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1. 发明公开

EP0309281A3 Apparatus for controlling relation in position between a photomask and a wafer 失效
标题翻译：用于控制光电晶体与波导之间位置关系的装置
公开(公告)号：EP0309281A3
公开(公告)日：1990-06-20
申请号：EP88308878.3
申请日：1988-09-23
申请人： MATSUSHITA ELECTRIC INDUSTRIAL CO., LTD.
发明人： Sato, Takeo , Aoki, Shinichiro , Yamaguchi, Katsumasa , Kaneko, Tadashi , Nomura, Noboru , Koga, Keisuke , Yamashita, Kazuhiro
IPC分类号： H01L21/00
CPC分类号： G03F9/7065 , G03F9/7049 , H01L21/682
摘要： A system for controlling the relation in position between a photomask and a wafer for use in manufacturing apparatus of a highly integrated circuit such as large scale integration (LSI). The position control system includes a coherent light source for generating two light beams which are different in frequency and polarizing direction from each other. The light beams from the coherent light source is introduced into a first diffraction grating and the diffracted light from the first diffraction grating selectively pass through a telecentric lens system and are led to second and third diffraction gratings respectively disposed on the photomask and the wafer. Light beat signals are obtained in correspondance with the diffracted light from the second and third diffraction gratings and the position relation between the photomask and wafer is controlled on the basis of the phase difference between the obtained light beat signals which corresponds to the position difference between the photomask and the wafer.

2. 发明公开

EP0129878A2 Ultrasonic probe having dual-motion transducer 失效
标题翻译：超声头具有双重移动传感器。
公开(公告)号：EP0129878A2
公开(公告)日：1985-01-02
申请号：EP84107190.5
申请日：1984-06-22
申请人： MATSUSHITA ELECTRIC INDUSTRIAL CO., LTD.
发明人： Sugiyama, Yoshiyuki , Aoki, Shinichiro , Morita, Yasuyuki
IPC分类号： G10K11/00 , A61B10/00
CPC分类号： G10K11/352 , A61B8/4281
摘要： In a mechanically scanned ultrasonic probe, an ultrasonic transducer (4) is swingably mounted on a drive shaft (9,9a,9b; 46; 64,67; 85) which is given a swinging transversal movement and a reciprocating longitudinal movement. The transducer emits an acoustic beam which is steered in a raster format in response to the swing and reciprocating motions. Echos returning from objects contain diagnostic data of a three-dimensional space. All the components are encased in a toothbrush-like housing having a head portion (3a), an intermediate portion (3b) and a hand-grip portion (2). The dual motions are provided by a drive mechanism accommodated in the hand-grip portion and the transducer is accommodated in the head portion. The drive shaft extends through the intermediate portion.

3. 发明授权

EP0458354B1 A compact reticle/wafer alignment system 失效
标题翻译：掩模和晶片的紧凑对准
公开(公告)号：EP0458354B1
公开(公告)日：1998-08-05
申请号：EP91108453.1
申请日：1991-05-24
申请人： MATSUSHITA ELECTRIC INDUSTRIAL CO., LTD.
发明人： Aoki, Shinichiro , Sato, Takeo , Yamamoto, Masaki , Takeuchi, Hiroyuki , Araki, Nobuhiro , Sugiyama, Yoshiyuki
IPC分类号： G03F9/00
CPC分类号： G03F9/7065 , G03F9/7049

4. 发明授权

EP0309281B1 Apparatus for controlling relation in position between a photomask and a wafer 失效
标题翻译：装置，用于控制光掩模和晶片之间的位置关系。
公开(公告)号：EP0309281B1
公开(公告)日：1995-03-08
申请号：EP88308878.3
申请日：1988-09-23
申请人： MATSUSHITA ELECTRIC INDUSTRIAL CO., LTD.
发明人： Sato, Takeo , Aoki, Shinichiro , Yamaguchi, Katsumasa , Kaneko, Tadashi , Nomura, Noboru , Koga, Keisuke , Yamashita, Kazuhiro
IPC分类号： H01L21/00
CPC分类号： G03F9/7065 , G03F9/7049 , H01L21/682

5. 发明公开

EP0477026A1 Position signal producing apparatus 失效
标题翻译： Lagesignalgeber。
公开(公告)号：EP0477026A1
公开(公告)日：1992-03-25
申请号：EP91308593.2
申请日：1991-09-20
申请人： MATSUSHITA ELECTRIC INDUSTRIAL CO., LTD.
发明人： Takeuchi, Hiroyuki , Yamamoto, Masaki , Sato, Takeo , Sugiyama, Yoshiyuki , Aoki, Shinichiro
IPC分类号： H01L21/00
CPC分类号： G03F9/7049 , H01L21/682
摘要： A position signal producing apparatus, for an apparatus for project-printing a pattern on a reticle (1) onto a wafer 82) through a project lens system (4) with exposure light (8), for producing a position signal indicative of the position of the wafer is disclosed, wherein two different frequency components (f1, f2) of alignment light (10) whose frequencies are different from that of the exposure light are interfered with each other at a position alignment blank (5) to form interference fringes (19) having a given pitch. The interference fringes are projected onto a diffraction grating (6) through an achromatizing optical system (18) and the project lens system. Diffracted light returning from the diffraction grating (6) is received by a photodetector (24) which produces a light beat signal. A position deviation signal obtained by phase comparison of the light beat signal provides position alignment by controlling relative positions between the position alignment blank (5) and the diffraction grating (6). Two light beams of the two different frequency components split by a polarized beam splitter (12) are equalized in image converting condition, or image aspect, by a mirror (60), so that an accurate mixing of the two frequency components of light beams is performed at the position alignment blank.
摘要翻译：一种位置信号产生装置，用于通过具有曝光光（8）的投影透镜系统（4）将掩模版（1）上的图案投影到晶片82上的装置，用于产生指示位置的位置信号公开了其中频率不同于曝光光的对准光（10）的两个不同频率分量（f1，f2）在位置对准空白（5）处彼此干涉以形成干涉条纹（ 19）具有给定的间距。干涉条纹通过消色光学系统（18）和投影透镜系统投影到衍射光栅（6）上。从衍射光栅（6）返回的衍射光由产生光拍信号的光电检测器（24）接收。通过对光拍信号进行相位比较而获得的位置偏移信号通过控制位置对准毛坯（5）和衍射光栅（6）之间的相对位置来提供位置对准。通过偏振分束器（12）分离的两个不同频率分量的两个光束在图像转换条件或图像方面由反射镜（60）均衡，使得光束的两个频率分量的精确混合是在位置对齐空白处执行。

6. 发明公开

EP0397530A2 Alignment apparatus 失效
标题翻译： Ausrichtvorrichtung。
公开(公告)号：EP0397530A2
公开(公告)日：1990-11-14
申请号：EP90305127.4
申请日：1990-05-11
申请人： MATSUSHITA ELECTRIC INDUSTRIAL CO., LTD.
发明人： Aoki, Shinichiro , Sato, Takeo , Yamaguchi, Katsumasa , Yamamoto, Masaki
IPC分类号： G01B11/00 , G03B41/00 , G03F9/00 , H01L21/00
CPC分类号： G03F9/7065 , G03F9/7049
摘要： A light source (1) emits light having two components which have slightly-different frequencies and which have different planes of polarization. The emitted light is separated into first, second, and third parts travelling along different paths respectively (7,10,11). First (17), second (18), and third (19) reference gratings diffract the first, second, and third light parts respectively. First, second, and third illumination optical systems selectively transmit the diffracted first, second, and third light parts respectively. First (30), second (31), and third (32) mark gratings having predetermined orientations are formed on a mask (28) and are illuminated with the first, second, and third light parts coming from the first, second, and third illumination systems respectively. Similarly, first, second, and third mark gratings are formed on a wafer (29) and are illuminated with the first, second, and third light parts coming from the first, second, and third illumination systems respectively. A first device (38) detects first optical beat signals of the diffracted lights coming from the first mark grating on the mask and the first mark grating on the wafer. Similar detection is made for the diffracted lights coming from the other mark gratings on the mask and the wafer.
摘要翻译：光源（1）发射具有略微不同频率且具有不同极化平面的两个分量的光。发射的光被分离成分别沿不同路径行进的第一，第二和第三部分（7,10,11）。第一（17），第二（18）和第三（19）参考光栅分别衍射第一，第二和第三光部分。第一，第二和第三照明光学系统分别选择性地透射衍射的第一，第二和第三光部分。在掩模（28）上形成具有预定取向的第一（30），第二（31）和第三（32）标记光栅，并且被来自第一，第二和第三光源的第一，第二和第三光部分照明照明系统。类似地，第一，第二和第三标记光栅形成在晶片（29）上，并分别由来自第一，第二和第三照明系统的第一，第二和第三光部分照明。第一装置（38）检测来自掩模上的第一标记光栅的衍射光和晶片上的第一标记光栅的第一光学差拍信号。对来自掩模和晶片上的其他标记光栅的衍射光进行类似的检测。

7. 发明授权

EP0129878B1 Ultrasonic probe having dual-motion transducer 失效
标题翻译：具有双动力传感器的超声波探头
公开(公告)号：EP0129878B1
公开(公告)日：1989-01-11
申请号：EP84107190.5
申请日：1984-06-22
申请人： MATSUSHITA ELECTRIC INDUSTRIAL CO., LTD.
发明人： Sugiyama, Yoshiyuki , Aoki, Shinichiro , Morita, Yasuyuki
IPC分类号： G10K11/00 , A61B10/00
CPC分类号： G10K11/352 , A61B8/4281

8. 发明公开

EP0408381A3 Position signal producing apparatus 失效
标题翻译：位置信号生产设备
公开(公告)号：EP0408381A3
公开(公告)日：1992-07-01
申请号：EP90307679.2
申请日：1990-07-13
申请人： MATSUSHITA ELECTRIC INDUSTRIAL CO., LTD.
发明人： Yamamoto, Masaki , Sato, Takeo , Sugiyama, Yoshiyuki , Aoki, Shinichiro , Takeuchi, Hiroyuki
IPC分类号： G01B11/00 , G03F9/00 , G03B41/00
CPC分类号： G03F9/7065 , G03F9/7049
摘要： A position signal producing apparatus, for an apparatus for project-printing a pattern on reticle (1) onto an wafer (2) through a project lens (4) with ultraviolet light, for producing a position signal indicative of position of the wafer, comprises: a laser (9) emitting two different frequency components polarized orthogonally with each other which are splitted by a polarizing beam splitter (12). The first and second components are reflected by first (15) and second (15') mirrors respectively to produce interference fringes at a given place being on an annular region within a circle defined by field angle of the project lens on the reticle through wave plates for circularly-polarizing. Another interference fringes is formed on a diffraction grating (6) of the wafer in correspondence with the interference fringes through the project lens and a lens for achromatizing the project lens at wavelength of the components. Another interference fringes reflected by the diffraction grating (6) is detected by a photodetector for producing the position signal. The interference fringes may formed on the wafer by another diffraction grating on the reticle illuminated by the first and second components in combination with polarizing elements provided between the reticle and the wafer in replace with the polarizing beam splitter (12) and wave plates (13,13').

9. 发明公开

EP0408381A2 Position signal producing apparatus 失效
标题翻译： Lagesignalgeber。
公开(公告)号：EP0408381A2
公开(公告)日：1991-01-16
申请号：EP90307679.2
申请日：1990-07-13
申请人： MATSUSHITA ELECTRIC INDUSTRIAL CO., LTD.
发明人： Yamamoto, Masaki , Sato, Takeo , Sugiyama, Yoshiyuki , Aoki, Shinichiro , Takeuchi, Hiroyuki
IPC分类号： G01B11/00 , G03F9/00 , G03B41/00
CPC分类号： G03F9/7065 , G03F9/7049
摘要： A position signal producing apparatus, for an apparatus for project-printing a pattern on reticle (1) onto an wafer (2) through a project lens (4) with ultraviolet light, for producing a position signal indicative of position of the wafer, comprises: a laser (9) emitting two different frequency components polarized orthogonally with each other which are splitted by a polarizing beam splitter (12). The first and second components are reflected by first (15) and second (15') mirrors respectively to produce interference fringes at a given place being on an annular region within a circle defined by field angle of the project lens on the reticle through wave plates for circularly-polarizing. Another interference fringes is formed on a diffraction grating (6) of the wafer in correspondence with the interference fringes through the project lens and a lens for achromatizing the project lens at wavelength of the components. Another interference fringes reflected by the diffraction grating (6) is detected by a photodetector for producing the position signal. The interference fringes may formed on the wafer by another diffraction grating on the reticle illuminated by the first and second components in combination with polarizing elements provided between the reticle and the wafer in replace with the polarizing beam splitter (12) and wave plates (13,13').
摘要翻译：一种位置信号产生装置，用于通过具有紫外光的投影透镜将掩模版投射到晶片上的图案的装置，用于产生指示晶片位置的位置信号，包括：发射两个不同频率分量极化的激光彼此正交地由偏振分束器分裂。第一和第二分量分别由第一和第二反射镜反射以在给定的位置处产生干涉条纹，该干涉条纹位于通过用于圆偏振的波片在标线片上的投影透镜的视场角限定的圆内的环形区域上。对应于通过投影透镜的干涉条纹和用于使投影透镜在组件的波长处消色差的透镜在晶片的衍射光栅上形成另外的干涉条纹。由衍射光栅反射的另一个干涉条纹由用于产生位置信号的光电检测器检测。干涉条纹可以通过由第一和第二部件照射的标线片上的另一个衍射光栅与设置在标线片和晶片之间的偏振元件组合替代偏振分束器和波片而形成在晶片上。

10. 发明公开

EP0309281A2 Apparatus for controlling relation in position between a photomask and a wafer 失效
标题翻译： Vorrichtung zur Kontrolle desLageverhältnisseszwischen einer Photomaske und einemPlättchen。
公开(公告)号：EP0309281A2
公开(公告)日：1989-03-29
申请号：EP88308878.3
申请日：1988-09-23
申请人： MATSUSHITA ELECTRIC INDUSTRIAL CO., LTD.
发明人： Sato, Takeo , Aoki, Shinichiro , Yamaguchi, Katsumasa , Kaneko, Tadashi , Nomura, Noboru , Koga, Keisuke , Yamashita, Kazuhiro
IPC分类号： H01L21/00
CPC分类号： G03F9/7065 , G03F9/7049 , H01L21/682
摘要： A system for controlling the relation in position between a photomask and a wafer for use in manufacturing apparatus of a highly integrated circuit such as large scale integration (LSI). The position control system includes a coherent light source for generating two light beams which are different in frequency and polarizing direction from each other. The light beams from the coherent light source is introduced into a first diffraction grating and the diffracted light from the first diffraction grating selectively pass through a telecentric lens system and are led to second and third diffraction gratings respectively disposed on the photomask and the wafer. Light beat signals are obtained in correspondance with the diffracted light from the second and third diffraction gratings and the position relation between the photomask and wafer is controlled on the basis of the phase difference between the obtained light beat signals which corresponds to the position difference between the photomask and the wafer.
摘要翻译：一种用于控制在诸如大规模集成（LSI）的高度集成电路的制造装置中使用的光掩模和晶片之间的位置关系的系统。位置控制系统包括相干光源，用于产生频率和偏振方向彼此不同的两个光束。来自相干光源的光束被引入到第一衍射光栅中，并且来自第一衍射光栅的衍射光选择性地通过远心透镜系统，并被引导到分别设置在光掩模和晶片上的第二和第三衍射光栅。根据来自第二和第三衍射光栅的衍射光获得光拍信号，并且基于获得的光拍信号之间的相位差来控制光掩模和晶片之间的位置关系，该相位差对应于第二和第三衍射光栅之间的位置差光掩模和晶片。

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