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1. 发明公开

EP1174768A1 Exposure apparatus and device manufacturing method using the same 失效
公开(公告)号：EP1174768A1
公开(公告)日：2002-01-23
申请号：EP01203844.4
申请日：1997-06-03
申请人： CANON KABUSHIKI KAISHA
发明人： Inoue, Mitsuru, c/o Canon Kabushiki Kaisha , Ebinuma, Ryuichi, c/o Canon Kabushiki Kaisha , Iwamoto, Kazunori, c/o Canon Kabushiki Kaisha , Osanai, Eiji, c/o Canon Kabushiki Kaisha , Takeishi, Hiroaki, c/o Canon Kabushiki Kaisha
IPC分类号： G03F7/20
CPC分类号： G03F7/70358 , G03F7/70716 , G03F7/70725 , G03F7/70833 , G03F7/709
摘要： A scanning exposure apparatus wherein a portion of a pattern of an original is projected on to a substrate through a projection optical system and wherein the original and the substrate are scanningly moved relatively to the projection optical system whereby the pattern of the original is transferred on to the substrate. The apparatus includes an original stage for holding the original, a base for supporting the original stage, and a supporting system for supporting the base at three positions, through dampers and pillar.

2. 发明公开

EP0540178A2 X-ray exposure apparatus 失效
标题翻译： Röntgenbelichtungsvorrichtung。
公开(公告)号：EP0540178A2
公开(公告)日：1993-05-05
申请号：EP92308909.8
申请日：1992-09-30
申请人： CANON KABUSHIKI KAISHA
发明人： Kasumi, Kazuyuki, c/o Canon Kabushiki Kaisha , Abe, Naoto, c/o Canon Kabushiki Kaisha , Ebinuma, Ryuichi, c/o Canon Kabushiki Kaisha , Hasegawa, Takayuki, c/o Canon Kabushiki Kaisha
IPC分类号： G03F7/20
CPC分类号： G03F7/70141 , G03F7/702 , G03F7/70841 , G03F7/70858 , G03F7/70891
摘要： An X-ray apparatus is disclosed which includes a mirror (2) having a reflection surface, for expanding an X-ray beam (1) in a predetermined direction, a detecting device (8a, 8b) for detecting a relative positional relationship between the X-ray beam and the reflection surface with respect to a direction perpendicular to the reflection surface, and an adjusting device (6) for adjusting the relative position of the X-ray beam and the reflection surface on the basis of the detection. Also disclosed is an exposure apparatus and a semiconductor device manufacturing method using the X-ray apparatus.
摘要翻译：公开了一种X射线装置，其包括：具有反射面的反射镜（2），用于将X射线束（1）沿预定方向扩展;检测装置（8a，8b），用于检测 X射线束和反射面相对于与反射面垂直的方向，以及调整装置（6），用于基于检测来调整X射线束和反射面的相对位置。还公开了使用该X射线装置的曝光装置和半导体装置的制造方法。

3. 发明公开

EP0422814A2 Exposure apparatus 失效
标题翻译： Belichtungsvorrichtung。
公开(公告)号：EP0422814A2
公开(公告)日：1991-04-17
申请号：EP90310748.0
申请日：1990-10-01
申请人： CANON KABUSHIKI KAISHA
发明人： Sakamoto, Eiji, c/o Canon Kabushiki Kaisha , Ebinuma, Ryuichi, c/o Canon Kabushiki Kaisha , Amemiya, Mitsuaki, c/o Canon Kabushiki Kaisha , Uzawa, Shunichi, c/o Canon Kabushiki Kaisha , Uda, Koji, c/o Canon Kabushiki Kaisha
IPC分类号： G03F7/20
CPC分类号： G03F7/70875 , G03F7/70008 , G03F7/70691 , G03F7/70858 , G03F7/70866
摘要： An exposure apparatus includes a chamber (1) for placing the article in a predetermined ambience; holding device (5) for holding the article in the chamber; a fluid supplying device (3) for supplying a temperature adjusting fluid into the holding device through a flow passageway (4); a detecting device (2) for detecting leakage of the fluid from the flow passageway; and a flow rate controlling device (9) for controlling the flow rate of the fluid to be supplied to the holding device on the basis of detection by the detecting device.
摘要翻译：曝光装置包括用于将物品放置在预定环境中的腔室（1）保持装置（5），用于将物品保持在所述室中; 流体供应装置（3），用于通过流动通道（4）将温度调节流体供应到所述保持装置中; 检测装置（2），用于检测来自流动通道的流体的泄漏; 以及流量控制装置（9），用于根据检测装置的检测来控制供给到保持装置的流体的流量。

4. 发明公开

EP0387038A2 Reflecting device and pattern transfer apparatus using the same 失效
标题翻译： Elerichtung verwendendesMusterübertragungsgerät的Reflektoreinrichtung und diese。
公开(公告)号：EP0387038A2
公开(公告)日：1990-09-12
申请号：EP90302441.2
申请日：1990-03-07
申请人： CANON KABUSHIKI KAISHA
发明人： Mochizuki, Noritaka, c/o Canon Kabushiki Kaisha , Ebinuma, Ryuichi, c/o Canon Kabushiki Kaisha
IPC分类号： G03F7/20
CPC分类号： G03F7/702 , G03F7/708
摘要： A reflecting device (2) includes a reflection surface for reflecting light from a predetermined direction; and a driving mechanism for moving the reflection surface without causing a change in a direction of reflection and a position (6,7) of reflection of the input light.
摘要翻译：反射装置（2）包括用于反射来自预定方向的光的反射表面; 以及用于移动反射表面而不引起反射方向的改变和输入光的反射的位置（6,7）的驱动机构。

5. 发明授权

EP0456426B1 Vacuum type wafer holder 失效
标题翻译：真空型衬底载体
公开(公告)号：EP0456426B1
公开(公告)日：2004-09-15
申请号：EP91304027.5
申请日：1991-05-03
申请人： CANON KABUSHIKI KAISHA
发明人： Sakamoto, Eiji, c/o Canon Kabushiki Kaisha , Ebinuma, Ryuichi, c/o Canon Kabushiki Kaisha , Hara, Shinichi, c/o Canon Kabushiki Kaisha , Marumo, Mitsuji, c/o Canon Kabushiki Kaisha
IPC分类号： H01L21/00 , C23C14/50 , C30B31/14
CPC分类号： C30B31/14 , C30B25/12 , H01L21/6838 , Y10T279/11

6. 发明公开

EP0421746A3 Exposure apparatus 失效
公开(公告)号：EP0421746A3
公开(公告)日：1992-01-22
申请号：EP90310798.5
申请日：1990-10-03
申请人： CANON KABUSHIKI KAISHA
发明人： Watanabe, Yutaka, c/o Canon Kabushiki Kaisha , Ebinuma, Ryuichi, c/o Canon Kabushiki Kaisha , Mizusawa, Nobutoshi, c/o Canon Kabushiki Kaisha , Uzawa, Shunichi, c/o Canon Kabushiki Kaisha , Kariya, Takao, c/o Canon Kabushiki Kaisha
IPC分类号： G03F7/20
CPC分类号： G03F7/7085 , G03F7/702
摘要： An exposure apparatus includes an exposure light source (13) for projecting a flux of light (14) to be used for exposure, having a non-uniform intensity distribution, toward a range including an exposure zone, set with respect to a main body (40) of the exposure apparatus; illuminance detectors (61) disposed at least at two points inside the exposure light flux (16) but outside the exposure zone; and a detecting device (62) for detecting a change in intensity of the exposure light and a change in relative position of the exposure zone and the exposure light flux, on the basis of detected illuminances at the two points.

7. 发明公开

EP0444936A3 Exposure apparatus 失效
公开(公告)号：EP0444936A3
公开(公告)日：1991-12-11
申请号：EP91301656.4
申请日：1991-02-28
申请人： CANON KABUSHIKI KAISHA
发明人： Ebinuma, Ryuichi, c/o Canon Kabushiki Kaisha , Mizusawa, Nobutoshi, c/o Canon Kabushiki Kaisha , Kariya, Takao, c/o Canon Kabushiki Kaisha , Suda, Shigeyuki, c/o Canon Kabushiki Kaisha , Uzawa, Shunichi, c/o Canon Kabushiki Kaisha
IPC分类号： G03F7/20 , G03B27/53 , G03F9/00
CPC分类号： G03F7/70066 , G03F7/70858 , G03F7/70891 , G03F9/70
摘要： An exposure apparatus for transferring a pattern of an original (1, 2) onto a workpiece (3), includes a blocking member (7a-7d) for defining a rectangular exposure region with respect to at least one of the original (1, 2) and the workpiece (3), wherein the exposure for the pattern transfer can be effected with the exposure region defined by the blocking member (7a-7d). Plural detection systems detect a positional deviation between the original (1, 2) and the workpiece (3), each of which is disposed so as to be associated with at least one of four sides of the rectangular exposure region. Plural first movable stages (8a-8d) each is provided so as to be associated with at least one of the four sides, and each is adapted to carry thereon one of the detection systems disposed to be associated with a corresponding side. Each first movable stage (8a-8d) comprises a single-axis stage movable in a direction parallel to a corresponding side. Plural second stages (9a-9d) each carrys thereon corresponding one of the first movable stages (8a-8d), and each comprises a single-axis stage movable in a direction perpendicular to a corresponding side and in a direction parallel to the rectangular exposure region. Each second movable stage (9a-9d) is operable to displace the light blocking member (7a-7d) to change the rectangular exposure region.

8. 发明公开

EP0444936A2 Exposure apparatus 失效
标题翻译：曝光装置
公开(公告)号：EP0444936A2
公开(公告)日：1991-09-04
申请号：EP91301656.4
申请日：1991-02-28
申请人： CANON KABUSHIKI KAISHA
发明人： Ebinuma, Ryuichi, c/o Canon Kabushiki Kaisha , Mizusawa, Nobutoshi, c/o Canon Kabushiki Kaisha , Kariya, Takao, c/o Canon Kabushiki Kaisha , Suda, Shigeyuki, c/o Canon Kabushiki Kaisha , Uzawa, Shunichi, c/o Canon Kabushiki Kaisha
IPC分类号： G03F7/20 , G03B27/53 , G03F9/00
CPC分类号： G03F7/70066 , G03F7/70858 , G03F7/70891 , G03F9/70
摘要： An exposure apparatus for transferring a pattern of an original (1, 2) onto a workpiece (3), includes a blocking member (7a-7d) for defining a rectangular exposure region with respect to at least one of the original (1, 2) and the workpiece (3), wherein the exposure for the pattern transfer can be effected with the exposure region defined by the blocking member (7a-7d). Plural detection systems detect a positional deviation between the original (1, 2) and the workpiece (3), each of which is disposed so as to be associated with at least one of four sides of the rectangular exposure region. Plural first movable stages (8a-8d) each is provided so as to be associated with at least one of the four sides, and each is adapted to carry thereon one of the detection systems disposed to be associated with a corresponding side. Each first movable stage (8a-8d) comprises a single-axis stage movable in a direction parallel to a corresponding side. Plural second stages (9a-9d) each carrys thereon corresponding one of the first movable stages (8a-8d), and each comprises a single-axis stage movable in a direction perpendicular to a corresponding side and in a direction parallel to the rectangular exposure region. Each second movable stage (9a-9d) is operable to displace the light blocking member (7a-7d) to change the rectangular exposure region.
摘要翻译：一种用于将原件（1,2）的图案转印到工件（3）上的曝光设备，包括用于相对于原件（1,2）中的至少一个定义矩形曝光区域的阻挡构件（7a-7d））和工件（3），其中用于图案转印的曝光可以通过由阻挡构件（7a-7d）限定的曝光区域来实现。多个检测系统检测原件（1,2）和工件（3）之间的位置偏差，每个位置偏差设置成与矩形曝光区域的四条边中的至少一条边相关联。多个第一可移动平台（8a-8d）各自被设置成与四个边中的至少一个相关联，并且每个第一可移动平台适于在其上承载设置成与对应边相关联的检测系统之一。每个第一可移动台（8a-8d）包括可在平行于相应侧的方向上移动的单轴台。多个第二平台（9a-9d）分别在其上具有对应的第一可移动平台（8a-8d）中的一个，并且每个第二平台包括单轴平台，该平台可在垂直于相应侧的方向上并且在平行于矩形曝光地区。每个第二可移动平台（9a-9d）可操作以移动光阻挡构件（7a-7d）以改变矩形曝光区域。

9. 发明授权

EP0422814B1 Exposure apparatus 失效
标题翻译：曝光装置
公开(公告)号：EP0422814B1
公开(公告)日：1999-03-17
申请号：EP90310748.0
申请日：1990-10-01
申请人： CANON KABUSHIKI KAISHA
发明人： Sakamoto, Eiji, c/o Canon Kabushiki Kaisha , Ebinuma, Ryuichi, c/o Canon Kabushiki Kaisha , Amemiya, Mitsuaki, c/o Canon Kabushiki Kaisha , Uzawa, Shunichi, c/o Canon Kabushiki Kaisha , Uda, Koji, c/o Canon Kabushiki Kaisha
IPC分类号： G03F7/20
CPC分类号： G03F7/70875 , G03F7/70008 , G03F7/70691 , G03F7/70858 , G03F7/70866

10. 发明授权

EP0416811B1 X-ray exposure method and apparatus 失效
标题翻译：对于X射线曝光的方法和装置
公开(公告)号：EP0416811B1
公开(公告)日：1996-12-04
申请号：EP90309487.8
申请日：1990-08-30
申请人： CANON KABUSHIKI KAISHA
发明人： Watanabe, Yutaka, c/o Canon Kabushiki Kaisha , Uno, Shinichiro, c/o Canon Kabushiki Kaisha , Ebinuma, Ryuichi, c/o Canon Kabushiki Kaisha , Mizusawa, Nobutoshi, c/o Canon Kabushiki Kaisha , Uzawa, Shunichi, c/o Canon Kabushiki Kaisha
IPC分类号： G03F7/20
CPC分类号： G03F7/702 , G03F7/2039

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