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1. 发明授权

EP0358426B1 SOR exposure system 失效
标题翻译： S.O.R.-Belichtungssystem
公开(公告)号：EP0358426B1
公开(公告)日：1996-02-07
申请号：EP89308922.7
申请日：1989-09-04
申请人： CANON KABUSHIKI KAISHA
发明人： Uda, Koji , Tanaka, Yutaka , Mori, Tetsuzo , Shimoda, Isamu , Uzawa, Schunichi
IPC分类号： G03F7/20
CPC分类号： G03F7/70525 , G03F7/70808 , G03F7/70841 , G03F7/70883 , G03F7/709 , G03F7/70991

2. 发明公开

EP0424181A2 X-ray exposure apparatus 失效
标题翻译： X射线曝光装置
公开(公告)号：EP0424181A2
公开(公告)日：1991-04-24
申请号：EP90311531.9
申请日：1990-10-19
申请人： CANON KABUSHIKI KAISHA
发明人： Tanaka, Yutaka , Mizusawa, Nobutoshi , Kariya, Takao , Uzawa, Shunichi , Amemiya, Mitsuaki
IPC分类号： G03F7/20
CPC分类号： G03F7/70866 , G03F7/70691 , G03F7/70808 , G03F7/70858
摘要： An X-ray exposure apparatus, for transferring a pattern of the mask (13) to a wafer (15), includes an X-ray source accommodating chamber (50); a mask chuck (14) for supporting the mask; a wafer chuck (16) for supporting the wafer; a stage (18) for moving the wafer chuck; a stage accommodating chamber (19) for accommodating therein the mask chuck, the wafer chuck and the stage; a barrel (5) for coupling the X-ray source accommodating chamber with the stage accommodating chamber, to define an X-ray projection passageway (30); a blocking window (6) provided in the X-ray projection passageway, for isolating the ambience in the X-ray accommodating chamber and the ambience in the stage accommodating chamber from each other; and a gas supply port (3) contributable to fill the stage accommodating chamber with a gas ambience of low X-ray absorption. The gas supply port opens to the X-ray projection passageway at a position between the blocking window and the mask supported by the mask chuck.
摘要翻译：一种用于将掩模（13）的图案转印到晶片（15）上的X射线曝光设备，包括：X射线源容纳室（50）; 一个掩模卡盘（14），用于支撑该掩模; 晶片卡盘（16），用于支撑晶片; 用于移动晶片卡盘的平台（18）一个用于在其中容纳掩模卡盘，晶片卡盘和工作台的工作台容纳室（19）用于将所述X射线源容纳室与所述载物台容纳室联接以限定X射线投影通道（30）的桶（5）; 设置在X射线投影通道中用于将X射线放置室中的气氛与台放置室中的气氛隔开的阻挡窗口; 和一个供气口（3），可以有助于充满低吸收X射线的气体氛围的载物台容纳室。气体供应端口在阻挡窗口和由掩模卡盘支撑的掩模之间的位置处通向X射线投影通道。

3. 发明公开

EP0358426A3 SOR exposure system 失效
标题翻译： SOR曝光系统
公开(公告)号：EP0358426A3
公开(公告)日：1991-04-17
申请号：EP89308922.7
申请日：1989-09-04
申请人： CANON KABUSHIKI KAISHA
发明人： Uda, Koji , Tanaka, Yutaka , Mori, Tetsuzo , Shimoda, Isamu , Uzawa, Schunichi
IPC分类号： G03F7/20
CPC分类号： G03F7/70525 , G03F7/70808 , G03F7/70841 , G03F7/70883 , G03F7/709 , G03F7/70991
摘要： Synchrotron orbital radiation (SOR) exposure system includes a SOR ring (8) and a plurality (15a-15c) of exposure apparatus each being coupled to the SOR ring and being arranged to expose a wafer to a mask pattern with X-rays contained in synchrotron radiation from the SOR ring (8) to thereby print the mask pattern on the wafer. Specific arrangement is provided to allow communication of a control of the SOR ring and respective controls of the exposure apparatuses. If any abnormality such as vacuum leakage occurs in one exposure apparatus, the information is transmitted to all the controls to start, in all the exposure apparatuses, appropriate operations to protect the exposure apparatuses against the abnormality. This makes it possible to prevent stoppage of the SOR exposure system as a whole even when any abnormality occurs in one exposure apparatus.

4. 发明公开

EP0363163A2 X-ray exposure apparatus 失效
标题翻译： Röntgenstrahl-Belichtungsvorrichtung。
公开(公告)号：EP0363163A2
公开(公告)日：1990-04-11
申请号：EP89310127.9
申请日：1989-10-04
申请人： CANON KABUSHIKI KAISHA
发明人： Tanaka, Yutaka , Mizusawa, Nobutoshi , Amemiya, Mitsuaki , Kariya, Takao , Shimoda, Isamu
IPC分类号： G03F7/20
CPC分类号： G03F7/70816 , G03F7/70858 , G03F7/70866 , G03F7/70875
摘要： An X-ray exposure apparatus for exposing a semiconductor wafer to a mask with X-rays, to print a pattern of the mask onto the wafer, is disclosed. The ambience within a stage accommodating chamber, accommodating a mask, a semiconductor wafer and the like, is replaced by helium and, thereafter, a predetermined quantity of helium is supplied into the stage accommodating chamber. This effectively prevents degradation in purity of helium due to air leakage into the chamber and, therefore, undesirable decrease in quantity of X-ray transmission can be avoided. Thus, high-precision and high-throughput exposure is ensured.
摘要翻译：公开了一种用于将半导体晶片暴露于具有X射线的掩模的X射线曝光装置，以将掩模的图案印刷到晶片上。在平台容纳室内容纳掩模，半导体晶片等的气氛被氦代替，之后将规定量的氦供给到载台收容室内。这有效地防止由于空气泄漏到室中氦的纯度降低，因此可以避免X射线透过量的不期望的减少。因此，确保了高精度和高通量的曝光。

5. 发明公开

EP0326425A3 Positioning mechanism and method 失效
标题翻译：定位机制
公开(公告)号：EP0326425A3
公开(公告)日：1989-12-20
申请号：EP89300838.3
申请日：1989-01-27
申请人： CANON KABUSHIKI KAISHA
发明人： Mizusawa, Nobutoshi , Tanaka, Yutaka , Ebinuma, Ryuichi
IPC分类号： H01L21/68 , H01L21/00
CPC分类号： G03F7/70691 , H01L21/681
摘要： A positioning device includes a movable table supported by a rectilinear guide mechanism or rotary mechanism, the movable table being moved by a driving mechanism so as to position a member, to be conveyed, placed on the movable table, with respect to a predetermined site. After the member being conveyed is conveyed to the predetermined site, the conveyed member is contacted intimately to a stationary table which provides a reference with respect to the attitude of the conveyed member, such that the attitude correction of the conveyed member is attained.

6. 发明授权

EP0363163B1 X-ray exposure apparatus 失效
标题翻译： X射线曝光装置
公开(公告)号：EP0363163B1
公开(公告)日：1996-07-24
申请号：EP89310127.9
申请日：1989-10-04
申请人： CANON KABUSHIKI KAISHA
发明人： Tanaka, Yutaka , Mizusawa, Nobutoshi , Amemiya, Mitsuaki , Kariya, Takao , Shimoda, Isamu
IPC分类号： G03F7/20
CPC分类号： G03F7/70816 , G03F7/70858 , G03F7/70866 , G03F7/70875

7. 发明公开

EP0424181A3 X-ray exposure apparatus 失效
标题翻译： X射线曝光装置
公开(公告)号：EP0424181A3
公开(公告)日：1992-06-10
申请号：EP90311531.9
申请日：1990-10-19
申请人： CANON KABUSHIKI KAISHA
发明人： Tanaka, Yutaka , Mizusawa, Nobutoshi , Kariya, Takao , Uzawa, Shunichi , Amemiya, Mitsuaki
IPC分类号： G03F7/20
CPC分类号： G03F7/70866 , G03F7/70691 , G03F7/70808 , G03F7/70858
摘要： An X-ray exposure apparatus, for transferring a pattern of the mask (13) to a wafer (15), includes an X-ray source accommodating chamber (50); a mask chuck (14) for supporting the mask; a wafer chuck (16) for supporting the wafer; a stage (18) for moving the wafer chuck; a stage accommodating chamber (19) for accommodating therein the mask chuck, the wafer chuck and the stage; a barrel (5) for coupling the X-ray source accommodating chamber with the stage accommodating chamber, to define an X-ray projection passageway (30); a blocking window (6) provided in the X-ray projection passageway, for isolating the ambience in the X-ray accommodating chamber and the ambience in the stage accommodating chamber from each other; and a gas supply port (3) contributable to fill the stage accommodating chamber with a gas ambience of low X-ray absorption. The gas supply port opens to the X-ray projection passageway at a position between the blocking window and the mask supported by the mask chuck.

8. 发明公开

EP0441646A1 Gate valve device 失效
标题翻译： Schieberanlage。
公开(公告)号：EP0441646A1
公开(公告)日：1991-08-14
申请号：EP91301039.3
申请日：1991-02-08
申请人： CANON KABUSHIKI KAISHA
发明人： Tanaka, Yutaka , Ozawa, Kunitaka , Kariya, Takao , Uzawa, Shunichi
IPC分类号： F16K3/18
CPC分类号： F16K3/188
摘要： A gate valve device including a partition wall (41) having an opening (13); a valve member (14) movable along the partition wall to openably close the opening; a driving system means for moving the valve member (14); and a pressing mechanism (26) for pressing the valve member toward the partition wall, the pressing mechanism having a pressing member (33) projectable toward and retractable from the valve member, wherein the pressing mechanism presses the valve member against the partition wall when the valve member is in a position closing the opening.
摘要翻译：一种闸阀装置，包括具有开口（13）的分隔壁（41）; 阀构件（14），其可沿所述隔壁移动以可开启地关闭所述开口; 用于移动阀构件（14）的驱动系统装置; 以及用于将所述阀构件朝向所述分隔壁按压的按压机构（26），所述按压机构具有可从所述阀构件朝向和从所述阀构件伸出的按压构件（33），其中，所述按压构件将所述阀构件压靠在所述隔壁上，阀构件处于关闭开口的位置。

9. 发明公开

EP0326425A2 Positioning mechanism and method 失效
标题翻译： Positionierungsmechanismus。
公开(公告)号：EP0326425A2
公开(公告)日：1989-08-02
申请号：EP89300838.3
申请日：1989-01-27
申请人： CANON KABUSHIKI KAISHA
发明人： Mizusawa, Nobutoshi , Tanaka, Yutaka , Ebinuma, Ryuichi
IPC分类号： H01L21/68 , H01L21/00
CPC分类号： G03F7/70691 , H01L21/681
摘要： A positioning device includes a movable table supported by a rectilinear guide mechanism or rotary mechanism, the movable table being moved by a driving mechanism so as to position a member, to be conveyed, placed on the movable table, with respect to a predetermined site. After the member being conveyed is conveyed to the predetermined site, the conveyed member is contacted intimately to a stationary table which provides a reference with respect to the attitude of the conveyed member, such that the attitude correction of the conveyed member is attained.
摘要翻译：定位装置包括由直线引导机构或旋转机构支撑的可移动台，所述可移动台由驱动机构移动，以将相对于预定位置放置在可移动台上的待传送构件定位。在被输送的构件被传送到预定位置之后，被传送的构件紧密地接触固定的桌子，该固定的桌子相对于所传送的构件的姿态提供参考，从而达到所传送的构件的姿态校正。

10. 发明授权

EP0424181B1 X-ray exposure apparatus 失效
标题翻译： X射线曝光装置
公开(公告)号：EP0424181B1
公开(公告)日：2001-09-05
申请号：EP90311531.9
申请日：1990-10-19
申请人： CANON KABUSHIKI KAISHA
发明人： Tanaka, Yutaka , Mizusawa, Nobutoshi , Kariya, Takao , Uzawa, Shunichi , Amemiya, Mitsuaki
IPC分类号： G03F7/20
CPC分类号： G03F7/70866 , G03F7/70691 , G03F7/70808 , G03F7/70858

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