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1. 发明授权

EP2372743B1 CHARGED PARTICLE BEAM SYSTEM WITH AN ION GENERATOR 有权
标题翻译： WITH离子发生器粒子束
公开(公告)号：EP2372743B1
公开(公告)日：2016-03-23
申请号：EP11172096.7
申请日：2003-09-18
申请人： FEI Company
发明人： Stewart, Diane , Knowles, Ralph , Kimball, Brian
IPC分类号： H01J37/00 , H01J37/244 , H01J37/26
CPC分类号： H01J37/26 , H01J37/244 , H01J2237/0045 , H01J2237/2448 , H01J2237/2605

2. 发明公开

EP2372743A2 Charged particle beam system with an ion generator 有权
标题翻译：蜂巢TEM TEM。。。。。。
公开(公告)号：EP2372743A2
公开(公告)日：2011-10-05
申请号：EP11172096.7
申请日：2003-09-18
申请人： FEI Company
发明人： Stewart, Diane , Knowles, Ralph , Kimball, Brian
IPC分类号： H01J37/00 , H01J37/244 , H01J37/26
CPC分类号： H01J37/26 , H01J37/244 , H01J2237/0045 , H01J2237/2448 , H01J2237/2605
摘要： A charged particle beam (306) system uses an ion generator (302) for charge neutralization on a work piece (307). Secondary or backscattered particles (320) enter a chamber (310) of the ion generator (302) to ionize an ion producing gas there. In some embodiments, the ion generator is configured to maintain an adequate gas pressure in the ion generator to generate ions, but a reduced pressure in the remainder of the vacuum chamber (308), so that another column can operate in the chamber either simultaneously or after an evacuation process that is much shorter than a process that would be required to evacuate the chamber from the full pressure required at the ion generator. The invention is particularly useful for repair of photolithography masks in a dual beam system.
摘要翻译：带电粒子束（306）系统使用离子发生器（302）在工件（307）上进行电荷中和。次级或后向散射的颗粒（320）进入离子发生器（302）的室（310），以将离子产生气体离子化。在一些实施例中，离子发生器被配置为在离子发生器中保持足够的气体压力以产生离子，而在真空室（308）的其余部分中减小压力，使得另一个柱可以同时在腔室中操作在疏散过程之后比从离子发生器所需的全部压力排空室所需的工艺要短得多。本发明对于双光束系统中的光刻掩模的修复特别有用。

3. 发明公开

EP2372743A3 Charged particle beam system with an ion generator 有权
标题翻译：用离子发生器粒子束系统
公开(公告)号：EP2372743A3
公开(公告)日：2014-05-14
申请号：EP11172096.7
申请日：2003-09-18
申请人： FEI Company
发明人： Stewart, Diane , Knowles, Ralph , Kimball, Brian
IPC分类号： H01J37/00 , H01J37/244 , H01J37/26
CPC分类号： H01J37/26 , H01J37/244 , H01J2237/0045 , H01J2237/2448 , H01J2237/2605
摘要： A charged particle beam (306) system uses an ion generator (302) for charge neutralization on a work piece (307). Secondary or backscattered particles (320) enter a chamber (310) of the ion generator (302) to ionize an ion producing gas there. In some embodiments, the ion generator is configured to maintain an adequate gas pressure in the ion generator to generate ions, but a reduced pressure in the remainder of the vacuum chamber (308), so that another column can operate in the chamber either simultaneously or after an evacuation process that is much shorter than a process that would be required to evacuate the chamber from the full pressure required at the ion generator. The invention is particularly useful for repair of photolithography masks in a dual beam system.

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