的衍射光获得光拍信号，并且基于获得的光拍信号之间的相位差来控制光掩模和晶片之间的位置关系，该相位差对应于第二和第三衍射光栅之间的位置差光掩模和晶片。

你已经成功收藏专利！

检索式保存成功!

IPRDB

热门服务

关于我们

友情链接

联系方式