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1. 发明公开

EP0762251A1 A pattern alignment and cutting system 失效转让
标题翻译： Musterausrichtungs- und -schnittsystem
公开(公告)号：EP0762251A1
公开(公告)日：1997-03-12
申请号：EP96113779.1
申请日：1996-08-28
申请人： Gerber Garment Technology, Inc.
发明人： Clarino, Thomas N. , McFadden Altshul, Mary
IPC分类号： G05B19/42 , A41H3/00
CPC分类号： G05B19/4205 , B26D5/007 , B26D7/015 , B26D2005/002 , B26F1/3813 , C14B5/00 , G05B2219/35162 , G06Q10/043
摘要： A pattern alignment system for use during the garment development process prior to the cutting operation includes a table with work surface (64). There is a digitizer located with the surface. The operator establishes a perimeter (24) of a hide or other fabric piece that has been positioned on the surface with a stylus (66) that presents position signals to a controller in real time. The controller has signals corresponding to a marker and further includes algorithms to compose the drawn lines or points into an electronic representation of the piece perimeter. Defects, textures or the like in the piece are identified in a similar manner. The system includes algorithms which enable the operator to reposition one or more garment segment patterns (12, 14) in the marker to avoid defects or otherwise optimize the segment position on the piece.
摘要翻译：在切割操作之前的服装开发过程中使用的图案对准系统包括具有工作表面（64）的工作台。有一个位于表面的数字化仪。操作者用触针（66）定位在表面上的皮革或其他织物片的周边（24），该触针（66）实时地向控制器呈现位置信号。控制器具有对应于标记的信号，并且还包括将绘制的线或点组合成片周边的电子表示的算法。以相似的方式识别片中的缺陷，纹理等。该系统包括使操作者能够重新定位标记中的一个或多个服装段图案（12,14）的算法，以避免缺陷或以其他方式优化片上的片段位置。

2. 发明公开

EP0512338A3 A pattern development system 有权转让
标题翻译：模式开发系统
公开(公告)号：EP0512338A3
公开(公告)日：1993-10-06
申请号：EP92107032.2
申请日：1992-04-24
申请人： Gerber Garment Technology, Inc.
发明人： Clarino, Thomas N. , Altshul, Mary McFadden
IPC分类号： A41H3/00 , G06F15/60
CPC分类号： G06F3/03545 , A41H3/007 , G06T11/00
摘要： A pattern development system (46) for use during the garment development process includes a digitizer (48) with a work surface (56). The designer draws the lines (36) of a garment pattern segment (38) on a sheet (54) placed on the work surface with a stylus (50̸) that enables the digitizer to present position signals to a controller (58) in real time. The controller includes algorithms to compose the drawn lines into a garment segment pattern as well as compensate for human errors such as multiply drawn lines and missing line portions. The present system is transparent to the designer in operation as it adapts to the human designer rather than forcing the designer to adapt to the system.

3. 发明公开

EP0512338A2 A pattern development system 有权转让
标题翻译： Musterentwicklungssystem。
公开(公告)号：EP0512338A2
公开(公告)日：1992-11-11
申请号：EP92107032.2
申请日：1992-04-24
申请人： Gerber Garment Technology, Inc.
发明人： Clarino, Thomas N. , Altshul, Mary McFadden
IPC分类号： A41H3/00 , G06F15/60
CPC分类号： G06F3/03545 , A41H3/007 , G06T11/00
摘要： A pattern development system (46) for use during the garment development process includes a digitizer (48) with a work surface (56). The designer draws the lines (36) of a garment pattern segment (38) on a sheet (54) placed on the work surface with a stylus (50̸) that enables the digitizer to present position signals to a controller (58) in real time. The controller includes algorithms to compose the drawn lines into a garment segment pattern as well as compensate for human errors such as multiply drawn lines and missing line portions. The present system is transparent to the designer in operation as it adapts to the human designer rather than forcing the designer to adapt to the system.
摘要翻译：在服装开发过程中使用的图案展开系统（46）包括具有工作表面（56）的数字化器（48）。设计人员使用能够使数字化仪实时地向控制器（58）呈现位置信号的触笔（50），将衣服图案片段（38）的线（36）绘制在放置在工作表面上的片材（54）上。控制器包括将绘制的线组合成服装区段图案的算法，以及补偿诸如乘法线和缺失线部分之类的人为错误。目前的系统对设计人员的操作是透明的，因为它适应了人类设计师，而不是迫使设计人员适应系统。

4. 发明授权

EP0762251B1 A pattern alignment and cutting system 失效转让
标题翻译：图案对齐和编辑系统
公开(公告)号：EP0762251B1
公开(公告)日：1998-10-07
申请号：EP96113779.1
申请日：1996-08-28
申请人： Gerber Garment Technology, Inc.
发明人： Clarino, Thomas N. , McFadden Altshul, Mary
IPC分类号： G05B19/42 , A41H3/00
CPC分类号： G05B19/4205 , B26D5/007 , B26D7/015 , B26D2005/002 , B26F1/3813 , C14B5/00 , G05B2219/35162 , G06Q10/043

5. 发明授权

EP0512338B1 A pattern development system 有权转让
标题翻译：模式开发系统
公开(公告)号：EP0512338B1
公开(公告)日：1998-01-21
申请号：EP92107032.2
申请日：1992-04-24
申请人： Gerber Garment Technology, Inc.
发明人： Clarino, Thomas N. , Altshul, Mary McFadden
IPC分类号： A41H3/00 , G06F17/50
CPC分类号： G06F3/03545 , A41H3/007 , G06T11/00

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