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1. 发明公开

EP3096343A1 ELECTRON BEAM MICROSCOPE WITH IMPROVED IMAGING GAS AND METHOD OF USE 有权
标题翻译：方法用于成像的样品与带电粒子束利用气体图
公开(公告)号：EP3096343A1
公开(公告)日：2016-11-23
申请号：EP16169828.7
申请日：2016-05-17
申请人： FEI Company
发明人： Shanley, Toby , Scott, John , Toth, Milos
IPC分类号： H01J37/244
CPC分类号： H01J37/18 , H01J37/22 , H01J37/244 , H01J37/28 , H01J2237/182 , H01J2237/2448 , H01J2237/2605 , H01J2237/2608 , H01J2237/2801 , H01J2237/2806
摘要： Charged particle beam imaging and measurement systems are provided using gas amplification with an improved imaging gas. The system includes a charged particle beam source for directing a charged particle beam to work piece, a focusing lens for focusing the charged particles onto the work piece, and an electrode for accelerating secondary electrons generated from the work piece irradiation by the charged practice beam, or another gas cascade detection scheme. The gas imaging is performed in a high pressure scanning electron microscope (HPSEM) chamber for enclosing the improved imaging gas including CH 3 CH 2 OH (ethanol) vapor. The electrode accelerates the secondary electrons though the CH 3 CH 2 OH to ionize the CH 3 CH 2 OH through ionization cascade to amplify the number of secondary electrons for detection. An optimal configuration is provided for use of the improved imaging gas, and techniques are provided to conduct imaging studies of organic liquids and solvents, and other CH 3 CH 2 OH-based processes.
摘要翻译：使用气体放大具有改善的气体的成像提供带电粒子束成像和测量系统。该系统包括用于将带电粒子束到工件，用于聚焦带电粒子到工件上的聚焦透镜，和在电极用于加速由所述带电实践束从工件照射而产生的二次电子的带电粒子束源，或其它气体级联检测方案。气体成像在高压扫描电子显微镜（HPSEM）室中进行用于封闭所述改进的成像气体包括CH 3 CH 2 OH（乙醇）的蒸气。电极加速二次电子虽然CH 3 CH 2 OH通过电离级联电离CH 3 CH 2 OH以放大探测二次电子的数量。的最优配置提供了一种用于使用改进的成像气体的，并且提供的技术来进行的有机液体和溶剂，以及其他CH 3 CH 2 OH基的流程成像研究。

2. 发明授权

EP3096343B1 METHOD OF IMAGING A SAMPLE WITH CHARGED PARTICLE BEAM USING AN IMAGING GAS 有权
标题翻译：用成像气体成像带电荷粒子束的样品的方法
公开(公告)号：EP3096343B1
公开(公告)日：2017-12-27
申请号：EP16169828.7
申请日：2016-05-17
申请人： FEI Company
发明人： Shanley, Toby , Scott, John , Toth, Milos
IPC分类号： H01J37/244 , H01J37/18 , H01J37/22 , H01J37/28
CPC分类号： H01J37/18 , H01J37/22 , H01J37/244 , H01J37/28 , H01J2237/182 , H01J2237/2448 , H01J2237/2605 , H01J2237/2608 , H01J2237/2801 , H01J2237/2806
摘要： Charged particle beam imaging and measurement systems are provided using gas amplification with an improved imaging gas. The system includes a charged particle beam source for directing a charged particle beam to work piece, a focusing lens for focusing the charged particles onto the work piece, and an electrode for accelerating secondary electrons generated from the work piece irradiation by the charged practice beam, or another gas cascade detection scheme. The gas imaging is performed in a high pressure scanning electron microscope (HPSEM) chamber for enclosing the improved imaging gas including CH 3 CH 2 OH (ethanol) vapor. The electrode accelerates the secondary electrons though the CH 3 CH 2 OH to ionize the CH 3 CH 2 OH through ionization cascade to amplify the number of secondary electrons for detection. An optimal configuration is provided for use of the improved imaging gas, and techniques are provided to conduct imaging studies of organic liquids and solvents, and other CH 3 CH 2 OH-based processes.

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