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1. 发明公开

EP0883244A4 FILTER CIRCUIT 失效
标题翻译：滤波电路
公开(公告)号：EP0883244A4
公开(公告)日：2005-01-12
申请号：EP97946096
申请日：1997-12-04
申请人： EBARA CORP
发明人： MURAKAMI CHIKARA , SATOH ICHIJU
IPC分类号： H03H11/04 , H03H17/02
CPC分类号： H03H11/04 , H03H17/02
摘要： A filter circuit for a biaxial signal, etc. which has an excellent sharp filtering characteristic in a narrow band, without performing conversion/inverse conversion from a coordinate system at rest to a rotatory coordinate system. Input signals related to two axes orthogonal to each other are expressed by one complex variable ( u = Ux + jUy: where Ux and Uy are Laplace transformation values of the respective signals). A complex coefficient transfer function F (s - j omega ) which is obtained by replacing the Laplacian s of F(s) is used as the transfer function of real number coefficient of a low- or high-pass filter. Output signals related to two axes orthogonal to each other and passing the input complex variable u through a complex coefficient transfer function F (s - j omega ) are expressed by one complex variable ( V = Vx + jVy: where Vx and Vy are Laplace transformation values of the respective signals). The connection is made with transfer elements of real number coefficient so that the real part and the imaginary part of a transfer expression equation which is obtained by multiplying both sides of a transfer expression equation U . F (s - j omega ) = V of U , F and V as defined above by the denominator of F (s - omega ) may be equal to each other.

2. 发明公开

EP1071097A4 STAGE POSITIONING DEVICE 审中-公开
标题翻译：设备定位的板
公开(公告)号：EP1071097A4
公开(公告)日：2007-07-25
申请号：EP98954803
申请日：1998-11-24
申请人： EBARA CORP
发明人： WATANABE KATSUHIDE , SATOH ICHIJU , HAGA TAKAHIDE , JOUNO YOSHINORI
IPC分类号： G12B5/00 , G01B11/00 , G03B27/42 , G03F7/20 , H02K7/09
CPC分类号： G03F7/70758 , G03F7/70716 , G03F7/70816 , Y10S977/839
摘要： A stage positioning device enabling a fine and stable positioning operation, comprising a stage (11) on which a sample (W) to which a beam (B) is applied, is placed, actuators (12a, 12b, 12c and 12d) which support the stage (11) in a noncontact and levitated state and control its movement, a first sensor (13) which measures relative displacement between the stage (11) and actuators (12a, 12b, 12c and 12d), a second sensor (36) which measures a relative displacement between an actual beam (B) application position and a target beam application position on the sample and a controller (15) which controls the movement of the stage so as to reduce the relative displacement detected by the sensor (36), wherein the stage is a magnetically levitated stage consisting of a levitation unit which has a table part on which the sample is placed and side plates hanging down from the outer circumference of the table part and a fixed unit which has the actuators which supports the levitation unit with the magnetic forces of magnets and, at the same time, controls the position of the levitation unit, and the fixed unit is covered with the table part and side plates of the levitation unit.

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